Buy and Sell Semiconductor, Assembly, Test and SMT Equipment at fabsurplus.com
Please find below a list of Used Fab Metrology , Inspection and QC Equipment for sale by fabsurplus.com .Click on any listed item of Fab Metrology , Inspection and QC Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q.ty | Sales Cond. | Lead Time | Att. |
|---|---|---|---|---|---|---|---|---|---|
| 16534 | ACCENT | Q8 | REGISTRATION Tool | 200mm | 1 | 0 | |||
| 23184 | ACCENT (Nanometrix, BioRad) | Quaestor Q8 | REGISTRATION | 200 mm | 1 | inquire | immediately | 0 | |
| 23185 | ACCENT (Nanometrix, BioRad) | Quaestor Q8 | REGISTRATION | 1 | inquire | 0 | |||
| 33532 | ACCENT OPTO | CDS 200 | WAFER INSPECTION | 200 MM | 1 | as is where is | immediately | 0 | |
| 30762 | ACCRETECH/TSK | CRYSTAL EDGE | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30763 | ACCRETECH/TSK | WIN-WIN 50-1400 | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30764 | ACCRETECH/TSK | WIN-WIN 50-1400 | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30765 | ACCRETECH/TSK | WIN-WIN 50-1600 | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 14521 | ADE | 3046A | PROFILOMETER | 1 | inquire | immediately | 1 | ||
| 20612 | ADE | AVS AWIS 3110 | WAFER INSPECTION SYSTEM | 300MM / 200 MM | 01.08.2001 | 1 | as is where is | immediately | 5 |
| 23186 | ADE | 9500 | FLATNESS TESTER DIFF | 200 mm | 1 | inquire | immediately | 2 | |
| 26133 | ADE | 9500 ULTRAGAGE | WAFER Characterization System | 200 mm | 1 | as is where is | immediately | 2 | |
| 33668 | ADE | Episcan 1000 | Epi Metrology Spectromter, ONLINE 2110 Spectrometer Head, IRVINE OPTICAL NanoLoader II | 1 | inquire | 0 | |||
| 33336 | Advanced Metrology Systems LLC (AMS) | IR3100 | Metrology - MBIR | 1 | inquire | 0 | |||
| 27846 | AMAT | Compass 200 | Wafer Inspection System | 01.09.2000 | 0 | as is where is | 1 month | 1 | |
| 11003 | Applied Materials | EXCITE IPM 832 | BARE SILICON WAFER INSPECTION SYSTEM | 200 MM | 01.06.2000 | 1 | inquire | immediately | 10 |
| 11561 | Applied Materials | 7830 si | SPARE PARTS FOR CD SEM | spares | 01.05.1998 | 1 | as is where is | immediately | 7 |
| 17843 | Applied Materials | SEM VISION | Defect Metrology | 1 | 0 | ||||
| 18487 | Applied Materials | ORBOT 736 | WAFER INSPECTION SYSTEM | 200 mm | 01.02.1998 | 1 | as is where is | immediately | 11 |
| 21961 | Applied Materials | Complus | Defect Inspection | 300 MM | 1 | inquire | immediately | 0 | |
| 23664 | Applied Materials | SEM Vision G2 | Defect review | 200mm/300mm | 01.05.2004 | 1 | as is where is | 8 | |
| 32404 | Applied Materials | SEMVISION_CX | Review SEM | 200 mm | 01.12.2006 | 1 | inquire | 0 | |
| 29700 | Applied Materials | Opal 7830 SI | CD SEM | 200 mm | 3 | as is where is | 0 | ||
| 30519 | APPLIED MATERIALS | SEMVISION G2 - DEFECT REVIEW STATION (MODULE ONLY) | INSPECTION - AUTOMATED MACRO-DEFECT | 1 | as is where is | 0 | |||
| 30527 | APPLIED MATERIALS | SEMVISION CX | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30529 | APPLIED MATERIALS | SEMVISION G2 | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30530 | APPLIED MATERIALS | SEMVISION G2 FIB | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30532 | APPLIED MATERIALS | SEMVISION CX | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30572 | APPLIED MATERIALS | COMPASS | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30573 | APPLIED MATERIALS | COMPASS PRO | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30574 | APPLIED MATERIALS | COMPASS PRO | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30575 | APPLIED MATERIALS | COMPLUS | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30576 | APPLIED MATERIALS | COMPLUS | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30578 | APPLIED MATERIALS | COMPLUS | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30579 | APPLIED MATERIALS | COMPLUS 2T | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30580 | APPLIED MATERIALS | COMPLUS MP | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30626 | APPLIED MATERIALS | NANOSEM 3D | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30627 | APPLIED MATERIALS | NANOSEM 3D | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30663 | APPLIED MATERIALS | SEMVISION G3 | SEM - DEFECT REVIEW | 1 | as is where is | 0 | |||
| 30664 | APPLIED MATERIALS | SEMVISION G3 FIB | SEM - DEFECT REVIEW | 1 | as is where is | 0 | |||
| 31240 | Applied Materials | Complus SUN Ultra10 | Offline station/ADC MGR | 200 mm | 1 | as is where is | 0 | ||
| 31241 | Applied Materials | Complus 3T | DARKFIELD WF INSPECTION | 200 mm | 1 | as is where is | 0 | ||
| 32798 | Applied Materials | Compass Pro | 200 mm | 1 | inquire | 0 | |||
| 32799 | Applied Materials | ComPlus | 200 mm | 1 | inquire | 0 | |||
| 32800 | Applied Materials | ComPlus | 200 mm | 1 | inquire | 0 | |||
| 32801 | Applied Materials | ComPlus | 200 mm | 1 | inquire | 0 | |||
| 32802 | Applied Materials | ComPlus | 200 mm | 1 | inquire | 0 | |||
| 32803 | Applied Materials | SEMVision G2 | 300 mm | 01.06.2003 | 1 | inquire | 0 | ||
| 32804 | Applied Materials | SEMVision G3 FIB | 300 mm | 01.10.2005 | 1 | inquire | 0 | ||
| 32805 | Applied Materials | SEMVision G3 FIB | 300 mm | 1 | inquire | 0 | |||
| 32806 | Applied Materials | UVision | 300 mm | 01.10.2005 | 1 | inquire | 0 | ||
| 32807 | Applied Materials | UVision | 200 mm | 01.02.2006 | 1 | inquire | 0 | ||
| 32808 | Applied Materials | VeraSEM 3D | 200 mm | 1 | inquire | 0 | |||
| 32809 | Applied Materials | VeritySEM | 300 mm | 01.04.2004 | 1 | inquire | 0 | ||
| 33524 | Applied Materials | Centura 5200 ULTIMA | CVD system, GIGAFILL HT USG HDP | 200 MM | 01.04.2000 | 1 | as is where is | immediately | 0 |
| 33525 | Applied Materials | Producer dual twin | SACVD PPS PROCESS | 300 MM | 01.04.2000 | 1 | as is where is | immediately | 0 |
| 33891 | Applied Materials | COMPASS | SEM | 200 MM | 01.10.2002 | 1 | as is where is | immediately | 0 |
| 33925 | APPLIED MATERIALS | COMPASS PRO | WAFER INSPECTION | 200 MM | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 33954 | APPLIED MATERIALS | SEM VISION | SEM | 1 | inquire | 0 | |||
| 33955 | APPLIED MATERIALS | SEM VISION | Defect Metrology | 1 | inquire | 0 | |||
| 16572 | Applied Research Lab. | 3410 ICP | Inductive coupled Plasma Mass Spec. | 01.06.1993 | 1 | 1 | |||
| 33669 | AT&T | Automatic | Robotic CV Plotter with Mercury Probe | 1 | inquire | 0 | |||
| 33670 | AT&T | Manual | CV Plotter with Mercury Probe, 3ea Available | 1 | inquire | 0 | |||
| 33918 | AUGUST | AXIS | WAFER INSPECTION | 1 | as is where is | immediately | 0 | ||
| 32810 | Bede Scientific | Metrix-F XRD | 300 mm | 01.10.2004 | 1 | inquire | 0 | ||
| 33675 | BIO-RAD | QS-300 | FT-IR Spectrometer | 1 | inquire | 2 | |||
| 33676 | BIO-RAD | QS-300 | FT-IR Spectrometer with MAP300 Wafer Chuck and PIKE AutoPro Motion Controller, WIN-Epi/IR | 1 | inquire | 0 | |||
| 33677 | BIO-RAD | QS-312 | FT-IR Spectrometer for up to 300mm Wafers | 01.05.1996 | 1 | inquire | 2 | ||
| 33956 | BIO-RAD | Q7 | Metrology | 1 | inquire | 0 | |||
| 14529 | BioRad | Q7 Q8 | Overlay Metrology Tool | 75mm-200mm | 01.11.1998 | 1 | inquire | immediately | 1 |
| 17458 | BioRad | QS408M/FTI | FTIR Spectrometer | 01.06.1994 | 1 | as is where is | immediately | 1 | |
| 17851 | BioRad | QS 500 | Automated FT-IR Spectrometer | 100-200 mm | 01.05.1996 | 1 | as is where is | 2 months | 6 |
| 19267 | BIORAD | QUAESTOR Q3 | OPTICAL METROLOGY | 100 mm | 1 | as is where is | immediately | 4 | |
| 29701 | BioRad | Q5 | Overlay | 200 mm | 7 | as is where is | 0 | ||
| 29702 | BioRad | Q7 | Overlay | 200 mm | 3 | as is where is | 0 | ||
| 33671 | BIORAD | Q5 | Overlay Metrology Tool | 1 | inquire | 0 | |||
| 33672 | BIORAD | Q6 | Overlay Metrology Tool | 1 | inquire | 0 | |||
| 33673 | BIORAD | Q7 | Overlay Metrology Tool | 1 | inquire | 0 | |||
| 33674 | BIORAD | QS-408M | Manual FTIR Spectrometer for Epi, SiN, BPSG Measurement, up to 200mm Wafers | 1 | inquire | 0 | |||
| 33678 | BOONTON | 72B | Capacitance Meter | 1 | inquire | 0 | |||
| 21838 | CAMECA | SHALLOW PROBE (LEXES) | EPI DOPANT CONCENTRATION MEASUREMENT | up to 300 MM | 01.10.2003 | 1 | inquire | immediately | 8 |
| 33957 | CAMECA | SHALLOW PROBE | Metrology | 1 | inquire | 0 | |||
| 25471 | Canon | M-830 | Ultra Sonic Image Inspection (SAT) | 1 | 6 | ||||
| 32473 | Carl Zeiss | LSM 210 | Laser Scanning Microscope and Optical Beam Induced Current(OBIC) system with inst* | 200 mm | 1 | inquire | 0 | ||
| 32405 | CDE | RESMAP468 | Resistivity mapping system | 200 mm | 01.12.2006 | 1 | inquire | 2 | |
| 33679 | CDE | 463-OC | Resistivity Mapping Tool, 150mm-300mm Wafers, 2ea Available. | 1 | inquire | 0 | |||
| 23163 | Cognex | 1600 | character recognition system | ASSEMBLY | 01.06.1995 | 1 | as is where is | immediately | 1 |
