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TEL TOKYO ELECTRON ACT 12 Photoresist coater and developer track with 4 C and 4 D for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used TEL TOKYO ELECTRON ACT 12 Photoresist coater and developer track with 4 C and 4 D.
Please click on the "Send More Details" button at the end of the ACT 12 description, if you'd like to get more details, photos and specifications of this Photoresist coater and developer track with 4 C and 4 D, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This TEL TOKYO ELECTRON ACT 12 Photoresist coater and developer track with 4 C and 4 D is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


TEL TOKYO ELECTRON ACT 12 Equipment Details

SDI ID: 87845
Manufacturer: TEL TOKYO ELECTRON
Model: ACT 12
Description: Photoresist coater and developer track with 4 C and 4 D
Version: 300 mm
Vintage: 01.06.2002
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

De-installed, warehoused. Inspection is available by appointment.

Configuration:-

1. Missing parts
1-1. IRA Z Axis Driver
1-2. IRA Y Axis Driver
1-3. IRA TH Axis Driver
1-4. TNH
2. DESCRIPTION
1-1.  Right to Left
1-3. MODEL : Clean track ACT-12
1-4. WAFER & CARRIER TYPE : 12", Notch Type , 25 Slots
1-5. System Power Rating : AC 200/220V , 3-Phase for System
1-6. Loading Configuration : 4 FOUP
1-7.Software Version : Unidentified (Hard disk has been removed and is not included)
1-8.Main controller :#3 Controller
3. Main system
1)Main frame with system controller
2) 4 FOUP SYSTEM (Asyst RFID)
- Type: Normal Cassette Type
3) Coater unit (2-1, 2-2, 2-3, 2-4)
- 4 dispense nozzle with temperature controlled lines
- RDS Pump
- Rinse nozzle : back/ EBR / solvent bath for etch unit
- Rinse system : 3 liter 2Tank Buffer tank system 2set
- Degas System : Installed
- Programmable side rinse
- Direct drain type
4) Developer unit (3-1, 3-2, 3-3, 3-4,) NDP Type
- NLD nozzle(1ea) for each unit
- 1 stream nozzle for DI rinse and 2 points for back side rinse each unit
- Dev solution1 : 3 liter 2Tank Buffer tank system 2set
- Degas System : Installed
- Developer temperature control system
- Direct Drain
5) Adhesion Unit (ADH) 2EA
- 100% sealing closed chamber(Built-in hot plate)
- HMDS tank with float sensor in system
- HMDS supply : Local
6) Low Temp Hot Plates (LHP) 12EA
7) Cup Washer Holder(CWH) 2EA
8) High speed Cill plates(HCP) 13EA
9) High Presision Hot Plates (PHP) 6EA
10) Transition Chill Plate (TCP) 1EA
11) Transition Stage (TRS) 2EA
12) WEE (wafer edge exposure ) unit 2EA
13) Chemical Cabinet 1 : HNDS and Solvent Supply System
14) Chemical Cabinet 2 : DEV Solution and DIW Supply System
15) TEMP Control Unit(TCU) 2EA
16) MFC
17) AC Power Box
- Voltage : AC200/220V

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The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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