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Pre-owned CVD Equipment , surplus CVD equipment, used CVD equipment for sale by fabsurplus.com

Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
91158 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 31.05.2000 1 inquire
91159 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 31.05.2001 1 inquire
91160 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
91162 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 1 as is where is
91168 Applied Materials Centura WCVD WSIX(OPTIMA) 200 mm 31.05.2000 1 inquire
91182 Applied Materials P5000 CVD Delta Teos 150 mm 31.05.1993 1 as is where is
91183 Applied Materials P5000 CVD TEOS, DxL 200 mm 1 as is where is
91185 Applied Materials P5000 CVD DxL 150 mm 31.05.1995 1 as is where is
91189 Applied Materials P5000 CVD DxL 200 mm 1 as is where is
91190 Applied Materials P5000 CVD DxL 200 mm 1 as is where is
91192 Applied Materials P5000 Mark-II CVD TEOS 200 mm 1 as is where is
91193 Applied Materials P5000 Mark-II CVD TEOS 150 mm 1 as is where is
91194 Applied Materials P5000 Mark-II CVD DxL 200 mm 1 as is where is
91195 Applied Materials P5000 Mark-II CVD TEOS 200 mm 1 as is where is
91196 Applied Materials P5000 Mark-II CVD+Etch Sputter 200 mm 1 as is where is
91199 Applied Materials P5000 Mark-II CVD+PVD TEOS 2Ch, SPUTTER 2Ch 200 mm 01.05.1997 1 as is where is
91204 Applied Materials P5000 WCVD WxL 200 mm 1 as is where is
91205 Applied Materials P5000 WCVD WxL 200 mm 1 as is where is
91208 Applied Materials Producer GT Chamber (A) SICONI Chamber only 300 mm 1 as is where is
91209 Applied Materials Producer GT Chamber (B) SICONI Chamber only 300 mm 1 as is where is
93051 Applied Materials P5000 WXL 150 mm 31.05.1994 1 as is where is
93053 Applied Materials PRODUCER GT LLTO 300 mm 31.05.2014 1 as is where is
94439 Applied Materials Centura WCVD WxZ Optima 200 mm 1 as is where is
103508 Applied Materials PRODUCER GT Ht ACL 3ch / Server OS Type 300 mm 31.05.2014 1 as is where is
103509 Applied Materials PRODUCER GT BD2_CU 300 mm 31.05.2002 1 as is where is
103510 Applied Materials PRODUCER SE CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type 300 mm 31.05.2003 1 as is where is
103511 Applied Materials PRODUCER SE Ht_SiN 2ch / Server OS Type 300 mm 1 as is where is
106575 Applied Materials Centura AP Ultima Chamber HDPCVD Chamber only 300 mm 1 as is where is
106582 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2001 1 as is where is
106584 Applied Materials ENDURA 2 (Gray Rack) 3CH (WxZ) 300 mm 01.06.2007 1 as is where is
106621 Applied Materials P5000 Delta Teos 3ch, Sputter 1ch 150 mm 01.06.1996 1 as is where is
106622 Applied Materials P5000 Delta Teos 3ch, Sputter 1ch 200 mm 01.06.1998 1 as is where is
106623 Applied Materials P5000 DxL 2ch 200 mm 01.06.1996 1 as is where is
106631 Applied Materials Producer GT Chamber SIH4 300 mm 1 as is where is
106633 Applied Materials PRODUCER SE CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type 300 mm 01.06.2004 1 as is where is immediately
106634 Applied Materials PRODUCER SE Ht_SiN 2ch / Server OS Type 300 mm 01.06.2006 1 as is where is
106635 Applied Materials PRODUCER SE SILANE 2ch / Server OS Type 300 mm 01.06.2011 1 as is where is
106636 Applied Materials PRODUCER SE Teos 2ch / Server OS Type 300 mm 01.06.2006 1 as is where is
108023 Applied Materials P5000 CVD 200 mm 01.11.1990 1 as is where is
108133 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2000 1 as is where is
108143 Applied Materials P5000 Delta Dlh 3chCVD 150 mm 1 as is where is
