fabsurplus.com

Pre-owned CVD Equipment , surplus CVD equipment, used CVD equipment for sale by fabsurplus.com

Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
60905 AMAT 2CH PRODUCER 01.06.2006 1 as is where is
60906 AMAT 1ch PRODUCER 1 as is where is
60909 AMAT P-5000 DxL 4CH 1 as is where is
60912 AMAT CENTURA-I PHASE II 1 as is where is
60913 AMAT TxZ 3C/H TECTRA 1 as is where is
60916 AMAT 2C/H MXP POLY 01.06.1995 1 as is where is
66388 AMAT Centura WxZ 3ch 1 as is where is
66389 AMAT Centura WxZ 3ch 1 as is where is
66406 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
66407 AMAT Centura 5200 eMxP+ 3 chamber 150 mm 1 as is where is immediately
66408 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
86674 AMAT Ultima + HDP CVD CHAMBER 2 as is where is
86675 AMAT Ultima PLUS HDP CVD tool 1 as is where is
3419 Applied Materials P5000 CVD System, 2 Chamber TEOS Oxide CVD 200 MM 01.01.1994 1 inquire immediately
82864 Applied Materials P5000 Multi-Process CVD 200 mm 01.06.1996 1 as is where is immediately
82865 Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1993 1 as is where is immediately
84164 Applied Materials P5000 200 mm 1 as is where is
84779 Applied Materials Centura 5200 WxZ 3 chamber WxZ deposition system 200 mm 01.06.1995 1 inquire immediately
86128 Applied Materials CENTURA W-CVD_3CH 3 chamber tungsten CVD system 200 mm 1 as is where is
86133 Applied Materials P3I(ACP/3CH) 300 mm 01.06.2010 1 as is where is
86136 Applied Materials PRODUCER_SE_2CH CVD 300 mm 01.06.2007 1 as is where is
86721 Applied Materials Centura Ultima X HDP CVD, 2 chamber 300 mm 01.01.2006 1 as is where is immediately
87078 Applied Materials Centura Ultima X HDP CVD, 2 chamber 300 mm 01.06.2003 1 as is where is immediately
87897 Applied Materials P5000 SACVD CVD 200 mm 01.06.1996 1 as is where is
87898 Applied Materials Producer GT CVD - 3 Twin chamber - HARP USG Process 300 mm 01.06.2008 1 as is where is immediately
87899 Applied Materials Centura Ultima X CVD 300 mm 1 as is where is
88172 Applied Materials Centura SiNgen Chamber LPCVD 200mm 1 as is where is
88460 Applied Materials Centura TAO Ta2O5 CVD 200 MM 01.06.2006 1 as is where is
88461 Applied Materials Producer SE HARP-USG 300 MM 01.06.2003 1 as is where is
88462 Applied Materials Producer SE HT ACL 300 MM 01.06.2007 1 as is where is
88463 Applied Materials Producer SE ULK 300 MM 01.06.2006 1 as is where is
88994 Applied Materials P5000 CVD 4 CHAMBER COPPER PROCESS 01.06.1996 1 as is where is immediately
90350 Applied Materials Centura WxZ CVD system, missing major parts 200 mm 01.06.2008 1 as is where is immediately
90768 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
90770 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 1 as is where is
90772 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 300mm 01.06.2015 1 as is where is
90936 Applied Materials Centura DLH SACVD BPSG 200 mm 01.06.1997 1 as is where is
90937 Applied Materials Centura Ultima+ HDP CVD 200 mm 01.06.2001 1 as is where is
90938 Applied Materials Centura Ultima+ HDP CVD 200 mm 01.06.2000 1 as is where is
90939 Applied Materials Centura UltimaX HDP CVD 300 mm 01.06.2005 1 as is where is
90940 Applied Materials Producer GT Chamber Low K 300 MM 01.06.2017 1 as is where is
91044 APPLIED MATERIALS P5000 (2CVD / 1 ETCH) CVD / ETCH 200 mm 1 as is where is
91045 APPLIED MATERIALS P5000 Mark II (TEOS 3C/B, MXP ETCH 1C/B) CVD /ETCHER 200 mm 1 as is where is
