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Pre-owned CVD Equipment , surplus CVD equipment, used CVD equipment for sale by fabsurplus.com

Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
60905 AMAT 2CH PRODUCER 01.06.2006 1 as is where is
60906 AMAT 1ch PRODUCER 1 as is where is
60908 AMAT Mirra on track 1 as is where is
60909 AMAT P-5000 DxL 4CH 1 as is where is
60911 AMAT P-5000 MxP+ Oxide 3C/H, OPTIMA 1 as is where is
60912 AMAT CENTURA-I PHASE II 1 as is where is
60913 AMAT TxZ 3C/H TECTRA 1 as is where is
60916 AMAT 2C/H MXP POLY 01.06.1995 1 as is where is
66388 AMAT Centura WxZ 3ch 1 as is where is
66389 AMAT Centura WxZ 3ch 1 as is where is
66406 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
66407 AMAT Centura 5200 eMxP+ 3 chamber 150 mm 1 as is where is immediately
66408 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
76360 AMAT 0010-01456 ESC Refurbished with 90 days warranty 2 as is where is
84328 AMAT Producer CVD3CH 1 as is where is
84329 AMAT Centura 5200 eMxP 1 as is where is
84330 AMAT Centura 5200 IPS 4ch 1 as is where is
84331 AMAT Producer CVD 3CH Cu 1 as is where is
84332 AMAT Producer CVD 3CH Cu 1 as is where is
84333 AMAT Producer CVD 3CH Cu 1 as is where is
84334 AMAT Producer CVD 3CH Cu 1 as is where is
86674 AMAT Ultima + HDP CVD CHAMBER 2 as is where is
86675 AMAT Ultima PLUS HDP CVD tool 1 as is where is
3419 Applied Materials P5000 CVD System, 2 Chamber TEOS Oxide CVD 200 MM 01.01.1994 1 inquire immediately
78650 Applied Materials Centura 5200 Rev. 4 Poly / WSiX 300 mm 01.03.2007 1 as is where is immediately
78661 Applied Materials P5000 CVD 200 mm 01.06.2002 1 as is where is
79714 Applied Materials P5000 CVD 200mm 1 as is where is
79842 Applied Materials Producer Shrink SACVD Twin 200 mm 1 as is where is immediately
80370 Applied Materials Centura 5200 HDP CVD system, with 3 Ultima chambers 200 mm 01.06.2000 1 as is where is immediately
81913 Applied Materials P5000 PECVD 1 chamber Silane Oxide Deposition 100 mm 1 as is where is immediately
82736 Applied Materials 5000PLATFORM CVD 6" 01.06.1995 1 as is where is
82738 Applied Materials P-5000CVD LTO 6 01.06.1990 1 as is where is
82739 Applied Materials P-5000CVD LTO 6 01.06.1990 1 as is where is
82740 Applied Materials P-5000CVD P-CVD 6 01.06.1988 1 as is where is
82852 Applied Materials Centura Multi-Process CVD Multi-Process CVD 200 01.01.1997 1 as is where is immediately
82853 Applied Materials Centura Ultima HDP CVD (Chemical Vapor Deposition) 200 01.01.2001 1 as is where is immediately
82860 Applied Materials Centura WxZ Metal CVD (Chemical Vapor Deposition) 200 01.06.1998 2 as is where is immediately
82864 Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1996 1 as is where is immediately
82865 Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1993 1 as is where is immediately
82866 Applied Materials P5000 PECVD PECVD (Chemical Vapor Deposition) 150 2 as is where is immediately
82867 Applied Materials P5000 TEOS Multi-Process CVD 200 01.06.1994 2 as is where is immediately
84164 Applied Materials P5000 200 mm 1 as is where is
84165 Applied Materials P5000 200 mm 1 as is where is
84505 Applied Materials Centura 5200 GigaFill SACVD 200 mm 01.01.2000 1 as is where is immediately
84630 Applied Materials P5000 CVD 1 as is where is