| 30614 | CREATIVE DESIGN ENGINEERING, INC | RESMAP 463-FOUP | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30615 | CREATIVE DESIGN ENGINEERING, INC | RESMAP 463-FOUP | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 34017 | Dage | 4000 | Wire Pull test system | 01.05.2009 | 1 | 3 | |||
| 32855 | Dionex | GT 40 | N/A | 1 | inquire | 0 | |||
| 21002 | Disco | DFD640 | DICING SAW | 01.06.1995 | 1 | as is where is | immediately | 0 | |
| 21003 | Disco | DFD640 | DICING SAW | 01.05.1993 | 1 | as is where is | immediately | 0 | |
| 27057 | E AND H | MX2012 | Wafer geometry measuring system | 300 mm | 01.09.1998 | 1 | as is where is | immediately | 1 |
| 27058 | E AND H | MX2012 | Wafer Geometry | 300 mm | 01.12.2001 | 1 | as is where is | immediately | 1 |
| 16505 | Eichhorn and Hausmann | MX208 | Wafer Geometry Gauge | 1 | as is where is | immediately | 5 | ||
| 23164 | Eichhorn and Hausmann | MX203 - 8 | Wafer Geometry Gauge | 200 mm | 01.06.1996 | 1 | as is where is | immediately | 3 |
| 21968 | Emitech | K550 | Sputter Coater for SEM sample preparation | 1 | as is all rebuilt | immediately | 2 | ||
| 16321 | ESI | 4300 | Laser Trim System | 01.01.2000 | 5 | as is where is | immediately | 10 | |
| 16418 | EVEX | EDX probe for SEM | 1 | inquire | immediately | 0 | |||
| 21461 | FEI | XL30 FEG | SEM | 1 | inquire | immediately | 1 | ||
| 14505 | FEI | XL830 | Dual beam FIB workstation | 01.06.1998 | 1 | inquire | 2 weeks | 1 | |
| 31278 | FEI | DUAL BEAM EXPIDA1265 | FIB SEM | 200 AND 300 MM | 01.06.2002 | 1 | as is where is | 0 | |
| 32117 | FEI | 200 XP | FIB SEM SINGLE BEAM | UP TO 50 MM FRAGMENTS | 01.06.2001 | 1 | inquire | immediately | 13 |
| 33680 | FEI | Expida 1265 | Dual Beam IonMill/SEM for up to 300mm Wafers | 1 | inquire | 0 | |||
| 33877 | FEI | FIB800 | FIB | 1 | as is where is | 0 | |||
| 33958 | FEI | 800 | FIB SEM | 1 | inquire | 0 | |||
| 23688 | FEINFOCUS | FXS 160.40 | X-Ray Inspection system | 01.05.2001 | 1 | 2 | |||
| 33681 | FIRST TEN ANGSTROMS | FTA-135 | Contact Angle Analyzer | 1 | inquire | 0 | |||
| 15948 | Four Dimensions | 280 | Automatic Sheet Resistivity Prober | 1 | as is all rebuilt | 2 weeks | 1 | ||
| 26582 | Four Dimensions | 280 SI | Automatic Sheet Resistivity Prober | 100-200 mm | 01.06.2004 | 1 | as is where is | immediately | 4 |
| 31279 | FRONTIER | FSM128L-NT | FILM STRESS AND WAFER BOW MEASUREMENT | 01.06.2006 | 1 | as is where is | 0 | ||
| 33459 | FRONTIER | FSM128L | FILM STRESS/WAFER BOW | 300 | 01.06.2003 | 1 | inquire | 0 | |
| 9961 | GCA TROPEL | 9000 | Surface Flatness Analyzer | 1 | as is where is | immediately | 3 | ||
| 9967 | HITACHI | S7000 | CD SEM | 150 mm | 01.06.1989 | 1 | inquire | immediately | 4 |
| 14856 | Hitachi | S8820 | CD SEM | 200 mm | 01.03.1997 | 1 | inquire | immediately | 7 |
| 15381 | Hitachi | S5000 | FE Inspection SEM | 01.06.1998 | 1 | as is where is | immediately | 1 | |
| 16407 | Hitachi | S4500 | FE Inspection SEM Type 1 chamber & Type 2 on 2nd S-4500 | 01.06.1996 | 2 | as is where is | immediately | 0 | |
| 16408 | Hitachi | S4500 | FE Inspection SEM Type 2 chamber | 01.06.1996 | 2 | as is where is | immediately | 0 | |
| 16409 | Hitachi | S4700 | FE Inspection SEM Type 2 chamber | 01.06.2001 | 1 | inquire | immediately | 3 | |
| 16419 | Hitachi | S570 | Inspection sem with EDX | 1 | as is where is | immediately | 0 | ||
| 20439 | Hitachi | S7800 | CD-SEM | 200 MM | 01.08.1997 | 1 | inquire | immediately | 0 |
| 21346 | Hitachi | S9380 | CD SEM | 200mm | 1 | 0 | |||
| 21457 | Hitachi | S2300 | SEM | 1 | inquire | immediately | 1 | ||
| 32430 | Hitachi | IS2600 | Wafer Inspecsion | 200 mm | 01.12.2006 | 1 | inquire | 0 | |
| 32431 | Hitachi | S-4500 | FESEM | 200 mm | 01.07.1995 | 1 | inquire | 0 | |
| 32408 | Hitachi | S-8840 | CD-SEM | 200 mm | 01.12.1997 | 1 | inquire | 0 | |
| 32409 | Hitachi | S-9200 | CD-SEM | 200 mm | 01.04.2000 | 1 | inquire | 0 | |
| 32406 | Hitachi | S-8820S | CD-SEM | 200 mm | 01.02.1996 | 1 | inquire | 0 | |
| 32407 | Hitachi | S-8840 | CD-SEM | 200 mm | 01.08.1997 | 1 | inquire | 0 | |
| 31294 | HITACHI | S-9380 TYPE II | CD-SEM | 300 MM | 01.06.2005 | 1 | as is where is | 0 | |
| 31292 | HITACHI | S-9380 TYPE II | CD-SEM | 300 MM | 01.06.2004 | 1 | as is where is | 0 | |
| 31291 | HITACHI | S-9360 | CD-SEM | 300 MM | 01.06.2005 | 1 | as is where is | 0 | |
| 31290 | HITACHI | S-9360 | CD-SEM | 200 AND 300 MM | 01.06.2003 | 1 | as is where is | 0 | |
| 31289 | HITACHI | S-9220 | CD-SEM | 01.06.2000 | 1 | as is where is | 0 | ||
| 31282 | HITACHI | LS-6800 | WAFER PARTICLE INSPECTION SYSTEM | 200 AND 300 MM | 01.06.2005 | 1 | as is where is | 0 | |
| 31281 | HITACHI | IS2700 | DARK-FIELD INSPECTION SYSTEM | 200 AND 300 MM | 01.06.2003 | 1 | as is where is | 0 | |
| 21839 | HITACHI | S9380 | CD SEM | 200 MM | 1 | inquire | immediately | 0 | |
| 22636 | Hitachi | S-4160 | Hitachi SEM with EDX | 1 | 4 | ||||
| 22702 | Hitachi | S-4500 | FEM SEM WITH TYPE 2 CHAMBER | 200mm | 01.06.1995 | 1 | as is where is | immediately | 0 |
| 22703 | Hitachi | S-4700 | SEM | 100mm | 1 | inquire | immediately | 12 | |
| 23183 | Hitachi | S5000 | FE SEM for inspection | 200 MM | 01.06.1999 | 1 | inquire | immediately | 0 |
| 23198 | HITACHI | S8840 | CD SEM | 1 | inquire | immediately | 0 | ||
| 23199 | HITACHI | S9220 | CD SEM W/ SMIF | 1 | inquire | immediately | 0 | ||
| 23200 | HITACHI | S9220 | CD SEM | 1 | inquire | immediately | 0 | ||
| 23201 | HITACHI | S9220 | CD SEM | 1 | inquire | immediately | 0 | ||
| 23202 | HITACHI | S9380 | CD SEM | 200 mm | 1 | inquire | immediately | 0 | |
| 26518 | Hitachi | S3000N | Scanning Electron Microscope with EDX | 6 Inch | 01.06.2004 | 1 | inquire | immediately | 21 |
| 26026 | HITACHI | PD-3000 | RETICLE PARTICLE DETECTION | 200 mm | 01.05.1998 | 1 | inquire | 1 | |
| 25472 | Hitachi | Mi-Scope 10 | Scanning Acoustic Microscope (SAM) | 01.06.1995 | 1 | as is where is | immediately | 3 | |
| 25468 | Hitachi | S-2700 | SEM with EDX | 01.03.1991 | 1 | 17 | |||
| 27178 | HITACHI | S5200 | SEM | Laboratory Equipment | 01.12.2004 | 1 | inquire | immediately | 2 |
| 28094 | Hitachi | S-5000 | INSPECTION SEM | 1 | as is where is | 0 | |||
| 34088 | HITACHI | S5200 | inspection sem | Laboratory Equipment | 01.12.2004 | 1 | inquire | immediately | 10 |
| 34078 | Hitachi | S9220 | CD SEM | 200 mm | 01.05.2000 | 3 | inquire | immediately | 0 |
| 32834 | Hitachi | IS-2600 | 300 mm | 01.11.2001 | 1 | inquire | 0 | ||
| 32835 | Hitachi | S-4500 | N/A | 1 | inquire | 0 | |||
| 32836 | Hitachi | S-5000 | N/A | 1 | inquire | 0 | |||
| 32837 | Hitachi | S-9380-II | 300 mm | 01.11.2005 | 1 | inquire | 0 | ||
| 33460 | HITACHI | S-6200H | CD-SEM | 150 | 01.06.1996 | 1 | inquire | 0 | |
| 33461 | HITACHI | S-7800 | CD-SEM | 125 | 01.06.1997 | 1 | inquire | 0 | |
| 33462 | HITACHI | S-8840 | CD-SEM | 200 | 01.06.1998 | 1 | inquire | 0 | |
| 33463 | HITACHI | S-9220 | CD-SEM | 200 | 01.06.2000 | 1 | inquire | 0 | |
| 33464 | HITACHI | S-9380II | CD-SEM | 300 | 01.06.2003 | 1 | inquire | 0 | |
| 33465 | HITACHI | S-9380II | CD-SEM | 300 | 01.06.2006 | 1 | inquire | 0 | |
| 33466 | HITACHI | S-9380II | CD-SEM | 300 | 01.06.2007 | 1 | inquire | 0 | |
| 33467 | HITACHI | WA-200C | AFM | 200 | 01.06.2001 | 1 | inquire | 0 | |
| 33535 | Hitachi | S8820 | CD SEM | 200 MM | 1 | as is where is | immediately | 0 | |
| 33536 | Hitachi | S8820 | CD SEM | 200 MM | 1 | as is where is | immediately | 0 | |
| 33537 | Hitachi | S5000 | INSPECTION SEM | 01.10.1997 | 1 | as is where is | immediately | 3 | |
| 33540 | Hitachi | S5000 | INSPECTION SEM | 01.10.1997 | 1 | as is where is | immediately | 3 | |
| 33570 | Hitachi | S-8840 | Scanning Electron Microscope | 8 inch | 01.12.1997 | 1 | inquire | 0 | |
| 33571 | Hitachi | S-8840 | Scanning Electron Microscope | 8 inch | 01.01.1998 | 1 | inquire | 0 | |
| 33893 | Hitachi | S9300 | CD SEM | 200 MM | 01.10.1999 | 1 | as is where is | immediately | 0 |
| 33928 | Hitachi | S8840 | CD SEM | 200 mm | 01.05.2000 | 1 | inquire | immediately | 0 |
| 33934 | Hitachi | S9300 | CD SEM | 200 mm | 1 | inquire | immediately | 0 | |
| 33959 | HITACHI | S5000 | INSPECTION SEM | 1 | inquire | 0 | |||
| 23284 | Hitachi (SEM) | S-4160 | FE SEM | 1 | inquire | 0 | |||
| 30630 | HITACHI (SEMICONDUCTOR) | S-6100 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30631 | HITACHI (SEMICONDUCTOR) | S-8820 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30632 | HITACHI (SEMICONDUCTOR) | S-8820 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30633 | HITACHI (SEMICONDUCTOR) | S-8820 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30634 | HITACHI (SEMICONDUCTOR) | S-8820 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30635 | HITACHI (SEMICONDUCTOR) | S-8820 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30636 | HITACHI (SEMICONDUCTOR) | S-8820 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30638 | HITACHI (SEMICONDUCTOR) | S-8840 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30639 | HITACHI (SEMICONDUCTOR) | S-9200 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30640 | HITACHI (SEMICONDUCTOR) | S-9200 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30641 | HITACHI (SEMICONDUCTOR) | S-9220 | SEM - CD (CRITICAL DIMENSION) | 01.04.2001 | 1 | as is where is | immediately | 0 | |
