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Second hand, used and surplus CMP Chemical Mechanical Planarization Equipment for sale by fabsurplus.com

Please find below a list of Used , surplus and pre-owned CMP Equipment (Chemical mechanical planarization equipment) for sale by fabsurplus.com -Click on any list item to see further data. Chemical mechanical polishing, or CMP, also known as chemical mechanical planarization, is a process of smoothing and thinning surfaces with a mixture of chemical and mechanical forces. We can consider it to be a hybrid of chemical etching and abrasive polishing. It is used in the semiconductor industry to polish and thin semiconductor wafers as part of the IC manufacturing process.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
111447 Accretech / TSK HRG-200X Fully Automatic Grinder 200 mm 01.12.2022 1 as is where is immediately
96534 Applied Materials Mirra Mesa CMP system 200 mm 1 inquire
96537 Applied Materials Mirra Ontrak Poly/STI CMP 200 mm 01.05.1999 1 inquire
96538 Applied Materials Mirra Ontrak Poly/STI CMP 200 mm 31.05.1999 1 inquire
100868 Applied Materials Mirra Mesa CMP System 200 mm 1 inquire 5 months
100873 Applied Materials Mirra Mesa Integrated Oxide/STI CMP 200 mm 01.05.1999 1 inquire
105881 Applied Materials Reflexion GT CMP system with integrated cleaner 300 MM 01.05.2011 1 as is where is immediately
106065 Applied Materials Mirra ® 3400 Stand-Alone CMP System 200 mm 01.06.2001 1 as is all rebuilt immediately
106203 Applied Materials Mirra 3400 Stand-Alone Oxide/STI CMP 200 mm 01.06.1998 1 inquire
106980 Applied Materials Reflexion CMP system 300 mm 1 inquire immediately
106981 Applied Materials Reflexion LK CMP system 300 mm 1 inquire immediately
106982 Applied Materials Mesa CMP cleaning system 300 mm 1 inquire immediately
106983 Applied Materials Desica CMP Cleaning system 300 mm 1 inquire immediately
106984 Applied Materials Kawasaki 4.0 Fab Interface Module 300 mm 1 inquire immediately
109063 Applied Materials Mirra Mesa Oxide CMP system, with SMIF 200 mm 1 inquire 1 month
109154 Applied Materials Reflexion LK Oxide Dielectric CMP 300mm 1 as is where is
110767 Applied Materials Mirra 3400 Ontrak CMP Polisher with Cleaning System 200 mm 01.05.1997 1 as is where is immediately
111636 Applied Materials Mirra Integra Dielectric Dielectric CMP 150mm 1 as is where is
111651 Applied Materials Reflexion LK Multi-Process CMP 300mm 1 as is where is
111652 Applied Materials Reflexion LK Oxide Dielectric CMP 300mm 5 as is where is
112116 Applied Materials Reflexion CMP Oxide 300 mm 01.06.2006 1 as is where is
112117 Applied Materials Reflexion LK CMP Oxide 300 mm 01.06.2008 1 as is where is
112118 Applied Materials Reflexion LK CMP W 300 mm 01.06.2012 1 as is where is
113203 Applied Materials Reflexion LK Oxide Low K Oxide CMP 300 mm 1 as is where is
113204 Applied Materials Reflexion LK Oxide Low K Oxide CMP 300 mm 1 as is where is
111438 Buehler Beta Series Twin Variable Speed Grinder-Polisher GRINDER-POLISHER 01.04.2008 1 as is where is immediately
111443 Buehler 49-5102-230 Twin Variable Speed Grinder Polisher with Vector Power Head 01.06.2001 1 as is where is immediately
111682 BUEHLER EcoMet 3000 Grinder Polisher 200mm 1 as is where is
111683 BUEHLER HandiMet 2 Grinder Polisher 1 as is where is
111684 BUEHLER MetaServe 2000 Grinder Polisher N/A 1 as is where is
91136 Daitron CVP-320 Wafer Edge Grinder 300 mm 01.11.2008 1 as is where is immediately
108155 DISCO DFG-82IF/8 Rotary Surface Grinder 200 mm 01.06.1992 1 as is where is
108398 Disco DFS8910 Surface Planarization 300 mm 1 as is where is
110800 Disco DGP8761 with DFM2800 Wafer Back Grinder with Wafer Taper 300 mm 01.06.2012 1 inquire immediately
98460 Ebara Frex 300 Tungsten CMP tool 300 mm 1 as is where is immediately
98461 Ebara Frex 300 STI CMP ( missing front end robot and load port) 300 mm 1 as is where is immediately
108409 Ebara FREX300S Poly/STI Poly/STI CMP 300 mm 1 as is where is
110757 Ebara FREX 300 Tungsten CMP system 300 mm 2 as is where is immediately
110796 Ebara FREX 300 Tungsten CMP tool 300 mm 01.05.2005 2 as is where is immediately
111596 Ebara EPO 222 Oxide CMP 200 mm 01.02.1999 1 as is where is immediately
111726 Ebara FREX300S Dielectric Dielectric CMP 300mm 1 as is where is
111727 Ebara FREX300S Tungsten Tungsten CMP 300mm 1 as is where is
111728 Ebara FREX300S Tungsten Tungsten CMP 300mm 1 as is where is
111729 Ebara FREX300S Tungsten Tungsten CMP 300mm 1 as is where is
112173 EBARA EPO-2228 CMP Oxide 200 mm 01.06.1999 1 as is where is
112174 EBARA EPO-223 CMP W 200 mm 01.06.1997 1 as is where is
112175 EBARA F-REX300 CMP W 300 mm 01.06.2010 1 as is where is
112176 EBARA F-REX300S2 CMP W 300 mm 01.06.2009 1 as is where is
113214 Ebara FREX300X Tungsten CMP 300 mm 01.05.2014 1 as is where is immediately
71907 Hamamatsu C7103 PC Controlled IC Back-side Lapping and Wafer Grinding System 200 mm and packages 01.09.2001 1 as is where is immediately
98465 IPEC 472 CMP Polishing system 150 MM / 200 mm 3 as is where is immediately
98466 IPEC 472 CMP 150 mm 2 as is where is immediately
109184 IPEC 372M Multi-Process CMP 200mm 1 as is where is
106820 Lam Research Ontrak Synergy Post CMP cleaner with HEPA mini-environment 200 mm 1 as is where is immediately
111584 Lam Research Ontrak Synergy Post CMP cleaner with HEPA mini-environment 200 mm 1 as is where is immediately
108846 MICROAUTOMATION M-1100 Wafer Dicing Saw, for up to 6" Wafers 150 MM 1 inquire
108191 NOVELLUS 676 CMP System Polisher 200 mm 01.06.1997 1 as is where is
108490 Strasbaugh 6DS-SP Multi-Process CMP 200 MM 1 as is where is
109605 Strasbaugh 7AA-SP Grinder 01.08.2004 1 as is where is immediately
109606 Strasbaugh 6EC CMP Wafer Polisher 1 inquire
111884 Strasbaugh 6DS-SP Multi-Process CMP 200mm 12 as is where is


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