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TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D.
Please click on the "Send More Details" button at the end of the ACT 12 description, if you'd like to get more details, photos and specifications of this Clean Track, 2 block, 2C / 4D, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


TEL Tokyo Electron ACT 12 Equipment Details

SDI ID: 83660
Manufacturer: TEL Tokyo Electron
Model: ACT 12
Description: Clean Track, 2 block, 2C / 4D
Version: 200 mm
Vintage: 01.06.2001
Quantity: 1
Sales Condition: inquire
Lead Time: immediately
Sales Price: 435,000 USD
Comments:

-De-installed
-Warehoused
-Can be inspected by appointment
-See attached photos for details
-See attached block diagram for layout details.
Configuration:-

1. DESCRIPTION
   
  1-2. Right to Left
  1-3. MODEL : Clean track ACT-12
  1-4. WAFER Size : 8" inch
  1-5. System Power Rating : AC 208V , 3-Phase for System , 300A(MAX)
  1-6. Loading Configuration : 3 Foup type
  1-7. Main controller : 2# controller
2. Main system
  1)Main frame with system controller
  2) Carrier station
  - Type : 8 inch Foup Type
  - 3 Cassette / 25 slots
  3) Coater unit (2-1,2-2 Module)
  - 4 dispense nozzle with temperature controlled lines for etch unit
  - RRC Pump
  - PR Suck-back Valve : Air operation Suck-back Valve (Total : 8 ea)
- Rinse system : 3 liter 2Tank Buffer tank system
- Programmable side rinse
- 4 PR nozzles (1, 2, 3, 4) - 8 bottles(1 bottle/1nozzle) in machine for unit
- Thinner supply - CCSS Cupply & Local canister tank function
- Degassing system : N/A
- Photo Resist temperature control system
- Drain: Direct drain
4) Developer unit (3-1,3-2,3-3,3-4)
- 2 H nozzle for each unit
- 1 stream nozzle for DI rinse and 2 points for back side rinse on each unit
- Developer system : 3 liter 2Tank Buffer tank system for each unit
- Developer supply : CCSS Supply & Local canister tank function
- Degassing system : N/A
- Developer temperature control system
- Drain: direct drain
5) I/F Wafer Stage Type : NIKON (S204)
6) Adhesion Unit 1EA
- 100% sealing closed chamber(Built-in hot plate)
- HMDS tank with float sensor in system
- HMDS supply : Local bottle
7) Low Temp Hot Plates (LHP) 8EA
8) 1 WEE (wafer edge exposure ) unit
- Type : DUV Type (UV254)
9) Chill Plates (CPL) 7EA
10) Chilling Hot Plates (CHP) 4EA
11) TCP Unit 1EA
12) TRS Unit 2EA
13) SHU : Shuttle 2EA
14) Chemical Cabinet 1 : Solvent , Developer , HMDS Chemical Cabinet
15) Temperature&Humidity controller
- Type: Shinwa Series (ESA-8)
16) TEMP Control Unit(TCU) 1EA
- Type: TEL OEM
17) AC Power Box
- AC200/220V , Full-load current 300A
18) Mass flow controller 2EA

 

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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