Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
91158 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | ||
91159 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2001 | 1 | inquire | ||
91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | |||
91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | |||
91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | ||
91182 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 31.05.1993 | 1 | as is where is | ||
91183 | Applied Materials | P5000 CVD | TEOS, DxL | 200 mm | 1 | as is where is | |||
91185 | Applied Materials | P5000 CVD | DxL | 150 mm | 31.05.1995 | 1 | as is where is | ||
91189 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | |||
91190 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | |||
91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | |||
91193 | Applied Materials | P5000 Mark-II CVD | TEOS | 150 mm | 1 | as is where is | |||
91194 | Applied Materials | P5000 Mark-II CVD | DxL | 200 mm | 1 | as is where is | |||
91195 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | |||
91196 | Applied Materials | P5000 Mark-II CVD+Etch | Sputter | 200 mm | 1 | as is where is | |||
91199 | Applied Materials | P5000 Mark-II CVD+PVD | TEOS 2Ch, SPUTTER 2Ch | 200 mm | 01.05.1997 | 1 | as is where is | ||
91204 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | |||
91205 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | |||
91208 | Applied Materials | Producer GT Chamber (A) | SICONI Chamber only | 300 mm | 1 | as is where is | |||
91209 | Applied Materials | Producer GT Chamber (B) | SICONI Chamber only | 300 mm | 1 | as is where is | |||
93051 | Applied Materials | P5000 | WXL | 150 mm | 31.05.1994 | 1 | as is where is | ||
93053 | Applied Materials | PRODUCER GT | LLTO | 300 mm | 31.05.2014 | 1 | as is where is | ||
94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | |||
103508 | Applied Materials | PRODUCER GT | Ht ACL 3ch / Server OS Type | 300 mm | 31.05.2014 | 1 | as is where is | ||
103509 | Applied Materials | PRODUCER GT | BD2_CU | 300 mm | 31.05.2002 | 1 | as is where is | ||
103510 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 31.05.2003 | 1 | as is where is | ||
103511 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 1 | as is where is | |||
106575 | Applied Materials | Centura AP Ultima Chamber | HDPCVD Chamber only | 300 mm | 1 | as is where is | |||
106582 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2001 | 1 | as is where is | ||
106584 | Applied Materials | ENDURA 2 (Gray Rack) | 3CH (WxZ) | 300 mm | 01.06.2007 | 1 | as is where is | ||
106621 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 150 mm | 01.06.1996 | 1 | as is where is | ||
106622 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 200 mm | 01.06.1998 | 1 | as is where is | ||
106623 | Applied Materials | P5000 | DxL 2ch | 200 mm | 01.06.1996 | 1 | as is where is | ||
106631 | Applied Materials | Producer GT Chamber | SIH4 | 300 mm | 1 | as is where is | |||
106633 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
106634 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | ||
106635 | Applied Materials | PRODUCER SE | SILANE 2ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | ||
106636 | Applied Materials | PRODUCER SE | Teos 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | ||
108023 | Applied Materials | P5000 | CVD | 200 mm | 01.11.1990 | 1 | as is where is | ||
108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | ||
108143 | Applied Materials | P5000 | Delta Dlh 3chCVD | 150 mm | 1 | as is where is | |||
108145 | Applied Materials | P5000 | Teos dlh 3ch CVD | 150 mm | 1 | as is where is | |||
108147 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | ||
108148 | Applied Materials | Producer SE Chamber | LLTO Chamber only | 300 mm | 01.06.2014 | 1 | as is where is | ||
108149 | Applied Materials | PRODUCER SE CHAMBER | PECVD Silane Chamber Only | 300 mm | 1 | as is where is | |||
108150 | Applied Materials | PRODUCER SE CHAMBER | PECVD TEOS Chamber Only | 300 mm | 1 | as is where is | immediately | ||
108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | ||
109134 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
109135 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
109582 | Applied Materials | P5000 | CVD SiN Process with 2 x CVD chambers | 150 MM | 01.06.1989 | 1 | as is where is | immediately | |
109583 | Applied Materials | P5000 | CVD TEOS Process with 2 x CVD chambers | 150 MM | 01.06.1989 | 1 | as is where is | immediately | |
110716 | Applied Materials | P5000 Mark 2 | 2 Chambers TEOS PECVD and 2 Chambers Dry Etch | 150 MM | 01.06.2000 | 1 | as is where is | immediately | |
110717 | Applied Materials | P5000 | 3 Chambers PECVD TEOS | 150 MM | 01.06.1996 | 1 | as is where is | immediately | |
111631 | Applied Materials | Centura AP iSprint | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111632 | Applied Materials | Centura Ultima Plus | HDP CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