108145 Applied Materials P5000 Teos dlh 3ch CVD 150 mm 1 as is where is
108147 Applied Materials PRODUCER SE Ht_SiN 2ch / Server OS Type 300 mm 01.06.2006 1 as is where is
108148 Applied Materials Producer SE Chamber LLTO Chamber only 300 mm 01.06.2014 1 as is where is
108149 Applied Materials PRODUCER SE CHAMBER PECVD Silane Chamber Only 300 mm 1 as is where is
108150 Applied Materials PRODUCER SE CHAMBER PECVD TEOS Chamber Only 300 mm 1 as is where is immediately
108701 Applied Materials Centura 5200 High K CVD Process Chamber CVD Process Chamber 200 mm 1 as is where is immediately
109134 Applied Materials Centura 5200 Ti/TiN MCVD Metal CVD (Chemical Vapor Deposition) 200mm 1 as is where is
109135 Applied Materials Centura 5200 Ti/TiN MCVD Metal CVD (Chemical Vapor Deposition) 200mm 1 as is where is
109582 Applied Materials P5000 CVD SiN Process with 2 x CVD chambers 150 MM 01.06.1989 1 as is where is immediately
109583 Applied Materials P5000 CVD TEOS Process with 2 x CVD chambers 150 MM 01.06.1989 1 as is where is immediately
110716 Applied Materials P5000 Mark 2 2 Chambers TEOS PECVD and 2 Chambers Dry Etch 150 MM 01.06.2000 1 as is where is immediately
110717 Applied Materials P5000 3 Chambers PECVD TEOS 150 MM 01.06.1996 1 as is where is immediately
111631 Applied Materials Centura AP iSprint Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111632 Applied Materials Centura Ultima Plus HDP CVD (Chemical Vapor Deposition) 200mm 1 as is where is
111637 Applied Materials P-5000 Mark II DLH PECVD TEOS PECVD (Chemical Vapor Deposition) 200mm 1 as is where is
111638 Applied Materials P-5000 Mark II DLH PECVD TEOS PECVD (Chemical Vapor Deposition) 200mm 1 as is where is
111642 Applied Materials Producer GT PECVD Silane PECVD (Chemical Vapor Deposition) 1 as is where is
111644 Applied Materials Producer SE PECVD SILANE PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
111645 Applied Materials Producer SE PECVD SILANE PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
111646 Applied Materials Producer SE PECVD TEOS PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
111647 Applied Materials Producer SE PECVD TEOS PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
111648 Applied Materials Producer SE SACVD SACVD (Chemical Vapor Deposition) 300mm 1 as is where is
111649 Applied Materials Producer SE SACVD SACVD (Chemical Vapor Deposition) 300mm 1 as is where is
112085 Applied Materials Centura AP ISPRINT CVD VIA W, with 4 chambers 300 mm 01.06.2006 1 as is where is
112112 Applied Materials P5000 CVD ILD BPTEOS with 3 process chambers 200 mm 01.06.1996 1 as is where is
112114 Applied Materials Producer S TEOS-BPSG CVD TEOS-BPSG with 3 x twin chambers 300 mm 01.06.2002 1 as is where is
113008 Applied Materials CENTURA DXZ 200 mm 1 as is where is
113017 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2000 1 as is where is
113018 Applied Materials CENTURA MCVD WxZ Optima 200 mm 01.06.2002 1 as is where is
113024 Applied Materials P5000 2 MARK II 150 mm 01.06.1990 1 as is where is
113025 Applied Materials P5000 2 MARK II Oxide 200 mm 1 as is where is
113028 Applied Materials P5000 2 Teos DLH, 2 MARK II 200 mm 01.06.1998 1 as is where is
113029 Applied Materials P5000 3 DxZ 200 mm 01.06.1998 1 as is where is
113030 Applied Materials P5000 3 Teos DLH, 1 MARK II 150 mm 01.06.1996 1 as is where is
113201 Applied Materials Producer GT APF CVD Advanced Patterning Film 300 mm 1 as is where is
113202 Applied Materials Producer GT PECVD TEOS PECVD TEOS 300 mm 1 as is where is
108384 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300 mm 3 as is where is
