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Pre-owned CVD Equipment , surplus CVD equipment, used CVD equipment for sale by fabsurplus.com

Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
60905 AMAT 2CH PRODUCER 01.06.2006 1 as is where is
60906 AMAT 1ch PRODUCER 1 as is where is
60908 AMAT Mirra on track 1 as is where is
60909 AMAT P-5000 DxL 4CH 1 as is where is
60911 AMAT P-5000 MxP+ Oxide 3C/H, OPTIMA 1 as is where is
60912 AMAT CENTURA-I PHASE II 1 as is where is
60913 AMAT TxZ 3C/H TECTRA 1 as is where is
60916 AMAT 2C/H MXP POLY 01.06.1995 1 as is where is
66388 AMAT Centura WxZ 3ch 1 as is where is
66389 AMAT Centura WxZ 3ch 1 as is where is
66406 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
66407 AMAT Centura 5200 eMxP+ 3 chamber 150 mm 1 as is where is immediately
66408 AMAT Centura 5200 eMxP+ 3ch 1 as is where is
86674 AMAT Ultima + HDP CVD CHAMBER 2 as is where is
86675 AMAT Ultima PLUS HDP CVD tool 1 as is where is
3419 Applied Materials P5000 CVD System, 2 Chamber TEOS Oxide CVD 200 MM 01.01.1994 1 inquire immediately
78661 Applied Materials P5000 CVD 200 mm 01.06.2002 1 as is where is
82864 Applied Materials P5000 Multi-Process CVD 200 mm 01.06.1996 1 as is where is immediately
82865 Applied Materials P5000 Multi-Process CVD Multi-Process CVD 200 01.06.1993 1 as is where is immediately
84164 Applied Materials P5000 200 mm 1 as is where is
84779 Applied Materials Centura 5200 WxZ 3 chamber WxZ deposition system 200 mm 01.06.1995 1 inquire immediately
86128 Applied Materials CENTURA W-CVD_3CH 3 chamber tungsten CVD system 200 mm 1 as is where is
86133 Applied Materials P3I(ACP/3CH) 300 mm 01.06.2010 1 as is where is
86136 Applied Materials PRODUCER_SE_2CH CVD 300 mm 01.06.2007 1 as is where is
86721 Applied Materials Centura Ultima X HDP CVD, 2 chamber 300 mm 01.01.2006 1 as is where is immediately
87078 Applied Materials Centura Ultima X HDP CVD, 2 chamber 300 mm 01.06.2003 1 as is where is immediately
87118 APPLIED MATERIALS Centura DXZ PLASMA CVD 150 mm 01.06.1999 1 as is where is
87119 APPLIED MATERIALS Centura HDP HDP-CVD 200 mm 01.06.1995 1 as is where is
87897 Applied Materials P5000 SACVD CVD 200 mm 01.06.1996 1 as is where is
87898 Applied Materials Producer GT CVD - 3 Twin chamber - HARP USG Process 300 mm 01.06.2008 1 as is where is immediately
87899 Applied Materials Centura Ultima X CVD 300 mm 1 as is where is
88172 Applied Materials Centura SiNgen Chamber LPCVD 200mm 1 as is where is
88460 Applied Materials Centura TAO Ta2O5 CVD 200 MM 01.06.2006 1 as is where is
88461 Applied Materials Producer SE HARP-USG 300 MM 01.06.2003 1 as is where is
88462 Applied Materials Producer SE HT ACL 300 MM 01.06.2007 1 as is where is
88463 Applied Materials Producer SE ULK 300 MM 01.06.2006 1 as is where is
88831 Applied Materials Producer SE SACVD TEOS BPSG 300 mm 1 as is where is
88832 Applied Materials Producer CVD - 3 chamber standard type 200 mm 01.06.2000 1 as is where is immediately
88833 Applied Materials Producer CVD 1 as is where is
88834 Applied Materials Ultima X HDPCVD multi chamber system 300 mm 01.06.2007 1 as is where is
88835 Applied Materials Ultima X HDPCVD multi chamber system 300 mm 1 as is where is
88993 Applied Materials P5000 CVD 3 CHAMBER 200 MM 01.06.1995 1 as is where is immediately
88994 Applied Materials P5000 CVD 4 CHAMBER COPPER PROCESS 01.06.1996 1 as is where is immediately
90023 Applied Materials PRODUCER SE CVD 300 mm 01.05.2006 1 as is where is
90024 Applied Materials PRODUCER SE CVD 300 mm 01.03.2006 1 as is where is
90025 Applied Materials PRODUCER SE CVD 300 mm 01.03.2006 1 as is where is
90350 Applied Materials Centura WxZ CVD system, missing major parts 200 mm 01.06.2008 1 as is where is immediately
90375 Applied Materials Centura 5200 Ultima HDP CVD system, 3 chamber 200 mm 01.06.1998 1 inquire 1 month
90489 Applied Materials Producer SE SACVD SACVD (Chemical Vapor Deposition) 300 mm 01.06.2005 1 as is where is
90490 Applied Materials Producer SE SACVD SACVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
90491 Applied Materials Producer SE SACVD SACVD (Chemical Vapor Deposition) 300 mm 01.06.2006 1 as is where is
