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Pre-owned CVD Equipment , surplus CVD equipment, used CVD equipment for sale by fabsurplus.com

Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
61395 AIXTRON INC LYNX3, TM CVD-WSIX 1 as is where is
61396 AIXTRON INC LYNX3, TM CVD-WSIX 1 as is where is
56538 AMAT P-5000 CVD - TEOS 150mm 01.06.1990 1 as is where is
57622 AMAT P-5000 2xCVD(DLH) 100mm 1 as is where is
57623 AMAT P-5000 2xCVD(DLH) 125mm 1 as is where is
57627 AMAT P-5000 2xCVD(DLH) 100mm 1 as is where is
60550 AMAT P-5000 CVD 200 mm 01.12.1997 1 as is where is
60905 AMAT 2CH PRODUCER 01.06.2006 1 as is where is
60906 AMAT 1ch PRODUCER 1 as is where is
60908 AMAT Mirra on track 1 as is where is
60909 AMAT P-5000 DxL 4CH 1 as is where is
60911 AMAT P-5000 MxP+ Oxide 3C/H, OPTIMA 1 as is where is
60912 AMAT CENTURA-I PHASE II 1 as is where is
60913 AMAT TxZ 3C/H TECTRA 1 as is where is
60916 AMAT 2C/H MXP POLY 01.06.1995 1 as is where is
61712 AMAT P-5000 CVD 100 mm, 200 mm 1 as is where is
66388 AMAT Centura WxZ 3ch 1 as is where is
66389 AMAT Centura WxZ 3ch 1 as is where is
66406 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
66407 AMAT Centura 5200 eMxP+ 3 chamber 150 mm 1 as is where is immediately
66408 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
76360 AMAT 0010-01456 ESC Refurbished with 90 days warranty 2 as is where is
84328 AMAT Producer CVD3CH 1 as is where is
84329 AMAT Centura 5200 eMxP 1 as is where is
84330 AMAT Centura 5200 IPS 4ch 1 as is where is
84331 AMAT Producer CVD 3CH Cu 1 as is where is
84332 AMAT Producer CVD 3CH Cu 1 as is where is
84333 AMAT Producer CVD 3CH Cu 1 as is where is
84334 AMAT Producer CVD 3CH Cu 1 as is where is
58500 Amaya AEC-2250U AP-CVD 125 mm 01.01.2006 4 as is where is immediately
63633 Applied P5000, 2 chambers PECVD Dep 150mm 1 as is where is
3419 Applied Materials P5000 CVD System, 2 Chamber TEOS Oxide CVD 200 MM 01.01.1994 1 inquire immediately
20449 Applied Materials ENDURA CHAMBER Endura chambers 300mm 300mm 4
60551 Applied Materials P5000 Plasma Enhanced TEOS CVD 150 mm, 200 mm 01.06.1996 1 as is where is
60552 Applied Materials P5000 Metal Etch Process Tool 150 mm, 200 mm 01.06.1994 1 as is where is
60553 Applied Materials P5000 Poly Etch ESC 150 mm 01.06.1995 1 as is where is
60554 Applied Materials P5000 Plasma Enhanced CVD 150 mm, 200 mm 01.06.1994 1 as is where is
63666 APPLIED MATERIALS CENTURA 5200 3X SA BPSG CHM, TEB TEPO TEOS 200mm 01.06.1999 1 as is where is
67263 Applied Materials Centura AP Ultima X HDP CVD (Chemical Vapor Deposition) 300mm 1 as is where is
70345 Applied Materials Centura AP Ultima X HDP CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
70347 Applied Materials Centura AP Ultima X HDP CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
70348 Applied Materials Centura AP Ultima X HDP CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
75938 Applied Materials Centura 5.3 HT Polycide 12 01.06.2005 1 as is where is
75939 Applied Materials Centura 5.3 HT Polycide 12 01.06.2005 1 as is where is
75971 Applied Materials P-5000 2CH/ WCVD 6 1 as is where is
75972 Applied Materials P-5000 CVD 8 1 as is where is
75973 Applied Materials P-5000 CVD 8 1 as is where is
