Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
---|---|---|---|---|---|---|---|---|
86136 | Applied Materials | PRODUCER_SE_2CH | CVD | 300 mm | 31.05.2007 | 1 | as is where is | |
91158 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
91159 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2001 | 1 | inquire | |
91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | ||
91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
91182 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 31.05.1993 | 1 | as is where is | |
91183 | Applied Materials | P5000 CVD | TEOS, DxL | 200 mm | 1 | as is where is | ||
91185 | Applied Materials | P5000 CVD | DxL | 150 mm | 31.05.1995 | 1 | as is where is | |
91189 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
91190 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
91193 | Applied Materials | P5000 Mark-II CVD | TEOS | 150 mm | 1 | as is where is | ||
91194 | Applied Materials | P5000 Mark-II CVD | DxL | 200 mm | 1 | as is where is | ||
91195 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
91196 | Applied Materials | P5000 Mark-II CVD+Etch | Sputter | 200 mm | 1 | as is where is | ||
91199 | Applied Materials | P5000 Mark-II CVD+PVD | TEOS 2Ch, SPUTTER 2Ch | 200 mm | 01.05.1997 | 1 | as is where is | |
91204 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
91205 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
91208 | Applied Materials | Producer GT Chamber (A) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
91209 | Applied Materials | Producer GT Chamber (B) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
93051 | Applied Materials | P5000 | WXL | 150 mm | 31.05.1994 | 1 | as is where is | |
93053 | Applied Materials | PRODUCER GT | LLTO | 300 mm | 31.05.2014 | 1 | as is where is | |
94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
98514 | Applied Materials | P5000 | PE CVD | 200 mm | 1 | as is where is | ||
102855 | Applied Materials | Centura 5200 | WxP Chamber (Mechanical Clamp Chuck) Tungsten etch Back | 200 mm | 4 | as is where is | ||
102857 | Applied Materials | P5000 | PECVD TEOS with 3 x SACVD chambers | 200 mm | 1 | as is where is | ||
103508 | Applied Materials | PRODUCER GT | Ht ACL 3ch / Server OS Type | 300 mm | 31.05.2014 | 1 | as is where is | |
103509 | Applied Materials | PRODUCER GT | BD2_CU | 300 mm | 31.05.2002 | 1 | as is where is | |
103510 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 31.05.2003 | 1 | as is where is | |
103511 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 1 | as is where is | ||
106344 | Applied Materials | P5000 SiN | CVD cluster tool | 150 mm | 1 | as is where is | ||
106345 | Applied Materials | P5000 TEOS | CVD cluster tool | 150 mm | 01.06.1989 | 1 | as is where is | |
106346 | Applied Materials | PRODUCER (2)DPN (1) RTP | CVD cluster tool | 300 mm | 01.06.2008 | 1 | as is where is | |
106348 | Applied Materials | PRODUCER SE ACL (2CH) | CVD cluster tool | 300 mm | 01.06.2006 | 1 | as is where is | |
106349 | Applied Materials | PRODUCER-GT(EFEM) | CVD cluster tool | 300 mm | 01.06.2019 | 1 | as is where is | |
106575 | Applied Materials | Centura AP Ultima Chamber | HDPCVD Chamber only | 300 mm | 1 | as is where is | ||
106582 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2001 | 1 | as is where is | |
106584 | Applied Materials | ENDURA 2 (Gray Rack) | 3CH (WxZ) | 300 mm | 01.06.2007 | 1 | as is where is | |
106621 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 150 mm | 01.06.1996 | 1 | as is where is | |
106622 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 200 mm | 01.06.1998 | 1 | as is where is | |
106623 | Applied Materials | P5000 | DxL 2ch | 200 mm | 01.06.1996 | 1 | as is where is | |
106631 | Applied Materials | Producer GT Chamber | SIH4 | 300 mm | 1 | as is where is | ||
106633 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 01.06.2004 | 1 | as is where is | |
106634 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
106635 | Applied Materials | PRODUCER SE | SILANE 2ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
106636 | Applied Materials | PRODUCER SE | Teos 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
108023 | Applied Materials | P5000 | CVD | 200 mm | 01.11.1990 | 1 | as is where is | |
108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | |
108143 | Applied Materials | P5000 | Delta Dlh 3chCVD | 150 mm | 1 | as is where is | ||
108145 | Applied Materials | P5000 | Teos dlh 3ch CVD | 150 mm | 1 | as is where is | ||
108147 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
108148 | Applied Materials | Producer SE Chamber | LLTO Chamber only | 300 mm | 01.06.2014 | 1 | as is where is | |
108149 | Applied Materials | PRODUCER SE CHAMBER | PECVD Silane Chamber Only | 300 mm | 1 | as is where is | ||
108150 | Applied Materials | PRODUCER SE CHAMBER | PECVD TEOS Chamber Only | 300 mm | 1 | as is where is | ||
108254 | Applied Materials | P5000 | CVD system with 4 x DXZ chambers, Silane process | 200 mm | 01.06.2001 | 1 | as is where is | |
108352 | Applied Materials | Centura AP iSprint | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108361 | Applied Materials | Producer GT APF | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108362 | Applied Materials | Producer GT Eterna FCVD | PECVD (Chemical Vapor Deposition) | 300 mm | 5 | as is where is | ||
108363 | Applied Materials | Producer GT PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108365 | Applied Materials | Producer SE APF | PECVD (Chemical Vapor Deposition) | 300 mm | 4 | as is where is | ||
108366 | Applied Materials | Producer SE PECVD SILANE | PECVD (Chemical Vapor Deposition) | 300 mm | 8 | as is where is | ||
