Buy and Sell Semiconductor, Assembly, Test and SMT Equipment at fabsurplus.com
Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q.ty | Sales Cond. | Lead Time | Att. |
|---|---|---|---|---|---|---|---|---|---|
| 33821 | AMAT | P-5000 | 3 Chamber TEOS Deposition with Hot Box Delivery System, for 200mm Wafers, 2ea Available | 1 | as is where is | 0 | |||
| 19373 | Applied Material | PRODUCER BPSG | Producer BPSG Shrink Type Body | 1 | 6 | ||||
| 3419 | Applied Materials | P5000 | CVD SYSTEM, 2 CHAMBER TEOS Oxide CVD | 200 MM | 01.01.1994 | 1 | inquire | immediately | 51 |
| 15559 | APPLIED MATERIALS | SPARES | MIPS MIXING SYSTEM AND FULL SCAN ENDPOINT | 200 MM | 01.12.1995 | 1 | as is where is | immediately | 0 |
| 15560 | APPLIED MATERIALS | SPARES | MIPS MIXING SYSTEM AND FULL SCAN ENDPOINT | 200 MM | 01.10.2002 | 1 | as is where is | immediately | 0 |
| 16433 | Applied Materials | Producer | PECVD (Plasma Enhanced) TWIN | 200 MM | 01.06.2001 | 1 | inquire | 1 month | 27 |
| 17358 | Applied Materials | 5200 ULTIMA | HDP CVD SYSTEM | 200 mm | 01.06.2000 | 2 | inquire | immediately | 0 |
| 17839 | APPLIED MATERIALS | P5000 | 3 CVD/1 Etch Configured SACVD | 200 MM | 1 | as is where is | immediately | 0 | |
| 19039 | Applied Materials | Centura 5200 Radiance | 1 | as is where is | 0 | ||||
| 20085 | Applied Materials | Producer PECVD | PECVD | 200 mm | 01.01.2001 | 1 | 1 | ||
| 20236 | Applied Materials | 5200 CENTURA Ultima X | HDP-CVD | 300 mm | 1 | inquire | immediately | 0 | |
| 20449 | Applied Materials | ENDURA CHAMBER | Endura chambers 300mm | 300mm | 4 | 4 | |||
| 21458 | Applied Materials | P5000 | SiN PECVD system | 200 mm | 1 | inquire | immediately | 10 | |
| 21905 | Applied Materials | PRODUCER S | 3-TWIN CHAMBER CVD TRANSPARENT CARBON | 200 mm | 1 | inquire | 0 | ||
| 21906 | Applied Materials | PRODUCER S | 3-TWIN CVD TRANSPARENT CARBON | 200 mm | 1 | inquire | 0 | ||
| 21907 | Applied Materials | 5200 | 4 CH TI | 200 mm | 1 | inquire | 0 | ||
| 21908 | Applied Materials | 5200 | 4 CH TI | 200 mm | 1 | inquire | 0 | ||
| 22838 | Applied Materials | DPS II | Centura Chamber | 200 mm | 1 | as is where is | immediately | 10 | |
| 23187 | APPLIED MATERIALS | 5000 | PECVD NITRIDE MHM | 1 | inquire | 0 | |||
| 23224 | Applied Materials | DPN Chamber | Centura DPN Chamber | 200 mm | 01.06.2004 | 1 | as is where is | immediately | 25 |
| 30015 | APPLIED MATERIALS | CENTURA 5200 WXZ | CVD - W | 1 | as is where is | 0 | |||
| 30016 | APPLIED MATERIALS | CENTURA 5200 WXZ | CVD - W | 1 | as is where is | 0 | |||
| 30014 | APPLIED MATERIALS | CENTURA 5200 WXZ | CVD - W | 1 | as is where is | 0 | |||
| 30008 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - TEOS | 1 | as is where is | 0 | |||
| 30009 | APPLIED MATERIALS | PRODUCER TEOS FSG | CVD - TEOS | 1 | as is where is | 0 | |||
| 30010 | APPLIED MATERIALS | CENTURA 5200 | CVD - TIN | 1 | as is where is | 0 | |||
| 30005 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - TEOS | 1 | as is where is | 0 | |||
| 30006 | APPLIED MATERIALS | PRODUCER TEOS | CVD - TEOS | 1 | as is where is | 0 | |||
| 30013 | APPLIED MATERIALS | CENTURA 5200 WXZ | CVD - W | 1 | as is where is | 0 | |||
