Buy and Sell Semiconductor, Assembly, Test and SMT Equipment at fabsurplus.com
Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q.ty | Sales Cond. | Lead Time | Att. |
|---|---|---|---|---|---|---|---|---|---|
| 33785 | APT | Photoresist Coater for up to 300mm Wafers | 1 | inquire | 0 | ||||
| 21500 | Dainippon Screen | SCW-524-BV | SPIN DEVELOPER | 01.05.1981 | 1 | 1 | |||
| 21499 | Dianippon Screen | SCW-524-BV | SPIN COATER | 01.05.1981 | 1 | 1 | |||
| 9928 | DNS | SKW-80A-BVP | Photoresist Coater Developer | 200 mm | 01.10.1992 | 1 | as is where is | immediately | 11 |
| 16425 | DNS | SD-W80B | Developer Track | 150 mm | 1 | inquire | 3 months | 3 | |
| 19255 | DNS | SCW-621-AV | SOG TRACK | 100 mm | 1 | as is where is | 1 | ||
| 31470 | DNS | RF3 | Coat/Deve | 200 mm | 01.10.2006 | 1 | as is where is | 0 | |
| 31471 | DNS | SKW-60A-BVP | Coat/Developer 2C/3D | 150 mm | 01.01.1995 | 1 | as is where is | 0 | |
| 32399 | DNS | SC-W80A-AV | Coater | 200 mm | 01.07.1995 | 1 | inquire | 0 | |
| 32385 | DNS | SC-W80A-AVG | coater | 200 mm | 01.06.1995 | 1 | inquire | 0 | |
| 34155 | DNS | SK 200W | Photoresist Coater/Developer | 1 | as is where is | immediately | 19 | ||
| 34110 | DNS | SC-W60A-AVC | PIQ Coater | 01.03.2007 | 1 | 0 | |||
| 34107 | DNS | SC-W60A-AVFG | SOG Coater/Baker | 01.02.1996 | 1 | 0 | |||
| 32740 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32741 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32742 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32743 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32744 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32745 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32746 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32747 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32748 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32749 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | as is where is | immediately | 0 | |
| 32750 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32751 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32752 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32753 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32754 | DNS | SK-200 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32755 | DNS | SK-2000 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32756 | DNS | SK-2000 | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32757 | DNS | SS-W80A | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 33780 | DNS | SC-W60A | Photoresist Coater | 1 | inquire | 0 | |||
| 33781 | DNS | SC-W80A | SOG Coater Track | 1 | inquire | 0 | |||
| 33782 | DNS | SD-W60A | Photoresist Developer | 1 | inquire | 0 | |||
| 33784 | DNS | SK-W80B | Photoresist Coater/Developers, 2ea Available, Details to Come | 1 | inquire | 0 | |||
| 11555 | DNS-Dainippon Screen Ltd. | SP-W813-AS | Brush Clean Track | 125 mm to 150 mm | 01.03.2001 | 1 | inquire | immediately | 20 |
| 19473 | EVATECH | NESS 7100R / NESS 8330R | INITIAL CLEANER AND DEVELOPER | 200MM X 200 MM | 01.06.2001 | 1 | as is where is | 0 | |
| 32467 | EVG | 101 | Spin Spray Coating System | 1 | 16 | ||||
| 21994 | Fairchild | M2000 | PHOTORESIST COAT / DEVELOP TRACK | 100- 150 MM | 01.06.1992 | 1 | as is where is | immediately | 0 |
| 21995 | Fairchild | M2000 | PHOTORESIST COAT / DEVELOP TRACK | 100- 150 MM | 01.06.1993 | 1 | as is where is | immediately | 0 |
| 33779 | FUSION | M150 | UV Photoresist Stabilization Tool | 1 | inquire | 0 | |||
| 21514 | Headway Research | PWM-101 & PWM32 | Manual Spinner | 4" | 1 | 0 | |||