84631 Applied Materials P5000 CVD 1 as is where is
84632 Applied Materials P5000 CVD 1 as is where is
84779 Applied Materials Centura 5200 WxZ 3 chamber WxZ deposition system 200 mm 01.06.1995 1 inquire immediately
84859 Applied Materials Centura HDPCVD CVD 200 mm 1 as is where is
84861 Applied Materials P5000 CVD TEOS 200 mm 1 as is where is
84862 Applied Materials P5000 PECVD passivation 200 mm 01.06.1996 1 as is where is
84863 Applied Materials P5000 - Mark II CVD TEOS 200 mm 1 as is where is
84864 Applied Materials P5000 - Mark II teos deposition 3 chamber 200 MM 01.06.2000 1 as is where is
84865 Applied Materials PRODUCER GT Chemical Vapor Deposition (CVD) Cluster tool 300 MM 01.06.2013 1 as is where is immediately
85229 Applied Materials Centura 4.0 HT Polycide 300 mm 01.06.2005 1 as is where is
85230 Applied Materials Centura 4.0 HT Polycide 300 mm 01.06.2005 1 as is where is
85231 Applied Materials Centura 4.0 HT Polycide 300 mm 01.06.2007 1 as is where is
85232 Applied Materials Centura AP Frame TM Lid 300 mm 1 as is where is
85233 Applied Materials Centura TAO Ta2O5 CVD 200 mm 01.06.2006 1 as is where is
85234 Applied Materials Centura Ultima CVD 200 mm 1 as is where is
85235 Applied Materials Centura Ultima HDP HDP CVD 200 mm 1 as is where is
85236 Applied Materials Centura Ultima HDP HDP CVD 200 mm 1 as is where is
85237 Applied Materials Centura Ultima HDP HDP CVD 200 mm 01.06.2001 1 as is where is
85238 Applied Materials Centura Ultima Plus HDP CVD 200 mm 01.06.2000 1 as is where is
85239 Applied Materials Centura Ultima TE HDP 150 mm 01.06.1998 1 as is where is
85240 Applied Materials Producer GT FCVD Ch x1 300 mm 01.06.2011 1 as is where is
85241 Applied Materials Producer GT FCVD Ch x1 300 mm 01.06.2011 1 as is where is
85242 Applied Materials Producer GT FCVD Ch x2, SA CVD x1 & O3 Rack 300 mm 01.06.2015 1 as is where is
85243 Applied Materials Producer GT SA CVD x1 & O3 Rack 300 mm 01.06.2011 1 as is where is
85244 Applied Materials Producer SE HARPUSG 300 mm 01.06.2002 1 as is where is
85245 Applied Materials Producer SE HARPUSG 300 mm 01.06.2003 1 as is where is
85246 Applied Materials Producer SE HT ACL 300 mm 01.06.2006 1 as is where is
85247 Applied Materials Producer SE HT ACL 300 mm 01.06.2007 1 as is where is
85248 Applied Materials Producer SE HT SiN 300 mm 01.06.2005 1 as is where is
85249 Applied Materials Producer SE PESiON 300 mm 01.06.2004 1 as is where is
85250 Applied Materials Producer SE PESiON 300 mm 01.06.2006 1 as is where is
85251 Applied Materials Producer SE SA HARP 300 mm 01.06.2002 1 as is where is
85252 Applied Materials Producer SE ULK 300 mm 01.06.2006 1 as is where is
85253 Applied Materials Producer SE USG/BPSG 300 mm 01.06.2004 1 as is where is
85254 Applied Materials Producer SE UV Cure 300 mm 01.06.2010 1 as is where is
86128 Applied Materials CENTURA W-CVD_3CH 3 chamber tungsten CVD system 200 mm 1 as is where is
86129 Applied Materials CENTURA WSI CHAMBER Wsi Chamber 300 mm 1 as is where is
86130 Applied Materials CENTURA WSI CHAMBER Wsi Chamber 300 mm 1 as is where is
86131 Applied Materials CENTURA WSI CHAMBER Wsi Chamber 300 mm 1 as is where is
86132 Applied Materials CENTURA WSI CHAMBER Wsi Chamber 300 mm 1 as is where is