75974 Applied Materials P-5000 LTO CVD 8 1 as is where is
75976 Applied Materials P-5000 LTO CVD, Ozone TEOS 8 01.06.1996 1 as is where is
75977 Applied Materials P-5000 LTO CVD, Ozone TEOS 8 1 as is where is
75978 Applied Materials P-5000 LTO CVD, TEOS 8 01.06.1995 1 as is where is
75979 Applied Materials P-5000 LTO CVD,TEOS 8 1 as is where is
75982 Applied Materials P-5000 PETEOS 6 01.06.1991 1 as is where is
75984 Applied Materials P-5000 TEOS 6 01.06.1988 1 as is where is
78348 Applied Materials Centura 5200 Gigafil SA CVD 200 mm 01.06.2000 1 as is where is immediately
78650 Applied Materials Centura 5200 Rev. 4 Poly / WSiX 300 mm 01.03.2007 1 as is where is immediately
78661 Applied Materials P5000 CVD 200 mm 01.06.2002 1 as is where is
79714 Applied Materials P5000 CVD 200mm 1 as is where is
79842 Applied Materials Producer Shrink SACVD Twin 200 mm 1 as is where is immediately
80370 Applied Materials Centura 5200 HDP CVD system, with 3 Ultima chambers 200 mm 01.06.2000 1 as is where is immediately
81913 Applied Materials P5000 PECVD 1 chamber Silane Oxide Deposition 100 mm 1 as is where is immediately
82242 Applied Materials PRODUCER_SE_2CH CVD 12" 01.06.2007 1 as is where is
82243 Applied Materials PRODUCER_SE_2CH CVD 12" 01.06.2007 1 as is where is
82244 Applied Materials CENTURA WSI CHAMBER CVD 12" 1 as is where is
82418 Applied Materials Producer GT - UV Cure Chamber PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
82420 Applied Materials Producer SE BD/BLOk Low k Dielectric PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
82736 Applied Materials 5000PLATFORM CVD 6" 01.06.1995 1 as is where is
82738 Applied Materials P-5000CVD LTO 6 01.06.1990 1 as is where is
82739 Applied Materials P-5000CVD LTO 6 01.06.1990 1 as is where is
82740 Applied Materials P-5000CVD P-CVD 6 01.06.1988 1 as is where is
82851 Applied Materials Centura DxZ Multi-Process CVD 200 01.01.2000 1 as is where is immediately
82852 Applied Materials Centura Multi-Process CVD Multi-Process CVD 200 01.01.1997 1 as is where is immediately
82853 Applied Materials Centura Ultima HDP CVD (Chemical Vapor Deposition) 200 01.01.2001 1 as is where is immediately
82856 Applied Materials Centura Ultima X HDP CVD (Chemical Vapor Deposition) 200 01.06.2006 1 as is where is immediately
82858 Applied Materials Centura Ultima X HDP CVD (Chemical Vapor Deposition) 200 01.06.2006 1 as is where is immediately
82859 Applied Materials Centura Ultima X HDP CVD (Chemical Vapor Deposition) 200 01.06.2007 1 as is where is immediately
82860 Applied Materials Centura WxZ Metal CVD (Chemical Vapor Deposition) 200 01.06.1998 2 as is where is immediately
82864 Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1996 1 as is where is immediately
82865 Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1993 1 as is where is immediately
82866 Applied Materials P5000 PECVD PECVD (Chemical Vapor Deposition) 150 2 as is where is immediately
82867 Applied Materials P5000 TEOS Multi-Process CVD 200 01.06.1994 2 as is where is immediately
83145 Applied Materials Centura AP Ultima X HDP cvd 300 mm 1 as is where is
83146 Applied Materials Centura DxZ Nitride 200 mm 01.06.1996 1 as is where is
83147 Applied Materials Centura DxZ TEOS 200 mm 01.06.1996 1 as is where is