| 30012 | APPLIED MATERIALS | CENTURA 5200 | CVD - W | 1 | as is where is | 0 | |||
| 30003 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - TEOS | 1 | as is where is | 0 | |||
| 30004 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - TEOS | 1 | as is where is | 0 | |||
| 30007 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - TEOS | 1 | as is where is | 0 | |||
| 30000 | APPLIED MATERIALS | CENTURA 5200 | CVD - TEOS | 1 | as is where is | 0 | |||
| 30001 | APPLIED MATERIALS | CENTURA 5200 | CVD - TEOS | 1 | as is where is | 0 | |||
| 30002 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - TEOS | 1 | as is where is | 0 | |||
| 29985 | APPLIED MATERIALS | PRODUCER BLOK | CVD - PECVD | 1 | as is where is | 0 | |||
| 29986 | APPLIED MATERIALS | PRODUCER | CVD - PECVD | 1 | as is where is | 0 | |||
| 29981 | APPLIED MATERIALS | PRODUCER | CVD - PECVD | 1 | as is where is | 0 | |||
| 29982 | APPLIED MATERIALS | PRODUCER | CVD - PECVD | 1 | as is where is | 0 | |||
| 29979 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29974 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29975 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29976 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29980 | APPLIED MATERIALS | PRODUCER | CVD - PECVD | 1 | as is where is | 0 | |||
| 29969 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29970 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29971 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29977 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29973 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29972 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29968 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29967 | APPLIED MATERIALS | CENTURA 5200 DXZ | CVD - PECVD | 1 | as is where is | 0 | |||
| 29958 | APPLIED MATERIALS | CENTURA ULTIMA | CVD - HDP | 1 | as is where is | 0 | |||
| 29959 | APPLIED MATERIALS | CENTURA ULTIMA | CVD - HDP | 1 | as is where is | 0 | |||
| 29956 | APPLIED MATERIALS | CENTURA ULTIMA | CVD - HDP | 1 | as is where is | 0 | |||
| 29955 | APPLIED MATERIALS | CENTURA ULTIMA X | CVD - HDP | 1 | as is where is | 0 | |||
| 29954 | APPLIED MATERIALS | CENTURA ULTIMA X | CVD - HDP | 1 | as is where is | 0 | |||
| 29953 | APPLIED MATERIALS | CENTURA ULTIMA X | CVD - HDP | 300mm | 1 | as is where is | 1 | ||
| 29952 | APPLIED MATERIALS | CENTURA ULTIMA X | CVD - HDP | 1 | as is where is | 0 | |||
| 29945 | APPLIED MATERIALS | PRODUCER | CVD | 1 | as is where is | 0 | |||
| 29946 | APPLIED MATERIALS | PRODUCER | CVD | 1 | as is where is | 0 | |||
| 29951 | APPLIED MATERIALS | CENTURA ULTIMA | CVD - HDP | 1 | as is where is | 0 | |||
| 29950 | APPLIED MATERIALS | CENTURA ULTIMA | CVD - HDP | 1 | as is where is | 0 | |||
| 29940 | APPLIED MATERIALS | PRODUCER | CVD | 1 | as is where is | 0 | |||
| 29948 | APPLIED MATERIALS | CENTURA ULTIMA | CVD - HDP | 1 | as is where is | 0 | |||
| 29944 | APPLIED MATERIALS | CENTURA DPN GATE STACK | CVD | 1 | as is where is | 0 | |||
| 29943 | APPLIED MATERIALS | PRODUCER | CVD | 1 | as is where is | 0 | |||
| 29942 | APPLIED MATERIALS | PRODUCER | CVD | 1 | as is where is | 0 | |||