| 33542 | Liebherr | FKV 3610 | Fridge for photoresist | facilities | 1 | inquire | immediately | 5 | |
| 33778 | LOCTITE | Zeta 7740 | UV Curing System | 1 | inquire | 0 | |||
| 30381 | SIGMAMELTEC | CTS6000 | MASK COATER DEVELOPER | 01.06.2003 | 1 | as is where is | immediately | 0 | |
| 31228 | SOKUDO | RF3 | DEVELOPER | 200 mm | 1 | as is where is | 0 | ||
| 30399 | SOKUDO CO., LTD. | RF3 (RF CUBE) | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 20863 | SVG | 88 | PHOTOLITHOGRAPHY TRACK | 150 mm | 1 | inquire | immediately | 2 | |
| 21485 | SVG | 8026 PC RD | Boron Coater | 1 | 1 | ||||
| 26590 | SVG | 8600 | track | 1 | as is where is | immediately | 6 | ||
| 33777 | SVG | Series 90 | Photoresist Coater/Developer, 3 Coat/2 Develop, 5 Hot/5 Chill Plates, Chemistry Cabinet, 200mm Wafers | 1 | inquire | 0 | |||
| 33864 | SVG | 86 | SVG DOUBLE COAT PZT | 1 | as is where is | 0 | |||
| 33865 | SVG | 86 | SVG DOUBLE COAT PZT | 1 | as is where is | 0 | |||
| 33866 | SVG | 86 | SVG DOUBLE COAT PZT | 1 | as is where is | 0 | |||
| 33867 | SVG | 86 | SVG DOUBLE COAT PZT | 1 | as is where is | 0 | |||
| 33868 | SVG | 86 | SVG DOUBLE COAT PZT | 1 | as is where is | 0 | |||
| 17351 | TEL | ACT 12-200 | Lithography | 1 | 0 | ||||
| 17841 | TEL | ACT 12-200 | 1 | 0 | |||||
| 21272 | TEL | ACT 12 | Coater (Clean track Act 12) | 300 mm | 01.05.2002 | 1 | as is where is | 1 | |
| 21336 | TEL | MARK 8 | High throughput track | 1 | 0 | ||||
| 23138 | TEL | MK 8 | Dual Coat developer | 1 | 1 | ||||
| 26513 | TEL | LITHIUS | PHOTORESIST COATER AND DEVELOPER | 300 mm | 01.12.2004 | 1 | inquire | immediately | 4 |
| 33776 | TEL | ACT-12 | Photoresist Coater/Developer for 300mm Wafers, Model A910C-WCD for DUV Application | 1 | inquire | 0 | |||
| 19467 | TEL TOKYO ELECTRON | ACT 8 | PHOTORESIST COAT AND DEVELOP TRACK WITH SMIF | 200 mm | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 19468 | TEL TOKYO ELECTRON | ACT 8 | PHOTORESIST COAT AND DEVELOP TRACK WITH SMIF | 200 mm | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 19470 | TEL TOKYO ELECTRON | ACT 8 SOG | SOD PHOTORESIST COAT AND DEVELOP TRACK WITH SMIF | 200 mm | 01.03.1999 | 1 | as is where is | immediately | 0 |
| 19472 | TEL TOKYO ELECTRON | ACT 8 SOG | SOD PHOTORESIST COAT AND DEVELOP TRACK WITH SMIF | 200 mm | 01.12.1998 | 1 | as is where is | immediately | 0 |
| 31500 | TEL TOKYO ELECTRON | MARK 8 | Developer | 200 mm | 01.07.1999 | 1 | as is where is | 0 | |
| 31501 | TEL TOKYO ELECTRON | MARK 8 | Developer | 200 mm | 01.01.1996 | 1 | as is where is | 0 | |
| 31503 | TEL TOKYO ELECTRON | MARK 8 | Developer | 200 mm | 01.04.1996 | 1 | as is where is | 0 | |
| 31478 | TEL TOKYO ELECTRON | ACT 8 | Coat/Deve | 150 mm | 01.01.1999 | 1 | as is where is | 0 | |
| 31479 | TEL TOKYO ELECTRON | ACT 8 | Coat/Deve | 200 mm | 01.01.2003 | 1 | as is where is | 0 | |
| 31482 | TEL TOKYO ELECTRON | ACT 8 | Coat/Deve | 150 mm | 01.01.2002 | 1 | as is where is | 0 | |
| 31485 | TEL TOKYO ELECTRON | MARK 7 | Coat/Deve | 200 mm | 01.03.1995 | 1 | as is where is | 0 | |
| 31487 | TEL TOKYO ELECTRON | MARK 7 | Coat/Deve | 200 mm | 01.09.1995 | 1 | as is where is | 0 | |
| 31488 | TEL TOKYO ELECTRON | MARK 7 | Coat/Deve | 200 mm | 01.01.1994 | 1 | as is where is | 0 | |
| 31489 | TEL TOKYO ELECTRON | MARK 7 | Coat/Deve | 200 mm | 01.02.1994 | 1 | as is where is | 0 | |
| 31490 | TEL TOKYO ELECTRON | MARK 7 | Coat/Deve | 200 mm | 01.12.1994 | 1 | as is where is | 0 | |
| 31491 | TEL TOKYO ELECTRON | MARK 8 | Coat/Deve | 200 mm | 01.07.1999 | 1 | as is where is | 0 | |
| 31492 | TEL TOKYO ELECTRON | MARK 8 | Coat/Deve | 200 mm | 01.01.1996 | 1 | as is where is | 0 | |