86133 Applied Materials P3I(ACP/3CH) 300 mm 01.06.2010 1 as is where is
86134 Applied Materials PRODUCER_SE_2CH CVD 300 mm 01.06.2006 1 as is where is
86135 Applied Materials PRODUCER_SE_2CH CVD 300 mm 01.06.2006 1 as is where is
86136 Applied Materials PRODUCER_SE_2CH CVD 300 mm 01.06.2007 1 as is where is
86488 Applied Materials PRODUCER SE CVD 300 mm 01.03.2010 1 as is where is immediately
86687 Applied Materials Producer GT CVD High-Capacity Cluster Tool 300 MM 01.02.2008 1 as is where is immediately
86721 Applied Materials Centura Ultima X HDP CVD, 2 chamber 300 mm 01.01.2006 1 as is where is immediately
87044 Applied Materials Centura 5200 Ultima Plus HDP CVD system, 3 chamber USG 200 mm 01.01.2017 1 as is where is immediately
87045 Applied Materials Centura 5200 Ultima Plus HDP CVD system, 3 chamber PA FSG 200 mm 01.01.2017 1 as is where is immediately
87046 Applied Materials Centura 5200 Ultima Plus HDP CVD system, 3 chamber Ultima Plus PA PSG 200 mm 01.03.2017 1 as is where is immediately
87078 Applied Materials Centura Ultima X HDP CVD, 2 chamber 300 mm 01.06.2003 1 as is where is immediately
87118 APPLIED MATERIALS Centura DXZ PLASMA CVD 150 mm 01.06.1999 1 as is where is
87119 APPLIED MATERIALS Centura HDP HDP-CVD 200 mm 01.06.1995 1 as is where is
87236 Applied Materials Producer SE APF PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87237 Applied Materials Producer SE APF PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87238 Applied Materials Producer SE SACVD SACVD (Chemical Vapor Deposition) 300 mm 1 as is where is
78421 ASM Eagle XP ALD Chemical Vapor Deposition Equipment - 2 ch HT SIO / HT SIN 300 mm 01.03.2010 1 as is where is immediately
84633 ASM Eagle-10 DARC 1 as is where is
84634 ASM Eagle-10 PETEOS 1 as is where is
85255 ASM Dragon 2300 PECVD Equipment for Barrier 300 mm 01.06.2003 1 as is where is
85256 ASM Eagle 10 DARC 200 mm 01.08.1999 1 as is where is immediately
85257 ASM Eagle 10 PETEOS 200 mm 1 as is where is
85258 ASM Eagle 12 Curing 300 mm 01.06.2010 1 as is where is
85259 ASM PXJ200 PECVD 150 mm 01.06.1989 1 as is where is
87120 ASM Eagle10 PLASMA CVD 200 mm 01.06.1998 1 as is where is
87121 ASM Eagle10 TRIDENT PLASMA CVD 150 mm 01.06.2007 1 as is where is
82875 ASM Pacific AD896A Bonding Equipment 150 18 as is where is immediately
82878 ASYS Group LSE 03 unloader 150 01.06.1996 3 as is where is immediately
77342 Aviza Celsior ALD (Atomic Layer Deposition) 300 1 as is where is
77344 Aviza Pantheon ALD (Atomic Layer Deposition) 300 1 as is where is
70643 Beijing Sevenstar Huachang Electronics Co. Ltd. L42500-4/ZM PECVD furnace 156 mm 01.10.2006 1 as is where is immediately
84866 Ci Science Torus 300K Plasma Processing Equipment and Tools 300 mm 01.06.2005 1 as is where is
82887 clone Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1996 1 as is where is immediately
77345 JEL (Jusung Engineering) Cyclone Plus Metal CVD (Chemical Vapor Deposition) 300 1 as is where is
77347 JEL (Jusung Engineering) Cyclone Plus Metal CVD (Chemical Vapor Deposition) 300 1 as is where is
60918 KE DJ813V CVD 1 as is where is
60919 KE DJ813V Vertical low-pressure CVD 1 as is where is
84335 KLA 8100 2 as is where is
84336 KLA 8100 2 as is where is
84337 KLA AIT 2 as is where is
81878 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