| 27853 | Applied Materials | P5000 | Oxide/Nitride Etcher | 100 mm | 1 | as is where is | immediately | 0 | |
| 27854 | Applied Materials | P5000 | Oxide/Nitride Etcher | 150 mm | 1 | as is where is | immediately | 0 | |
| 28035 | Applied Materials | P5000 TEOS | CVD | 1 | as is where is | 0 | |||
| 32351 | Applied Materials | CENTURA(SiON) | PLASMA CVD SYSTEM | 200 mm | 01.08.2002 | 1 | inquire | 0 | |
| 32348 | Applied Materials | P-5000 | CVD | 200 mm | 01.04.2000 | 1 | inquire | 0 | |
| 32349 | Applied Materials | P-5000 | CVD | 200 mm | 01.01.2001 | 1 | inquire | 0 | |
| 32346 | Applied Materials | CENTURA(3CHB) | CVD | 200 mm | 01.05.2000 | 1 | inquire | 0 | |
| 32347 | Applied Materials | CENTURA_DCVD | CVD | 200 mm | 01.12.2006 | 1 | inquire | 0 | |
| 32344 | Applied Materials | CENTURA 5200 | CVD | 200 mm | 01.11.1997 | 1 | inquire | 0 | |
| 32345 | Applied Materials | CENTURA(3CHB) | CVD | 200 mm | 01.12.1999 | 1 | inquire | 0 | |
| 32343 | Applied Materials | CENTURA 5200 | CVD | 200 mm | 01.09.1995 | 1 | inquire | 0 | |
| 34159 | Applied Materials | Centura 5200 | CVD system, GIGAFILL SACVD TEOS 4 CH | 200 mm | 01.06.2000 | 1 | as is where is | immediately | 9 |
| 34158 | Applied Materials | Centura 5200 | CVD system, GIGAFILL SACVD TEOS 4 CH | 200 mm | 01.06.2000 | 4 | as is where is | immediately | 9 |
| 34026 | Applied Materials | 0010-38754 | HR DTCU | 1 | as is where is | immediately | 7 | ||
| 31229 | Applied Materials | Centura 5200 Ultima | HDP CVD Oxide 2ch "ultima" | 200 mm | 1 | as is where is | 0 | ||
| 32151 | Applied Materials | Centura 5200 TiCl4 | CVD 3 chamber TiCl4 process | 200 mm | 01.06.1999 | 1 | inquire | immediately | 0 |
| 32625 | Applied Materials | Centura 5200 Multi-process | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32626 | Applied Materials | Centura 5200 Multi-process | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32627 | Applied Materials | Centura DxZ Chamber | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32628 | Applied Materials | Centura Polycide | cvd system | 300 mm | 01.09.2005 | 1 | inquire | 0 | |
| 32629 | Applied Materials | P5000 TEOS | cvd system | 150 mm | 1 | inquire | 0 | ||
| 32630 | Applied Materials | Producer S | cvd system | 200 mm | 01.09.2005 | 1 | inquire | 0 | |
| 32631 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32632 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32633 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32634 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32635 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32636 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32637 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32638 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32639 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32640 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32641 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32642 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32643 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32644 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32645 | Applied Materials | Producer S | cvd system | 200 mm | 1 | inquire | 0 | ||