| 30642 | HITACHI (SEMICONDUCTOR) | S-9220 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30643 | HITACHI (SEMICONDUCTOR) | S-9220 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30644 | HITACHI (SEMICONDUCTOR) | S-9220 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30645 | HITACHI (SEMICONDUCTOR) | S-9220 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30648 | HITACHI (SEMICONDUCTOR) | S-9380 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30649 | HITACHI (SEMICONDUCTOR) | S-9200 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30650 | HITACHI (SEMICONDUCTOR) | S-9200 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30791 | HITACHI (SEMICONDUCTOR) | Z-8270 | SPECTROMETER - POLARIZED ZEEMAN ATOMIC ABSORPTION | 1 | as is where is | 0 | |||
| 27185 | Hitachi High-Technologies | S5200 | REM S5200 | Laboratory Equipment | 01.12.2001 | 1 | inquire | immediately | 2 |
| 31635 | Horiba | PD3000 | RETICLE INSPECTION | 01.02.1994 | 1 | as is where is | 4 | ||
| 32838 | Horiba | PD3000 | N/A | 1 | inquire | 0 | |||
| 33468 | HORIBA | UT-300 20 | FILM THICKNESS | 0 ???/??? | 01.06.2006 | 1 | inquire | 0 | |
| 30767 | HSEB DRESDEN GMBH | AXIOSPECT | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 27192 | ION-TOF | TOF 300 | TOF-SIMS Mass Spectrometer for full wafers | up to 300 mm | 01.02.2008 | 1 | inquire | immediately | 2 |
| 33683 | IONIC SYSTEMS | Stressgauge | Wafer Stress Measurement Tool,150mm Wafers, 2ea Available | 1 | inquire | 0 | |||
| 33684 | IONIC SYSTEMS | Stressgauge II | Wafer Stress Measurement Tool,150mm Wafers | 1 | inquire | 0 | |||
| 11069 | IRVINE OPTICAL | UltraSpec III | Wafer Inspection microscope | 3 to 6 inch | 1 | inquire | immediately | 1 | |
| 33685 | IRVINE OPTICAL | Ultrasort 208 | Wafer Sorting Tool, 200mm | 1 | inquire | 0 | |||
| 33686 | IRVINE OPTICAL | Ultrasort 208 | Wafer Sorting Tool, 200mm | 1 | inquire | 0 | |||
| 30555 | IVS, INC. | ACV4 | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30503 | J. A. WOOLLAM | VUV-VASE | ELLIPSOMETER | 1 | as is where is | 0 | |||
| 15289 | JEOL | JSM 7550 | INSPECTION SEM | 200 mm | 01.06.1996 | 1 | as is where is | immediately | 12 |
| 15299 | JEOL | JSM 7700 | INSPECTION SEM | 200 mm | 01.06.1995 | 1 | as is where is | immediately | 0 |
| 17461 | Jeol | JWS-7855S | SEM Scope Mask Observation | 01.05.2001 | 1 | 1 | |||
| 34064 | JEOL | JSM 5300LV | SEM | 1 | as is where is | immediately | 0 | ||
| 29638 | JEOL | JWS-7500E | SEM | 200 mm | 1 | as is where is | 0 | ||
| 29703 | Jeol | 7505 | SEM | 200 mm | 1 | as is where is | 0 | ||
| 30670 | JEOL | JFS-9855S | SEM - FIB (FOCUSED ION BEAM) | 1 | as is where is | 1 | |||
| 30671 | JEOL | JWS-8755S | SEM (SCANNING ELECTRON MICROSCOPE) | 1 | as is where is | 0 | |||
| 32159 | Jeol | JWS 7700 | FE Inspection SEM | 1 | 1 | ||||
| 32811 | JEOL | JSM6320 | Field Emission SEM | N/A | 1 | inquire | immediately | 0 | |
| 33337 | JEOL | JWS3000 | FE Sem for wafer defect review | up to 300 mm | 01.06.2004 | 1 | inquire | immediately | 0 |
| 22994 | Jeol / Holon | EMU-220 | CD SEM / Mask Measurement | 01.07.2002 | 1 | inquire | immediately | 4 | |
| 30789 | JORDAN VALLEY SEMICONDUCTORS LTD | JVX 6200 | 1 | as is where is | 0 | ||||
| 16420 | KEVEX | QUADRA | With EDX System | 1 | as is where is | immediately | 0 | ||
| 26577 | KLA | 2135 | WAFER INSPECTION | 200 mm | 1 | 5 | |||
| 1680 | KLA TENCOR | 2132 | bright-field WAFER INSPECTION | 200 mm | 01.08.1995 | 1 | inquire | immediately | 40 |
| 9991 | KLA TENCOR | RS 55 | Resistivity Mapping Tool | 100mm - 200 mm | 01.06.1991 | 1 | as is all rebuilt | immediately | 3 |
| 15493 | KLA Tencor | Surfscan 7700 | Patterned Wafer Surface Inspection Tool | 200 mm | 01.06.1997 | 1 | inquire | immediately | 4 |
| 17831 | KLA TENCOR | 2135 | Defect Metrology | 200mm | 1 | 1 | |||
| 19018 | KLA Tencor | 2138 | wafer inspection system | 200 mm | 01.01.1998 | 1 | inquire | immediately | 10 |
| 20938 | KLA TENCOR | AIT XP | Wafer Inspection Equipment | 200 mm | 1 | 1 | |||
| 21834 | KLA TENCOR | 6200 | bare wafer surface inspection | 200 MM | 2 | inquire | immediately | 0 | |
| 21334 | KLA Tencor | ES31 | Voltage Contrast SEM | 1 | 0 | ||||
| 21335 | KLA Tencor | 6200 | Surfscan Particle detection | 2 | 0 | ||||
| 21343 | KLA Tencor | AIT 2 + Fusion | Patterned and unpatterened wafer inspection | 200 mm | 01.06.2005 | 1 | inquire | immediately | 2 |
| 21345 | KLA Tencor | AIT 2 + FUSION | Wafer inspection System | 200 MM | 01.06.2005 | 1 | inquire | immediately | 2 |
| 21853 | KLA TENCOR | 6200 | wafer surface inspection | 150 MM AND 200 MM | 01.03.1993 | 1 | inquire | immediately | 3 |
| 21962 | KLA Tencor | Stealth | Defect Inspection | 200 MM | 1 | inquire | immediately | 0 | |
| 34062 | KLA TENCOR | 2135 | Bight field wafer inspection | 200mm | 1 | as is where is | immediately | 10 | |
| 32230 | KLA TENCOR | SFS6400 MECHANICAL CALIBRATION Document Number 238 | WAFERSURFACE ANALYSIS SYSTEM CUSTOMER MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | 1 | |
| 32231 | KLA TENCOR | Surfscan 64X0 Calibration Procedure | Surfscan 64X0 Calibration Procedure | MANUAL | 1 | as is where is | immediately | 1 | |
| 32232 | KLA TENCOR | surfscan 64XX optical alignments Document Number 236 | WAFER SURFACE ANALYSIS SYSTEM MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | 1 | |
| 32233 | KLA TENCOR | SFS6x00 MECHANICAL CALIBRATION Document number 200 | WAFER SURFACE ANALYSIS SYSTEM MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | 1 | |
| 33935 | KLA TENCOR | QUANTOX 64100 | Metrology | 200mm | 1 | as is where is | 0 | ||
| 1691 | KLA-TENCOR | 259 (spare parts) | Reticle Inspection - SPARE PARTS | up to 7 inch | 01.12.1991 | 1 | inquire | immediately | 0 |
| 15058 | KLA-Tencor | Surfscan 7700 | Patterned Wafer Surface Inspection Tool | 01.05.1996 | 2 | 1 | |||
| 15562 | KLA-TENCOR | eS20XP | CD-SEM e-beam inspection system SMIF | 200 MM | 01.09.2001 | 1 | as is where is | immediately | 0 |
| 15563 | KLA-TENCOR | 8100XP | CD SEM WITH SMIF | 100-200 MM | 01.07.2001 | 1 | as is where is | immediately | 0 |
| 15564 | KLA-TENCOR | 8100XP | CD SEM SMIF FITTED | 100-200 MM | 01.11.1998 | 1 | as is where is | immediately | 0 |
| 15565 | KLA-TENCOR | FABVARS | VARS IMAGE STORAGE DATABASE | FACILITIES | 01.07.2000 | 1 | as is where is | immediately | 0 |
| 15797 | KLA-TENCOR | eS20XP | CD-SEM | 1 | as is where is | 0 | |||
| 16441 | KLA-TENCOR | 2132 | Patterned wafer brightfield defect inspection | 200 mm | 1 | as is where is | immediately | 0 | |
| 17464 | KLA-TENCOR | 2550 | WAFER INSPECTION COMPUTER | facilities | 01.02.1992 | 1 | as is where is | immediately | 0 |
| 19345 | KLA-Tencor | TeraStar | Reticle Inspection System | reticle | 01.06.2002 | 1 | inquire | immediately | 0 |
| 20140 | KLA-Tencor | Viper 2401 | MACRO DEFECT INSPECTION SYSTEM | 1 | inquire | immediately | 0 | ||
| 20141 | KLA-Tencor | Viper 2401 | MACRO DEFECT INSPECTION SYSTEM | 1 | inquire | immediately | 0 | ||
| 20142 | KLA-Tencor | Viper 2401 | MACRO DEFECT INSPECTION SYSTEM | 150 MM | 01.12.1998 | 1 | inquire | immediately | 5 |
| 20480 | KLA-TENCOR | 6220 | WAFER INSPECTION | 2 to 8 inch | 1 | inquire | immediately | 0 | |
| 20673 | KLA-TENCOR | VIPER 2410 | MACRO WAFER DEFECT INSPECTION | 200 MM | 01.06.2001 | 1 | as is where is | 0 | |
| 31505 | KLA-Tencor | SFS6200 | Inspection | 200 mm | 01.11.1993 | 1 | as is where is | 0 | |
| 31506 | KLA-Tencor | SFS6200 | Inspection | 200 mm | 01.05.1993 | 1 | as is where is | 0 | |
| 31507 | KLA-Tencor | SFS6200 | Inspection | 200 mm | 01.11.1993 | 1 | as is where is | 0 | |
| 32429 | KLA-Tencor | RS75TC | Resistivity mapping system | 200 mm | 01.09.1997 | 1 | inquire | 0 | |
| 32432 | KLA-Tencor | SURFSCAN 6420 | Surface Analyzer | 200 mm | 01.09.1995 | 1 | inquire | 0 | |
| 32433 | KLA-Tencor | SURFSCAN 7600 | Surface Analyzer | 200 mm | 01.05.1995 | 1 | inquire | 0 | |
| 32426 | KLA-Tencor | UV-1280SE | Thin Film Measurement | 200 mm | 01.10.2000 | 1 | inquire | 0 | |
| 32427 | KLA-Tencor | KLA-5200XP | Overlay measurement | 200 mm | 01.08.2000 | 1 | inquire | 0 | |
| 32428 | KLA-Tencor | KLA-5200XP | Overlay measurement | 200 mm | 01.02.2006 | 1 | inquire | 0 | |
| 32414 | KLA-Tencor | RS35C | Resistivity mapping system | 200 mm | 01.09.1996 | 1 | inquire | 0 | |
| 32415 | KLA-Tencor | SFS6420 | Non pattern wafer inspection | 200 mm | 01.02.1996 | 1 | inquire | 0 | |
| 32416 | KLA-Tencor | SFS6420 | Non pattern wafer inspection | 200 mm | 01.09.1996 | 1 | inquire | 0 | |