| 31493 | TEL TOKYO ELECTRON | MARK 8 | Coat/Deve | 200 mm | 01.01.1997 | 1 | as is where is | 0 | |
| 31494 | TEL TOKYO ELECTRON | MARK 8 | Coat/Deve | 200 mm | 01.05.1995 | 1 | as is where is | 0 | |
| 31495 | TEL TOKYO ELECTRON | MARK Vz | Coat/Deve | 150 mm | 01.01.1995 | 1 | as is where is | 0 | |
| 31496 | TEL TOKYO ELECTRON | MARK 8 | Coater | 200 mm | 01.12.1995 | 1 | as is where is | 0 | |
| 31498 | TEL TOKYO ELECTRON | MARK Vz | Coater | 150 mm | 01.01.1995 | 1 | as is where is | immediately | 1 |
| 21680 | TEL TOKYO ELECTRON | ACT12 | photoresist coater and developer | 200 mm | 1 | inquire | immediately | 9 | |
| 31325 | TEL TOKYO ELECTRON | ACT8(2DEV) | DEVELOPER | 150 MM | 01.06.2003 | 1 | as is where is | 0 | |
| 31324 | TEL TOKYO ELECTRON | ACT8(2COAT) | COATER | 150 MM | 01.06.2003 | 1 | as is where is | 0 | |
| 23220 | TEL TOKYO ELECTRON | MARK 8 | HIGH THROUGHPUT TRACK | 1 | inquire | immediately | 0 | ||
| 32401 | TEL TOKYO ELECTRON | CLEAN TRACK MARK-8 | Coater/Developer | 200 mm | 01.07.1995 | 1 | inquire | 0 | |
| 32402 | TEL TOKYO ELECTRON | ACT-8(Iw) | Coater/Developer | 200 mm | 01.07.2000 | 1 | inquire | 0 | |
| 32403 | TEL TOKYO ELECTRON | ACT 8 | Coater/Developer | 200 mm | 01.06.2000 | 1 | inquire | 0 | |
| 28064 | TEL TOKYO ELECTRON | MARK 7 | PHOTOLITOGRAPHY COAT DEVELOP TRACK | 1 | as is where is | 0 | |||
| 28065 | TEL TOKYO ELECTRON | MARK 7 | PHOTOLITOGRAPHY COAT DEVELOP TRACK | 1 | as is where is | 0 | |||
| 28066 | TEL TOKYO ELECTRON | MARK 7 | PHOTOLITOGRAPHY COAT DEVELOP TRACK | 1 | as is where is | 0 | |||
| 28067 | TEL TOKYO ELECTRON | MARK 7 | PHOTOLITOGRAPHY COAT DEVELOP TRACK | 1 | as is where is | 0 | |||
| 28068 | TEL TOKYO ELECTRON | MARK 7 | PHOTOLITOGRAPHY COAT DEVELOP TRACK | 1 | as is where is | 0 | |||
| 28069 | TEL TOKYO ELECTRON | MARK 7 | PHOTOLITOGRAPHY COAT DEVELOP TRACK | 1 | as is where is | 0 | |||
| 28070 | TEL TOKYO ELECTRON | MARK 7 | PHOTOLITOGRAPHY COAT DEVELOP TRACK | 1 | as is where is | 0 | |||
| 28071 | TEL TOKYO ELECTRON | MARK 7 | PHOTOLITOGRAPHY COAT DEVELOP TRACK | 1 | as is where is | 0 | |||
| 32400 | TEL TOKYO ELECTRON | CLEAN TRACK MARK-8 | Coater/Developer | 200 mm | 01.06.1995 | 1 | inquire | 0 | |
| 32397 | TEL TOKYO ELECTRON | MARK 8 (10000CWD-FPA) | Coater/Developer | 200 mm | 01.09.1997 | 1 | inquire | 0 | |
| 32398 | TEL TOKYO ELECTRON | MARK 8 (10000CWD-FPA) | Coater/Developer | 200 mm | 01.12.1997 | 1 | inquire | 0 | |
| 32396 | TEL TOKYO ELECTRON | MARK 8 | Coater/Developer | 200 mm | 01.04.1998 | 1 | inquire | 0 | |
| 32394 | TEL TOKYO ELECTRON | MARK 8 | Coater/Developer | 200 mm | 01.02.1996 | 1 | inquire | 0 | |
| 32395 | TEL TOKYO ELECTRON | MARK 8 | Coater/Developer | 200 mm | 01.09.1996 | 1 | inquire | 0 | |
| 32392 | TEL TOKYO ELECTRON | MARK 7 | Coater | 200 mm | 01.09.1997 | 1 | inquire | 0 | |
| 32393 | TEL TOKYO ELECTRON | MARK 8 | Coater/Developer | 200 mm | 01.02.1996 | 1 | inquire | 0 | |
| 32390 | TEL TOKYO ELECTRON | MARK 5 | Coater/Developer | 200 mm | 01.03.1990 | 1 | inquire | 0 | |
| 32391 | TEL TOKYO ELECTRON | MARK 7 | Coater | 200 mm | 01.01.1996 | 1 | inquire | 0 | |
| 32389 | TEL TOKYO ELECTRON | ACT 8 | Coater/Developer | 200 mm | 01.03.2001 | 1 | inquire | 0 | |
| 32387 | TEL TOKYO ELECTRON | ACT 8 | Coater/Developer | 200 mm | 01.06.1999 | 1 | inquire | 0 | |
| 32386 | TEL TOKYO ELECTRON | ACT8 (LD nozzle) | Coater/Developer | 200 mm | 01.06.2006 | 1 | inquire | 0 | |
| 34079 | TEL TOKYO ELECTRON | Mark 8 | Coater and Developer Track | 200 mm | 01.01.1997 | 1 | inquire | immediately | 0 |
| 31326 | TEL TOKYO ELECTRON | ACT8(CAR 1COAT 2DEV) | COATER AND DEVELOPER | 01.06.2003 | 1 | as is where is | 0 | ||