111637 | Applied Materials | P-5000 Mark II DLH PECVD TEOS | PECVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
111638 | Applied Materials | P-5000 Mark II DLH PECVD TEOS | PECVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
111642 | Applied Materials | Producer GT PECVD Silane | PECVD (Chemical Vapor Deposition) | 1 | as is where is | ||||
111644 | Applied Materials | Producer SE PECVD SILANE | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111645 | Applied Materials | Producer SE PECVD SILANE | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111646 | Applied Materials | Producer SE PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111647 | Applied Materials | Producer SE PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111648 | Applied Materials | Producer SE SACVD | SACVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111649 | Applied Materials | Producer SE SACVD | SACVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112085 | Applied Materials | Centura AP ISPRINT | CVD VIA W, with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | ||
112112 | Applied Materials | P5000 | CVD ILD BPTEOS with 3 process chambers | 200 mm | 01.06.1996 | 1 | as is where is | ||
112114 | Applied Materials | Producer S TEOS-BPSG | CVD TEOS-BPSG with 3 x twin chambers | 300 mm | 01.06.2002 | 1 | as is where is | ||
113008 | Applied Materials | CENTURA | DXZ | 200 mm | 1 | as is where is | |||
113017 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | ||
113018 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2002 | 1 | as is where is | ||
113024 | Applied Materials | P5000 | 2 MARK II | 150 mm | 01.06.1990 | 1 | as is where is | ||
113025 | Applied Materials | P5000 | 2 MARK II Oxide | 200 mm | 1 | as is where is | |||
113028 | Applied Materials | P5000 | 2 Teos DLH, 2 MARK II | 200 mm | 01.06.1998 | 1 | as is where is | ||
113029 | Applied Materials | P5000 | 3 DxZ | 200 mm | 01.06.1998 | 1 | as is where is | ||
113030 | Applied Materials | P5000 | 3 Teos DLH, 1 MARK II | 150 mm | 01.06.1996 | 1 | as is where is | ||
113201 | Applied Materials | Producer GT APF | CVD Advanced Patterning Film | 300 mm | 1 | as is where is | |||
113202 | Applied Materials | Producer GT PECVD TEOS | PECVD TEOS | 300 mm | 1 | as is where is | |||
108384 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 3 | as is where is | |||
109117 | ASM | XP8 | Dual Chamber PECVD system for Oxide and Nitride | 300 mm | 01.06.2010 | 2 | as is where is | immediately | |
111661 | ASM | Eagle XP | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111662 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112124 | ASM | Dragon 2300 | CVD PECVD Equipment for Barrier | 300 mm | 01.06.2003 | 1 | as is where is | ||
112125 | ASM | Eagle10 | CVD PETEOS | 200 mm | 01.06.1999 | 1 | as is where is | ||
112126 | ASM | Eagle12 | CVD CVD | 300 mm | 01.06.2004 | 1 | as is where is | ||
106641 | BMR | HIDEP | PECVD | N/A | 01.06.2006 | 1 | as is where is | ||
109044 | CVD Equipment Corporation | Easy Tube 3000 | Growth Equipment | 06.01.2009 | 2 | as is where is | |||
112178 | EUGENE TECH | BJM3000 | CVD SINGLE HTO | 300 mm | 1 | as is where is | |||
106698 | LAM | ALTUS | CVD | 300 mm | 01.06.2009 | 1 | as is where is | ||
106700 | LAM | Novellus Altus Max Concept Three | Tungsten CVD | 300 mm | 01.03.2014 | 1 | as is where is | immediately | |
100919 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2001 | 1 | as is where is | ||
100920 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2010 | 1 | as is where is | ||
100921 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2003 | 1 | as is where is | ||
106307 | Lam Research | Vector Express AHM | PECVD | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
108574 | LAM RESEARCH | STRATA-3 | CVD | 300mm | 01.06.2021 | 1 | as is where is | immediately | |
108577 | LAM RESEARCH | Vector Express | CVD | 300 mm | 01.06.2003 | 1 | as is where is | immediately | |
111340 | LAM RESEARCH | CONCEPT 3 (Parts) | Preclean module | 300 mm | 01.06.2010 | 2 | as is where is | immediately | |
111525 | LAM Research | STRATA-GX | CVD Cluster tool | 300 mm | 01.06.2016 | 1 | as is where is | immediately | |
111541 | Lam Research | Vector (Parts) | Hub Only | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
91218 | NOVELLUS | CONCEPT 3 GAMMA 2130 | 300 mm | 1 | as is where is | ||||
91219 | NOVELLUS | CONCEPT 3 GAMMA 2130 | 300 mm | 1 | as is where is | ||||
91220 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2004 | 1 | as is where is | ||
91221 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2006 | 1 | as is where is | ||
91223 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2005 | 1 | as is where is | ||
103546 | NOVELLUS | VECTOR | PECVD Nitride | 300 mm | 31.05.2005 | 1 | as is where is | ||
106710 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2003 | 1 | as is where is | ||
106711 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2004 | 1 | as is where is | ||
106712 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | ||
