Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 91158 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
| 91159 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2001 | 1 | inquire | |
| 91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | ||
| 91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
| 91182 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 31.05.1993 | 1 | as is where is | |
| 91183 | Applied Materials | P5000 CVD | TEOS, DxL | 200 mm | 1 | as is where is | ||
| 91185 | Applied Materials | P5000 CVD | DxL | 150 mm | 31.05.1995 | 1 | as is where is | |
| 91189 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
| 91190 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
| 91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 91193 | Applied Materials | P5000 Mark-II CVD | TEOS | 150 mm | 1 | as is where is | ||
| 91194 | Applied Materials | P5000 Mark-II CVD | DxL | 200 mm | 1 | as is where is | ||
| 91195 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 91196 | Applied Materials | P5000 Mark-II CVD+Etch | Sputter | 200 mm | 1 | as is where is | ||
| 91199 | Applied Materials | P5000 Mark-II CVD+PVD | TEOS 2Ch, SPUTTER 2Ch | 200 mm | 01.05.1997 | 1 | as is where is | |
| 91204 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
| 91205 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
| 91208 | Applied Materials | Producer GT Chamber (A) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 91209 | Applied Materials | Producer GT Chamber (B) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 93051 | Applied Materials | P5000 | WXL | 150 mm | 31.05.1994 | 1 | as is where is | |
| 93053 | Applied Materials | PRODUCER GT | LLTO | 300 mm | 31.05.2014 | 1 | as is where is | |
| 94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 103508 | Applied Materials | PRODUCER GT | Ht ACL 3ch / Server OS Type | 300 mm | 31.05.2014 | 1 | as is where is | |
| 103509 | Applied Materials | PRODUCER GT | BD2_CU | 300 mm | 31.05.2002 | 1 | as is where is | |
| 103510 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 31.05.2003 | 1 | as is where is | |
| 103511 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 1 | as is where is | ||
| 106575 | Applied Materials | Centura AP Ultima Chamber | HDPCVD Chamber only | 300 mm | 1 | as is where is | ||
| 106582 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2001 | 1 | as is where is | |
| 106584 | Applied Materials | ENDURA 2 (Gray Rack) | 3CH (WxZ) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106621 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 150 mm | 01.06.1996 | 1 | as is where is | |
| 106622 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 200 mm | 01.06.1998 | 1 | as is where is | |
| 106623 | Applied Materials | P5000 | DxL 2ch | 200 mm | 01.06.1996 | 1 | as is where is | |
| 106631 | Applied Materials | Producer GT Chamber | SIH4 | 300 mm | 1 | as is where is | ||
| 106633 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
| 106634 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106635 | Applied Materials | PRODUCER SE | SILANE 2ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
| 106636 | Applied Materials | PRODUCER SE | Teos 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108023 | Applied Materials | P5000 | CVD | 200 mm | 01.11.1990 | 1 | as is where is | |
| 108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | |
| 108143 | Applied Materials | P5000 | Delta Dlh 3chCVD | 150 mm | 1 | as is where is | ||
| 108145 | Applied Materials | P5000 | Teos dlh 3ch CVD | 150 mm | 1 | as is where is | ||
| 108147 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108148 | Applied Materials | Producer SE Chamber | LLTO Chamber only | 300 mm | 01.06.2014 | 1 | as is where is | |
| 108149 | Applied Materials | PRODUCER SE CHAMBER | PECVD Silane Chamber Only | 300 mm | 1 | as is where is | ||
| 108150 | Applied Materials | PRODUCER SE CHAMBER | PECVD TEOS Chamber Only | 300 mm | 1 | as is where is | immediately | |
| 108254 | Applied Materials | P5000 Mark 2 | CVD system with 4 x DXZ chambers, Silane process | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | |
| 109134 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | ||
| 109135 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | ||
| 109152 | Applied Materials | Producer SE PECVD SILANE | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 109582 | Applied Materials | P5000 | CVD SiN Process with 2 x CVD chambers | 150 MM | 01.06.1989 | 1 | as is where is | immediately |