| 32410 | KLA-Tencor | HRP-240 | High Resolution Surface Profiler | 200 mm | 01.05.2006 | 1 | inquire | 0 | |
| 32411 | KLA-Tencor | M-GAGE300 | Thin Film Measurement | 200 mm | 01.01.1996 | 1 | inquire | 0 | |
| 32412 | KLA-Tencor | P-2 | Surface Profiler | 200 mm | 01.01.1996 | 1 | inquire | 0 | |
| 32413 | KLA-Tencor | RS35C | Resistivity mapping system | 200 mm | 01.01.1996 | 1 | inquire | 0 | |
| 31301 | KLA-TENCOR | 5200XP | OVERLAY MEASUREMENT | 200 MM | 01.06.2000 | 1 | as is where is | 0 | |
| 21857 | KLA-TENCOR | AIT | WAFER SURFACE PARTICLE INSPECTION SYSTEM | 125-200 MM | 1 | as is where is | immediately | 0 | |
| 22719 | KLA-Tencor | Surfscan SP-1 Classic | Wafer Surface Inspection System | Multiple | 01.06.2002 | 1 | inquire | 2 weeks | 8 |
| 23203 | KLA-TENCOR | 6220 | SURFSCAN BARE | 200 mm | 01.02.1999 | 1 | inquire | immediately | 0 |
| 26160 | KLA-TENCOR | 2139 | WAFER INSPECTION SYSTEM | 200 mm | 01.05.1996 | 1 | inquire | immediately | 1 |
| 26158 | KLA-TENCOR | 2139 | WAFER INSPECTION SYSTEM | 200 mm | 01.05.1996 | 1 | inquire | immediately | 1 |
| 26138 | KLA-TENCOR | 2139 | WAFER INSPECTION | 150 mm | 01.01.2001 | 1 | inquire | immediately | 1 |
| 26119 | KLA-TENCOR | SURFSCAN 6220 | UNPATTERNED WAFER SURFACE INSPECTION | 200 mm | 01.03.1998 | 1 | inquire | 1 | |
| 26084 | KLA-TENCOR | P-22 | Automated SURFACE PROFILER | 200 mm | 01.02.1997 | 1 | inquire | 1 | |
| 26574 | KLA-Tencor | 2135 XP | BRIGHTFIELD WAFER DEFECT INSPECTION | 200 mm | 01.09.1996 | 1 | as is where is | immediately | 9 |
| 27225 | KLA-TENCOR | AIT 2 FUSION | Darkfield Defect inspection system | 300 mm | 01.11.1998 | 1 | inquire | immediately | 1 |
| 27230 | KLA-TENCOR | ASET F5X | Film Thickness Measurement F5+ | 300 mm | 01.06.2001 | 1 | as is where is | immediately | 4 |
| 27789 | KLA-Tencor | SP1 TBI | unpatterned wafer surface inspecion system | 200 and 300 mm | 01.06.2000 | 1 | inquire | immediately | 1 |
| 27796 | KLA-Tencor | Surfscan SP-1 Classic | Wafer Surface Inspection System | Multiple | 01.03.1997 | 1 | inquire | 2 weeks | 2 |
| 27865 | KLA-Tencor | SP1-TBI | WAFER INSPECTION SYSTEM | 200 MM | 01.01.2001 | 1 | inquire | immediately | 2 |
| 28024 | KLA-TENCOR | ES32 | VOLTAGE CONTRAST SEM | 01.07.2004 | 1 | inquire | immediately | 5 | |
| 28097 | KLA-Tencor | 6100 | WAFER PARTICLE DETECTION | 1 | as is where is | 0 | |||
| 28098 | KLA-Tencor | 6100 | WAFER PARTICLE DETECTION | 1 | as is where is | 0 | |||
| 28099 | KLA-Tencor | 6420 | WAFER PARTICLE DETECTION | 1 | as is where is | 0 | |||
| 28100 | KLA-Tencor | 7700 | WAFER PARTICLE DETECTION | 1 | as is where is | 0 | |||
| 34053 | KLA-Tencor | 6420 | surface particle detection system | 1 | as is where is | immediately | 1 | ||
| 29705 | KLA-TENCOR | FT 600 | Film thickness | 200 mm | 1 | as is where is | 0 | ||
| 29706 | KLA-TENCOR | FT 750 | Film thickness | 200 mm | 4 | as is where is | 0 | ||
| 29707 | KLA-TENCOR | QUANTOX | 200 mm | 1 | as is where is | 0 | |||
| 29708 | KLA-TENCOR | QUANTOX | spare parts tool | 200 mm | 1 | as is where is | 0 | ||
| 30594 | KLA-TENCOR | PUMA 9130 | PATTERNED WAFER INSPECTION SYSTEM | 200/300 mm | 1 | as is where is | immediately | 1 | |
| 31238 | KLA-Tencor | AIT UV | Inspection System | 200 mm | 1 | as is where is | 0 | ||
| 31239 | KLA-Tencor | AIT UV | Inspection System | 200 mm | 1 | as is where is | 0 | ||
| 31242 | KLA-Tencor | 5100 XP | registration tool / overlay measurement | 200 mm | 01.04.1999 | 1 | inquire | immediately | 13 |
| 31243 | KLA-Tencor | AIT UV | Inspection System | 200 mm | 1 | as is where is | 0 | ||
| 31244 | KLA-Tencor | 8250 | cd sem | 200 mm | 1 | as is where is | 0 | ||
| 32208 | KLA-TENCOR | 9000 PUMA | darkfield defect inspection system | 300 mm | 01.06.2004 | 1 | inquire | immediately | 1 |
| 32203 | KLA-TENCOR | 9000 PUMA | darkfield defect inspection system | 300 mm | 01.06.2004 | 1 | inquire | immediately | 1 |
| 32234 | KLA-TENCOR | 9000 PUMA | darkfield defect inspection system | 300 mm | 01.06.2004 | 1 | inquire | immediately | 1 |
| 32812 | KLA-Tencor | 6100 | 200 mm | 01.12.1993 | 1 | inquire | 0 | ||
| 32813 | KLA-Tencor | 6200 | 200 mm | 1 | inquire | 0 | |||
| 32814 | KLA-Tencor | 6420 | 150 mm | 01.07.1998 | 1 | inquire | 0 | ||
| 32815 | KLA-Tencor | 7700 | 200 mm | 01.11.1995 | 1 | inquire | 0 | ||
| 32816 | KLA-Tencor | 7700 | 200 mm | 01.11.1995 | 1 | inquire | 0 | ||
| 32817 | KLA-Tencor | 8250 | N/A | 1 | inquire | 0 | |||
| 32818 | KLA-Tencor | AIT Fusion UV | 200 mm | 1 | inquire | 0 | |||
| 32819 | KLA-Tencor | AIT Fusion UV | 200 mm | 1 | inquire | 0 | |||
| 32820 | KLA-Tencor | AIT Fusion UV | 200 mm | 1 | inquire | 0 | |||
| 32821 | KLA-Tencor | AIT Fusion XUV | 200 mm | 1 | inquire | 0 | |||
| 32822 | KLA-Tencor | Archer 10 | 200 mm | 1 | inquire | 0 | |||
| 32823 | KLA-Tencor | Archer 10 | 200 mm | 01.03.2003 | 1 | inquire | 0 | ||
| 32824 | KLA-Tencor | Archer 10 | 200 mm | 1 | inquire | 0 | |||
| 32825 | KLA-Tencor | Archer AIM | 200 mm | 01.05.2000 | 1 | inquire | 0 | ||
| 32826 | KLA-Tencor | eS32 | 300 mm | 01.06.2005 | 1 | inquire | 0 | ||
| 32827 | KLA-Tencor | SP1 | 200 mm | 1 | inquire | 0 | |||
| 32828 | KLA-Tencor | SP1-DLS | 200 mm | 1 | inquire | 0 | |||
| 32829 | KLA-Tencor | SP1-DLS | 200 mm | 01.08.2004 | 1 | inquire | 0 | ||
| 32830 | KLA-Tencor | SP1-DLS | 300 mm | 01.01.2005 | 1 | inquire | 0 | ||
| 32831 | KLA-Tencor | SP1-TBI | 200 mm | 01.09.2002 | 1 | inquire | 0 | ||
| 32832 | KLA-Tencor | SP2 | 300 mm | 01.09.2007 | 1 | inquire | 0 | ||
| 32833 | KLA-Tencor | SP2 | 200 mm | 1 | inquire | 0 | |||
| 33078 | KLA-Tencor | SL301 | Reticle inspection system | 01.06.1996 | 1 | as is where is | immediately | 34 | |
| 33079 | KLA-Tencor | SL3UV HR | Reticle inspection system | 01.06.2002 | 1 | as is where is | immediately | 6 | |
| 33522 | KLA-TENCOR | AIT XP | WAFER INSPECTION | 200 MM | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 33523 | KLA-TENCOR | AIT XP | WAFER INSPECTION | 200 MM | 01.09.2000 | 1 | as is where is | immediately | 0 |
| 33527 | KLA-Tencor | Surfscan 7600 | Wafer inspection system | 200 MM | 01.03.1997 | 1 | as is where is | immediately | 0 |
| 33529 | KLA-TENCOR | UV 1280 SE | Thin film measurement | 200 MM | 1 | as is where is | immediately | 0 | |
| 33572 | KLA-Tencor | SFS6200 | Bare Wafer Inspection | 8 inch | 01.01.1995 | 1 | inquire | 0 | |
| 33573 | KLA-Tencor | SFS6200 | Bare Wafer Inspection | 8 inch | 01.02.1995 | 1 | inquire | 0 | |
| 33574 | KLA-Tencor | SFS6420 | Bare Wafer Inspection, Wafer Size:6,8 | 8 inch | 01.01.1996 | 1 | inquire | 0 | |
| 33575 | KLA-Tencor | UV-1280SE | Film Thickness Measurement | 8 inch | 01.11.1998 | 1 | inquire | 0 | |
| 33576 | KLA-Tencor | UV-1280SE | Film Thickness Measurement | 8 inch | 01.05.1998 | 1 | inquire | 0 | |
| 33577 | KLA-Tencor | UV-1280SE | Film Thickness Measurement | 8 inch | 01.11.1998 | 1 | inquire | 0 | |
| 33687 | KLA-TENCOR | 5100 | Overlay Metrology Tool for 200mm Wafers | 1 | inquire | 0 | |||
| 33688 | KLA-TENCOR | AlphaStep 200 | Profilometer | 1 | inquire | 2 weeks | 1 | ||
| 33689 | KLA-TENCOR | CRS-3000 | Confocal Review Station for up to 300mm Wafers | 1 | inquire | 0 | |||
| 33690 | KLA-TENCOR | P-2 | Long Scan Profiler | 1 | inquire | 0 | |||
| 33691 | KLA-TENCOR | P-22 | Long Scan Profiler, Cassette to Cassette | 1 | inquire | 0 | |||
| 33692 | KLA-TENCOR | SpectraFx 200 | Optical Thin-Film Metrology System | 1 | inquire | 0 | |||
| 33693 | KLA-TENCOR | Surfscan 7700 | Patterned Wafer Surface Inspection Tool | 1 | inquire | 0 | |||
| 33694 | KLA-TENCOR | Surfscan 7700 | Patterned Wafer Surface Inspection Tool | 1 | inquire | 0 | |||
| 33695 | KLA-TENCOR | Surfscan AIT | Patterned Wafer Surface Inspection Tool | 1 | inquire | 0 | |||
| 33696 | KLA-TENCOR | Surfscan AIT 8020 | Patterned Wafer Surface Inspection Tool with Autofocus Review | 1 | inquire | 0 | |||
| 33892 | KLA-Tencor | Aset F5 | Metrology system | 200 MM | 01.10.1999 | 1 | as is where is | immediately | 0 |
| 33894 | KLA-Tencor | RS 55 TC | Metrology system | 200 MM | 01.06.1996 | 1 | as is where is | immediately | 0 |
| 33895 | KLA-Tencor | 6220 | WAFER SURFACE INSPECTION | 200 MM | 01.04.1996 | 1 | as is where is | immediately | 0 |
| 33896 | KLA-Tencor | 6220 | WAFER SURFACE INSPECTION | 200 MM | 01.04.1996 | 1 | as is where is | immediately | 0 |
| 33897 | KLA-Tencor | AIT | WAFER SURFACE INSPECTION | 200 MM | 01.03.1998 | 1 | as is where is | immediately | 0 |
| 33898 | KLA-Tencor | SURFSCAN 7600 | WAFER SURFACE INSPECTION | 200 MM | 01.04.1995 | 1 | as is where is | immediately | 0 |
| 33900 | KLA-Tencor | SURFSCAN 6200 | WAFER SURFACE INSPECTION | 200 MM | 01.06.1994 | 1 | as is where is | immediately | 0 |
| 33901 | KLA-Tencor | SURFSCAN 6220 | WAFER SURFACE INSPECTION | 200 MM | 01.05.1999 | 1 | as is where is | immediately | 0 |
