SDI fabsurplus.com is pleased to announce the availability of the following listed used Plasmatherm SLR PECVD Plasma Enhanced Chemical Vapor Deposition System.
Please click on the "Send More Details" button at the end of the SLR description, if you'd like to get more details, photos and specifications of this PECVD Plasma Enhanced Chemical Vapor Deposition System, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Plasmatherm SLR PECVD Plasma Enhanced Chemical Vapor Deposition System is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|Description:||PECVD Plasma Enhanced Chemical Vapor Deposition System|
|Sales Condition:||as is where is|
PECVD Plasma Enhanced Chemical Vapor Deposition System. Load locked parallel plate PECVD system. Windows graphical user interface provides an easy and familiar environment for machine operation and control. The top electrode is RF powered and the substrate is temperature controlled. Gas box is configured with eight gas input lines controlled by MFC. Previously used the following gases: CF4, SF6, AR, HE, NH3, Silane, N2O, SiN, N2. Includes Neslab chiller, roughing pump and power box.
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