90767 Applied Materials Centura AP Ultima X HDP CVD (Chemical Vapor Deposition) 300mm 01.06.2005 1 as is where is
90768 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
90769 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 1 as is where is
90770 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 1 as is where is
90771 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
90772 Applied Materials Producer GT Eterna FCVD PECVD (Chemical Vapor Deposition) 300mm 01.06.2015 1 as is where is
90936 Applied Materials Centura DLH SACVD BPSG 200 mm 01.06.1997 1 as is where is
90937 Applied Materials Centura Ultima+ HDP CVD 200 mm 01.06.2001 1 as is where is
90938 Applied Materials Centura Ultima+ HDP CVD 200 mm 01.06.2000 1 as is where is
90939 Applied Materials Centura UltimaX HDP CVD 300 mm 01.06.2005 1 as is where is
90940 Applied Materials Producer GT Chamber Low K 300 MM 01.06.2017 1 as is where is
85256 ASM Eagle 10 DARC 200 mm 01.08.1999 1 as is where is immediately
85257 ASM Eagle 10 PETEOS 200 mm 1 as is where is
87120 ASM Eagle10 PLASMA CVD 200 mm 01.06.1998 1 as is where is
88464 ASM Dragon 2300 PECVD Equipment for Barrier 300 MM 01.06.2003 1 as is where is
88465 ASM Eagle12 Curing 300 MM 01.06.2010 1 as is where is
90502 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 01.03.2002 1 as is where is
90773 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300mm 01.07.2004 1 as is where is
90774 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300mm 01.05.2003 1 as is where is
70643 Beijing Sevenstar Huachang Electronics Co. Ltd. L42500-4/ZM PECVD furnace 156 mm 01.10.2006 1 as is where is immediately
84866 Ci Science Torus 300K Plasma Processing Equipment and Tools 300 mm 01.06.2005 1 as is where is
60918 KE DJ813V CVD 1 as is where is
60919 KE DJ813V Vertical low-pressure CVD 1 as is where is
81878 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
81879 Kurt J. Lesker Nano 36 Thermal Evaporator 1 as is where is immediately
90026 LAM VECTOR PE CVD 300 mm 01.03.2006 1 as is where is
78665 Lam Research VECTOR EXPRESS CVD 300 MM 01.06.2007 1 as is where is immediately
78666 Lam Research VECTOR_EXPRESS CVD 300 MM 01.06.2008 1 as is where is
78667 Lam Research VECTOR_EXTREME CVD 300 MM 01.06.2013 1 as is where is immediately
91024 LAM Research Vector Express PECVD Deposition system 300mm 01.06.2003 1 as is where is
91025 LAM Research Vector Express PECVD Deposition system 300mm 01.06.2010 1 as is where is
91026 LAM Research Vector Express PECVD Deposition system 300mm 1 as is where is
50592 Novellus C2 Altus CVD 200 MM 01.06.2001 1 as is where is immediately
66390 Novellus 676 1 as is where is
66391 Novellus 676 1 as is where is
66392 Novellus 676 1 as is where is
66393 Novellus Speed C3 1 as is where is
66394 Novellus Speed C3 1 as is where is
66395 Novellus Speed C3 1 as is where is
66396 Novellus Speed C3 1 as is where is
66397 Novellus Speed C2 1 as is where is
66398 Novellus Speed C2 1 as is where is
66399 Novellus Speed C2 1 as is where is
66400 Novellus Speed C2 CVD TRIPLE CHAMBER 200 mm 01.06.2000 1 as is where is immediately
66401 Novellus Speed C2 1 as is where is
66402 Novellus Speed C2 1 as is where is
66403 Novellus Speed C2 1 as is where is
66404 Novellus Speed C2 1 as is where is
66405 Novellus Speed C2 1 as is where is
83599 Novellus Concept 3 Speed CVD System, 3 chamber, STI / IMD process 300 mm 01.06.2005 1 inquire immediately
83976 Novellus C2 Dual Altus CVD system for Tungsten Deposition 200 mm 01.06.2001 1 as is where is immediately
84041 Novellus Concept 2 Dual Altus (Shrink) CVD system for Tungsten Deposition 200 mm 1 inquire immediately
84758 Novellus Concept 1 CVD- UNDOPED SILANE and SiN 200 mm 01.06.1991 1 as is where is immediately
86418 Novellus Concept One CVD 200 mm 5 as is where is
86682 Novellus Concept 1 PE CVD Silane 200mm 01.01.1993 1 as is where is immediately
87122 NOVELLUS CONCEPT ONE-W PLASMA CVD_W 150 mm 01.06.1995 1 as is where is
87123 NOVELLUS CONCEPT TWO Speed PLASMA CVD 200 mm 01.06.2000 1 as is where is