| 33902 | KLA-Tencor | RS 55 TC | RESMAP | 200 MM | 01.06.1996 | 1 | as is where is | immediately | 0 |
| 33906 | KLA-Tencor | Surfscan AIT | WAFER INSPECTION | 200 MM | 01.04.1999 | 1 | as is where is | immediately | 0 |
| 33907 | KLA-Tencor | AIT UV | WAFER SURFACE INSPECTION DUAL SMIF | 200 MM | 01.10.2002 | 1 | as is where is | immediately | 0 |
| 33911 | KLA-Tencor | AIT UV | WAFER SURFACE INSPECTION DUAL SMIF | 200 MM | 01.08.2002 | 1 | as is where is | immediately | 0 |
| 33912 | KLA-Tencor | QUANTOX | WAFER INSPECTION | 200 MM | 01.08.2002 | 1 | as is where is | immediately | 0 |
| 33914 | KLA-Tencor | 2370 STEALTH | WAFER INSPECTION | 300 MM | 01.02.2003 | 1 | as is where is | immediately | 0 |
| 33915 | KLA-Tencor | 2608 | WAFER INSPECTION | 200 MM | 1 | as is where is | immediately | 0 | |
| 33916 | KLA-Tencor | 2350 | WAFER INSPECTION | 200 MM | 01.09.2000 | 1 | as is where is | immediately | 0 |
| 33919 | KLA-Tencor | FUSION XUV PLUS | WAFER INSPECTION | 200 MM | 01.06.2004 | 1 | as is where is | immediately | 0 |
| 33923 | KLA-Tencor | RS100 | WAFER INSPECTION | 200 MM | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 33960 | KLA-TENCOR | 2132 | BRIGHT FIELD WAFER INSPECTION | 1 | inquire | 0 | |||
| 33961 | KLA-TENCOR | SP1 | Defect Metrology | 1 | inquire | 0 | |||
| 33962 | KLA-TENCOR | 5340PS | OVERLAY MEASUREMENT | 1 | inquire | 0 | |||
| 33963 | KLA-TENCOR | AIT UV | Defect Metrology | 1 | inquire | 0 | |||
| 33964 | KLA-TENCOR | AIT UV+ | Defect Metrology | 1 | inquire | 0 | |||
| 33965 | KLA-TENCOR | AIT-XP PLUS | Defect Metrology | 1 | inquire | 0 | |||
| 33966 | KLA-TENCOR | AIT2 | Defect Metrology | 1 | inquire | 0 | |||
| 33967 | KLA-TENCOR | ARCHER 10 | OVERLAY MEASUREMENT | 1 | inquire | 0 | |||
| 33968 | KLA-TENCOR | SP1 | DEFECT INSPECTION | 1 | inquire | 0 | |||
| 33969 | KLA-TENCOR | SP1 TBI READY | Defect Metrology | 1 | inquire | 0 | |||
| 34090 | KLA-Tencor Corp. | 2800 (Parts) | Front end of Patterned wafer inspection system | 300 MM | 01.11.2006 | 1 | as is where is | immediately | 1 |
| 30520 | KLA-TENCOR CORP. | VIPER 2401 | INSPECTION - AUTOMATED MACRO-DEFECT | 1 | as is where is | 0 | |||
| 30521 | KLA-TENCOR CORP. | VIPER 2401 | INSPECTION - AUTOMATED MACRO-DEFECT | 1 | as is where is | 0 | |||
| 30522 | KLA-TENCOR CORP. | VIPER 2401 | INSPECTION - AUTOMATED MACRO-DEFECT | 1 | as is where is | 0 | |||
| 30523 | KLA-TENCOR CORP. | VIPER 2401 | INSPECTION - AUTOMATED MACRO-DEFECT | 1 | as is where is | 0 | |||
| 30524 | KLA-TENCOR CORP. | VIPER 2410 | INSPECTION - AUTOMATED MACRO-DEFECT | 200 mm | 01.01.2001 | 1 | as is where is | 1 | |
| 30525 | KLA-TENCOR CORP. | VIPER 2410 | INSPECTION - AUTOMATED MACRO-DEFECT | 1 | as is where is | 0 | |||
| 30533 | KLA-TENCOR CORP. | CRS-1200-S | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30556 | KLA-TENCOR CORP. | 5200XP | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30557 | KLA-TENCOR CORP. | 5200XP | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30558 | KLA-TENCOR CORP. | 5200XP | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30559 | KLA-TENCOR CORP. | 5200XP | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30560 | KLA-TENCOR CORP. | 5200XP | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30561 | KLA-TENCOR CORP. | 5200XP | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30562 | KLA-TENCOR CORP. | 5200XP | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30563 | KLA-TENCOR CORP. | 5200XP | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30565 | KLA-TENCOR CORP. | ARCHER 10 | OVERLAY MEASUREMENT SYSTEM | 01.03.2000 | 1 | as is where is | 1 | ||
| 30583 | KLA-TENCOR CORP. | AIT XP | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30584 | KLA-TENCOR CORP. | AIT XP | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30585 | KLA-TENCOR CORP. | AIT XP | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30586 | KLA-TENCOR CORP. | AIT XP | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30587 | KLA-TENCOR CORP. | AIT XP+ | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30588 | KLA-TENCOR CORP. | AIT XP+ | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30589 | KLA-TENCOR CORP. | AIT XP+ | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30590 | KLA-TENCOR CORP. | AIT XP+ | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30591 | KLA-TENCOR CORP. | AIT XP+ | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30592 | KLA-TENCOR CORP. | AIT XP+ | PATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30593 | KLA-TENCOR CORP. | AIT XP+ | PATTERNED WAFER INSPECTION SYSTEM | 200 mm | 01.05.2000 | 1 | as is where is | 1 | |
| 30595 | KLA-TENCOR CORP. | SURFSCAN AIT | PATTERNED WAFER INSPECTION SYSTEM WITH SMIF PORTS | 01.12.2000 | 1 | as is where is | immediately | 0 | |
| 30596 | KLA-TENCOR CORP. | SURFSCAN AIT | PATTERNED WAFER INSPECTION SYSTEM | 200 MM | 01.12.1997 | 1 | as is where is | immediately | 0 |
| 30597 | KLA-TENCOR CORP. | SURFSCAN AIT | PATTERNED WAFER INSPECTION SYSTEM WITH SMIF PODS | 200 MM | 01.02.2001 | 1 | as is where is | immediately | 0 |
| 30598 | KLA-TENCOR CORP. | SURFSCAN AIT | PATTERNED WAFER INSPECTION SYSTEM | 200 mm | 01.12.1997 | 1 | as is where is | immediately | 0 |
| 30610 | KLA-TENCOR CORP. | HRP-240 | PROFILOMETER - LONG SCAN | 1 | as is where is | 0 | |||
| 30611 | KLA-TENCOR CORP. | HRP-240 | PROFILOMETER - LONG SCAN | 1 | as is where is | 0 | |||
| 30616 | KLA-TENCOR CORP. | OMNIMAP RS75 | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30617 | KLA-TENCOR CORP. | OMNIMAP RS75 | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30618 | KLA-TENCOR CORP. | RS-100 | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30619 | KLA-TENCOR CORP. | RS-100 | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30620 | KLA-TENCOR CORP. | RS-100 | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30621 | KLA-TENCOR CORP. | RS-100 | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30622 | KLA-TENCOR CORP. | RS-75 OMNIMAP | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30623 | KLA-TENCOR CORP. | RS-75 OMNIMAP | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30624 | KLA-TENCOR CORP. | RS-75 OMNIMAP | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30625 | KLA-TENCOR CORP. | RS-75 OMNIMAP | RESISTIVITY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30651 | KLA-TENCOR CORP. | 8100XP | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30652 | KLA-TENCOR CORP. | 8100XP | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30653 | KLA-TENCOR CORP. | 8100XP | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30654 | KLA-TENCOR CORP. | 8100XP-S | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30656 | KLA-TENCOR CORP. | ECD-1 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30657 | KLA-TENCOR CORP. | ECD-1 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30658 | KLA-TENCOR CORP. | ECD-1 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30659 | KLA-TENCOR CORP. | ECD-1 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30660 | KLA-TENCOR CORP. | ECD-1 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30661 | KLA-TENCOR CORP. | ECD-2 | SEM - CD (CRITICAL DIMENSION) | 1 | as is where is | 0 | |||
| 30666 | KLA-TENCOR CORP. | EV300 | SEM - DEFECT REVIEW | 1 | as is where is | 0 | |||
| 30667 | KLA-TENCOR CORP. | EV300 | SEM - DEFECT REVIEW | 1 | as is where is | 0 | |||
| 30668 | KLA-TENCOR CORP. | EV300 | SEM - DEFECT REVIEW | 1 | as is where is | 0 | |||
| 30669 | KLA-TENCOR CORP. | EV300 | SEM - DEFECT REVIEW | 1 | as is where is | 0 | |||
| 30673 | KLA-TENCOR CORP. | FLX-5500 | STRESS MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30674 | KLA-TENCOR CORP. | FLX-5500 | STRESS MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30675 | KLA-TENCOR CORP. | FLX-5500 | STRESS MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30677 | KLA-TENCOR CORP. | P-30H | SURFACE PROFILER | 200 mm | 01.02.1997 | 1 | as is where is | 1 | |
| 30679 | KLA-TENCOR CORP. | P-22H | SURFACE PROFILER | 1 | as is where is | 0 | |||
| 30682 | KLA-TENCOR CORP. | ASET-F5X | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30683 | KLA-TENCOR CORP. | ASET-F5X | THIN FILM MEASUREMENT SYSTEM | 01.10.2000 | 1 | as is where is | 1 | ||