83148 Applied Materials Centura DxZ USG 200 mm 01.06.1996 1 as is where is
83149 Applied Materials Centura Ultima STD HDP CVD 200 mm 01.06.2000 1 as is where is
83150 Applied Materials Centura Ultima STD HDP CVD 200 mm 01.06.2000 1 as is where is
83151 Applied Materials Centura Ultima STD HDP CVD 200 mm 01.06.2000 1 as is where is
83152 Applied Materials Centura Ultima STD HDP CVD 200 mm 01.06.2001 1 as is where is
83153 Applied Materials Centura Ultima STD HDP CVD 200 mm 1 as is where is
83154 Applied Materials Centura Ultima STD HDP CVD 200 mm 1 as is where is
83155 Applied Materials Centura Ultima TE USG CVD 200 mm 01.06.1999 1 as is where is
83156 Applied Materials P5000 DxZ SiN PSG 200 mm 01.06.1997 1 as is where is
83157 Applied Materials P5000 DxZ USG 200 mm 01.06.1997 1 as is where is
83158 Applied Materials Producer GT Avila TSV PECVD 300 mm 01.06.2008 1 as is where is
83159 Applied Materials PRODUCER SE Low K 300 mm 01.06.2005 1 as is where is
83160 Applied Materials Producer SE PE TEOS 300 mm 01.06.2006 1 as is where is
83161 Applied Materials PRODUCER SE PE TEOS 300 mm 01.06.2005 1 as is where is
83162 Applied Materials PRODUCER SE PE TEOS 300 mm 01.06.2007 1 as is where is
83163 Applied Materials PRODUCER SE SiCN 300 mm 01.06.2005 1 as is where is
83164 Applied Materials PRODUCER SE SiCN 300 mm 01.06.2006 1 as is where is
83165 Applied Materials Producer SE USG/BPSG 300 mm 01.06.2004 1 as is where is
83166 Applied Materials PRODUCER SE+ Low K 300 mm 01.06.2007 1 as is where is
83167 Applied Materials PRODUCER_GT F-CVD Ch x1 300 mm 01.06.2011 1 as is where is
83168 Applied Materials PRODUCER_GT F-CVD Ch x1 300 mm 01.06.2011 1 as is where is
83169 Applied Materials PRODUCER_GT F-CVD Ch x2, SA CVD x1 & O3 Rack 300 mm 01.06.2015 1 as is where is
83170 Applied Materials PRODUCER_GT SA CVD x1 & O3 Rack 300 mm 01.06.2011 1 as is where is
83598 Applied Materials Producer SE CVD system, with Dual Twin chambers, BPSG process 300 mm 01.06.2003 1 as is where is immediately
83648 Applied Materials Producer SE HARP / USG Deposition System 300 mm 01.06.2002 1 inquire immediately
83755 Applied Materials PRODUCER GT CVD 300 mm 01.09.2011 1 as is where is immediately
84164 Applied Materials P5000 200 mm 1 as is where is
84165 Applied Materials P5000 200 mm 1 as is where is
84505 Applied Materials Centura 5200 GigaFill SACVD 200 mm 01.01.2000 1 as is where is immediately
84630 Applied Materials P5000 CVD 1 as is where is
84631 Applied Materials P5000 CVD 1 as is where is
84632 Applied Materials P5000 CVD 1 as is where is
84779 Applied Materials Centura 5200 WxZ 3 chamber WxZ deposition system 200 mm 01.06.1995 1 inquire immediately
60907 ASM EAGLE-10 3C/H PE-CVD 01.07.2007 1 as is where is immediately
76041 ASM PXJ-200 PECVD 6 01.06.1989 1 as is where is
78421 ASM Eagle XP ALD Chemical Vapor Deposition Equipment - 2 ch HT SIO / HT SIN 300 mm 01.03.2010 1 as is where is immediately
84633 ASM Eagle-10 DARC 1 as is where is
84634 ASM Eagle-10 PETEOS 1 as is where is
82871 ASM International Epsilon E2000 Epitaxial Silicon (EPI) 150 01.06.1996 1 as is where is immediately
82875 ASM Pacific AD896A Bonding Equipment 150 18 as is where is immediately
82878 ASYS Group LSE 03 unloader 150 01.06.1996 3 as is where is immediately