| 33447 | APPLIED MATERIALS | P-5000 | TEOS-CVD | 150 | 1 | as is where is | 0 | ||
| 33526 | Applied Materials | Centura 5200 WxZ | CVD system | 200 MM | 01.09.2000 | 1 | as is where is | immediately | 0 |
| 33543 | Applied Materials | Centura | CVD | 8 inch | 01.01.1999 | 1 | inquire | 0 | |
| 33544 | Applied Materials | Centura | CVD | 8 inch | 01.05.2000 | 1 | inquire | 0 | |
| 33545 | Applied Materials | Centura | CVD | 8 inch | 01.01.1997 | 1 | inquire | 0 | |
| 33546 | Applied Materials | P-5000 | CVD | 8 inch | 01.12.1992 | 1 | inquire | 0 | |
| 33547 | Applied Materials | P-5000 | CVD | 8 inch | 01.02.1994 | 1 | inquire | 0 | |
| 33548 | Applied Materials | P-5000C | CVD | 8 inch | 01.11.1993 | 1 | inquire | 0 | |
| 33549 | Applied Materials | Producer | CVD | 8 inch | 01.01.1999 | 1 | inquire | 0 | |
| 33550 | Applied Materials | Producer | CVD | 8 inch | 01.01.2003 | 1 | inquire | 0 | |
| 33946 | APPLIED MATERIALS | 5200 CENTURA | CVD SYSTEM | 1 | inquire | 0 | |||
| 33947 | APPLIED MATERIALS | 5200 ULTIMA | CVD SYSTEM | 1 | inquire | 0 | |||
| 33948 | APPLIED MATERIALS | ULTIMA X 300MM | CVD SYSTEM | 300 MM | 1 | inquire | 0 | ||
| 17452 | ASM | DFS 250 (C) | 4 Stack Diffusion Furnace (WET OXIDE) | 150 mm | 1 | inquire | immediately | 5 | |
| 17453 | ASM | DFS 250 (D) | 4 Stack Diffusion Furnace (ANNEAL PROCESS) | 150 mm | 1 | inquire | immediately | 5 | |
| 20629 | ASM | EAGLE 10 TRIDENT | PLASMA PECVD | 01.09.2006 | 1 | as is where is | 0 | ||
| 33448 | ASM | Eagle10 TRIDENT | PLASMA CVD SYSTEM | 200 | 01.06.2004 | 1 | as is where is | 0 | |
| 28036 | ASM International | Polygon Chamber - SiN | CVD | 1 | as is where is | 0 | |||
| 28037 | ASML/SVG | AVP 8000 - Nitride | CVD | 1 | as is where is | 0 | |||
| 21052 | AVIZA | WJ 999R | apcvd system | 200 mm | 1 | as is where is | immediately | 0 | |
| 27795 | AVIZA | WJ 999TEOS | apcvd system with TEOS cabinet | 200 mm | 1 | as is where is | immediately | 22 | |
| 17106 | Hitachi | M308ATE | Metal Etch | 200 mm | 20 | as is where is | immediately | 0 | |
| 31231 | Kokusai | DJ-825V-E | Furnace | 200 mm | 01.06.1999 | 1 | as is where is | immediately | 3 |
| 32128 | Kokusai | DJ-825V-E | Furnace | 200 mm | 01.06.1999 | 1 | as is where is | immediately | 3 |
| 32129 | Kokusai | DJ-825V-8L | Vertical furnace, load lock low pressure D-Poly Si system | 200 mm | 01.06.1999 | 1 | as is where is | immediately | 3 |
| 15553 | LAM RESEARCH | 9500 (TRANSFER MODULE) | SPARES - USED IN A FAB HAVING SMIFFED EQUIPMENT | 200 MM | 01.02.1998 | 1 | as is where is | immediately | 0 |
| 20693 | LAM RESEARCH | ALLIANCE 4428XL | 3 CHAMBER ETCH | 200 MM | 01.01.2003 | 1 | as is where is | immediately | 0 |
| 15063 | Novellus | Concept One-W(200) | W-CVD Tungsten | 200 mm | 01.05.1996 | 1 | as is where is | immediately | 11 |
| 17878 | Novellus | Vector | PECVD | 200 mm | 01.06.2006 | 2 | as is where is | immediately | 0 |
| 18972 | Novellus | Concept 2 Sequel Express | Sequel Express SiN, ARL, UV-SiN | 150 MM | 01.08.2003 | 1 | inquire | immediately | 2 |