| 30684 | KLA-TENCOR CORP. | ASET-F5X | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30686 | KLA-TENCOR CORP. | PROMETRIX UV-1070 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30687 | KLA-TENCOR CORP. | PROMETRIX UV-1280SE | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30688 | KLA-TENCOR CORP. | PROMETRIX UV-1280SE | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30689 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30690 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30691 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30693 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30694 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30696 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30697 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30698 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30699 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30700 | KLA-TENCOR CORP. | PROMETRIX UV-1080 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30701 | KLA-TENCOR CORP. | PROMETRIX UV-1280SE | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30702 | KLA-TENCOR CORP. | PROMETRIX UV-1280SE | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30703 | KLA-TENCOR CORP. | PROMETRIX UV-1280SE | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30704 | KLA-TENCOR CORP. | PROMETRIX UV-1280SE | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30732 | KLA-TENCOR CORP. | SURFSCAN 6200 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30733 | KLA-TENCOR CORP. | SURFSCAN 6200 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30735 | KLA-TENCOR CORP. | SURFSCAN 6420 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30736 | KLA-TENCOR CORP. | SURFSCAN 6420 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30737 | KLA-TENCOR CORP. | SURFSCAN 6420 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30738 | KLA-TENCOR CORP. | SURFSCAN 6420 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30740 | KLA-TENCOR CORP. | SURFSCAN SP1 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30741 | KLA-TENCOR CORP. | SURFSCAN SP1 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30742 | KLA-TENCOR CORP. | SURFSCAN SP1 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30743 | KLA-TENCOR CORP. | SURFSCAN SP1 TBI | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30744 | KLA-TENCOR CORP. | SURFSCAN SP1 TBI | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30745 | KLA-TENCOR CORP. | SURFSCAN SP1 TBI | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30747 | KLA-TENCOR CORP. | SURFSCAN SP2 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30748 | KLA-TENCOR CORP. | SURFSCAN 6220 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30749 | KLA-TENCOR CORP. | SURFSCAN 6220 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30750 | KLA-TENCOR CORP. | SURFSCAN 6220 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30751 | KLA-TENCOR CORP. | SURFSCAN 6220 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30752 | KLA-TENCOR CORP. | SURFSCAN 6220 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30753 | KLA-TENCOR CORP. | SURFSCAN 6220 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30754 | KLA-TENCOR CORP. | SURFSCAN 6220 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30755 | KLA-TENCOR CORP. | SURFSCAN 6420 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30756 | KLA-TENCOR CORP. | SURFSCAN 6420 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30757 | KLA-TENCOR CORP. | SURFSCAN 6420 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30758 | KLA-TENCOR CORP. | SURFSCAN SP1 | UNPATTERNED WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30768 | KLA-TENCOR CORP. | 2135 | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30769 | KLA-TENCOR CORP. | 2138 | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30770 | KLA-TENCOR CORP. | 2138XP | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 33338 | KLA-Tencor Corp. | 2800 | Patterned wafer inspection system | 200 MM | 01.07.2007 | 1 | as is where is | immediately | 0 |
| 33339 | KLA-Tencor Corp. | AIT XP | Patterned wafer inspection system | 01.03.2000 | 1 | inquire | 0 | ||
| 33340 | KLA-Tencor Corp. | ASET-F5X / Spectra CD 100 | Thin film measurement system | 01.12.2003 | 1 | inquire | 0 | ||
| 33341 | KLA-Tencor Corp. | eV300 | SEM - Defect Review | 01.10.2000 | 1 | inquire | 0 | ||
| 33342 | KLA-Tencor Corp. | FLX-5400 | Stress measurement system | 01.06.1997 | 1 | inquire | 0 | ||
| 33343 | KLA-Tencor Corp. | Quantox 64100 | Oxide charge monitoring system | 01.03.2001 | 1 | inquire | 0 | ||
| 16209 | KLA/TENCOR | CRS 1010 | DEFECT REVIEW STATION | 01.06.1996 | 1 | 4 | |||
| 33469 | KLA/TENCOR | KLA2138 | DEFECT ANALYZER | 200 | 01.06.1999 | 1 | inquire | 0 | |
| 33470 | KLA/TENCOR | SP1 20 | WAFER PARTICLE COUNTER | 0 ???/??? | 01.06.2000 | 1 | inquire | 0 | |
| 15112 | Leica | INS3000 | Microscope inspection station | 100 to 200 mm | 01.03.1999 | 1 | inquire | immediately | 5 |
| 33697 | LEICA | INS 2000 | Defect Review System | 1 | inquire | 0 | |||
| 33698 | LEICA | Polylite 88 | Microscope - Incomplete, 3ea Available | 1 | inquire | 0 | |||
| 33699 | LEICA | SZ6 | StereoZoom Microscope on Boom Stand with 10X WF EPs | 1 | inquire | 0 | |||
| 33917 | LEICA | INS 3000 | WAFER INSPECTION MICROSCOPE | 200 MM | 01.03.2000 | 1 | as is where is | immediately | 0 |
| 30534 | LEICA INC. | LDS3000M | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30535 | LEICA INC. | LDS3000M | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30536 | LEICA INC. | LDS3000M | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30537 | LEICA INC. | LDS3000M | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 30543 | LEICA INC. | INM20 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 30544 | LEICA INC. | INM20 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 30545 | LEICA INC. | INM20 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 30546 | LEICA INC. | INM 200 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 30547 | LEICA INC. | INM 200 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 30548 | LEICA INC. | INM 200 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 1 | |||
| 30549 | LEICA INC. | INM 200 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 30550 | LEICA INC. | INM 200 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 30551 | LEICA INC. | INM 200 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 30553 | LEICA INC. | INM 200 | MICROSCOPE- WAFER INSPECTION | 1 | as is where is | 0 | |||
| 20442 | LEITZ | MPV-SP | REFLECTOMETER | 150mm | 01.06.1995 | 1 | as is where is | immediately | 7 |
| 21456 | LEO | 435VP | Inspection SEM | 01.06.1999 | 1 | inquire | immediately | 16 | |
| 32839 | Leo | LTA-550 | 200 mm | 01.10.1996 | 1 | inquire | 0 | ||
| 33538 | LEO | 1560 Gemini | INSPECTION SEM | 1 | as is where is | immediately | 0 | ||
| 14861 | Leo Giken | LTA 330A | Carrier Lifetime measurement | 150 mm | 01.06.1993 | 1 | inquire | immediately | 3 |
| 33082 | Logitech | PM5 | Polishing System | 1 | 1 | ||||
| 19268 | MDC | CSM / 2 | CV MEASUREMENT | 100 mm | 1 | as is where is | immediately | 1 | |
| 33539 | MICRION | 9500 | FIB SEM | 01.11.1996 | 1 | as is where is | immediately | 0 | |
| 32840 | Micro Instruments | PE9015 | N/A | 01.06.1997 | 1 | inquire | 0 | ||
| 15529 | Micro Vu | Smartscope 250 | Video Microscope Measuring System | 01.05.1999 | 1 | as is where is | immediately | 9 | |
| 15530 | Micro Vu | Smarscope 250 | Video Microscope Measuring System | 01.05.1995 | 1 | 6 | |||
| 32841 | Micro-Tec Instrumentation | Z-CHECK 700 S | N/A | 1 | inquire | 0 | |||
| 32842 | Micro-Vu | H-14 | N/A | 1 | inquire | 0 | |||
| 33345 | MKS Instruments Inc. | HPQ 2 - High Pressure Quadrapole | RGA Equipment - Spectra | 1 | inquire | 0 | |||
| 33970 | MSP | 2300 | PSL SPHERE | 1 | inquire | 0 | |||
| 28096 | NANO-Master | NSC-2000 | SEM SAMPLE PREPARATION | 1 | as is where is | 0 | |||
| 14563 | Nanometrics | NanoSpec AFT #010-0181 | Film Thickness Analyzers | 150 mm/125 mm | 2 | as is where is | immediately | 2 | |
| 32435 | Nanometrics | NANOSPEC 8000XSE | Thin Film Measurement | 200 mm | 01.11.2000 | 1 | inquire | 0 | |
| 32436 | Nanometrics | NANOSPEC 8000XSE-NT | Thin Film Measurement | 200 mm | 01.10.2001 | 1 | inquire | 0 | |
| 32434 | Nanometrics | NANOSPEC 8000XSE | Thin Film Measurement | 200 mm | 01.04.2000 | 1 | inquire | 0 | |
| 32843 | Nanometrics | 9010T | 200 mm | 01.08.2004 | 1 | inquire | 0 | ||
| 33471 | NANOMETRICS | NMI-1627-1 | FILM STRESS(NANO SPEC) | 125 | 01.06.1982 | 1 | inquire | 0 | |
| 33700 | NANOMETRICS | Nanoline CD-50 | CD Measurement Tool | 1 | inquire | 0 | |||
| 33701 | NANOMETRICS | Nanospec 181 | Film Thickness Measurement System | 1 | inquire | 0 | |||
| 33702 | NANOMETRICS | Nanospec 181 | Film Thickness Measurement System | 1 | inquire | 0 | |||
| 33703 | NANOMETRICS | Nanospec 2100 | Film Thickness Measurement System with Irvine Optical Optistation 200 Automatic Wafer Loader | 1 | inquire | 0 | |||
| 33704 | NANOMETRICS | Nanospec 212 | Film Thickness Measurement System with 125mm/150mm Dual Wafer Sliding Stage | 1 | inquire | 0 | |||
| 33705 | NANOMETRICS | Nanospec 8300XSE | Automatic Film Thickness Tool, Cassette to Cassette for 200mm & 300mm Wafers | 1 | inquire | 0 | |||
| 33706 | NANOMETRICS | Nanospec 9000i | Automatic In Situ Film CMP Thickness Tools, 3ea Available | 1 | inquire | 0 | |||