81879 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
86058 LAM Vector CVD 200 MM 01.06.2003 1 as is where is immediately
86511 LAM 2300 EXELAN FLEX Dielectric etch 3 CHAMBER 300 mm 01.03.2006 1 as is where is immediately
78665 Lam Research VECTOR EXPRESS CVD 300 MM 01.06.2007 1 as is where is immediately
78666 Lam Research VECTOR_EXPRESS CVD 300 MM 01.06.2008 1 as is where is
78667 Lam Research VECTOR_EXTREME CVD 300 MM 01.06.2013 1 as is where is immediately
35783 NOVELLUS C2 ALTUS Standard type CVD W-deposition 200 mm 01.01.1997 1 as is where is immediately
50592 Novellus C2 Altus CVD 200 MM 01.06.2001 1 as is where is immediately
62725 Novellus C1 SiO2 / Nitride 01.01.1994 1 as is where is immediately
66390 Novellus 676 1 as is where is
66391 Novellus 676 1 as is where is
66392 Novellus 676 1 as is where is
66393 Novellus Speed C3 1 as is where is
66394 Novellus Speed C3 1 as is where is
66395 Novellus Speed C3 1 as is where is
66396 Novellus Speed C3 1 as is where is
66397 Novellus Speed C2 1 as is where is
66398 Novellus Speed C2 1 as is where is
66399 Novellus Speed C2 1 as is where is
66400 Novellus Speed C2 1 as is where is
66401 Novellus Speed C2 1 as is where is
66402 Novellus Speed C2 1 as is where is
66403 Novellus Speed C2 1 as is where is
66404 Novellus Speed C2 1 as is where is
66405 Novellus Speed C2 1 as is where is
76066 Novellus C2 SPEED HDP CVD (Chemical Vapor Deposition) 200 01.01.2001 1 as is where is
76069 Novellus C2 Speed max CVD 300 mm 01.06.2008 1 as is where is
76070 Novellus C2 speed Standard CVD - parts machine 300 mm 1 as is where is
76072 Novellus C2 Triple SPEED HDP CVD (Chemical Vapor Deposition) 200 01.01.2004 1 as is where is
76076 Novellus C3 Altus Tungsten CV Deposition 300 mm 1 as is where is
83599 Novellus Concept 3 Speed CVD System, 3 chamber, STI / IMD process 300 mm 01.06.2005 1 inquire immediately
83976 Novellus C2 Dual Altus CVD system for Tungsten Deposition 200 mm 01.06.2001 1 as is where is immediately
84041 Novellus Concept 2 Dual Altus (Shrink) CVD system for Tungsten Deposition 200 mm 1 inquire immediately
84338 Novellus Innova PVD 2 as is where is
84541 NOVELLUS C2 SPEED CVD 200 mm 1 as is where is
84758 Novellus Concept 1 CVD- UNDOPED SILANE and SiN 200 mm 01.06.1991 1 as is where is immediately
85260 Novellus C2 Dual Altus STD WCVD 200 mm 01.06.1994 1 as is where is
85261 Novellus C2 Dual Speed Shrink HDP 200 mm 01.06.2000 1 as is where is
85262 Novellus C2 Dual Speed Shrink HDP 200 mm 01.06.1999 1 as is where is
85263 Novellus C2 Single Altus Shrink WCVD(PNL) 200 mm 01.06.1996 1 as is where is
85264 Novellus C2 Triple Speed Shrink HDP 200 mm 1 as is where is
85265 Novellus C2 Triple Speed Shrink HDP 200 mm 1 as is where is
85266 Novellus C2 Triple Speed Shrink HDP 200 mm 01.06.2001 1 as is where is
85267 Novellus C2 Triple Speed Shrink HDP 200 mm 01.06.2005 1 as is where is
85268 Novellus C3 Speed MAX CVD 300 mm 01.06.2006 1 as is where is
85269 Novellus C3 Speed NEXT HDP 300 mm 01.06.2004 1 as is where is
85270 Novellus C3 Speed XT ILD,IMD 300 mm 01.06.2008 1 as is where is
85271 Novellus C3 Vector CVD 300 mm 1 as is where is
85272 Novellus C3 Vector CVD 300 mm 1 as is where is
85273 Novellus C3 Vector CVD 300 mm 1 as is where is
85274 Novellus C3 Vector CVD 300 mm 1 as is where is