91046 APPLIED MATERIALS PRODUCER SE_BPSG (2CH) CVD 300 mm 01.06.2006 1 as is where is
91145 Applied Materials CENTURA 5200 DLH 200 mm 1 as is where is
91146 Applied Materials CENTURA 5200 WxZ 200 mm 1 as is where is
91147 Applied Materials CENTURA 5200 DLH 200 mm 1 as is where is
91148 Applied Materials CENTURA 5200 DxZ (TEOS) 200 mm 01.06.1996 1 as is where is
91149 Applied Materials CENTURA 5200 WXP (2CVD/2ETCH) 200 mm 01.06.2005 1 as is where is
91150 Applied Materials CENTURA 5200 DLH 200 mm 1 as is where is
91151 Applied Materials CENTURA 5200 TECTRA TxZ 200 mm 01.06.2000 1 as is where is
91152 Applied Materials CENTURA 5200 DxZ (SLAINE) 200 mm 01.06.1997 1 as is where is
91153 Applied Materials CENTURA 5200 WxZ 200 mm 1 as is where is
91154 Applied Materials CENTURA 5200 TXZ 200 mm 01.06.1998 1 as is where is
91155 Applied Materials CENTURA 5200 WxZ 150 mm 01.06.1999 1 as is where is
91156 Applied Materials Centura Ultima X Ultima_X RPS TYPE 300 mm 1 as is where is
91157 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
91158 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 01.06.2000 1 as is where is
91159 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 01.06.2001 1 as is where is
91160 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
91161 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 01.06.2002 1 as is where is
91162 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 1 as is where is
91163 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
91164 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
91165 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
91166 Applied Materials Centura WCVD WxZ Optima 200 mm 01.06.1999 1 as is where is
91167 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 01.06.2000 1 as is where is
91168 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 01.06.2000 1 as is where is
91169 Applied Materials P5000 WXL 150 mm 01.06.1994 1 as is where is
91170 Applied Materials P5000 WXZ 150 mm 01.06.1991 1 as is where is
91171 Applied Materials P5000 WXZ 1ch, sputter 1ch 150 mm 01.06.1999 1 as is where is
91172 Applied Materials P5000 WXZ 2ch, sputter 1ch 200 mm 01.06.1995 1 as is where is
91173 Applied Materials P5000 WXZ 200 mm 01.06.1995 1 as is where is
91174 Applied Materials P5000 PECVD 200 mm 01.06.1995 1 as is where is
91175 Applied Materials P5000 WXZ 1ch, sputter 1ch 150 mm 01.06.1995 1 as is where is
91176 Applied Materials P5000 WXZ Mark II 200 mm 01.06.1996 1 as is where is
91177 Applied Materials P5000 DXZ 150 mm 1 as is where is
91178 Applied Materials P5000 DXZ 200 mm 1 as is where is
91179 Applied Materials P5000 DXZ 200 mm 1 as is where is
91180 Applied Materials P5000 CVD Delta TEOS 3ch + Sputter 1Ch 200 mm 01.06.2000 1 as is where is
91181 Applied Materials P5000 CVD Delta TEOS 3ch + Sputter 1Ch 200 mm 01.06.2000 1 as is where is
91182 Applied Materials P5000 CVD Delta Teos 150 mm 01.06.1993 1 as is where is
91183 Applied Materials P5000 CVD TEOS, DxL 200 mm 1 as is where is
91184 Applied Materials P5000 CVD Delta Teos 150 mm 01.06.1995 1 as is where is
91185 Applied Materials P5000 CVD DxL 150 mm 01.06.1995 1 as is where is
91186 Applied Materials P5000 CVD Delta Teos 3ch, sputter 1ch 200 mm 1 as is where is
91187 Applied Materials P5000 CVD Delta Teos 3ch, Etch 1ch 200 mm 01.06.1998 1 as is where is
91188 Applied Materials P5000 CVD Delta Teos 3ch, sputter 1ch 200 mm 1 as is where is
91189 Applied Materials P5000 CVD DxL 200 mm 1 as is where is