77342 Aviza Celsior ALD (Atomic Layer Deposition) 300 1 as is where is
77344 Aviza Pantheon ALD (Atomic Layer Deposition) 300 1 as is where is
70643 Beijing Sevenstar Huachang Electronics Co. Ltd. L42500-4/ZM PECVD furnace 156 mm 01.10.2006 1 as is where is immediately
82857 clone Applied Materials Centura Ultima X HDP CVD (Chemical Vapor Deposition) 200 01.06.2005 1 as is where is immediately
82887 clone Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1996 1 as is where is immediately
84312 IPS LTD Bluetain MCVD 300 mm 01.06.2008 1 as is where is immediately
77345 JEL (Jusung Engineering) Cyclone Plus Metal CVD (Chemical Vapor Deposition) 300 1 as is where is
77347 JEL (Jusung Engineering) Cyclone Plus Metal CVD (Chemical Vapor Deposition) 300 1 as is where is
60918 KE DJ813V CVD 1 as is where is
60919 KE DJ813V Vertical low-pressure CVD 1 as is where is
84335 KLA 8100 2 as is where is
84336 KLA 8100 2 as is where is
84337 KLA AIT 2 as is where is
69252 Kokusai DJ-815V-8L LPCVD Reactor 1 as is where is
81878 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
81879 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
83762 LAM SPEED CVD 300 mm 01.07.2007 1 as is where is immediately
83763 LAM SPEED CVD 300 mm 01.07.2007 1 as is where is immediately
78665 Lam Research VECTOR_EXPRESS CVD 300 MM 01.06.2007 1 as is where is
78666 Lam Research VECTOR_EXPRESS CVD 300 MM 01.06.2008 1 as is where is
78667 Lam Research VECTOR_EXTREME CVD 300 MM 01.06.2013 1 as is where is immediately
17878 Novellus Vector PECVD 200 mm 01.06.2006 2 as is where is immediately
29961 Novellus Concept 3 Speed CVD - HDP 300 MM 01.06.2005 1 as is where is immediately
35783 NOVELLUS C2 ALTUS Standard type CVD W-deposition 200 mm 01.01.1997 1 as is where is immediately
50592 Novellus C2 Altus CVD 200 MM 01.06.2001 1 as is where is immediately
52354 Novellus C2 Dual Speed Sequel 200 1 as is where is
60904 NOVELLUS CONCEPT ONE CVD 200mm 2 as is where is
61398 NOVELLUS SPEED CONCEPT2 CVD 1 as is where is
61399 NOVELLUS PDL CVD 1 as is where is
63631 Novellus C1 PECVD Dep 100mm 1 as is where is
63632 Novellus C1 PECVD Dep 150mm 1 as is where is
63677 NOVELLUS CONCEPT 2 SPEED SHRINK 3XSPEED SHRINK CHAMBERS 200mm 01.06.2005 1 as is where is
63678 NOVELLUS CONCEPT 2 SPEED SHRINK 3XSPEED SHRINK CHAMBERS 200mm 01.06.2005 1 as is where is
63679 NOVELLUS CONCEPT 2 SPEED SHRINK 3xSPEED SHRINK CHAMBERS 200mm 01.06.2003 1 as is where is
63680 NOVELLUS CONCEPT 2 SPEED SHRINK 2xSPEED SHRINK CHAMBERS 200mm 01.06.2002 1 as is where is
63681 NOVELLUS CONCEPT 2 SPEED SHRINK 3xSPEED SHRINK CHAMBERS 200mm 01.06.2003 1 as is where is
63682 NOVELLUS CONCEPT 2 TRIPLE SPEED NEXT CONCEPT TWO TRIPLE SPEED NE SYSTEM 200MM 200mm 1 as is where is
66175 Novellus C1 TUNGSTEN CVD 150 MM 01.01.2001 1 as is where is immediately
66390 Novellus 676 1 as is where is
66391 Novellus 676 1 as is where is
66392 Novellus 676 1 as is where is
66393 Novellus Speed C3 1 as is where is
66394 Novellus Speed C3 1 as is where is
66395 Novellus Speed C3 1 as is where is
66396 Novellus Speed C3 1 as is where is
66397 Novellus Speed C2 1 as is where is
66398 Novellus Speed C2 1 as is where is
66399 Novellus Speed C2 1 as is where is
