SDI fabsurplus.com is pleased to announce the availability of the following listed used Oxford Plasmalab 800 Plus Plasma Enhanced Chemical Vapor Deposition Automatic pressure control.
Please click on the "Send More Details" button at the end of the Plasmalab 800 Plus description, if you'd like to get more details, photos and specifications of this Plasma Enhanced Chemical Vapor Deposition Automatic pressure control, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Oxford Plasmalab 800 Plus Plasma Enhanced Chemical Vapor Deposition Automatic pressure control is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|Model:||Plasmalab 800 Plus|
|Description:||Plasma Enhanced Chemical Vapor Deposition Automatic pressure control|
|Sales Condition:||as is where is|
Substrate electrode: 460mm with PID controlCan process wafer piecesShower head gas inlet optimized for PECVD400 C substrate tableSystem ComputerPC control with OPT software under WindowsSystem software controls all aspects of machine functionality and control of the process operationProduction mode: system will perform the following sequence without any operator intervention: chamber pumping, recipe running, chamber ventingProcess chamber includes a window panel giving a view on the process tableSystem ChillerEdwards IHX 610 Vacuum PumpAdvanced Energy LF-5 RF GeneratorPower: 208VAC, 3PH, 50/60 HZGas Box with MKS MFCs consisting of:1)� Gas: CF42)� Gas: N23)� Gas: N2O4)� Gas: SiH45)� Gas: N26)� Gas: O2�
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