Gasonics AE 2001 Single wafer etch system for Sale

SDI fabsurplus.com is pleased to announce the availability of the following listed used Gasonics AE 2001 Single wafer etch system .
Please click on the "Get Quote" button at the end of the AE 2001 description, if you'd like to get a quotation, photos and specifications of this Single wafer etch system , and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Gasonics AE 2001 Single wafer etch system is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.

Gasonics AE 2001 Equipment Details

SDI ID: 69945
Manufacturer: Gasonics
Model: AE 2001
Description: Single wafer etch system
Version: Inquire
Vintage: Inquire
Quantity: 1
Sales Condition:
Lead Time: Inquire
Sales Price: Inquire
Gasonics AE 2001 is a single wafer downstream isotropic etch system, designed to etch thin films such as poly silicon, silicon nitride and CVD oxides.Utilizing the proven Aura downstream microwave source and a dedicated reactor chamber, GaSonicsAE2001 offers high etch rates and no RF damage to the wafer. Featuring high reliability and flexibility in process parameter, GaSonics AE 2001 is the unparalleled tool of choice for multiple applications and high capital productivity. Gaonicsa AE2001 is an electro-mechanical production system used to etch materials such as nitride, oxide poly-silicon etc. from the surface of silicon or other substrate. Each wafer is processed individually by means a chemical reaction induced by a gas plasma. Single Wafer, Multi-Step Processing Closed-Loop Temperature Control Pressure Control Accurate, closed-loop pressure control with ¡°butterfly-style¡± throttle valve and capacitance manometer RF power: 100 to 500 watts Timed cycles up to 4 hour each No RF damage (¡ê0.1 volt CV shift) High throughput Front and backside etching Excellent etch rates and uniformities 100mm ¨C 150mm wafer capability Variable platen temperature Alumina (ceramic) plasma tube Fluorine compatible chamber Well-characterized process Multiple step process capability High capital productivity.

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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