SDI fabsurplus.com is pleased to announce the availability of the following listed used Nanofab Nano150 Ion Beam Lithography / Implanter System.
Please click on the "Get Quote" button at the end of the Nano150 description, if you'd like to get a quotation, photos and specifications of this Ion Beam Lithography / Implanter System, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Nanofab Nano150 Ion Beam Lithography / Implanter System is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|Description:||Ion Beam Lithography / Implanter System|
The Nanofab 150 is a fully functional, high energy focused ion beam lithography/implanter system with integrated laser position stage.
Option A - Set up for 150 mm wafers
Option B - Set up for 200 mm wafers, with a writing Area of 177mm
The system is capable of operating with upgraded optics to 20nm and energies from 4 to 150keV using both element and alloy liquid metal ion sources (Ga, Si, Ge, In, Be, Au, As, B, Pd, Bi). Pattern data input is converted from standard GDSII format to a minimum 10nm addressing. Registration is performed to standard industry ASML marks with overlay to 45nm 1sigma. The system is ideal for fundamental research or custom wafer modification. Pallets are available that can hold sample sizes from 200 mm to 50 mm. The system runs all solid-state drives, new turbo pumps, controllers, 3 ion guns and 3 Ga sources. Spare parts, other ion sources, and ion gun assemblies are available on request.
The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.
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