fabsurplus.com

List of Tokyo equipment available for sale at fabsurplus.com

The following are the items available for sale related to Tokyo at SDI fabsurplus.com. To inquire about the Tokyo equipment item you need, click on the relevant link below to get more details, and inquiry if interested. If no result is shown, please try to search for another item or inquiry us about your request of Tokyo items.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
96514 TEL Tokyo Electron A303I Diffusion Furnace 300mm 01.10.2003 1 as is where is
96515 TEL Tokyo Electron ACT12 Photoresist coater and developer track 300mm 01.03.2004 1 as is where is
96516 TEL Tokyo Electron CERTAS Single wafer Dry Cleaning System 300mm 01.11.2008 1 as is where is
96517 TEL Tokyo Electron INDY Diffusion Furnace 300mm 01.11.2004 1 as is where is
96518 TEL Tokyo Electron INDY Diffusion Furnace 300mm 01.02.2010 1 as is where is
96519 TEL Tokyo Electron INDY Diffusion Furnace 300mm 01.10.2006 1 as is where is
96520 TEL Tokyo Electron INDY Diffusion Furnace 300mm 01.03.2010 1 as is where is
96521 TEL Tokyo Electron LITHIUS Lithography Coater/Developer 300mm 01.07.2008 1 as is where is
96522 TEL Tokyo Electron SCCM SHIN Oxide Etcher 300mm 01.03.2007 1 as is where is
97034 TEL Tokyo Electron INDY Furnace Anneal 300 mm 01.06.2006 1 as is where is
96523 TEL Tokyo Electron TACTRAS VIGUS0 Deep Etch Cluster Tool 300mm 01.06.2010 1 as is where is
97035 TEL Tokyo Electron INDY PLUS LPCVD ALD-HfO 300 mm 01.06.2011 1 as is where is
96524 TEL Tokyo Electron TRIAS HIGH K Diffusion Furnace 300mm 01.05.2011 1 as is where is
97036 TEL Tokyo Electron LITHIUS Track Coater Developer 300 mm 01.06.2012 1 as is where is
96525 TEL Tokyo Electron TRIAS-EX2 Metal CVD 300mm 01.03.2014 1 as is where is
97037 TEL Tokyo Electron MARK 7 Track 1C 2D 1Block 200 mm 01.06.1995 1 as is where is
87822 TEL TOKYO ELECTRON Trias 2 chamber metal CVD cluster tool 300 MM 01.06.2002 1 as is where is immediately
96526 TEL Tokyo Electron VESTA Plasma Etch System 300mm 01.02.2011 1 as is where is
97038 TEL Tokyo Electron TRIAS PECVD Oxynitride 300 mm 01.06.2008 1 as is where is
83984 TEL Tokyo Electron P8 XL Fully Automatic prober 200 mm 1 as is where is immediately
94481 TEL TOKYO ELECTRON TRIAS Chamber only N/A 300 mm 01.06.2018 1 as is where is
94482 TEL TOKYO ELECTRON TRIAS Chamber only N/A 300 mm 01.06.2018 1 as is where is
94483 TEL TOKYO ELECTRON TRIAS_EX-2 Chamber only N/A 300 mm 01.06.2018 1 as is where is
92437 TEL Tokyo Electron 19S Prober 9 inquire
34069 TEL TOKYO ELECTRON P8 PROBER 200 MM 01.06.2002 1 as is where is immediately
21270 TEL TOKYO ELECTRON MB2 730HT CVD SYSTEM, 3 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
92438 TEL Tokyo Electron P8 ( VIP4 ) Prober 16 inquire
92439 TEL Tokyo Electron P8LC ( WAT / Low current chuck ) Prober 1 inquire
92440 TEL Tokyo Electron P8XL Prober 01.10.2002 1 inquire
92441 TEL Tokyo Electron P12XL ( WAT ) Fully Automatic Prober with Gold Hot Chuck and WAT 300 MM 01.06.2009 1 inquire immediately
92442 TEL Tokyo Electron P12XLn cool chuck ( -25~150 degree ) Prober 1 inquire
92443 TEL Tokyo Electron P12XLn+ Prober 1 inquire
68895 TEL TOKYO ELECTRON P12XLn+ PROBER, WITH COOL CHUCK 300 mm 01.11.2004 2 as is where is immediately
74527 TEL Tokyo Electron P12XLn Prober 300 mm 01.10.2004 2 as is where is immediately
74530 TEL Tokyo Electron P8 PROBER 200 MM 6 as is where is
92195 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
92196 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
87845 TEL TOKYO ELECTRON ACT12(4C4D) Photoresist coater and developer track 300 mm 01.06.2002 1 as is where is
92197 TEL Tokyo Electron Trias Ti/TiN Chamber Parts/Peripherals 300 mm 1 as is where is
95013 TEL Tokyo Electron SPA-TRIAS Niride CVD 200 MM / 300 MM 01.06.2008 0 as is where is
92199 TEL Tokyo Electron Trias Ti/TiN Chamber Parts/Peripherals 300 mm 1 as is where is
92711 TEL Tokyo Electron P12XLn+ cool chuck ( -25~150 degree ) Prober with cool chuck D240 300 mm 01.09.2005 1 inquire immediately
87848 TEL TOKYO ELECTRON P12XLM Prober 300 mm 01.06.2006 1 inquire immediately
90152 TEL TOKYO ELECTRON INDY-B-L Vertical Furnace (HTO) 300 MM 01.03.2007 1 as is where is immediately