106713 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | ||
106714 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2005 | 1 | as is where is | ||
109222 | Novellus | Concept Three Altus | WCVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111854 | Novellus | Concept Three Altus Max | WCVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111855 | Novellus | Concept Three Altus Max | WCVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112261 | Novellus | C3 Altus | CVD W | 300 mm | 01.06.2007 | 1 | as is where is | ||
112262 | Novellus | C3 Altus | CVD WCVD | 300 mm | 01.06.2005 | 1 | as is where is | ||
112263 | Novellus | C3 Altus | CVD WCVD | 300 mm | 01.06.2006 | 1 | as is where is | ||
112264 | Novellus | C3 Speed | CVD | 300 mm | 01.06.2002 | 1 | as is where is | ||
112265 | Novellus | C3 Speed NeXT | CVD HDP | 300 mm | 01.06.2006 | 1 | as is where is | ||
112274 | Novellus | Vector Express AHMS | CVD – Ashable Hard Mask | 300 mm | 01.06.2011 | 1 | as is where is | ||
112275 | Novellus | Vector SOLA xT | CVD CVD | 300 mm | 01.06.2011 | 1 | as is where is | ||
113240 | Novellus | VECTOR Extreme | PECVD Silan | 300 mm | 1 | as is where is | |||
113241 | Novellus | VECTOR Extreme - PECVD SILANE | PECVD Silane | 300 mm | 1 | as is where is | |||
109097 | Oxford | Plasmalab System 100 | PECVD TEOS with Load Lock | 200 mm | 01.05.2001 | 1 | as is where is | immediately | |
109595 | Oxford | NGP 1000 | PECVD | 150 mm | 01.06.2012 | 1 | inquire | ||
111600 | Oxford | Plasmalab 100 | Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock | 150 mm | 1 | as is where is | immediately | ||
112895 | Oxford Instruments | Plasmalab System 100 | pecvd teos with load lock | 1 | as is where is | ||||
112905 | Plasma-Therm | Unaxis 790 | DRIE PECVD | 1 | as is where is | ||||
106953 | PLASMATHERM | LAPECVD | Large Area PECVD system, used for SiO and SiN process depositions | 150 mm | 01.06.2015 | 4 | as is where is | immediately | |
111864 | PlasmaTherm | Versaline Large-Area PECVD | PECVD (Chemical Vapor Deposition) | 150mm | 1 | as is where is | |||
112910 | PLASMATHERM | VLR 700 | Single Chamber PECVD | 1 | as is where is | ||||
91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | |||
106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | |||
106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is | |||
108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2012 | 1 | inquire | ||
109118 | TEL TOKYO ELECTRON | Trias | CVD | 300 mm | 01.06.2010 | 14 | as is where is | immediately | |
110643 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
110644 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
111979 | TEL TOKYO ELECTRON | Trias EX-II Plus HT Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111980 | TEL TOKYO ELECTRON | Trias EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111981 | TEL TOKYO ELECTRON | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111982 | TEL TOKYO ELECTRON | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111983 | TEL TOKYO ELECTRON | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111984 | TEL TOKYO ELECTRON | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111985 | TEL TOKYO ELECTRON | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111986 | TEL TOKYO ELECTRON | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111987 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
111988 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
112500 | TEL Tokyo Electron | Trias | CVD ALD TiN | 300 mm | 01.06.2013 | 1 | as is where is | ||
112501 | TEL Tokyo Electron | Trias | CVD Copper Barrier Seed | 300 mm | 01.06.2012 | 1 | as is where is | ||
112502 | TEL Tokyo Electron | Trias | CVD CVD TiN | 300 mm | 01.06.2006 | 1 | as is where is | ||
112503 | TEL Tokyo Electron | Trias | CVD CVD TiN | 300 mm | 01.06.2004 | 1 | as is where is | ||
112504 | TEL Tokyo Electron | Trias | CVD UV Cure | 300 mm | 01.06.2011 | 1 | as is where is | ||
112505 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 1 | as is where is | |||
112506 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 1 | as is where is | |||
112507 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
112508 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
112509 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
112510 | TEL Tokyo Electron | Trias SPA | CVD CVD | 300 mm | 01.06.2010 | 1 | as is where is | ||
112511 | TEL Tokyo Electron | Trias SPA | CVD CVD | 300 mm | 01.06.2010 | 1 | as is where is | ||
113172 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD | 300 mm | 1 | as is where is | |||
113274 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Ti / TiN CVD | 300 mm | 1 | as is where is | |||
113275 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Ti / TiN CVD | 300 mm | 1 | as is where is | |||
108608 | TES | CHALLENGER_ST | Plasma-Enhanced CVD system | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
112954 | Unaxis | 790 ICP | DRIE PECVD | 1 | as is where is | ||||
91249 | VARIAN | MBB | W CVD | 200 mm | 1 | as is where is |