109117 ASM XP8 Dual Chamber PECVD system for Oxide and Nitride 300 mm 01.06.2010 2 as is where is immediately
111661 ASM Eagle XP PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
111662 ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition) 300mm 1 as is where is
112124 ASM Dragon 2300 CVD PECVD Equipment for Barrier 300 mm 01.06.2003 1 as is where is
112125 ASM Eagle10 CVD PETEOS 200 mm 01.06.1999 1 as is where is
112126 ASM Eagle12 CVD CVD 300 mm 01.06.2004 1 as is where is
106641 BMR HIDEP PECVD N/A 01.06.2006 1 as is where is
109044 CVD Equipment Corporation Easy Tube 3000 Growth Equipment 06.01.2009 2 as is where is
112178 EUGENE TECH BJM3000 CVD SINGLE HTO 300 mm 1 as is where is
106698 LAM ALTUS CVD 300 mm 01.06.2009 1 as is where is
106700 LAM Novellus Altus Max Concept Three Tungsten CVD 300 mm 01.03.2014 1 as is where is immediately
100919 LAM Research ALTUS CVD System 300 mm 31.05.2001 1 as is where is
100920 LAM Research ALTUS CVD System 300 mm 31.05.2010 1 as is where is
100921 LAM Research ALTUS CVD System 300 mm 31.05.2003 1 as is where is
106307 Lam Research Vector Express AHM PECVD 300 mm 01.06.2011 1 as is where is immediately
108574 LAM RESEARCH STRATA-3 CVD 300mm 01.06.2021 1 as is where is immediately
108577 LAM RESEARCH Vector Express CVD 300 mm 01.06.2003 1 as is where is immediately
111340 LAM RESEARCH CONCEPT 3 (Parts) Preclean module 300 mm 01.06.2010 2 as is where is immediately
111525 LAM Research STRATA-GX CVD Cluster tool 300 mm 01.06.2016 1 as is where is immediately
111541 Lam Research Vector (Parts) Hub Only 300 mm 01.06.2006 1 as is where is immediately
91218 NOVELLUS CONCEPT 3 GAMMA 2130 300 mm 1 as is where is
91219 NOVELLUS CONCEPT 3 GAMMA 2130 300 mm 1 as is where is
91220 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2004 1 as is where is
91221 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2006 1 as is where is
91223 NOVELLUS CONCEPT 3 SPEED NEXT 300 mm 31.05.2005 1 as is where is
103546 NOVELLUS VECTOR PECVD Nitride 300 mm 31.05.2005 1 as is where is
106710 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2003 1 as is where is
106711 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2004 1 as is where is
106712 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2005 1 as is where is
106713 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2005 1 as is where is
106714 NOVELLUS VECTOR TEOS CVD SYSTEM 300 mm 01.06.2005 1 as is where is
109222 Novellus Concept Three Altus WCVD (Chemical Vapor Deposition) 300mm 1 as is where is
111854 Novellus Concept Three Altus Max WCVD (Chemical Vapor Deposition) 300mm 1 as is where is
111855 Novellus Concept Three Altus Max WCVD (Chemical Vapor Deposition) 300mm 1 as is where is
112261 Novellus C3 Altus CVD W 300 mm 01.06.2007 1 as is where is
112262 Novellus C3 Altus CVD WCVD 300 mm 01.06.2005 1 as is where is
112263 Novellus C3 Altus CVD WCVD 300 mm 01.06.2006 1 as is where is
112264 Novellus C3 Speed CVD 300 mm 01.06.2002 1 as is where is
112265 Novellus C3 Speed NeXT CVD HDP 300 mm 01.06.2006 1 as is where is
112274 Novellus Vector Express AHMS CVD – Ashable Hard Mask 300 mm 01.06.2011 1 as is where is
112275 Novellus Vector SOLA xT CVD CVD 300 mm 01.06.2011 1 as is where is
113240 Novellus VECTOR Extreme PECVD Silan 300 mm 1 as is where is
113241 Novellus VECTOR Extreme - PECVD SILANE PECVD Silane 300 mm 1 as is where is
109097 Oxford Plasmalab System 100 PECVD TEOS with Load Lock 200 mm 01.05.2001 1 as is where is immediately
109595 Oxford NGP 1000 PECVD 150 mm 01.06.2012 1 inquire
