Ultratech 1500 Projection Stepper for Sale

SDI fabsurplus.com is pleased to announce the availability of the following listed used Ultratech 1500 Projection Stepper.
Please click on the "Get Quote" button at the end of the 1500 description, if you'd like to get a quotation, photos and specifications of this Projection Stepper, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Ultratech 1500 Projection Stepper is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.

Ultratech 1500 Equipment Details

SDI ID: 96663
Manufacturer: Ultratech
Model: 1500
Description: Projection Stepper
Version: 150 mm
Vintage: 31.12.1995
Quantity: 1
Sales Condition: as is all rebuilt
Lead Time: immediately
Sales Price: Inquire


ULTRATECH Model 1500 0.8um Features and Specifications

Automatic Functions 

<0.13um, 2 sigma and +/-0.18um

Placement and Overlay: 

+- 2 millimeters

Capture Window: 


Site by Site Alignment: 

+/ - 50 microns, scanning 200 micron target

Target Capture Window:

Site by Site, electronic

Auto Focus: 

Automatic compensation for environmental fluctuations, image tilt

Focus Gauge: 

Site by Site, electronic

Auto wafer level: 

Cassette to Cassette, SEMI standard


Input and Output slot, single wafer

Manual Loader:

System specifications 

Air bearing, laser metered, resolution of .00004 mm

Wafer Sizes: 

6", 5",4",3"

XY Stage: 

Air cushioned granite table 

Vibration Control: 


Lens Specifications 

5 Total in two groups 

Lens Type: 

1:1 , 0.8um

Lens Elements: 

Broadband, 390nm-450nm 

Projection Ratio, Resolution: 


Exposure Spectrum: 

variable, .26NA thru .40NA 

Alignment Spectrum: 

Longest rectangle = 39 mm x 8.4 mm

Numerical Aperture: 

Largest square, 15.5 mm x 15.5 mm

Field Size, 0.8um lens:

Max area rectangle =

31.8 mm x 11.5 mm

30mm x 18mm standard aperture size 

39mm x 18mm aperture also available, manual quick change

Illumination Specifications  Automatic Exposure Control:      

Integrated dose monitored for exposure repeatability

Lamp Type:      

200 watt mercury arc, pulsed to 500 watts during exposure

Mercury Vapor Control: 

Built in 

Reticle Specifications

Size ( from standard 5"x5" plates):

3" x 5" x 0.090" 

Pellicle Protection: 

Chrome Side 

KLA/NJS Inspectable: 

Yes, 4 identical rows 


Quartz or low expansion 

Alignment Mark:     

Scribe Area


200um square standard, 

Design Flexibility: 

Verticle or Horizontal alignment marks

Generation Technique: 

E-Beam or optical step and repeat

Fields per reticle: 

3 fields standard

Physical Specifications


14 feet square 


46" width x 50" depth x 78" height 

Service Clearance: 

Allow 24" on all sides, and in back 


3000 lbs. 

Facility Requirements:     

No environmental chamber required

Ambient Temperature Control:

70 degrees , +/- 2 degrees Fahrenheit 


115 volts, 50/60 Hz, 15 Amps, Inrush current, 35 Amps for 100 milliseconds

Nitrogen or Compressed Air:

Minimum 80 psi, 2 CFM, Dry to -40 degrees F dewpoint, filtered to 0.2   


One line, minimum 20" Hg, 2 CFM 


Single exhaust to 3 - 10 CFM at 0.1" H20    

It is refurbished and has 0.8um resolution.  It can be setup for 1.0um no problem.

Please check pictures below for more information.

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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