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Oxford Flex AL-II ALD system for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used Oxford Flex AL-II ALD system.
Please click on the "Send More Details" button at the end of the Flex AL-II description, if you'd like to get more details, photos and specifications of this ALD system, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Oxford Flex AL-II ALD system is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


Oxford Flex AL-II Equipment Details

SDI ID: 99401
Manufacturer: Oxford
Model: Flex AL-II
Description: ALD system
Version: 150 mm
Vintage: 01.06.2012
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

In excellent condition . Inspection is available by appointment.

The Oxford Instruments Plasma Technology FlexAL II is an Atomic Layer Deposition (ALD) system which grows thin films one atomic layer at a time under very precise deposition conditions. It features:-

1.A 240 mm diameter resistance-heated, RF-biased aluminum electrode with temperature control to 600 °C
2. For ubstrate sizes up to 6 inches (150 mm).
3. An inductively-coupled plasma (ICP) source for plasma-enhanced ALD, as well as the more traditional thermal processes.
4. Six precursor gases to grow a variety of high-purity oxides and nitrides.
Applications include:
    Aluminum oxide and nitride deposition
    Silicon dioxide and nitride deposition
    Titanium oxide and nitride deposition
    Hafnium oxide deposition
    Niobium oxide and nitride deposition

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The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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