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Nikon NSR 2205 i14e2 i line stepper for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used Nikon NSR 2205 i14e2 i line stepper.
Please click on the "Send More Details" button at the end of the NSR 2205 i14e2 description, if you'd like to get more details, photos and specifications of this i line stepper, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Nikon NSR 2205 i14e2 i line stepper is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


Nikon NSR 2205 i14e2 Equipment Details

SDI ID: 101847
Manufacturer: Nikon
Model: NSR 2205 i14e2
Description: i line stepper
Version: 200 mm
Vintage: Inquire
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: 3,300,000 USD
Comments:

-Currently installed in demonstration cleanroom in working condition.

Key Features of the equipment
• High Throughput
A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers).
• High Resolution and Modified Illumination
The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better.
With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse  process requirements, including rough and middle layers.
• Overall Alignment Accuracy
The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy.
Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved.
• Refined Operation Interface
The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements.

Specifications
Resolution: 0.35μm or better
N.A.: 0.63 Exposure light source: i line
Reduction ratio:1:5
Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm
Alignment accuracy (EGA, |x|+3σ):40nm or better
Alignment system:LSA(standard), FIA(standard), LIA(optional)

SYSTEM

MC NAME&SEREAL

NAME

2205I14E2

SERIAL

 

BASIC VERSION

MCSV BASIC

VER.3.41A

OPTION VERSION

OCS OPTION

VER.3.41A

TOOL

VER.4.02-SR8110

MAINTENANCE SYSTEM

 MAIN SYSTEM

 

 AMS SYSTEM

 

BASE KIT NAME

 SYSTEM KIT

BASE8 105-0011C

 

WL KIT

WLDR8 022-V340B

 

RL KIT

RLDR8 011-V470A

UNIT SOFT VER

WAFER STAGE

MCSV$UNITSOFT:ST-82.H50

ALIGNMENT 

AL-82.H91

OPERATION PANEL

PA-82.H61

LENS CONTROLLER

LC-85.H80

WAFER LOADER

WR-22.H34

RETICLE LOADER 

RL-11.H47

MAIN COMPUTER

SYSTEM

DMCC

DISK Drive

 

 

 

Illumination

2.5 U.V LAMP

 

WAFER STAGE

Air Stage , 8inch chuck

 

RETICLE ALIGNMENT

VRA

Reticle Microscope

Fix

WAFER ALIGNMENT 

LSA ,  FIA

AUTO FOCUS

Multypoint

FOCUS CALIBRATION  

FC2

WAFER LOADER

 NC Pre2

Type3

8inch Notch

Pre1 CCD

2 Cassette

 

Control Rack방향

Right

RETICLE LOADER 

6inch Library (10 Layer + 10Layer+ 10Layer)

Robot type

PPD

 

BARCODE SYSTEM

 

RT Washer

 

MAC0

 

MAC1-1

 

MAC1-2

 

INC Washer

 

Temp check

 

CHAMBER

ASAHI (N4A-C) , 2000.12

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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