| 32388 | TEL TOKYO ELECTRON | ACT 8 | Coater/Developer | 200 mm | 01.12.1999 | 1 | inquire | 0 | |
| 32758 | TEL TOKYO ELECTRON | ACT 12 | PHOTORESIST PROCESSING SYSTEM | 300 mm | 01.02.2007 | 1 | inquire | 0 | |
| 32759 | TEL TOKYO ELECTRON | ACT 8 Coater/Developer | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32760 | TEL TOKYO ELECTRON | ACT 8 Coater/Developer | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32761 | TEL TOKYO ELECTRON | ACT 8 Coater/Developer | PHOTORESIST PROCESSING SYSTEM | 200 mm | 01.01.2001 | 1 | inquire | 0 | |
| 32762 | TEL TOKYO ELECTRON | ACT 8 SOD | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32763 | TEL TOKYO ELECTRON | ACT-8 Coater | PHOTORESIST PROCESSING SYSTEM | 200 mm | 01.03.2000 | 1 | inquire | 0 | |
| 32764 | TEL TOKYO ELECTRON | ACT-8 Coater | PHOTORESIST PROCESSING SYSTEM | 200 mm | 01.04.2004 | 1 | inquire | 0 | |
| 32765 | TEL TOKYO ELECTRON | LITHIUS | PHOTORESIST PROCESSING SYSTEM | 300 mm | 01.06.2005 | 1 | inquire | 0 | |
| 32766 | TEL TOKYO ELECTRON | MARK-7 Coater/Developer | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32767 | TEL TOKYO ELECTRON | MARK-7 Coater/Developer | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 32768 | TEL TOKYO ELECTRON | MARK-7 Coater/Developer | PHOTORESIST PROCESSING SYSTEM | 200 mm | 1 | inquire | 0 | ||
| 33326 | TEL Tokyo Electron | ACT 8 | Track - Coater/Developer | 1 | inquire | 0 | |||
| 33327 | TEL Tokyo Electron | ACT 8 | Track - Coater/Developer | 01.06.1998 | 1 | inquire | 0 | ||
| 33328 | TEL Tokyo Electron | ACT 8 | Track - Coater/Developer | 1 | inquire | 0 | |||
| 33329 | TEL Tokyo Electron | ACT 8 | Track - Coater/Developer | 1 | inquire | 0 | |||
| 33330 | TEL Tokyo Electron | LITHIUS | Track - Coater/Developer | 01.06.2006 | 1 | inquire | 0 | ||
| 33480 | TEL TOKYO ELECTRON | ACT 8 | COATER & DEVELOPER | 200 | 01.06.2001 | 1 | inquire | 0 | |
| 33481 | TEL TOKYO ELECTRON | MARK 7 | COATER & DEVELOPER | 200 | 01.06.1993 | 1 | inquire | 0 | |
| 33613 | TEL Tokyo Electron | ACT 12 | Coat/Deve | 8 inch | 01.01.2005 | 1 | inquire | 0 | |
| 33614 | TEL Tokyo Electron | LITHIUS | Coat/Deve | 8 inch | 01.03.2005 | 1 | inquire | 0 | |
| 33926 | TEL TOKYO ELECTRON | Mark 8 | Coater and Developer Track | 200 mm | 01.01.1997 | 3 | inquire | immediately | 0 |
| 33972 | TEL TOKYO ELECTRON | ACT12 | PHOTORESIST CT AND DEV | 1 | inquire | 0 | |||
| 33973 | TEL TOKYO ELECTRON | ACT 12-200 | PHOTORESIST CT AND DEV | 1 | inquire | 0 | |||
| 33974 | TEL TOKYO ELECTRON | ACT 8 | PHOTORESIST CT AND DEV | 1 | inquire | 0 | |||
| 33975 | TEL TOKYO ELECTRON | ACT 8 | PHOTORESIST CT AND DEV | 1 | inquire | 0 | |||
| 33976 | TEL TOKYO ELECTRON | ACT 8 | PHOTORESIST CT AND DEV | 1 | inquire | 0 | |||
| 33977 | TEL TOKYO ELECTRON | ACT12 | PHOTORESIST CT AND DEV | 1 | inquire | 0 | |||
| 30469 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - DEVELOPER | 1 | as is where is | 0 | |||
| 30461 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30462 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30467 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30466 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30463 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30458 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30459 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30460 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30453 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30456 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30455 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30454 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30443 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30446 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30445 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30444 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30442 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30441 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30440 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30437 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30439 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30438 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30432 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 7 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30434 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30435 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30429 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 7 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30430 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 7 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30436 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30425 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30426 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30431 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 7 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30422 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30417 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30424 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30423 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30421 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30420 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30419 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30412 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30416 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30410 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30411 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30413 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30405 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30406 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30409 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30408 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30404 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30403 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30394 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER | 1 | as is where is | 0 | |||
| 30391 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER | 1 | as is where is | 0 | |||
| 30395 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER | 1 | as is where is | 0 | |||
| 30387 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 12 | TRACK | 1 | as is where is | 0 | |||
| 30389 | TOKYO ELECTRON LTD. | CLEAN TRACK ACT 12 | TRACK | 1 | as is where is | 0 | |||
| 30393 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER | 1 | as is where is | 0 | |||
| 30464 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30465 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30449 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30450 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30451 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30448 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30447 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 | |||
| 30457 | TOKYO ELECTRON LTD. | CLEAN TRACK MARK 8 | TRACK - COATER/DEVELOPER | 1 | as is where is | 0 |
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