108367 | Applied Materials | Producer SE PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | |
108318 | ASM | Eagle XP | PECVD (Chemical Vapor Deposition) | 300 mm | 01.12.2007 | 1 | as is where is | immediately |
108319 | ASM | Eagle XP | PECVD (Chemical Vapor Deposition) | 300 mm | 01.08.2007 | 1 | as is where is | immediately |
108379 | ASM | Eagle XP | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108380 | ASM | Eagle XP | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108384 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 3 | as is where is | ||
106641 | BMR | HIDEP | PECVD | N/A | 01.06.2006 | 1 | as is where is | |
98502 | Canon | APT-5800 | AP CVD | 200 mm | 1 | as is where is | ||
98503 | Canon | APT-5800 | AP CVD | 200 mm | 1 | as is where is | ||
98504 | Canon | APT-5800 | AP CVD | 200 mm | 1 | as is where is | ||
98505 | Canon | APT-5800 | AP CVD | 200 mm | 1 | as is where is | ||
109044 | CVD Equipment Corporation | Easy Tube 3000 | Growth Equipment | 06.01.2009 | 2 | as is where is | ||
106698 | LAM | ALTUS | CVD | 300 mm | 01.06.2009 | 1 | as is where is | |
106700 | LAM | Novellus Altus Max Concept Three | Tungsten CVD | 300 mm | 01.03.2014 | 1 | as is where is | immediately |
100919 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2001 | 1 | as is where is | |
100920 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2010 | 1 | as is where is | |
100921 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2003 | 1 | as is where is | |
106307 | Lam Research | Vector Express AHM | PECVD | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
106378 | Lam Research | C3 SPEED(3CH) | CVD cluster tool | 300 mm | 01.06.2005 | 1 | as is where is | |
106393 | Lam Research | VECTOR STRATA-3 | CVD cluster tool | 300 mm | 01.06.2022 | 1 | as is where is | |
106394 | Lam Research | VECTOR STRATA-3 | CVD cluster tool | 300 mm | 01.06.2022 | 1 | as is where is | |
106395 | Lam Research | VECTOR STRATA-3 | CVD cluster tool | 300 mm | 01.06.2017 | 1 | as is where is | |
106396 | Lam Research | VECTOR STRATA-GX | CVD cluster tool | 300 mm | 01.06.2017 | 1 | as is where is | |
106397 | Lam Research | VECTOR STRATA-GX | CVD cluster tool | 300 mm | 01.06.2016 | 1 | as is where is | |
106398 | Lam Research | VECTOR STRATA-GX | CVD cluster tool | 300 mm | 01.06.2021 | 1 | as is where is | |
108169 | LAM Research | VECTOR EXPRESS | TEOS CVD | 300 mm | 01.06.2010 | 1 | as is where is | |
108170 | LAM Research | VECTOR EXPRESS | TEOS CVD | 300 mm | 01.06.2018 | 1 | as is where is | |
108571 | LAM RESEARCH | ALTUS | CVD | 300mm | 01.06.2010 | 1 | as is where is | immediately |
108574 | LAM RESEARCH | STRATA-3 | CVD | 300mm | 01.06.2021 | 1 | as is where is | immediately |
108575 | LAM RESEARCH | STRIKER | CVD | 300mm | 01.06.2021 | 1 | as is where is | immediately |
108576 | LAM RESEARCH | STRIKER | CVD | 300mm | 01.06.2008 | 1 | as is where is | immediately |
108577 | LAM RESEARCH | Vector Express | CVD | 300mm | 01.06.2003 | 1 | as is where is | immediately |
91218 | NOVELLUS | CONCEPT 3 GAMMA 2130 | 300 mm | 1 | as is where is | |||
91219 | NOVELLUS | CONCEPT 3 GAMMA 2130 | 300 mm | 1 | as is where is | |||
91220 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2004 | 1 | as is where is | |
91221 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2006 | 1 | as is where is | |
91223 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2005 | 1 | as is where is | |
103546 | NOVELLUS | VECTOR | PECVD Nitride | 300 mm | 31.05.2005 | 1 | as is where is | |
106710 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2003 | 1 | as is where is | |
106711 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2004 | 1 | as is where is | |
106712 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | |
106713 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | |
106714 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | |
108471 | Novellus | Concept Three Altus | WCVD (Chemical Vapor Deposition) | 300 mm | 7 | as is where is | ||
108472 | Novellus | Concept Three Speed | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108473 | Novellus | Concept Three Speed MAX | HDP CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108476 | Novellus | VECTOR Express - AHM | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108477 | Novellus | VECTOR SOLA UV Cure | PECVD (Chemical Vapor Deposition) | 300 mm | 2 | as is where is | ||
99399 | Oxford | Micro-dep 300 | PE CVD system (For spares use) | 1 | as is where is | immediately | ||
109097 | Oxford | Plasmalab System 100 | PECVD TEOS with Load Lock | 200 mm | 01.05.2001 | 1 | as is where is | immediately |
91047 | PLASMATHERM | 7300 | PECVD SYSTEM | 200 mm | 31.05.1996 | 1 | as is where is | |
106953 | PLASMATHERM | LAPECVD | Large Area PECVD system, used for SiO and SiN process depositions | 150 mm | 01.06.2015 | 4 | as is where is | immediately |
91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | ||
106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is | ||
108529 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 8 | as is where is | ||
108531 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108532 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108533 | TEL Tokyo Electron | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108534 | TEL Tokyo Electron | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2012 | 1 | inquire | |
108608 | TES | CHALLENGER_ST | Plasma-Enhanced CVD system | 300 mm | 01.05.2010 | 1 | as is where is | immediately |
91249 | VARIAN | MBB | W CVD | 200 mm | 1 | as is where is |