Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 99395 | Convac | CBA-M-2000-U | Photoresist coater | 31.01.1995 | 1 | as is where is | immediately | |
| 106523 | Custom | S-Cubed | Spin Coat Bake System | Clamshell | 1 | as is where is | immediately | |
| 106450 | Delta | 4CJ | Photoresist Coater | 150 mm/200 mm | 01.02.2005 | 1 | as is where is | immediately |
| 106451 | Delta | 5AQ | Positive Photoresist Developer | 200 mm | 01.06.2005 | 1 | as is where is | immediately |
| 91581 | DNS | SK-80BW AVPE | Photoresist Coater and Developer system (2C/2D) | 200 mm | 31.05.1995 | 1 | as is where is | 3 months |
| 93076 | DNS | SK-200W-AVPF | Coater / Developer system (2C/2D) | 200 mm | 31.05.1997 | 1 | as is where is | |
| 93077 | DNS | SK-200W-BVPE | i-Line Photo Track Coater (3C3D) | 200 mm | 31.05.1997 | 1 | as is where is | |
| 106022 | DNS | SK 2000 BVPE | COATER AND DEVELOPER TRACK WITH 2 CT, 2 BCT, 4 DEVELOPERS | 200 mm | 30.09.2003 | 1 | as is where is | immediately |
| 106023 | DNS | SK 2000 BVPE | Photoresist coater and developer - 2 ct - 2 bct - 4 dev | 200 mm | 31.03.2004 | 1 | as is where is | immediately |
| 106738 | DNS | DUOI | ARF-I TRACK | 300 mm | 1 | as is where is | ||
| 106817 | DNS | RF3S | coater and developer( 5C5D) | 300mm | 1 | inquire | ||
| 110628 | DNS | SCW-80A Coater | Lithography Coater and Developer | 200 mm | 1 | as is where is | ||
| 110629 | DNS | SDW-80A Developer | Lithography Coater and Developer | 200 mm | 1 | as is where is | ||
| 110630 | DNS | SK-3000-BVPEU | Lithography Coater and Developer | 300 mm | 1 | as is where is | ||
| 108220 | DNS / SOKUDO | RF3 | Photoresist Coater and Developer Track | 300 mm | 01.06.2019 | 1 | inquire | immediately |
| 110621 | DNS / Sokudo | RF3 | Lithography Coater and Developer | 300 mm | 1 | as is where is | ||
| 109581 | EVG | 101 | Photoresist coater and developer | 200 mm | 01.05.2008 | 1 | as is where is | immediately |
| 109596 | EVG | 101 | Photoresist Spray Coater | 150 mm | 1 | inquire | ||
| 83515 | Extraction Systems | TMB 150 | Photoresist Contamination Monitor System / Total Amine Analyzer | Facilities | 31.05.2004 | 1 | as is where is | immediately |
| 108717 | FSI | Polaris 3500 | Mini Photolithography Track without coaters and developers | 300 MM / 200 mm | 01.06.2004 | 1 | as is where is | immediately |
| 110742 | Karl Suss | Gamma | Photoresist Spray Coater and Developer | 200 mm | 01.06.2016 | 6 | as is where is | |
| 110748 | Karl Suss | ACS | Photoresist Spray Coater and Developer | 200 mm | 01.06.2021 | 1 | as is where is | |
| 33542 | Liebherr | FKV 3610 | Fridge for the safe storage of photoresist | facilities | 1 | as is where is | immediately | |
| 108715 | Semix | Tazmo | SOG track | 150 mm | 1 | inquire | immediately | |
| 110631 | Sokudo | SK-3000 | Lithography Coater and Developer | 300 mm | 1 | as is where is | ||
| 110632 | Sokudo | SK-3000 | Lithography Coater and Developer | 300 mm | 1 | as is where is | ||
| 110633 | Sokudo | SK-3000 | Lithography Coater and Developer | 300 mm | 1 | as is where is | ||
| 110634 | Sokudo | SK-3000 | Lithography Coater and Developer | 300 mm | 1 | as is where is | ||
| 110635 | Sokudo | SK-3000 | Lithography Coater and Developer | 300 mm | 1 | as is where is | ||
| 110636 | Sokudo | SK-3000 | Lithography Coater and Developer | 300 mm | 1 | as is where is | ||
| 73208 | Solitec | 5110C | Manually loading Photoresist Spin Coater | 3 to 9 inch | 01.09.1998 | 1 | as is where is | immediately |
| 109589 | Solitec | FlexiFab | Coater and Developer | 150 mm | 1 | inquire | ||
| 109590 | Solitec | 5100 | Manual Spin Coater | 150 mm | 1 | inquire | ||
| 98497 | SUSS | ACS200 | Photoresist coater and developer track, 1C, 1 D | 200 mm | 1 | as is where is | immediately | |
| 106535 | SUSS Microtec | ACS200 | Automated Photoresist Coater | 200 mm | 1 | as is where is | immediately | |
| 106536 | SUSS Microtec | ACS200 | Automated Photoresist Coater | 150 mm/200 mm | 1 | as is where is | immediately | |
| 106537 | SUSS Microtec | ACS200 Classic | Automated Photoresist Coater | 200 mm | 1 | as is where is | immediately | |
| 106538 | SUSS Microtec | ACS200 Classic | Automated Photoresist Coater | 150 mm/200 mm | 1 | as is where is | immediately | |
| 106539 | SUSS Microtec | ACS200 Plus | Automated Photoresist Coater | 150 mm/200 mm | 1 | as is where is | immediately | |