85275 Novellus C3 Vector CVD 300 mm 1 as is where is
85276 Novellus C3 Vector CVD 300 mm 01.06.2004 1 as is where is
85277 Novellus C3 Vector Extreme CVD 300 mm 01.06.2010 1 as is where is
85676 Novellus VECTOR Express PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
86418 Novellus Concept One CVD 200 mm 5 as is where is
86682 Novellus Concept 1 PE CVD Silane 200mm 01.01.1993 1 as is where is immediately
87122 NOVELLUS CONCEPT ONE-W PLASMA CVD_W 150 mm 01.06.1995 1 as is where is
87123 NOVELLUS CONCEPT TWO Speed PLASMA CVD 200 mm 01.06.2000 1 as is where is
87239 Novellus VECTOR Express PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87240 Novellus VECTOR Express PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87241 Novellus VECTOR Express PECVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87402 Novellus C3 Speed NExT CVD System 300 mm 01.06.2005 1 as is where is immediately
82215 Oxford Plasmalab 100 PE CVD 150 mm and 200 mm 01.04.2003 1 as is where is immediately
82234 Oxford Plasmalab 80 Plus PE CVD 150 mm and 200 mm 01.04.2003 1 as is where is immediately
72031 PLASMATHERM 7300 PE(7000) (PECVD_PT#01) PECVD 200 mm 01.07.1996 1 as is where is immediately
77348 TEL Trias Metal CVD (Chemical Vapor Deposition) 300 1 as is where is
82917 TEL Unity II 85 DRM Oxide Etch System 200 01.06.2006 1 as is where is immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
27653 TEL Tokyo Electron TRIAS Trias Ti / TiN ALD system for MOCVD 300 mm 01.02.2008 1 as is where is immediately
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
84635 TEL Tokyo Electron MB2 WSI CVD 1 as is where is
84867 Tel Tokyo Electron Trias Chemical Vapor Deposition Equipment, TiCl4 300 MM 01.06.2010 1 as is where is
84868 Tel Tokyo Electron Trias Modules, TEL, Trias, UVRF / High-K CVD / SPA-N / LPA 300 MM 01.06.2008 1 as is where is
84869 Tel Tokyo Electron Trias SPA chamber 300 MM 01.06.2006 1 as is where is
85278 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
85279 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
85280 TEL Tokyo Electron Trias CVD Ti 300 mm 01.06.2016 1 as is where is
85281 TEL Tokyo Electron Trias CVD Ti 300 mm 1 as is where is
85282 TEL Tokyo Electron Trias CVD Ti 300 mm 1 as is where is
85283 TEL Tokyo Electron Trias CVD TiN 300 mm 01.06.2004 1 as is where is
85284 TEL Tokyo Electron Trias METAL 300 mm 01.06.2012 1 as is where is
85698 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 1 as is where is
87124 TEL Tokyo Electron Unity-CVD PLASMA CVD_MO 200 mm 01.06.2003 1 as is where is
87242 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87243 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
87244 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
69323 Tempress Amtech TS8403 Diffusion Furnace for POCL3 with 2 tubes 75 mm to 200 mm 1 as is where is immediately
84339 Teradyne J972 1 as is where is
86524 TES CHALLENGER ST PE CVD 300 mm 01.02.2010 1 as is where is immediately
76123 Tokyo Electron Ltd Trias CVD 200 MM 1 as is where is
84870 WATKINS-JOHNSON 1500 Atmospheric Pressure CVD Tools 200 mm 1 as is where is
84871 WATKINS-JOHNSON 1500 Atmospheric Pressure CVD Tools, TEOS 200 mm 01.06.2008 1 as is where is


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