91190 Applied Materials P5000 CVD DxL 200 mm 1 as is where is
91191 Applied Materials P5000 Mark-II CVD DxL Nitride 200 mm 1 as is where is
91192 Applied Materials P5000 Mark-II CVD TEOS 200 mm 1 as is where is
91193 Applied Materials P5000 Mark-II CVD TEOS 150 mm 1 as is where is
91194 Applied Materials P5000 Mark-II CVD DxL 200 mm 1 as is where is
91195 Applied Materials P5000 Mark-II CVD TEOS 200 mm 1 as is where is
91196 Applied Materials P5000 Mark-II CVD+Etch Sputter 200 mm 1 as is where is
91197 Applied Materials P5000 Mark-II CVD+Etch SACVD Delta TEOS 3Ch, Etch 1ch 200 mm 01.06.1996 1 as is where is
91198 Applied Materials P5000 Mark-II CVD+Etch Delta TEOS 3Ch, Etch 1ch 200 mm 01.06.1997 1 as is where is
91199 Applied Materials P5000 Mark-II CVD+Etch TEOS 2Ch, Etch 2Ch 200 mm 01.06.1997 1 as is where is
91200 Applied Materials P5000 Mark-II CVD+Etch TEOS 2Ch, Sputter 2Ch 200 mm 01.06.1997 1 as is where is
91201 Applied Materials P5000 Mark-II CVD+Etch TEOS 2Ch, Sputter 2Ch 200 mm 01.06.2000 1 as is where is
91202 Applied Materials P5000 SACVD Delta TEOS 3ch + Sputter 1Ch 200 mm 01.06.2000 1 as is where is
91203 Applied Materials P5000 SACVD Delta 1 as is where is
91204 Applied Materials P5000 WCVD WxL 200 mm 1 as is where is
91205 Applied Materials P5000 WCVD WxL 200 mm 1 as is where is
91206 Applied Materials P5000 WCVD WXZ 150 mm 1 as is where is
91207 Applied Materials P5000 WCVD WxZ Metal 200 mm 1 as is where is
91208 Applied Materials Producer GT Chamber (A) SICONI Chamber only 300 mm 1 as is where is
91209 Applied Materials Producer GT Chamber (B) SICONI Chamber only 300 mm 1 as is where is
91210 Applied Materials Producer GT Chamber (C) SICONI Chamber only 300 mm 1 as is where is
91211 Applied Materials Producer SE BPSG Server OS Type 300 mm 01.06.2006 1 as is where is
91212 Applied Materials Producer SE TEOS 300 mm 01.06.2007 1 as is where is
91213 Applied Materials Producer SE SILANE Server OS Type 300 mm 01.06.2011 1 as is where is
91691 Applied Materials Producer S TEOS/SiN CVD System 200 mm 1 inquire 1 month
91900 APPLIED MATERIALS P5000 3x SiN 200 MM 01.06.1993 1 as is where is immediately
91901 APPLIED MATERIALS P5000 2x SiO, 1x Etch 200 MM 01.06.1996 1 as is where is immediately
91902 APPLIED MATERIALS P5000 3x SiN 200 MM 01.06.1990 1 as is where is immediately
91903 APPLIED MATERIALS P5000 2x SiO, 1xEtch 200 MM 01.06.1996 1 as is where is immediately
91904 APPLIED MATERIALS P5000 3x SiN 200 MM 01.06.1995 1 as is where is immediately
91905 APPLIED MATERIALS P5000 2x SiO, 1xEtch 200 MM 01.06.1995 1 as is where is immediately
91925 APPLIED MATERIALS PRODUCER CVD 300 mm 01.04.2008 1 as is where is
91987 Applied Materials P5000 Cluster tools for spares harvesting 200 MM 01.06.1997 6 as is where is immediately
92186 Applied Materials Centura 5200 Ti/TiN MCVD Metal CVD (Chemical Vapor Deposition) 200mm 01.06.2003 1 as is where is
92187 Applied Materials Centura AP Ultima X HDP CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
92188 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
85256 ASM Eagle 10 DARC 200 mm 01.08.1999 1 as is where is immediately
85257 ASM Eagle 10 PETEOS 200 mm 1 as is where is
88464 ASM Dragon 2300 PECVD Equipment for Barrier 300 MM 01.06.2003 1 as is where is
88465 ASM Eagle12 Curing 300 MM 01.06.2010 1 as is where is
90502 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 01.03.2002 1 as is where is