92200 TEL Tokyo Electron Trias Ti/TiN Chamber Parts/Peripherals 300 mm 1 as is where is
87849 TEL TOKYO ELECTRON P-12XLM Prober 300 mm 01.06.2006 1 inquire immediately
78124 TEL TOKYO ELECTRON P8 Wafer Prober 200 MM 01.09.1996 1 as is where is immediately
90924 TEL Tokyo Electron Alpha-303i-K Vertical Furnace, HTO/SiN 300 mm 01.06.2005 1 as is where is
90925 TEL Tokyo Electron Alpha-303i-K Vertical furnace, TEOS 300 mm 01.06.2007 1 as is where is
78131 TEL TOKYO ELECTRON P8XL Fully Automatic Wafer Prober (Gold Chuck) 200 MM 01.09.2000 1 as is where is immediately
86067 TEL Tokyo Electron P8XL Prober 1 inquire immediately
90934 TEL Tokyo Electron Indy-A DCS Nitride CVD 300 mm 01.06.2008 1 as is where is
90935 TEL Tokyo Electron Indy-A DCS Nitride CVD 300 mm 01.06.2008 1 as is where is
84543 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2004 1 as is where is
90943 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
84544 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
90944 TEL Tokyo Electron Trias SPA CVD 300 mm 01.06.2010 1 as is where is
84545 TEL Tokyo Electron A303I Vertical furnace 300 mm 01.06.2006 1 as is where is
94023 TEL Tokyo Electron P8XL Fully Automatic Prober with Hot Chuck 200 mm 01.06.2001 1 as is where is immediately
21064 TEL TOKYO ELECTRON MB2 730 HT HT CVD SYSTEM, 2 CHAMBER WSi Process 200 mm 01.09.1996 1 as is where is immediately
89928 TEL TOKYO ELECTRON UW8000 Wet - Process 01.06.1997 2 as is where is immediately
96073 TEL Tokyo Electron ACT 12 SOD Resist Coater / Developer 300 mm 01.06.2010 1 inquire
96074 TEL Tokyo Electron Expedius-i Wafer and Mask Cleaning 300 mm 01.06.2010 1 inquire
92747 TEL Tokyo Electron Trias ALD TiN (CVD) 300 mm 01.06.2013 1 as is where is
96075 TEL Tokyo Electron TBDB Synapse Series coater + bonder + debonder 300 mm 1 inquire
88399 TEL Tokyo Electron P12XLn cool chuck ( -30~150 degree ) Prober 300 mm 1 inquire immediately
95567 Tel Tokyo Electron Act 8 Polyimide Stand-Alone Track, Single Block 200 mm 1 as is where is immediately
90448 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.10.2010 1 as is where is
90449 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.03.2011 1 as is where is
95313 TEL Tokyo Electron CLEAN TRACK ACT 12 Coat only Track (With 4 coaters) 300 mm 01.06.2008 1 as is where is immediately
90450 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.09.2006 1 as is where is
90452 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.08.2010 1 as is where is
94292 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 1C 2 D 300 mm 01.09.2003 1 as is where is immediately
94548 TEL Tokyo Electron ACT8 COATER AND DEVELOPER TRACK 200 mm 01.06.2000 1 as is where is
94293 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 300 mm 01.01.2002 1 as is where is immediately
94549 TEL Tokyo Electron ACT8 COATER AND DEVELOPER TRACK 200 mm 01.06.2000 1 as is where is
95317 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 2D 1 C 300 mm 01.05.2002 1 as is where is immediately
94550 TEL Tokyo Electron Indy Plus ALD High K 300 mm 01.06.2010 1 as is where is
95318 TEL Tokyo Electron CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer) 2D IC 300 mm 01.01.2002 1 as is where is immediately
90455 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.02.2011 1 as is where is
94551 TEL Tokyo Electron LITHIUS i+ COATER AND DEVELOPER TRACK 200 mm 01.06.2006 1 as is where is
90456 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300 mm 01.09.2010 1 as is where is
94552 TEL Tokyo Electron Mark7 COATER AND DEVELOPER TRACK 200 mm 01.06.1999 1 as is where is
92761 TEL Tokyo Electron Alpha-303i-K DCS MTO (Furnace) 300 mm 01.06.2006 1 as is where is
94553 TEL Tokyo Electron Mark7 COATER AND DEVELOPER TRACK 125 mm 01.06.1995 1 as is where is
94554 TEL Tokyo Electron Mark8 COATER AND DEVELOPER TRACK 125 mm 01.06.1997 1 as is where is
94555 TEL Tokyo Electron MRC Eclipse Mark IV Metal sputter 200 mm 01.06.2011 1 as is where is
95323 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.06.2015 1 as is where is
94300 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.02.2013 1 as is where is