| 20219 | Novellus | C2 Speed Sequel | Multi-Process CVD | 200 mm | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 20220 | Novellus | C2 Dual Speed Sequel | Multi-Process CVD | 200 mm | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 20221 | Novellus | C2 Dual Sequel | PECVD CU NITRIDE ES Dual Sequel System | 200 mm | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 20222 | Novellus | C2 Sequel EXPRESS | CVD SINGLE CH NITRIDE DEP. | 200 mm | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 21584 | Novellus | Concept One | CVD | 6 | 01.06.1995 | 1 | as is where is | immediately | 3 |
| 21585 | Novellus | Concept One | CVD | 6 inch | 01.01.1994 | 1 | as is where is | immediately | 3 |
| 21586 | Novellus | Concept One | CVD - TUNGSTEN | 200 MM | 01.07.1996 | 1 | as is where is | immediately | 4 |
| 21928 | NOVELLUS | CONCEPT TWO DUAL ALTUS | 2-CHAMBER CVD TUNGSTEN | 200 mm | 1 | inquire | 0 | ||
| 21988 | Novellus | C1 | TEOS CVD | 150 MM | 1 | inquire | immediately | 0 | |
| 21989 | Novellus | C1 | TEOS CVD | 150 MM | 1 | inquire | immediately | 0 | |
| 21990 | Novellus | C1 | PASSIVIZATION CVD | 150 MM | 1 | inquire | immediately | 0 | |
| 21991 | Novellus | C1 | TUNGSTEN CVD | 150 MM | 1 | inquire | immediately | 0 | |
| 21992 | Novellus | C1 | TUNGSTEN CVD | 150 MM | 1 | inquire | immediately | 0 | |
| 23329 | NOVELLUS | C2 SEQUEL S | CVD | 200 mm | 01.12.2007 | 1 | inquire | immediately | 0 |
| 30017 | NOVELLUS | CONCEPT THREE ALTUS | Tungsten CVD | 300 mm | 01.06.2005 | 1 | as is where is | immediately | 4 |
| 25559 | NOVELLUS | VECTOR | SiO2/ SiN/Pearl/Teos | 300 mm | 1 | inquire | 1 | ||
| 28038 | Novellus | C1 - Dielectric | CVD | 1 | as is where is | 0 | |||
| 34032 | Novellus | C1 200 | CVD | 1 | 14 | ||||
| 29594 | Novellus | Concept One - 200 | CVD | 200 mm | 01.05.1996 | 1 | as is where is | immediately | 1 |
| 29596 | Novellus | Concept Two - Dual Altus | CVD | 200 mm | 1 | as is where is | immediately | 0 | |
| 29597 | Novellus | Concept Two - Dual Speed | CVD | 200 mm | 1 | as is where is | immediately | 0 | |
| 29685 | Novellus | C1 | tungsten (carcass) | 200 mm | 1 | as is where is | 0 | ||
| 32646 | Novellus | C1 - Dielectric | cvd system | 150 mm | 1 | inquire | 0 | ||
| 32647 | Novellus | C2 Altus | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32648 | Novellus | C2 Altus | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32649 | Novellus | C2 Altus | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32650 | Novellus | C2 Altus | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32651 | Novellus | C2 Dual Altus | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32652 | Novellus | C2 Triple SPEED | cvd system | 200 mm | 1 | inquire | 0 | ||
| 32653 | Novellus | C2 Triple SPEED | cvd system | 200 mm | 1 | inquire | 0 | ||
| 33449 | NOVELLUS | CONCEPT ONE | CVD | 150 | 01.06.1995 | 1 | as is where is | 0 | |
| 30023 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL ALTUS | CVD - W | 1 | as is where is | 0 | |||
| 30024 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL ALTUS | CVD - W | 1 | as is where is | 0 | |||
| 30025 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL ALTUS | CVD - W | 1 | as is where is | 0 | |||
| 30019 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL ALTUS-S | CVD - W | 1 | as is where is | 0 | |||