90773 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300mm 01.07.2004 1 as is where is
90774 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300mm 01.05.2003 1 as is where is
92189 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 01.06.2003 1 as is where is
92190 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
92191 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 01.07.2003 1 as is where is
92192 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 01.07.2003 1 as is where is
70643 Beijing Sevenstar Huachang Electronics Co. Ltd. L42500-4/ZM PECVD furnace 156 mm 01.10.2006 1 as is where is immediately
84866 Ci Science Torus 300K Plasma Processing Equipment and Tools 300 mm 01.06.2005 1 as is where is
91214 GENUS LYNX3 CVD 300 mm 1 as is where is
91215 GENUS LYNX3 ( TGME08) CVD 300 mm 1 as is where is
91216 GENUS LYNX3 ( TGME08) CVD 300 mm 1 as is where is
91217 GENUS Stratagem300 CVD 1 as is where is
60918 KE DJ813V CVD 1 as is where is
60919 KE DJ813V Vertical low-pressure CVD 1 as is where is
81878 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
81879 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
78665 Lam Research VECTOR EXPRESS CVD 300 MM 01.06.2007 1 as is where is immediately
78666 Lam Research VECTOR_EXPRESS CVD 300 MM 01.06.2008 1 as is where is
78667 Lam Research VECTOR_EXTREME CVD 300 MM 01.06.2013 1 as is where is immediately
91024 LAM Research Vector Express PECVD Deposition system 300 mm 01.06.2003 1 as is where is immediately
91025 LAM Research Vector Express PECVD Deposition system 300 mm 01.12.2010 1 as is where is immediately
91026 LAM Research Vector Express PECVD Deposition system 300mm 1 as is where is
91926 LAM RESEARCH VECTOR CVD 300 mm 01.04.2004 1 as is where is
91927 LAM RESEARCH VECTOR CVD 300 mm 01.05.2003 1 as is where is
91928 LAM RESEARCH VECTOR CVD 300 mm 01.09.2001 1 as is where is
66390 Novellus 676 1 as is where is
66391 Novellus 676 1 as is where is
66392 Novellus 676 1 as is where is
66393 Novellus Speed C3 1 as is where is
66394 Novellus Speed C3 1 as is where is
66395 Novellus Speed C3 1 as is where is
66396 Novellus Speed C3 1 as is where is
66397 Novellus Speed C2 1 as is where is
66398 Novellus Speed C2 1 as is where is
66399 Novellus Speed C2 1 as is where is
66400 Novellus Speed C2 CVD TRIPLE CHAMBER 200 mm 01.06.2000 1 as is where is immediately
66401 Novellus Speed C2 1 as is where is
66402 Novellus Speed C2 1 as is where is
66403 Novellus Speed C2 1 as is where is
66404 Novellus Speed C2 1 as is where is
66405 Novellus Speed C2 1 as is where is
83599 Novellus Concept 3 Speed CVD System, 3 chamber, STI / IMD process 300 mm 01.06.2005 1 inquire immediately
84041 Novellus Concept 2 Dual Altus (Shrink) CVD system for Tungsten Deposition 200 mm 1 inquire immediately
84758 Novellus Concept 1 CVD- UNDOPED SILANE and SiN 200 mm 01.06.1991 1 as is where is immediately
86418 Novellus Concept One CVD 200 mm 5 as is where is
86682 Novellus Concept 1 PE CVD Silane 200mm 01.01.1993 1 as is where is immediately
88189 Novellus Concept Three Speed NExT HDP CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88467 Novellus C2 Speed Shrink HDP 200 MM 01.06.2001 1 as is where is
88468 Novellus C2 Speed Shrink HDP 200 MM 01.06.1999 1 as is where is
88469 Novellus C2 Speed Shrink HDP 200 MM 01.06.2000 1 as is where is
88470 Novellus C3 Speed MAX HDP 300 MM 01.06.2006 1 as is where is
88471 Novellus C3 Speed NEXT HDP 300 MM 01.06.2004 1 as is where is