66400 Novellus Speed C2 1 as is where is
66401 Novellus Speed C2 1 as is where is
66402 Novellus Speed C2 1 as is where is
66403 Novellus Speed C2 1 as is where is
66404 Novellus Speed C2 1 as is where is
66405 Novellus Speed C2 1 as is where is
71581 NOVELLUS CONCEPT ONE CVD 5 as is where is
76060 Novellus C2 Dual Speed CVD 8 01.06.2000 1 as is where is
76061 Novellus C2 Dual SPEED HDP CVD 200 mm 01.06.1999 1 as is where is immediately
76063 Novellus C2 Single ALTUS Shrink WCVD(PNL) 8 01.06.1996 1 as is where is
76066 Novellus C2 SPEED HDP CVD (Chemical Vapor Deposition) 200 01.01.2001 1 as is where is
76069 Novellus C2 Speed max CVD 300 mm 01.06.2008 1 as is where is
76070 Novellus C2 speed Standard CVD - parts machine 300 mm 1 as is where is
76072 Novellus C2 Triple SPEED HDP CVD (Chemical Vapor Deposition) 200 01.01.2004 1 as is where is
76076 Novellus C3 Altus Tungsten CV Deposition 300 mm 1 as is where is
76095 Novellus Concept one PECVD 8 01.06.1990 1 as is where is
77879 NOVELLUS C2 SPEED CVD 8" 1 as is where is
77880 NOVELLUS C2 SPEED CVD 8" 1 as is where is
78422 Novellus Speed HDP NexT CVD 300 mm 01.06.2005 1 as is where is
78423 Novellus Vector Chemical Vapor Deposition Equipment 300 mm 1 as is where is
83171 Novellus Concept 2 Triple Speed Shrink HDP 200 mm 01.06.2001 1 as is where is
83172 Novellus Concept 2 Triple Speed Shrink HDP 200 mm 01.06.2005 1 as is where is
83173 Novellus Concept Three SPEED NeXT HDP 300 mm 01.06.2004 1 as is where is
83174 Novellus Concept Three Vector CVD 300 mm 01.06.2004 1 as is where is
83175 Novellus Concept Three Vector CVD 300 mm 1 as is where is
83176 Novellus Concept Three Vector CVD 300 mm 1 as is where is
83177 Novellus Concept Three Vector CVD 300 mm 1 as is where is
83178 Novellus Concept Three Vector CVD 300 mm 1 as is where is
83179 Novellus Concept Three Vector CVD 300 mm 1 as is where is
83599 Novellus Concept 3 Speed CVD System, 3 chamber, STI / IMD process 300 mm 01.06.2005 1 inquire immediately
83759 NOVELLUS C3 SPEED CVD 300 mm 01.06.2006 1 as is where is immediately
83760 NOVELLUS C3 SPEED CVD 300 mm 01.11.2005 1 as is where is immediately
83772 NOVELLUS SPEED CVD 300 mm 01.03.2006 1 as is where is
83773 NOVELLUS VECTOR PE-CVD 300 mm 01.06.2005 1 as is where is immediately
83774 NOVELLUS VECTOR PE CVD 300 mm 01.06.2005 1 as is where is immediately
83775 NOVELLUS VECTOR PE-CVD 300 mm 01.06.2005 1 as is where is immediately
83976 Novellus C2 Dual Altus CVD system for Tungsten Deposition 200 mm 01.06.2001 1 as is where is immediately
84041 Novellus Concept 2 Dual Altus (Shrink) CVD system for Tungsten Deposition 200 mm 1 inquire immediately
84293 Novellus Vector Extreme PECVD 300 mm 01.02.2012 1 as is where is immediately
84296 Novellus Vector Extreme (Parts) Hub and EFEM module 300 mm 01.02.2010 1 as is where is immediately
84338 Novellus Innova PVD 2 as is where is
84541 NOVELLUS C2 SPEED CVD 200 mm 1 as is where is
84758 Novellus Concept 1 CVD- UNDOPED SILANE and SiN 200 mm 01.06.1991 1 as is where is immediately
82421 Novellus Systems Concept Three Speed MAX HDP CVD (Chemical Vapor Deposition) 300mm 1 as is where is
78997 Oxford PlasmaProTM 800Plus PECVD susceptor 01.08.2010 1 as is where is immediately