94556 TEL Tokyo Electron NS300 Scrubber Track 300 mm 1 as is where is immediately
92765 TEL Tokyo Electron Alpha-303i-K Poly (Furnace) 300 mm 01.06.2003 1 as is where is
94557 TEL Tokyo Electron NS300 Scrubber Track 300 mm 1 as is where is immediately
92766 TEL Tokyo Electron Indy-B DIFF (Furnace) 300 mm 01.06.2012 1 as is where is
94558 TEL Tokyo Electron NS300 Scrubber 300 mm 1 as is where is immediately
94559 TEL Tokyo Electron Telius SCCM Shin Oxide etcher 300 mm 01.06.2000 1 as is where is
94304 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.02.2006 1 as is where is
91239 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
92775 TEL Tokyo Electron ACT12 Photoresist coater and developer track (Track) 200 mm 01.06.2000 1 as is where is
91240 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
92776 TEL Tokyo Electron ACT12 Photoresist coater and developer track (Track) 300 mm 01.06.2005 1 as is where is
91241 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
92777 TEL Tokyo Electron ACT12 Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
91242 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (N2/H2/CIF3) 300 mm 1 as is where is
92778 TEL Tokyo Electron ACT12 Photoresist coater and developer track (Track) 300 mm 01.06.2003 1 as is where is
91243 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
92523 TEL Tokyo Electron Trias Ti/TiN Chamber Chamber 300mm 1 as is where is
92779 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
91244 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI (NH3/H2/CIF3) 300 mm 1 as is where is
92780 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
91245 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TIN (N2/NH3/N2/CIF3) 300 mm 1 as is where is
92781 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92782 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92527 TEL Tokyo Electron Trias W MOCVD 300mm 01.05.2002 1 as is where is
92783 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
94575 TEL Tokyo Electron ACT12 STAND ALONE TRACK 300 mm 1 as is where is
92784 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
93040 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2009 1 as is where is
94576 TEL Tokyo Electron LITHIUS SINGLE TRACK 300 mm 1 as is where is
88177 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
92785 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
93041 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2010 1 as is where is
88178 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.06.2007 1 as is where is
92786 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
93042 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2010 1 as is where is
75635 TEL Tokyo Electron Unity Me SCCM (Chamber) Dry oxide etch chamber 200 mm 1 as is where is immediately
92787 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
94579 TEL Tokyo Electron ACT 8 (3C/3D) Photoresist coater and developer track (3C/3D) 200 mm 01.01.1997 1 as is where is immediately
75636 TEL Tokyo Electron Unity Me SCCM 85S Oxide etcher (3 chamber) 200 mm 01.10.2003 1 as is where is immediately
84084 TEL Tokyo Electron MARK II Clean Track Dual Block Coater / Developer 300mm 1 as is where is immediately
92788 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
92789 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2007 1 as is where is
92790 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
91255 TEL TOKYO ELECTRON ALPHA-303i H type / Poly 300 mm 1 as is where is
92791 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
91256 TEL TOKYO ELECTRON ALPHA-303i H type / Poly 300 mm 1 as is where is
92792 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
91257 TEL TOKYO ELECTRON ALPHA-303i H type / TEOS 300 mm 1 as is where is
92793 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 1 as is where is
84346 TEL Tokyo Electron Vigas Chamber Vigas chamber 1 as is where is
91258 TEL TOKYO ELECTRON ALPHA-303i K type 300 mm 1 as is where is
92794 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2006 1 as is where is
94330 TEL Tokyo Electron INDY Plus ALD High-K Vertical Furnace – ALD High K 300 mm 01.06.2011 1 as is where is
