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Pre-owned CVD Equipment , surplus CVD equipment, used CVD equipment for sale by fabsurplus.com

Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
60905 AMAT 2CH PRODUCER 01.06.2006 1 as is where is
60906 AMAT 1ch PRODUCER 1 as is where is
60908 AMAT Mirra on track 1 as is where is
60909 AMAT P-5000 DxL 4CH 1 as is where is
60911 AMAT P-5000 MxP+ Oxide 3C/H, OPTIMA 1 as is where is
60912 AMAT CENTURA-I PHASE II 1 as is where is
60913 AMAT TxZ 3C/H TECTRA 1 as is where is
60916 AMAT 2C/H MXP POLY 01.06.1995 1 as is where is
66388 AMAT Centura WxZ 3ch 1 as is where is
66389 AMAT Centura WxZ 3ch 1 as is where is
66406 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
66407 AMAT Centura 5200 eMxP+ 3 chamber 150 mm 1 as is where is immediately
66408 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
86674 AMAT Ultima + HDP CVD CHAMBER 2 as is where is
86675 AMAT Ultima PLUS HDP CVD tool 1 as is where is
3419 Applied Materials P5000 CVD System, 2 Chamber TEOS Oxide CVD 200 MM 01.01.1994 1 inquire immediately
78661 Applied Materials P5000 CVD 200 mm 01.06.2002 1 as is where is
82864 Applied Materials P5000 Multi-Process CVD 200 mm 01.06.1996 1 as is where is immediately
82865 Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1993 1 as is where is immediately
84164 Applied Materials P5000 200 mm 1 as is where is
84779 Applied Materials Centura 5200 WxZ 3 chamber WxZ deposition system 200 mm 01.06.1995 1 inquire immediately
86128 Applied Materials CENTURA W-CVD_3CH 3 chamber tungsten CVD system 200 mm 1 as is where is
86129 Applied Materials CENTURA WSI CHAMBER Wsi Chamber 300 mm 1 as is where is
86130 Applied Materials CENTURA WSI CHAMBER Wsi Chamber 300 mm 1 as is where is
86131 Applied Materials CENTURA WSI CHAMBER Wsi Chamber 300 mm 1 as is where is
86132 Applied Materials CENTURA WSI CHAMBER Wsi Chamber 300 mm 1 as is where is
86133 Applied Materials P3I(ACP/3CH) 300 mm 01.06.2010 1 as is where is
86134 Applied Materials PRODUCER_SE_2CH CVD 300 mm 01.06.2006 1 as is where is
86135 Applied Materials PRODUCER_SE_2CH CVD 300 mm 01.06.2006 1 as is where is
86136 Applied Materials PRODUCER_SE_2CH CVD 300 mm 01.06.2007 1 as is where is
86721 Applied Materials Centura Ultima X HDP CVD, 2 chamber 300 mm 01.01.2006 1 as is where is immediately
87078 Applied Materials Centura Ultima X HDP CVD, 2 chamber 300 mm 01.06.2003 1 as is where is immediately
87118 APPLIED MATERIALS Centura DXZ PLASMA CVD 150 mm 01.06.1999 1 as is where is
87119 APPLIED MATERIALS Centura HDP HDP-CVD 200 mm 01.06.1995 1 as is where is
87896 Applied Materials P5000 Mark-2 PECVD CVD 200 MM 01.06.1995 1 as is where is
87897 Applied Materials P5000 SACVD CVD 200 mm 01.06.1996 1 as is where is
87898 Applied Materials Producer GT CVD - 3 Twin chamber - HARP USG Process 300 mm 01.06.2008 1 as is where is immediately
87899 Applied Materials Centura Ultima X CVD 300 mm 1 as is where is
88171 Applied Materials Centura ACP Polygen LPCVD 300mm 1 as is where is
88172 Applied Materials Centura SiNgen Chamber LPCVD 200mm 1 as is where is
88173 Applied Materials Producer GT PECVD (Chemical Vapor Deposition) 300mm 01.06.2012 1 as is where is
88174 Applied Materials Producer SE SACVD HARP SACVD (Chemical Vapor Deposition) 300mm 01.06.2004 1 as is where is
88460 Applied Materials Centura TAO Ta2O5 CVD 200 MM 01.06.2006 1 as is where is
88461 Applied Materials Producer SE HARP-USG 300 MM 01.06.2003 1 as is where is
88462 Applied Materials Producer SE HT ACL 300 MM 01.06.2007 1 as is where is
88463 Applied Materials Producer SE ULK 300 MM 01.06.2006 1 as is where is
88831 Applied Materials Producer SE SACVD TEOS BPSG 300 mm 1 as is where is
88832 Applied Materials Producer CVD - 3 chamber standard type 200 mm 01.06.2000 1 as is where is immediately
88833 Applied Materials Producer CVD 1 as is where is
88834 Applied Materials Ultima X HDPCVD multi chamber system 300 mm 01.06.2007 1 as is where is