88472 Novellus C3 Speed XT ILD, IMD 300 MM 01.06.2008 1 as is where is
88479 Novellus Vector Extreme CVD 300 MM 01.06.2010 1 as is where is
90344 Novellus Speed MAX HDP CVD system, 2 chamber 300 mm 1 as is where is immediately
90376 Novellus Speed C2 CVD TRIPLE CHAMBER 200 mm 01.06.2003 1 as is where is immediately
90378 Novellus Concept 2 Speed HDP CVD system, 3 chamber 200 mm 1 as is where is immediately
90782 Novellus Concept Three Speed HDP CVD (Chemical Vapor Deposition) 300mm 01.06.2002 1 as is where is immediately
90941 Novellus C2 Altus WCVD 200 mm 01.06.1994 1 as is where is
90942 Novellus Vector PESiN/PETEOS 300 mm 01.06.2007 1 as is where is
91030 Novellus Concept 2 Dual Speed HDP CVD system, 2 chamber 200 mm 1 inquire immediately
91218 NOVELLUS CONCEPT 3 GAMMA 2130 300 mm 1 as is where is
91219 NOVELLUS CONCEPT 3 GAMMA 2130 300 mm 1 as is where is
91220 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 01.06.2004 1 as is where is
91221 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 01.06.2006 1 as is where is
91222 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 01.06.2005 1 as is where is
91223 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 01.06.2005 1 as is where is
91224 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 01.06.2007 1 as is where is
91225 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 01.06.2004 1 as is where is
91226 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 01.06.2004 1 as is where is
91227 NOVELLUS Concept one TEOS CVD 200 mm 01.06.1994 1 as is where is immediately
91228 NOVELLUS Concept one TEOS 200 mm 01.06.1994 1 as is where is immediately
91229 NOVELLUS Concept one Tungsten 200 mm 1 as is where is
91230 NOVELLUS Concept one WCVD 150 mm 1 as is where is
91231 NOVELLUS Concept one Tungsten 200 mm 1 as is where is
91232 NOVELLUS NOVELLUS CONCEPT 3 INOVA NEXT 300 mm 1 as is where is
91233 NOVELLUS NOVELLUS CONCEPT 3 INOVA NEXT 300 mm 01.06.2010 1 as is where is
91234 NOVELLUS VECTOR PECVD 300 mm 1 as is where is
92015 Novellus C2 Sequel Express CVD System 200 mm 1 as is where is immediately
92193 Novellus Concept Three Speed HDP CVD (Chemical Vapor Deposition) 01.06.2006 1 as is where is
87614 Optosystems Ardis 100 MW CVD Diamond up to 100 mm 01.04.2011 1 as is where is immediately
82215 Oxford Plasmalab 100 PE CVD 150 mm and 200 mm 01.04.2003 1 as is where is immediately
82234 Oxford Plasmalab 80 Plus PE CVD 150 mm and 200 mm 01.06.2000 1 as is where is immediately
90668 Plasmatherm 790 Dry Etcher / PECVD 200 mm 01.06.1997 1 as is where is immediately
91047 PLASMATHERM 7300 PECVD SYSTEM 200 mm 01.06.1996 1 as is where is
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
84867 Tel Tokyo Electron Trias Chemical Vapor Deposition Equipment, TiCl4 300 MM 01.06.2010 1 as is where is
84869 Tel Tokyo Electron Trias SPA chamber 300 MM 01.06.2006 1 as is where is
87822 TEL TOKYO ELECTRON Trias 2 chamber metal CVD cluster tool 300 MM 01.06.2002 1 as is where is immediately
88177 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88178 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88485 TEL Tokyo Electron Trias CVD TiN 300 MM 01.06.2004 1 as is where is
88486 TEL Tokyo Electron Trias Metal 300 MM 01.06.2012 1 as is where is
90493 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
90495 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
90496 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
90497 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