| 110737 | Suss MicroTec | Falcon | Polyimide Photo-resist Developer Track, 2D | 150-200 mm | 01.06.1996 | 1 | as is where is | immediately |
| 106670 | SUSS MICROTECH | RC 16 | Resist Spin Coater | N/A | 1 | as is where is | ||
| 106671 | SUSS MICROTECH | RC 16(RC5) | Resist Spin Coater | N/A | 1 | as is where is | ||
| 106672 | SUSS MICROTECH | RC 8-ACS 200 | Resist Spin Coater | 200 mm | 1 | as is where is | ||
| 108104 | SVG | 8626/8636 | Coater Track | 1 | as is where is | |||
| 108105 | SVG | 8632-CTD-D | Developer Track | 1 | as is where is | |||
| 106743 | SVS | MSX1000 | Auto Track | 200 mm | 1 | as is where is | ||
| 109015 | Tazmo/Semix | TR 6133UD | Photoresist Coater and Developer tRACK, SOG type | 100 mm to 150 mm | 2 | as is where is | immediately | |
| 111341 | TEL (Tokyo Electron Ltd) | ACT 8 (Parts) | Carrier Send Block, SMIF | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | |
| 103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | |
| 103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 106748 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108118 | TEL Tokyo Electron | Interface module | For Mark8 photoresist coater and developer | spares | 01.12.1995 | 1 | as is where is | immediately |
| 108209 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108210 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108211 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108212 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately |
| 108606 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.05.1997 | 1 | as is where is | |
| 108936 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.04.2004 | 1 | as is where is | |
| 108937 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108966 | TEL Tokyo Electron | ACT 12 | DOUBLE BLOCK TRACK with 3 PCT, 1 COT, 4 DEV, R to L | 200 mm | 01.06.2018 | 1 | inquire | immediately |
| 109244 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 109245 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 12 | Single Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 109246 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Coat only Track | 300mm | 1 | as is where is | ||
| 109247 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 109248 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 109249 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS Pro Z | Multi Block (Resist Coater/Developer) | 300mm | 1 | as is where is | ||
| 109250 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | ||
| 109251 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | ||
| 109252 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | ||
| 109253 | TEL TOKYO ELECTRON | CLEAN TRACK LITHIUS SINGLE BLOCK | Single Block (Coat/Develop) | 300mm | 1 | as is where is | ||
| 109526 | TEL TOKYO ELECTRON | ACT12 (4C4D) | PHOTORESIST COATER AND DEVELOPER TRACK | 300mm | 01.06.2010 | 1 | as is where is | |
| 110638 | TEL Tokyo Electron | Mark8 | Lithography Coater and Developer with 2c, 2d | 150 mm | 1 | as is where is | ||
| 110666 | TEL Tokyo Electron | Interface module | For Mark7 photoresist coater and developer | spares | 01.07.1997 | 1 | as is where is | immediately |
| 110693 | TEL TOKYO ELECTRON | Mark 8 | Polyimide Cure Track | 200 mm | 01.06.2009 | 1 | as is where is | immediately |
| 110698 | TEL TOKYO ELECTRON | Mark 5 | Photoresist Track | 150 mm | 01.06.1991 | 1 | as is where is | immediately |
| 110752 | TEL Tokyo Electron | ACT 12 | Double Block DUV Photoresist Coater and Developer Track | 300 mm | 01.01.2009 | 1 | as is where is | immediately |
| 109608 | Yield Engineering | YES-450PB6-2P | Polyimide Bake Oven | 1 | inquire | |||
| 109609 | Yield Engineering | YES-450PB | Polyimide Bake Oven | 1 | inquire | |||
| 109614 | Yield Engineering | YES-15 | HMDS Vapor Prime Oven | 1 | inquire | |||
| 109616 | Yield Engineering | 58 | HMDS Vapor Prime Oven | 1 | inquire | |||
| 109617 | Yield Engineering | 15F | HMDS Vapor Prime Oven | 1 | inquire | |||
| 109618 | Yield Engineering | LP#-M3 | HMDS Vapor Prime Oven | 150 mm | 1 | inquire | ||
| 109619 | Yield Engineering | 15 | HMDS Vapor Prime Oven | 150 mm | 1 | inquire | ||
| 109621 | Yield Engineering | 58SM | HMDS Vapor Prime Oven | 150 mm | 1 | inquire |