| 109583 | Applied Materials | P5000 | CVD TEOS Process with 2 x CVD chambers | 150 MM | 01.06.1989 | 1 | as is where is | immediately |
| 110715 | Applied Materials | P5000 | 4 Chamber SiN CVD | 150 MM | 01.06.1993 | 1 | as is where is | immediately |
| 110716 | Applied Materials | P5000 Mark 2 | 2 Chambers TEOS PECVD and 2 Chambers Dry Etch | 150 MM | 01.06.2000 | 1 | as is where is | immediately |
| 110717 | Applied Materials | P5000 | 3 Chambers PECVD TEOS | 150 MM | 01.06.1996 | 1 | as is where is | immediately |
| 108384 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 3 | as is where is | ||
| 109117 | ASM | XP8 | Dual Chamber PECVD system for Oxide and Nitride | 300 mm | 01.06.2010 | 2 | as is where is | immediately |
| 106641 | BMR | HIDEP | PECVD | N/A | 01.06.2006 | 1 | as is where is | |
| 109044 | CVD Equipment Corporation | Easy Tube 3000 | Growth Equipment | 06.01.2009 | 2 | as is where is | ||
| 106698 | LAM | ALTUS | CVD | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106700 | LAM | Novellus Altus Max Concept Three | Tungsten CVD | 300 mm | 01.03.2014 | 1 | as is where is | immediately |
| 100919 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2001 | 1 | as is where is | |
| 100920 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2010 | 1 | as is where is | |
| 100921 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2003 | 1 | as is where is | |
| 108574 | LAM RESEARCH | STRATA-3 | CVD | 300mm | 01.06.2021 | 1 | as is where is | immediately |
| 108577 | LAM RESEARCH | Vector Express | CVD | 300 mm | 01.06.2003 | 1 | as is where is | immediately |
| 111340 | LAM RESEARCH | CONCEPT 3 (Parts) | Preclean module | 300 mm | 01.06.2010 | 2 | as is where is | immediately |
| 91218 | NOVELLUS | CONCEPT 3 GAMMA 2130 | 300 mm | 1 | as is where is | |||
| 91219 | NOVELLUS | CONCEPT 3 GAMMA 2130 | 300 mm | 1 | as is where is | |||
| 91220 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2004 | 1 | as is where is | |
| 91221 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2006 | 1 | as is where is | |
| 91223 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103546 | NOVELLUS | VECTOR | PECVD Nitride | 300 mm | 31.05.2005 | 1 | as is where is | |
| 106710 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2003 | 1 | as is where is | |
| 106711 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2004 | 1 | as is where is | |
| 106712 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | |
| 106713 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | |
| 106714 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | |
| 108472 | Novellus | Concept Three Speed | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 108477 | Novellus | VECTOR SOLA UV Cure | PECVD (Chemical Vapor Deposition) | 300 mm | 2 | as is where is | ||
| 109221 | Novellus | Concept Three Altus | WCVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 109222 | Novellus | Concept Three Altus | WCVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 109223 | Novellus | VECTOR | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 109224 | Novellus | VECTOR SOLA UV Cure | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
| 99399 | Oxford | Micro-dep 300 | PE CVD system (For spares use) | 1 | as is where is | immediately | ||
| 109097 | Oxford | Plasmalab System 100 | PECVD TEOS with Load Lock | 200 mm | 01.05.2001 | 1 | as is where is | immediately |
| 109595 | Oxford | NGP 1000 | PECVD | 150 mm | 01.06.2012 | 1 | inquire | |
| 106953 | PLASMATHERM | LAPECVD | Large Area PECVD system, used for SiO and SiN process depositions | 150 mm | 01.06.2015 | 4 | as is where is | immediately |
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
| 106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | ||
| 106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is | ||
| 108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2012 | 1 | inquire | |
| 109118 | TEL TOKYO ELECTRON | Trias | CVD | 300 mm | 01.06.2010 | 14 | as is where is | immediately |
| 110643 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | ||
| 110644 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | ||
| 108608 | TES | CHALLENGER_ST | Plasma-Enhanced CVD system | 300 mm | 01.05.2010 | 1 | as is where is | immediately |
| 91249 | VARIAN | MBB | W CVD | 200 mm | 1 | as is where is |