| 30020 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL ALTUS-S | CVD - W | 1 | as is where is | 0 | |||
| 30022 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL ALTUS | CVD - W | 1 | as is where is | 0 | |||
| 30021 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL ALTUS | CVD - W | 1 | as is where is | 0 | |||
| 29987 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL SEQUEL-S | CVD - PECVD | 1 | as is where is | 0 | |||
| 29988 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-DUAL SEQUEL-S | CVD - PECVD | 1 | as is where is | 0 | |||
| 29964 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-TRIPLE SPEED-S | CVD - HDP | 1 | as is where is | 0 | |||
| 29965 | NOVELLUS SYSTEMS INC. | CONCEPT TWO-TRIPLE SPEED-S | CVD - HDP | 1 | as is where is | 0 | |||
| 29961 | NOVELLUS SYSTEMS INC. | CONCEPT THREE SPEED | CVD - HDP | 1 | as is where is | 0 | |||
| 33193 | Novellus Systems Inc. | Concept Two-Dual Speed | CVD - HDP | 1 | as is where is | 0 | |||
| 18655 | PlasmaQuest | Model 3 | PE CVD system | 01.05.1999 | 1 | as is where is | immediately | 36 | |
| 23219 | SELA | MC-100 | 1 | inquire | 0 | ||||
| 21495 | Semco | Goupyl 190 | PECVD System | 1 | 1 | ||||
| 21064 | TEL | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | inquire | immediately | 7 |
| 21548 | TEL | Alpha 8SE ZABF | Vertical Furnace Multi-Oxidation (LPRO+O3) | 200 MM | 01.12.2003 | 1 | as is where is | immediately | 1 |
| 21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.09.1996 | 1 | inquire | immediately | 9 |
| 32352 | TEL TOKYO ELECTRON | MB2-730 | CVD | 200 mm | 01.09.2000 | 1 | inquire | 0 | |
| 32350 | TEL TOKYO ELECTRON | MB2-730 | LPCVD | 200 mm | 01.09.2000 | 1 | inquire | 0 | |
| 31390 | TEL TOKYO ELECTRON | MB2-730 | W-CVD SYSTEM | 150 MM | 01.06.1996 | 1 | as is where is | 0 | |
| 32654 | TEL TOKYO ELECTRON | Trias | cvd system | 300 mm | 01.10.2005 | 1 | inquire | 0 | |
| 33450 | TEL TOKYO ELECTRON | MB2-730 | W-CVD | 150 | 01.06.2003 | 1 | as is where is | 0 | |
| 33451 | TEL TOKYO ELECTRON | Trias-SPA | PLASMA CVD SYSTEM | 200 | 01.06.2002 | 1 | as is where is | 0 | |
| 33551 | TEL Tokyo Electron | MB2-730 | CVD | 8 inch | 01.09.1998 | 1 | inquire | 0 | |
| 33552 | TEL Tokyo Electron | MB2-730 | CVD | 8 inch | 01.01.1998 | 1 | inquire | 0 | |
| 33553 | TEL Tokyo Electron | MB2-730 | CVD | 8 inch | 01.10.2002 | 1 | inquire | 0 | |
| 33554 | TEL Tokyo Electron | MB2-730 | CVD | 8 inch | 01.07.2002 | 1 | inquire | 0 | |
| 30011 | TOKYO ELECTRON LTD. | TRIAS TI/TIN | CVD - TIN | 1 | as is where is | 0 | |||
| 15796 | TRIKON AVIZA | PLANAR 204 | CVD SYSTEM | 150 MM | 1 | as is where is | 0 | ||
| 16514 | ULTRATECH | LA1300 | Laser Spike Anneal | 1 | as is where is | immediately | 0 | ||
| 20719 | VARIAN | MB2 | PVD | 01.07.1995 | 1 | as is where is | 0 | ||
| 20715 | VEECO | DEKTAK 200 SL | THICKNESS MEASUREMENT | 150MM AND 200MM | 01.07.2001 | 1 | as is where is | 0 | |
| 20718 | VEECO | MXR | 200 MM | 01.10.2000 | 1 | as is where is | 0 | ||
| 21973 | Watkins Johnson | WJ999R | CVD | 200 mm | 01.08.1992 | 1 | as is where is | immediately | 38 |
| 19329 | Watkins Johnston | WJ1000T-3.0 | APCVD Reactor | 1 | 2 |
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