| 26515 | Nicolet | Magna 550 | FTIR Spectrometer | Laboratory | 01.06.1995 | 1 | inquire | immediately | 1 |
| 33472 | NICOLET | ECO-RS | FT-IR | 300 | 01.06.1998 | 1 | inquire | 0 | |
| 17867 | NIDEK | IM140DJ | AUTO LOADER | 200 MM | 01.04.1996 | 3 | as is where is | immediately | 4 |
| 30760 | NIDEK CO., LTD. | IM-80 | WAFER AUTO LOADER | 1 | as is where is | 0 | |||
| 30761 | NIDEK CO., LTD. | IM-80 | WAFER AUTO LOADER | 1 | as is where is | 0 | |||
| 11111 | Nikon | NWL- 851M | Wafer auto loader | 200 MM | 01.04.1996 | 1 | 5 | ||
| 14570 | Nikon | Optiphot 88 | Microscope | 200 mm | 1 | 0 | |||
| 14573 | Nikon | Optistation 2A | Automatic Wafer Inspection System | 3 | 1 | ||||
| 14574 | NIKON | Optistation 2A | Automatic Wafer Inspection System w/Auto Focus - Parts Tool Only | 3 | 0 | ||||
| 17868 | Nikon | Optiphot 200 | MICROSCOPE WITH AUTO LOADER | 200 MM | 01.04.1996 | 1 | as is where is | immediately | 1 |
| 20215 | NIKON | OPTISTATION V | INSPECTION MICROSCOPE WITH SMIF LOADER | 200 MM | 1 | as is where is | immediately | 0 | |
| 32417 | Nikon | OPTISTATION V | WAFER INSPECTION | 200 mm | 01.12.2006 | 1 | inquire | 0 | |
| 32418 | Nikon | OPTISTATION V | WAFER INSPECTION | 200 mm | 01.12.2006 | 1 | inquire | 0 | |
| 23155 | Nikon | Optiphot 2 | Trinocular Microscope with 6 inch manual stage | 150 mm | 1 | as is where is | immediately | 1 | |
| 26154 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 200 mm | 01.07.1007 | 1 | inquire | 1 | |
| 33937 | NIKON | Optistation Mark 7 | Microscope inspection station | 1 | as is where is | immediately | 0 | ||
| 26598 | Nikon | Optiphot-150 | Microscope | 1 | 14 | ||||
| 34066 | Nikon | Optistation 3 | Microscope | 1 | as is where is | immediately | 0 | ||
| 34021 | Nikon | Optistation 3 | Inspection Microscope | 6 Inch | 01.05.1997 | 1 | 8 | ||
| 30569 | NIKON | NRM-1000A | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30570 | NIKON | NRM-1000A | OVERLAY MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30779 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30780 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30782 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30783 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30784 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30785 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30787 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 30788 | NIKON | OPTISTATION V | WAFER INSPECTION SYSTEM | 1 | as is where is | 0 | |||
| 32845 | Nikon | Optistation 3200 | 300 mm | 01.06.2005 | 1 | inquire | 0 | ||
| 32846 | Nikon | Optistation 3200 | 300 mm | 01.06.2005 | 1 | inquire | 0 | ||
| 33473 | NIKON | X6F-UM | MICRO SCOPE | - | 01.06.1987 | 1 | inquire | 0 | |
| 33707 | NIKON | NWL-851 | Cassette Wafer Loaders for up to 200mm Wafers, 3ea Available | 1 | inquire | 0 | |||
| 33708 | NIKON | Optiphot | Wafer Inspection Microscope | 1 | inquire | 0 | |||
| 33709 | NIKON | Optiphot 200 | Wafer Inspection Microscope, 10X, 20X, 50X, 100X & 150X Objectives, DIC Optics, 200mm XY Stage | 1 | inquire | 0 | |||
| 33710 | NIKON | Optiphot 66 | Binocular Microscope with 5X, l0X, 20X & 40X Obj. Lenses | 1 | inquire | 0 | |||
| 33711 | NIKON | Optistation 2A | Automatic Wafer Inspection Systems for 75mm- 150mm Wafers, Auto Focus, 4ea Available | 1 | inquire | 0 | |||
| 33931 | Nikon | NRM 3100 | WAFER SURFACE INSPECTION DUAL SMIF | 200 MM | 01.03.2004 | 1 | as is where is | immediately | 0 |
| 26601 | Niton | XLt797QWZ | XRF Analyser | 01.12.2005 | 2 | as is where is | immediately | 8 | |
| 23286 | Noran Instruments | Voyager | EDX | 1 | inquire | 0 | |||
| 23321 | Noran Instruments | Voyager | EDX | 1 | inquire | 0 | |||
| 32844 | Nova Measuring | NovaScan 3060 | 200 mm | 1 | inquire | 0 | |||
| 30507 | NOVA MEASURING INSTRUMENTS, INC. | NOVASCAN 420 | FILM THICKNESS MEASUREMENT SYSTEM - CMP | 1 | as is where is | 0 | |||
| 31245 | NOVA SYSTEMS | NOVASCAN 3060CD | epi measurement | 200 mm | 01.06.2004 | 1 | as is where is | immediately | 14 |
| 21819 | OGP | SMARTSCOPE Z250E | OPTICAL-PRECISION MEASUREMENT | 01.06.2000 | 1 | as is where is | immediately | 1 | |
| 15207 | Olympus | AL100-B8 | Programmable Wafer Loader | 200 mm | 9 | as is where is | immediately | 3 | |
| 23662 | Olympus | BH3 MJL A4 | INSPECTION MICROSCOPE | 150 mm | 01.01.1991 | 1 | inquire | immediately | 11 |
| 31509 | Olympus | AL110-MB8 | Inspection | 200 MM | 1 | as is where is | 0 | ||
| 31511 | Olympus | LEXT OLS3000IR | Inspection | 300 MM | 01.01.2006 | 1 | as is where is | 1 | |
| 31512 | Olympus | MX61L-IR | Inspection | 300 MM | 01.01.2006 | 1 | as is where is | 0 | |
| 32419 | OLYMPUS | AL-2100 | WAFER INSPECTION | 200 mm | 01.12.2006 | 1 | inquire | 0 | |
| 23169 | Olympus | SZ40 | stereo microscope on stand | ASSEMBLY | 1 | as is where is | immediately | 6 | |
| 32847 | Olympus | AL3110 | 300 mm | 01.04.2004 | 1 | inquire | 0 | ||
| 33712 | OLYMPUS | AL100-LMB8 | Wafer Loader, 200mm, 8ea Available | 1 | inquire | 0 | |||
| 33713 | OLYMPUS | BHM | Wafer Inspection Microscope with NeoSPlan 5X, 10X, 20X & 50X Objectives | 1 | inquire | 0 | |||
| 33714 | OLYMPUS | SZ4045 | StereoZoom Microsope with WF10X/22 EPs & Fluoroescent Ring Illuminator on Boom Stand, 2ea Available | 1 | inquire | 0 | |||
| 33932 | Olympus | MX80F | WAFER INSPECTION MICROSCOPE | 300 MM | 01.08.2002 | 1 | as is where is | immediately | 0 |
| 28093 | Omron | VT-Win II | INSPECTION | 01.01.2005 | 1 | as is where is | immediately | 0 | |
| 30509 | OPTIK ELEKTRONIK GERĂ?TETECHNIK (OEG) | SURFTENS | GONIOMETER | 1 | as is where is | 0 | |||
| 32848 | OptoMetrix | Schlieren Thermal Mapper (STM) | 200 mm | 1 | inquire | 0 | |||
| 22633 | Philips | CM 12 | TEM Transmission Electron Microscope | 1 | as is where is | immediately | 1 | ||
| 22634 | Philips | CM 20 | TEM Transmission Electron Microscope | 1 | as is where is | immediately | 1 | ||
| 22635 | Philips | Various | Parts for TEM Transmission Electron Microscopes | 1 | as is where is | immediately | 15 | ||
| 30792 | PHILIPS | TREX 610T | SPECTROMETER - XRF | 1 | as is where is | 0 | |||
| 30793 | PHILIPS | TREX 610T | SPECTROMETER - XRF | 1 | as is where is | 0 | |||
| 32849 | Philips | SPW2800 | 200 mm | 1 | inquire | 0 | |||
| 32850 | Philips | SPW2800 | 200 mm | 1 | inquire | 0 | |||
| 5225 | PLASMOS | SD 4000 | Ellipsometer DUAL WAVELENGHT | 200 mm | 01.07.1993 | 1 | inquire | immediately | 17 |
| 31246 | PMS | Liquitrack 776200 | Non volatile residual Monitor | facilities | 01.11.1999 | 1 | as is where is | immediately | 6 |
| 23159 | Polaron THERMO VG SCIENTIFIC | SC 7620 | Sputter Coater for sample preparation | laboratory | 01.06.2000 | 1 | as is where is | immediately | 1 |
| 10061 | PROMETRIX | VP-10e | Four Point Probe | 200 mm | 1 | as is where is | immediately | 8 | |
| 17463 | Prometrix | FT - 650 | Wafer Inspection Tool | 01.07.1992 | 1 | 1 | |||
| 23663 | Prometrix | FT750 | Patterned Wafer Mapping System | 200mm | 1 | as is where is | immediately | 10 | |
| 33715 | PROMETRIX | FT-600 | Film Thickness Measuring Tool | 1 | inquire | 0 | |||
| 33716 | PROMETRIX | FT-750 | Film Thickness Measuring Tool | 1 | inquire | 0 | |||
| 26136 | RAYTEX | EDGESCAN | WAFER EDGE DEFECT INSPECTION | 200 mm | 01.10.2004 | 1 | inquire | 2 | |
| 20227 | Realtime X-Ray Corp | Scan-Ray | X-Ray System | 1 | as is where is | immediately | 1 | ||
| 29704 | Reichardt | Polyvar | Visual inspect microscope | 200 mm | 12 | as is where is | 0 | ||
| 33717 | REICHERT | POLYVAR | Wafer Inspection Station with KENSINGTON LABS Wafer Loader, 12ea Available | 1 | inquire | 0 | |||
| 10066 | RIGAKU | 3630 | XRF Wafer Analyzer | 01.02.1996 | 1 | as is where is | 6 | ||
| 31513 | Rigaku | Wafer X 300 | Inspection | 200 MM | 01.07.2005 | 1 | as is where is | 0 | |
| 32420 | Rigaku | 3630 | X-Ray Fluorescence Analysis System | 200 mm | 01.03.1996 | 1 | inquire | 0 | |
| 32421 | Rigaku | 3630 | X-Ray Fluorescence Analysis System | 200 mm | 01.12.1997 | 1 | inquire | 0 | |
| 32422 | Rigaku | 3640 | X-Ray Fluorescence Analysis System | 200 mm | 01.12.2006 | 1 | inquire | 0 | |
| 30513 | RIGAKU | MFM65 | IN-LINE X-RAY METAL FILM MONITOR | 1 | as is where is | 0 | |||
| 29709 | Rigaku | 3620 | X Ray | 150 mm | 1 | as is where is | 0 | ||
| 30794 | RIGAKU | TXRF-V300 | SPECTROMETER - XRF | 1 | as is where is | 0 | |||
| 30795 | RIGAKU | WAFERX 300 | SPECTROMETER - XRF | 1 | as is where is | 1 | |||
| 21509 | RUDOLPH | AUTO EL II | Ellipsometer | 01.05.1981 | 1 | 2 | |||
| 31318 | RUDOLPH | AUTO EL 4 | ELLIPSOMETER | 150 MM | 01.06.1987 | 1 | as is where is | 0 | |
| 21836 | RUDOLPH | METAPULSE CU | CU BARRIER SEED THICKNESS MEASUREMENT | 200 MM | 01.10.2000 | 1 | inquire | immediately | 6 |
| 25995 | RUDOLPH | FOCUS FE VII | ELLIPSOMETER | 200 mm | 01.12.1996 | 1 | inquire | 2 | |
| 15568 | RUDOLPH RESEARCH | METAPULSE | COPPER FILM MEASUREMENT - HAS SMIF PODS | 200 MM | 01.09.2002 | 1 | as is where is | immediately | 1 |