87402 Novellus C3 Speed NExT CVD System 300 mm 01.06.2005 1 as is where is immediately
88189 Novellus Concept Three Speed NExT HDP CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88467 Novellus C2 Speed Shrink HDP 200 MM 01.06.2001 1 as is where is
88468 Novellus C2 Speed Shrink HDP 200 MM 01.06.1999 1 as is where is
88469 Novellus C2 Speed Shrink HDP 200 MM 01.06.2000 1 as is where is
88470 Novellus C3 Speed MAX HDP 300 MM 01.06.2006 1 as is where is
88471 Novellus C3 Speed NEXT HDP 300 MM 01.06.2004 1 as is where is
88472 Novellus C3 Speed XT ILD, IMD 300 MM 01.06.2008 1 as is where is
88479 Novellus Vector Extreme CVD 300 MM 01.06.2010 1 as is where is
90027 NOVELLUS ALTUS METAL CVD 300 mm 01.08.2009 1 as is where is
90344 Novellus Speed MAX HDP CVD system, 2 chamber 300 mm 1 as is where is immediately
90376 Novellus Speed C2 CVD TRIPLE CHAMBER 200 mm 01.06.2003 1 as is where is immediately
90378 Novellus Concept 2 Speed HDP CVD system, 3 chamber 200 mm 1 as is where is immediately
90492 Novellus VECTOR PECVD (Chemical Vapor Deposition) 300 mm 01.06.2006 1 as is where is
90782 Novellus Concept Three Speed HDP CVD (Chemical Vapor Deposition) 300mm 01.06.2002 1 as is where is immediately
90941 Novellus C2 Altus WCVD 200 mm 01.06.1994 1 as is where is
90942 Novellus Vector PESiN/PETEOS 300 mm 01.06.2007 1 as is where is
91030 Novellus Concept 2 Dual Speed HDP CVD system, 2 chamber 200 mm 1 inquire immediately
87614 Optosystems Ardis 100 MW CVD Diamond up to 100 mm 01.04.2011 1 as is where is immediately
82215 Oxford Plasmalab 100 PE CVD 150 mm and 200 mm 01.04.2003 1 as is where is immediately
82234 Oxford Plasmalab 80 Plus PE CVD 150 mm and 200 mm 01.06.2000 1 as is where is immediately
90668 Plasmatherm 790 Dry Etcher / PECVD 200 mm 01.06.1997 1 as is where is immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
84867 Tel Tokyo Electron Trias Chemical Vapor Deposition Equipment, TiCl4 300 MM 01.06.2010 1 as is where is
84869 Tel Tokyo Electron Trias SPA chamber 300 MM 01.06.2006 1 as is where is
87124 TEL Tokyo Electron Unity-CVD PLASMA CVD_MO 200 mm 01.06.2003 1 as is where is
87822 TEL TOKYO ELECTRON Trias 2 chamber metal CVD cluster tool 300 MM 01.06.2002 1 as is where is immediately
88177 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88178 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
88485 TEL Tokyo Electron Trias CVD TiN 300 MM 01.06.2004 1 as is where is
88486 TEL Tokyo Electron Trias Metal 300 MM 01.06.2012 1 as is where is
90028 TEL Tokyo Electron TRIAS METAL CVD 300 mm 01.05.2013 1 as is where is
90029 TEL Tokyo Electron TRIAS METAL CVD 300 mm 01.03.2003 1 as is where is
90493 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
90494 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.11.2005 1 as is where is
90495 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
90496 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
90497 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
90498 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 01.02.2009 1 as is where is
90499 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 01.03.2002 1 as is where is
90500 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.09.2006 1 as is where is
90501 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.10.2007 1 as is where is
90775 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.09.2007 1 as is where is
90943 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
90944 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
69323 Tempress Amtech TS8403 Diffusion Furnace for POCL3 with 2 tubes 75 mm to 200 mm 1 as is where is immediately
87901 TES CHALLENGER_ST Plasma-Enhanced CVD system 300 mm 01.06.2010 1 as is where is
84870 WATKINS-JOHNSON 1500 Atmospheric Pressure CVD Tools 200 mm 1 as is where is
84871 WATKINS-JOHNSON 1500 Atmospheric Pressure CVD Tools, TEOS 200 mm 01.06.2008 1 as is where is
87902 WONIK IPS TECHO300 Metal ALD / CVD system 300 mm 01.06.2005 1 as is where is
87903 WONIK IPS TECHO300 Metal ALD / CVD system 300 mm 01.06.2009 1 as is where is


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