88835 Applied Materials Ultima X HDPCVD multi chamber system 300 mm 1 as is where is
88993 Applied Materials P5000 CVD 3 CHAMBER 200 MM 01.06.1995 1 as is where is immediately
88994 Applied Materials P5000 CVD 4 CHAMBER COPPER PROCESS 01.06.1996 1 as is where is immediately
90023 Applied Materials PRODUCER SE CVD 300 mm 01.05.2006 1 as is where is
90024 Applied Materials PRODUCER SE CVD 300 mm 01.03.2006 1 as is where is
90025 Applied Materials PRODUCER SE CVD 300 mm 01.03.2006 1 as is where is
85256 ASM Eagle 10 DARC 200 mm 01.08.1999 1 as is where is immediately
85257 ASM Eagle 10 PETEOS 200 mm 1 as is where is
87120 ASM Eagle10 PLASMA CVD 200 mm 01.06.1998 1 as is where is
88175 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300mm 01.05.2005 1 as is where is
88176 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
88464 ASM Dragon 2300 PECVD Equipment for Barrier 300 MM 01.06.2003 1 as is where is
88465 ASM Eagle12 Curing 300 MM 01.06.2010 1 as is where is
70643 Beijing Sevenstar Huachang Electronics Co. Ltd. L42500-4/ZM PECVD furnace 156 mm 01.10.2006 1 as is where is immediately
84866 Ci Science Torus 300K Plasma Processing Equipment and Tools 300 mm 01.06.2005 1 as is where is
60918 KE DJ813V CVD 1 as is where is
60919 KE DJ813V Vertical low-pressure CVD 1 as is where is
81878 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
81879 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
86058 LAM Vector CVD 200 MM 01.06.2003 1 as is where is immediately
90026 LAM VECTOR PE CVD 300 mm 01.03.2006 1 as is where is
78665 Lam Research VECTOR EXPRESS CVD 300 MM 01.06.2007 1 as is where is immediately
78666 Lam Research VECTOR_EXPRESS CVD 300 MM 01.06.2008 1 as is where is
78667 Lam Research VECTOR_EXTREME CVD 300 MM 01.06.2013 1 as is where is immediately
35783 NOVELLUS C2 ALTUS Standard type CVD W-deposition 200 mm 01.01.1997 1 as is where is immediately
50592 Novellus C2 Altus CVD 200 MM 01.06.2001 1 as is where is immediately
66390 Novellus 676 1 as is where is
66391 Novellus 676 1 as is where is
66392 Novellus 676 1 as is where is
66393 Novellus Speed C3 1 as is where is
66394 Novellus Speed C3 1 as is where is
66395 Novellus Speed C3 1 as is where is
66396 Novellus Speed C3 1 as is where is
66397 Novellus Speed C2 1 as is where is
66398 Novellus Speed C2 1 as is where is
66399 Novellus Speed C2 1 as is where is
66400 Novellus Speed C2 1 as is where is
66401 Novellus Speed C2 1 as is where is
66402 Novellus Speed C2 1 as is where is
66403 Novellus Speed C2 1 as is where is
66404 Novellus Speed C2 1 as is where is
66405 Novellus Speed C2 1 as is where is
76069 Novellus C2 Speed max CVD 300 mm 01.06.2008 1 as is where is
76070 Novellus C2 speed Standard CVD - parts machine 300 mm 1 as is where is
83599 Novellus Concept 3 Speed CVD System, 3 chamber, STI / IMD process 300 mm 01.06.2005 1 inquire immediately
83976 Novellus C2 Dual Altus CVD system for Tungsten Deposition 200 mm 01.06.2001 1 as is where is immediately
84041 Novellus Concept 2 Dual Altus (Shrink) CVD system for Tungsten Deposition 200 mm 1 inquire immediately
84541 NOVELLUS C2 SPEED CVD 200 mm 1 as is where is
84758 Novellus Concept 1 CVD- UNDOPED SILANE and SiN 200 mm 01.06.1991 1 as is where is immediately
85676 Novellus VECTOR Express PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
86418 Novellus Concept One CVD 200 mm 5 as is where is
86682 Novellus Concept 1 PE CVD Silane 200mm 01.01.1993 1 as is where is immediately
87122 NOVELLUS CONCEPT ONE-W PLASMA CVD_W 150 mm 01.06.1995 1 as is where is
87123 NOVELLUS CONCEPT TWO Speed PLASMA CVD 200 mm 01.06.2000 1 as is where is
87239 Novellus VECTOR Express PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87240 Novellus VECTOR Express PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87241 Novellus VECTOR Express PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87402 Novellus C3 Speed NExT CVD System 300 mm 01.06.2005 1 as is where is immediately