111600 Oxford Plasmalab 100 Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock 150 mm 1 as is where is immediately
112895 Oxford Instruments Plasmalab System 100 pecvd teos with load lock 1 as is where is
112905 Plasma-Therm Unaxis 790 DRIE PECVD 1 as is where is
106953 PLASMATHERM LAPECVD Large Area PECVD system, used for SiO and SiN process depositions 150 mm 01.06.2015 4 as is where is immediately
111864 PlasmaTherm Versaline Large-Area PECVD PECVD (Chemical Vapor Deposition) 150mm 1 as is where is
112910 PLASMATHERM VLR 700 Single Chamber PECVD 1 as is where is
91245 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TIN (N2/NH3/N2/CIF3) 300 mm 1 as is where is
106750 TEL TOKYO ELECTRON TEL TRIAS CVD Cluster tool 300 mm 1 as is where is
106751 TEL TOKYO ELECTRON TEL TRIAS 200 SPA CVD Cluster tool 300 mm 1 as is where is
108536 TEL Tokyo Electron Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
108695 TEL Tokyo Electron TRIAS High K Metal CVD and ALD system, NiOx, HfOx process 300 MM 01.06.2012 1 inquire
109118 TEL TOKYO ELECTRON Trias CVD 300 mm 01.06.2010 14 as is where is immediately
110643 TEL Tokyo Electron Trias Ti/TiN TiN CVD 300 mm 1 as is where is
110644 TEL Tokyo Electron Trias Ti/TiN TiN CVD 300 mm 1 as is where is
111979 TEL TOKYO ELECTRON Trias EX-II Plus HT Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111980 TEL TOKYO ELECTRON Trias EX-II Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111981 TEL TOKYO ELECTRON Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111982 TEL TOKYO ELECTRON Trias W - Chamber Only Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111983 TEL TOKYO ELECTRON Triase+ EX-II Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111984 TEL TOKYO ELECTRON Triase+ EX-II Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111985 TEL TOKYO ELECTRON Triase+ SPA Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111986 TEL TOKYO ELECTRON Triase+ SPA Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111987 TEL TOKYO ELECTRON Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
111988 TEL TOKYO ELECTRON Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 1 as is where is
112500 TEL Tokyo Electron Trias CVD ALD TiN 300 mm 01.06.2013 1 as is where is
112501 TEL Tokyo Electron Trias CVD Copper Barrier Seed 300 mm 01.06.2012 1 as is where is
112502 TEL Tokyo Electron Trias CVD CVD TiN 300 mm 01.06.2006 1 as is where is
112503 TEL Tokyo Electron Trias CVD CVD TiN 300 mm 01.06.2004 1 as is where is
112504 TEL Tokyo Electron Trias CVD UV Cure 300 mm 01.06.2011 1 as is where is
112505 TEL Tokyo Electron Trias Chamber CVD CVD Ti 300 mm 1 as is where is
112506 TEL Tokyo Electron Trias Chamber CVD CVD Ti 300 mm 1 as is where is
112507 TEL Tokyo Electron Trias Chamber CVD CVD Ti 300 mm 01.06.2016 1 as is where is
112508 TEL Tokyo Electron Trias Chamber CVD CVD Ti 300 mm 01.06.2016 1 as is where is
112509 TEL Tokyo Electron Trias Chamber CVD CVD Ti 300 mm 01.06.2016 1 as is where is
112510 TEL Tokyo Electron Trias SPA CVD CVD 300 mm 01.06.2010 1 as is where is
112511 TEL Tokyo Electron Trias SPA CVD CVD 300 mm 01.06.2010 1 as is where is
113172 TEL TOKYO ELECTRON TEL TRIAS 200 SPA CVD 300 mm 1 as is where is
113274 TEL Tokyo Electron Trias EX-II Plus HT Ti/TiN Ti / TiN CVD 300 mm 1 as is where is
113275 TEL Tokyo Electron Trias EX-II Plus HT Ti/TiN Ti / TiN CVD 300 mm 1 as is where is
108608 TES CHALLENGER_ST Plasma-Enhanced CVD system 300 mm 01.05.2010 1 as is where is immediately
112954 Unaxis 790 ICP DRIE PECVD 1 as is where is
91249 VARIAN MBB W CVD 200 mm 1 as is where is


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