82215 Oxford Plasmalab 100 PE CVD 150 mm and 200 mm 01.04.2003 1 as is where is immediately
82234 Oxford Plasmalab 80 Plus PE CVD 150 mm and 200 mm 01.04.2003 1 as is where is immediately
72031 PLASMATHERM 7300 PE(7000) (PECVD_PT#01) PECVD 200 mm 01.07.1996 1 as is where is immediately
21495 Semco Goupyl 190 PECVD System 1
69253 SemiTherm VTP 1500 LH LPCVD Reactor (SiN) 1 as is where is immediately
79000 Speedline OMNIFLOW 7 REFLOW OVEN SMT 1 as is where is
79001 Speedline OMNIFLOW 7 REFLOW OVEN SMT 1 as is where is
63683 TEL ALPHA 808SC LPCVD HTO 200mm 01.10.1995 1 as is where is
69254 TEL Alpha 8S LPCVD Reactor 1 as is where is
77348 TEL Trias Metal CVD (Chemical Vapor Deposition) 300 1 as is where is
82917 TEL Unity II 85 DRM Oxide Etch System 200 01.06.2006 1 as is where is immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
27653 TEL Tokyo Electron TRIAS Trias Ti / TiN ALD system for MOCVD 300 mm 01.02.2008 1 as is where is immediately
78424 TEL Tokyo Electron Trias Chemical Vapor Deposition Equipment 300 mm 1 as is where is
78425 TEL Tokyo Electron Trias Chemical Vapor Deposition Equipment 300 mm 1 as is where is
78426 TEL Tokyo Electron Trias Chemical Vapor Deposition Equipment 300 mm 1 as is where is
78427 TEL Tokyo Electron Trias Chemical Vapor Deposition Equipment 300 mm 1 as is where is
82422 TEL Tokyo Electron Trias Chamber Parts/Peripherals 1 as is where is
82423 TEL Tokyo Electron Trias Chamber Parts/Peripherals 1 as is where is
82424 TEL Tokyo Electron Trias Chamber Parts/Peripherals 1 as is where is
82425 TEL Tokyo Electron Trias Chamber Parts/Peripherals 1 as is where is
82426 TEL Tokyo Electron Trias Chamber Parts/Peripherals 1 as is where is
82427 TEL Tokyo Electron Trias Chamber Parts/Peripherals 1 as is where is
82428 TEL Tokyo Electron Trias Chamber Parts/Peripherals 1 as is where is
82429 TEL Tokyo Electron Trias Chamber Parts/Peripherals 1 as is where is
82430 TEL Tokyo Electron Trias High-k CVD PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
82431 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
82432 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
82433 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
82434 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
82435 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
82436 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
83180 TEL Tokyo Electron TRIAS CVD Ti 300 mm 1 as is where is
83181 TEL Tokyo Electron TRIAS CVD Ti 300 mm 1 as is where is
83182 TEL Tokyo Electron TRIAS CVD Ti 300 mm 01.06.2016 1 as is where is
83183 TEL Tokyo Electron TRIAS CVD Ti 300 mm 01.06.2016 1 as is where is
83184 TEL Tokyo Electron TRIAS CVD Ti 300 mm 01.06.2016 1 as is where is
83185 TEL Tokyo Electron TRIAS CVD TiN 300 mm 01.06.2004 1 as is where is
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
84635 TEL Tokyo Electron MB2 WSI CVD 1 as is where is
84339 Teradyne J972 1 as is where is
84340 Teradyne J973 8 as is where is
84321 TES CO., LTD Challenger 300_ACL DCVD 300 mm 01.06.2008 1 as is where is immediately
69255 Thermco 4504 LPCVD Reactor 1 as is where is
76123 Tokyo Electron Ltd Trias CVD 200 MM 1 as is where is
63684 WATKINS JOHNSON WJ-1000T TEOS 200mm 01.06.2006 1 as is where is


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