| 32423 | Rudolph Research | FE-7 | Ellipsometer | 200 mm | 01.10.1997 | 1 | inquire | 0 | |
| 32424 | Rudolph Research | FE-7 | Ellipsometer | 200 mm | 01.12.1997 | 1 | inquire | 0 | |
| 30506 | RUDOLPH TECHNOLOGIES, INC. | VANGUARD SPECTRALASER 200XL | FILM THICKNESS MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30504 | RUDOLPH TECHNOLOGIES, INC. | METAPULSE 200X CU | FILM THICKNESS MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30538 | RUDOLPH TECHNOLOGIES, INC. | AXI 930 | INSPECTION - DEFECT ANALYSIS | 1 | as is where is | 0 | |||
| 32123 | Rudolph Technologies, Inc. | NSX-105c | Automatic Defect Inspection System | 01.05.2007 | 1 | 2 | |||
| 23141 | SCIENCSCOPE | SZ-BD-B2 | Microscope with light source & stand | 1 | 5 | ||||
| 21859 | SDI | SPV STATION 1010 | CARRIER LIFETIME MEASUREMENT | 125-200 MM | 01.06.1996 | 1 | as is where is | immediately | 1 |
| 33718 | SDI | FAaST-330 | SPV, Ultimate SPV, PDM, SILC and other Test Capabilities, 300mm - Call for Details | 1 | inquire | 0 | |||
| 33924 | SDI | FAAAST 200 SL | WAFER INSPECTION | 200 MM | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 25469 | Seiko Instruments | SMI-8300 | FIB Focused Ion Beam | 01.08.1990 | 1 | 14 | |||
| 32425 | SEIKO SEIKI | SMI8800 | FIB | 200 mm | 01.03.1995 | 1 | inquire | 0 | |
| 21274 | Sela | MC-500 | Microcleaver System | 01.05.2003 | 1 | 1 | |||
| 32851 | Sela | MC100 SEM/TEM Sample Prep Tool | 200 mm | 1 | inquire | 0 | |||
| 30518 | SEMICONDUCTOR DIAGNOSTICS, INC. | FAAST-350 | INSPECTION | 1 | as is where is | 0 | |||
| 32196 | semilab | 4085 | 1 | as is where is | immediately | 0 | |||
| 31321 | SII | SFT9300 | FLUORESCENT X RAY COATING | 01.06.2002 | 1 | as is where is | 0 | ||
| 28354 | Solid State Measurements | CV470i | CV MEASUREMENT | 1 | as is where is | immediately | 0 | ||
| 30571 | SOLURIS INC. | IVS-130 | OVERLAY MEASUREMENT SYSTEM | 01.06.2001 | 1 | as is where is | immediately | 1 | |
| 33719 | SSM | 530 | CV Profiler | 1 | inquire | 0 | |||
| 23133 | Struers | Tegrapol-15 | Sample grinder Polisher | 1 | 9 | ||||
| 28365 | TA Instruments | AR1000 Rheometer | RHEOMETER | 1 | as is where is | immediately | 0 | ||
| 33720 | TECHNICAL INSTRUMENT | K2 IND/NIKON | Confocal Microscope | 1 | inquire | 0 | |||
| 28353 | Tektronix | 371A | CURVE TRACER | 1 | as is where is | immediately | 0 | ||
| 33721 | TENCOR | AlphaStep 200 | Profilometer | 1 | inquire | 0 | |||
| 33722 | TENCOR | AlphaStep 300 | Profilometer | 1 | inquire | 0 | |||
| 33723 | TENCOR | Surfscan 4500 | Unpatterned Wafer Surface Inspection Tool, for 75mm-150mm Wafers | 1 | inquire | 0 | |||
| 23223 | TEVET | IN3 | PARC THICKNESS AND K MEASUREMENT | 1 | inquire | immediately | 0 | ||
| 26100 | THERMA-WAVE | OPTI-PROBE 5240I | THIN FILM | 200 mm | 01.01.1999 | 1 | inquire | 1 | |
| 33530 | Therma-wave | Optiprobe 2600 | WAFER INSPECTION | 200 MM | 01.06.1995 | 1 | as is where is | immediately | 0 |
| 33531 | Therma-wave | Optiprobe 2600 | WAFER INSPECTION | 200 MM | 01.06.1995 | 1 | as is where is | immediately | 0 |
| 33899 | Therma-wave | 2600 | WAFER SURFACE INSPECTION | 200 MM | 01.03.1998 | 1 | as is where is | immediately | 0 |
| 33903 | Therma-wave | TP420 XP | WAFER SURFACE INSPECTION | 200 MM | 01.10.1997 | 1 | as is where is | immediately | 0 |
| 33921 | Therma-wave | OP 5230 | WAFER INSPECTION | 200 MM | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 33922 | Therma-wave | OP 5230 | WAFER INSPECTION | 200 MM | 01.06.2000 | 1 | as is where is | immediately | 0 |
| 30510 | THERMA-WAVE INC. | THERMA-PROBE 320S | IMPLANT MONITOR | 1 | as is where is | 0 | |||
| 30511 | THERMA-WAVE INC. | THERMA-PROBE 500 | IMPLANT MONITOR | 01.12.1996 | 1 | as is where is | 0 | ||
| 30705 | THERMA-WAVE INC. | OPTI-PROBE 3260 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30707 | THERMA-WAVE INC. | OPTI-PROBE 3260 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30708 | THERMA-WAVE INC. | OPTI-PROBE 3260 DUV | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30709 | THERMA-WAVE INC. | OPTI-PROBE 3260 DUVI | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30710 | THERMA-WAVE INC. | OPTI-PROBE 3290 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30711 | THERMA-WAVE INC. | OPTI-PROBE 5205 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30712 | THERMA-WAVE INC. | OPTI-PROBE 5205I | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30713 | THERMA-WAVE INC. | OPTI-PROBE 5220 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30714 | THERMA-WAVE INC. | OPTI-PROBE 5230 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30715 | THERMA-WAVE INC. | OPTI-PROBE 5230I | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30716 | THERMA-WAVE INC. | OPTI-PROBE 5230I | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30717 | THERMA-WAVE INC. | OPTI-PROBE 5230I | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30718 | THERMA-WAVE INC. | OPTI-PROBE 5230I | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30719 | THERMA-WAVE INC. | OPTI-PROBE 5240 | THIN FILM MEASUREMENT SYSTEM | 200 mm | 01.08.1998 | 1 | as is where is | 1 | |
| 30721 | THERMA-WAVE INC. | OPTI-PROBE 5240I | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30723 | THERMA-WAVE INC. | OPTI-PROBE 7341 | THIN FILM MEASUREMENT SYSTEM | 200mm | 01.08.2003 | 1 | as is where is | 1 | |
| 30724 | THERMA-WAVE INC. | OPTI-PROBE 7341 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30725 | THERMA-WAVE INC. | OPTI-PROBE 7341 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30726 | THERMA-WAVE INC. | OPTI-PROBE 7341 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 30727 | THERMA-WAVE INC. | OPTI-PROBE 7341 | THIN FILM MEASUREMENT SYSTEM | 1 | as is where is | 0 | |||
| 33347 | Therma-Wave Inc. | Opti-Probe 5240i | Thin film measurement system | 01.10.2001 | 1 | inquire | 0 | ||
| 20971 | Thermawave | TP420 | Implant dose monitoring tool | 150 mm and 200 mm | 01.06.1996 | 1 | inquire | immediately | 12 |
| 30512 | THERMAWAVE | THERMA-PROBE 630XP | IMPLANT MONITOR | 200 mm and 300 mm | 01.06.2005 | 1 | as is where is | immediately | 0 |
| 32852 | Thermawave | TP420 | 200 mm | 1 | inquire | 0 | |||
| 33971 | THERMAWAVE | 2600B | Metrology | 1 | inquire | 0 | |||
| 30672 | TOPCON | EM-002B | SEM (SCANNING ELECTRON MICROSCOPE) | 1 | as is where is | 1 | |||
| 14513 | Varian | CP 3800 | Gas Chromatograph | 01.06.1999 | 1 | as is where is | immediately | 7 | |
| 10130 | VEECO | Dektak IIA | Profilometer | 150 MM | 01.06.1984 | 1 | as is all rebuilt | immediately | 1 |
| 21355 | VEECO | Dektak IIA | Profilometer | 150 MM | 01.06.1997 | 1 | as is all rebuilt | immediately | 1 |
| 17000 | Veeco | SXM AFM-9960 | Atomic Force Microscope | 75 mm to 200 mm | 01.05.1996 | 1 | as is where is | immediately | 4 |
| 17635 | VEECO | UVX210 | ATOMIC FORCE PROFILER | 200 mm | 01.06.2001 | 1 | as is where is | immediately | 2 |
| 20716 | VEECO | DEKTAK 200 SL | PROFILOMETER | 150MM AND 200MM | 01.07.2001 | 1 | as is where is | immediately | 9 |
| 32195 | Veeco | Dimension 3000 | AFM | 1 | as is where is | immediately | 3 | ||
| 32854 | Veeco | SXM | 200 mm | 01.11.1995 | 1 | inquire | 0 | ||
| 33724 | VEECO | Dektak 3-30 | Profilometer | 1 | inquire | 0 | |||
| 33725 | VEECO | Dektak IIA | Profilometer | 1 | inquire | 0 | |||
| 34019 | Veeco / Digital Instruments | Nanoscope E | AFM | 01.06.1998 | 1 | as is where is | immediately | 4 | |
| 30541 | VEECO INSTRUMENTS INC. | DIMENSION X1D | MICROSCOPE - ATOMIC FORCE (AFM) | 1 | as is where is | 0 | |||
| 30542 | VEECO INSTRUMENTS INC. | SXM-320 | MICROSCOPE - ATOMIC FORCE (AFM) | 200 mm | 01.05.1998 | 1 | as is where is | 1 | |
| 30604 | VEECO INSTRUMENTS INC. | DIMENSION VX 210 | PROFILER - ATOMIC FORCE | 200 mm | 01.02.2001 | 1 | as is where is | 0 | |
| 30606 | VEECO INSTRUMENTS INC. | DIMENSION VX 310 | PROFILER - ATOMIC FORCE | 300 mm | 01.05.2004 | 1 | as is where is | 1 | |
| 30607 | VEECO INSTRUMENTS INC. | DIMENSION VX 310 | PROFILER - ATOMIC FORCE | 1 | as is where is | 0 | |||
| 33348 | Veeco Instruments Inc. | Dimension 9000M | Microscope - Atomic Force (AFM) | 01.06.1999 | 1 | inquire | 0 | ||
| 32187 | Votsch | VT7010 | Temperature Chamber | 01.05.2001 | 1 | 3 | |||
| 33904 | VOTSCH | VT 7012 S3 | THERMAL SHOCK CHAMBER | 1 | 3 | ||||
| 21353 | WED | MACROSPEC | BRIGHT LIGHT INSPECTION | 200 MM | 01.06.1995 | 2 | as is where is | immediately | 1 |
| 33726 | WILD | M410 | Makrozoom Microscope w/Coaxial Illumination, Focus Mechanism, w/o Stand | 1 | inquire | 0 | |||
| 34091 | Wyko | NT 2000 | Optical Profiling system | 1 | 0 | ||||
| 15561 | ZEISS | AXIOTRON II | INSPECTION MICROSCOPE WITH SMIF LOADER | 200 MM | 01.02.1998 | 2 | as is where is | immediately | 0 |
| 32853 | Zygo | ARHS | N/A | 1 | inquire | 0 |
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