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Roth & Rau SiNA Plus PECVD - Deposition of Silicon Nitride for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used Roth & Rau SiNA Plus PECVD - Deposition of Silicon Nitride. This Roth & Rau SiNA Plus PECVD - Deposition of Silicon Nitride is available for immediate sale. Please click on the "Send More Details" button if you'd like to get more details, photos and specifications of this PECVD - Deposition of Silicon Nitride and your request will be forwarded to our customer representatives automatically. Crating, refurbishment and delivery can be quoted on request.


Roth & Rau SiNA Plus Equipment Details

SDI ID: 56813
Manufacturer: Roth & Rau
Model: SiNA Plus
Description: PECVD - Deposition of Silicon Nitride
Version: 156 mm SQUARE/125 MM
Vintage: 01.06.2005
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price (each): Inquire
Comments:

Currently Deinstalled and warehoused in Temple, TX, USA.
One (1) SINA, a modular in-line system manufactured by Roth and Rau for deposition of silicon nitride, or similar silicon based layer, on wafers (flat substrates) by a continuous PECVD process.
The former application was for anti-reflection coating for solar cells. The systems consists of 5 chambers, or modules, for load-lock; heating; deposition; cooling off; load-lock and includes carriers for wafers through the system. Technical Data:
Dimensions:
Frame (LXWXH) 6000 x 1800 x 1600
Installation Cabinets 2400 x 600 x 2000
Control Rack 800 x 600 x 2000
Weight: 8000KG
Electrical:
Power 160KW
Voltage 400V +/- 5%, 3 phase, 60 HZ
Voltage of Comp. 220V~, 24V~, 24V=
Pnuematics: Compressed air: 5-7 bar oil free
connections: Festo 10mm
Process Gas Distribution: Central connection of gas pipes: VCR4
Cooling Water: Pressure 4-6 bars
Outlet pressureless against atmosphere inlet temperature max 20*C
water flow max. 4000 l/h
connectors 1 1/4" pins
Exhaust Connector DN 63 ISO-K
In its standard version the system consists of five modules:
Chamber 1 - load lock chamber (load)
Chamber 2 - heating chamber
Chamber 3 - deposition chamber
Chamber 4 - cooling of chamber
Chamber 5 - load-lock chamber (unload)
All chambers are mounted on separate stainless steel racks

Additional details:

PECVD line Silicon Nitride-SIN 1: 41'L x 8.2'W x 6.9'H Approximate capacity of 1,200 156mm x 156mm wafers per hour each.

General Info:

·     Located in USA

·     Operational until taken out of service in 2012

Specifications:

·    Manufacturer: Roth & Rau Model - SiNa Plus

·    Megawatt production: 30MW

·    Material: Poly Silicon (Multi Crystalline Silicon)

·    Process: Ammonia & Silane Gas

·    Wafer Size: 125mm and/or 156mm Square

·    Ammonia gas panel and Ammonia fume scrubber

·    Lines are complete with:

·    Loader, Unloader, conveyor, changer and process unit.

Other info:

Roth & Rau Silicon Nitride Line: Roth & Rau SiNA Plus Lot: PECVD line Silicon Nitride-SIN 1: 41'L x 8.2'W x 6.9'H; 480V AC; 3ph; Current 400A; Line Frequency 60 Hz;  Operation and Maintenance Manual. Includes (1) ATS # 1815, SiN 1 Loader w/ Allen-Bradley PanelView 600 controller. 19'L x 11'W x 7'H; 480V AC; 3ph; Cur-rent 30A; Line Frequency 60Hz; Operation Manual included (2005).

Categories:
Attachments: 10 Files
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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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