90498 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 01.02.2009 1 as is where is
90499 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 01.03.2002 1 as is where is
90500 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.09.2006 1 as is where is
90501 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.10.2007 1 as is where is
90775 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.09.2007 1 as is where is
90943 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
90944 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
91048 TEL TOKYO ELECTRON TRIAS TI/TIN CVD system 300 MM 1 as is where is
91235 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 mm 1 as is where is
91236 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 mm 1 as is where is
91237 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 mm 1 as is where is
91238 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 mm 1 as is where is
91239 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
91240 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
91241 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
91242 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (N2/H2/CIF3) 300 mm 1 as is where is
91243 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
91244 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
91245 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TIN (N2/NH3/N2/CIF3) 300 mm 1 as is where is
91763 TEL TOKYO ELECTRON Trias CVD TEL Trias, CVD Ti TiN, 300mm 300 MM 1 as is where is
91764 TEL TOKYO ELECTRON Trias CVD TEL Trias, CVD TiN, 300mm 300 MM 1 as is where is
91929 TEL TOKYO ELECTRON TRIAS METAL CVD SYSTEM 300 mm 01.05.2013 1 as is where is
91930 TEL TOKYO ELECTRON TRIAS METAL CVD SYSTEM 300 mm 01.03.2003 1 as is where is
92194 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2003 1 as is where is
92195 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
92196 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
92197 TEL Tokyo Electron Trias Ti/TiN Chamber Parts/Peripherals 300 mm 1 as is where is
92198 TEL Tokyo Electron Trias Ti/TiN Chamber Parts/Peripherals 300 mm 1 as is where is
92199 TEL Tokyo Electron Trias Ti/TiN Chamber Parts/Peripherals 300 mm 1 as is where is
92200 TEL Tokyo Electron Trias Ti/TiN Chamber Parts/Peripherals 300 mm 1 as is where is
91246 TEL/Varian MB2-730 WSIX 200 mm 01.06.1996 1 as is where is
69323 Tempress Amtech TS8403 Diffusion Furnace for POCL3 with 2 tubes 75 mm to 200 mm 1 as is where is immediately
87901 TES CHALLENGER_ST Plasma-Enhanced CVD system 300 mm 01.06.2010 1 as is where is
91247 TES CHALLENGER TELIA 300 PECVD (ACL) 300 mm 1 as is where is
91248 TES CHALLENGER TELIA 300 PECVD (ACL) 300 mm 1 as is where is
91049 UNAXIS UNAXIS 7000 CVD 200 mm 01.06.2001 1 as is where is
91249 VARIAN MBB W CVD 200 mm 1 as is where is
87902 WONIK IPS TECHO300 Metal ALD / CVD system 300 mm 01.06.2005 1 as is where is
87903 WONIK IPS TECHO300 Metal ALD / CVD system 300 mm 01.06.2009 1 as is where is
91931 WONIK IPS MAHA SP CVD 300 MM 01.09.2011 1 as is where is
91932 WONIK IPS MAHA SP CVD 300 MM 01.09.2011 1 as is where is


Not the item you were looking for?



Ask SDI fabsurplus.com!

If you can't find what you need, or are looking for a specific piece of semiconductor equipment let us know what type of semiconductor manufacturing equipment you would like to buy, and we will conduct a search for what you are looking for.

Inquiry