Nikon NSR-SF100 i-line scan-field Stepper for Sale

SDI fabsurplus.com is pleased to announce the availability of the following listed used Nikon NSR-SF100 i-line scan-field Stepper.
Please click on the "Get Quote" button at the end of the NSR-SF100 description, if you'd like to get a quotation, photos and specifications of this i-line scan-field Stepper, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Nikon NSR-SF100 i-line scan-field Stepper is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.

Nikon NSR-SF100 Equipment Details

SDI ID: 109536
Manufacturer: Nikon
Model: NSR-SF100
Description: i-line scan-field Stepper
Version: 200 mm
Vintage: 01.06.2003
Quantity: 1
Sales Condition: as is all rebuilt
Lead Time: immediately
Sales Price: Inquire

Reticle size: 6 inch
Wafer track interface on Right side.
The system has been refurbished, using all Nikon original OEM parts.
Current equipment condition: Installed and operational, and can be demonstrated running wafers by appointment.
Please refer to the attached data for details regarding the current system performance.

Technical Overview
The SF100 is an i-line scan-field Stepper, designed to allow high accuracy Mix-and-Match with other scanners, whilst delivering High Throughput
In order to take advantage of the high mix-and-match performance potential with KrF excimer scanners such as NSR-S204B and NSR-S203B , Nikon has developed the NSR-SF100 i-line stepper for non-critical layers. The NSR-SF100 has a large 25 x 33mm exposure area and a reticle reduction ratio of 1:4, the same as for the NSR-S204B and S203B.
The SF100 at the same time offers high resolution, high precision and high throughput, hence allowing significant improvements in productivity, while also reducing total production line investment costs.

Main Features
• Wide Exposure Field, High Resolution and High Throughput
The NSR-SF100 features the same wide exposure area (25 x 33mm) as the scanners, at an impressive resolution of
0.4 μm. It also features very high throughput rates of 120 or more 200mm wafers per hour, or 80 or more 300mm wafers per hour.

• Optimized for Mix-and-Match
In addition to full operational compatibility with the KrF excimer laser scanners NSR-S203B and NSR-S204B, the
NSR-SF100 also features reticle compatibility with the i- line scanner NSR-S103B.

• 300mm Wafer Compatibility
The NSR-SF100 can be upgraded as required from 200 mm wafer size to 300mm wafers, which is useful in the case that a 200 mm line is upgraded to 300 mm wafer size.

Main Specifications
Resolution: 0.4μm or better
N.A.: 0.5
Exposure Wavelength: i-line (365nm)
Reduction ratio: 1:4
Exposure area: 25 mm x 33 mm
Alignment accuracy:45nm or better
(EGA, |x| + 3σ)
Throughput: 200mm wafers: 120/hour or more
300mm wafers: 80/hour or more

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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