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Applied Materials Centura EPI Epitaxial Deposition, reduced pressure, 2 chamber for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used Applied Materials Centura EPI Epitaxial Deposition, reduced pressure, 2 chamber.
Please click on the "Send More Details" button at the end of the Centura EPI description, if you'd like to get more details, photos and specifications of this Epitaxial Deposition, reduced pressure, 2 chamber, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Applied Materials Centura EPI Epitaxial Deposition, reduced pressure, 2 chamber is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


Applied Materials Centura EPI Equipment Details

SDI ID: 93920
Manufacturer: Applied Materials
Model: Centura EPI
Description: Epitaxial Deposition, reduced pressure, 2 chamber
Version: 300 mm
Vintage: 01.06.2002
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

Deinstalled, warehoused. Can be inspected by appointment.

Platform Type: 300mm Centura
Application Level 1 : Reduced Pressure
Application Level 2 : Reduced Pressure
First in Fab System or Apps : No
Ch-A : (RH3) Reduced PRESSURE EPI
Ch-B : (RH3) Reduced PRESSURE EPI
Ch-C : Empty
Ch-D : Empty
Electrical: SEMI

Chamber A Configuration

Thickness Control Option AccuSETT 2
Recipe Control AccuSETT Yes
Lamp Type
Ushio BNA8

Chamber B Configuration

Thickness Control Option AccuSETT 2
Recipe Control AccuSETT Yes
Lamp Type
Ushio BNA8

Gas Delivery Configuration
Pump Purge: Yes
Regulator and Displays: Transducers and Regulators
Transducer Display Type: SI (KPA)
H2 Leak Detector: SINGLE

MFC Configuration
#        CH A       CH B
Slot 1   N2          N2
Slot 2   HCL         HCL
Slot 3   SiH4        SiH4
Slot 5   Si2H6       D-DOP#1
Slot 6   HCL         D-DOP#2
Slot 7   DCS         DCS
Slot 8   GeH4        GeH4
Slot 9   M-DOP#1     M-DOP#1
Slot 10  M-DOP#2     M-DOP#2

Mainframe Configuration
Mainframe Type: STD CENTURA
Loadlocks:BATCH LOAD LOCK
Upper Frame H2 Leak Detector:Present
Mass Flow Verification: YES
Multi Water Clean: NO MVC FOR 4 CHAMBER SYSTEM
Wafer Transfer Robot: YASKAWA
ORIENTER: PRE ALIGNER
End effecter: Edge grip PEEK material
Wafer storage: 2 Slot
Wafer Mapping: LED sensor Detection
Number of Load Parts: Two

Categories:
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The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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