88189 Novellus Concept Three Speed NExT HDP CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88466 Novellus C2 Altus Shrink WCVD(PNL) 200 MM 01.06.1996 1 as is where is
88467 Novellus C2 Speed Shrink HDP 200 MM 01.06.2001 1 as is where is
88468 Novellus C2 Speed Shrink HDP 200 MM 01.06.1999 1 as is where is
88469 Novellus C2 Speed Shrink HDP 200 MM 01.06.2000 1 as is where is
88470 Novellus C3 Speed MAX HDP 300 MM 01.06.2006 1 as is where is
88471 Novellus C3 Speed NEXT HDP 300 MM 01.06.2004 1 as is where is
88472 Novellus C3 Speed XT ILD, IMD 300 MM 01.06.2008 1 as is where is
88473 Novellus Vector CVD 300 MM 1 as is where is
88474 Novellus Vector CVD 300 MM 1 as is where is
88475 Novellus Vector CVD 300 MM 1 as is where is
88476 Novellus Vector CVD 300 MM 1 as is where is
88477 Novellus Vector CVD 300 MM 1 as is where is
88478 Novellus Vector CVD 300 MM 01.06.2004 1 as is where is
88479 Novellus Vector Extreme CVD 300 MM 01.06.2010 1 as is where is
90027 NOVELLUS ALTUS METAL CVD 300 mm 01.08.2009 1 as is where is
87614 Optosystems Ardis 100 MW CVD Diamond up to 100 mm 01.04.2011 1 as is where is immediately
82215 Oxford Plasmalab 100 PE CVD 150 mm and 200 mm 01.04.2003 1 as is where is immediately
82234 Oxford Plasmalab 80 Plus PE CVD 150 mm and 200 mm 01.06.2000 1 as is where is immediately
87900 OXFORD Plasmalab 133 ICP CVD 200 MM 01.06.1994 1 as is where is
72031 PLASMATHERM 7300 PE(7000) (PECVD_PT#01) PECVD 200 mm 01.07.1996 1 as is where is immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
84867 Tel Tokyo Electron Trias Chemical Vapor Deposition Equipment, TiCl4 300 MM 01.06.2010 1 as is where is
84869 Tel Tokyo Electron Trias SPA chamber 300 MM 01.06.2006 1 as is where is
87124 TEL Tokyo Electron Unity-CVD PLASMA CVD_MO 200 mm 01.06.2003 1 as is where is
87242 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87243 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87244 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87822 TEL TOKYO ELECTRON Trias 2 chamber metal CVD cluster tool 300 MM 01.06.2002 1 as is where is immediately
88177 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88178 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88179 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88180 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88181 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88182 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88183 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88184 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88185 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88186 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88187 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber Only 300mm 1 as is where is
88188 TEL Tokyo Electron Trias W MOCVD 300mm 01.08.2003 1 as is where is
88480 TEL Tokyo Electron Trias CVD Ti 300 MM 1 as is where is
88481 TEL Tokyo Electron Trias CVD Ti 300 MM 1 as is where is
88482 TEL Tokyo Electron Trias CVD Ti 300 MM 01.06.2016 1 as is where is
88483 TEL Tokyo Electron Trias CVD Ti 300 MM 01.06.2016 1 as is where is
88484 TEL Tokyo Electron Trias CVD Ti 300 MM 01.06.2016 1 as is where is
88485 TEL Tokyo Electron Trias CVD TiN 300 MM 01.06.2004 1 as is where is
88486 TEL Tokyo Electron Trias Metal 300 MM 01.06.2012 1 as is where is
90028 TEL Tokyo Electron TRIAS METAL CVD 300 mm 01.05.2013 1 as is where is
90029 TEL Tokyo Electron TRIAS METAL CVD 300 mm 01.03.2003 1 as is where is
69323 Tempress Amtech TS8403 Diffusion Furnace for POCL3 with 2 tubes 75 mm to 200 mm 1 as is where is immediately
87901 TES CHALLENGER_ST Plasma-Enhanced CVD system 300 mm 01.06.2010 1 as is where is
84870 WATKINS-JOHNSON 1500 Atmospheric Pressure CVD Tools 200 mm 1 as is where is
84871 WATKINS-JOHNSON 1500 Atmospheric Pressure CVD Tools, TEOS 200 mm 01.06.2008 1 as is where is
87902 WONIK IPS TECHO300 Metal ALD / CVD system 300 mm 01.06.2005 1 as is where is
87903 WONIK IPS TECHO300 Metal ALD / CVD system 300 mm 01.06.2009 1 as is where is


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