91259 TEL TOKYO ELECTRON Telformula(ver.0) optimal thermal processing 300 mm 1 as is where is
92795 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2006 1 as is where is
94331 TEL Tokyo Electron INDY Plus ALD High-K Vertical Furnace – ALD High K 300 mm 01.06.2014 1 as is where is
92796 TEL Tokyo Electron LITHIUS Photoresist coater and developer track (Track) 300 mm 01.06.2005 1 as is where is
90493 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2007 1 as is where is
92797 TEL Tokyo Electron LITHIUS i+ Photoresist coater and developer track (Track) 300 mm 01.06.2008 1 as is where is
94333 TEL Tokyo Electron INDY Plus ALD High-K Vertical Furnace – ALD High K 300 mm 01.06.2011 1 as is where is
96381 TEL Tokyo Electron P-12XL Prober 300 mm 01.02.2006 1 as is where is immediately
93054 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 MM 1 as is where is
90495 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 1 as is where is
93055 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 MM 1 as is where is
93056 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 MM 1 as is where is
93057 TEL TOKYO ELECTRON TRIAS CHAMBER ONLY LT TI/TIN (N2/NH3/H2/Ar/CIF3) 300 MM 1 as is where is
94338 TEL Tokyo Electron Triase+ EX-II Plus Ti/TiN - Chamber Only Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2016 1 as is where is
96386 TEL Tokyo Electron Lithius Lithography Coater Developer 01.06.2007 0 as is where is immediately
93059 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2005 1 as is where is
95875 TEL Tokyo Electron ACT 12 Single Block (Resist Coater/Developer) 2C 2D 300 mm 01.06.2004 1 as is where is immediately
93060 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2005 1 as is where is
95876 TEL Tokyo Electron ACT 12 Single Block POLYIMIDE COATER AND DEVELOPER IC 2 D 300 mm 01.02.2002 1 as is where is immediately
2181 TEL TOKYO ELECTRON TE 5480 Nitride Plasma Reactive Ion Etch 150 mm 01.12.1992 1 inquire immediately
93061 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2006 1 as is where is
93062 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2004 1 as is where is
93063 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2005 1 as is where is
95879 TEL Tokyo Electron Expedius+ Wet Etch 300 mm 01.06.2008 1 as is where is
93064 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2007 1 as is where is
95880 TEL Tokyo Electron Expedius+ Wet Etch 300 mm 01.05.2008 1 as is where is
91017 TEL Tokyo Electron TE8500 Dry Etcher 200mm 01.06.1994 1 as is where is
93065 TEL TOKYO ELECTRON ALPHA-303i Vertical Furnace K type / MTO 300 MM 01.06.2007 1 as is where is
95881 TEL Tokyo Electron FORMULA Vertical LPCVD Nitride Furnace 300 mm 01.06.2003 1 as is where is
95882 TEL Tokyo Electron FORMULA Vertical LPCVD Nitride Furnace 300 mm 01.08.2003 1 as is where is
92555 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 01.09.2013 1 as is where is
95883 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.07.2014 1 as is where is
96652 TEL Tokyo Electron Mark 7 Photoresist coater / developer track 1c 1d 200 mm 01.07.1996 1 as is where is immediately
93837 TEL Tokyo Electron P12XL Prober 300 mm 01.06.2004 1 inquire immediately
90510 TEL Tokyo Electron Telius 305 SCCM Dielectric Etch 300 mm 01.09.2003 1 as is where is
21135 TEL TOKYO ELECTRON UPGRADE FOR SCCM OXIDE TOOL KIT FOR UPGRADE FOR SCCM OXIDE TOOL SPARES 1 as is where is immediately
95887 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
95888 TEL Tokyo Electron FORMULA ALD High-K Vertical LPCVD Furnace 300 mm 1 as is where is
95890 TEL Tokyo Electron FORMULA Nitride Vertical LPCVD Furnace 300 mm 01.09.2003 1 as is where is
92565 TEL Tokyo Electron TELINDY ALD High-K Vertical LPCVD Furnace 300mm 01.03.2013 1 as is where is
95893 TEL Tokyo Electron FORMULA Nitride Vertical LPCVD Furnace 300 mm 01.09.2003 1 as is where is
95894 TEL Tokyo Electron FORMULA Nitride Vertical LPCVD Furnace 300 mm 1 as is where is
90775 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300mm 01.09.2007 1 as is where is
95895 TEL Tokyo Electron FORMULA Nitride Vertical LPCVD Furnace 300 mm 1 as is where is
96922 TEL Tokyo Electron ALPHA-303i Anneal Vertical Anneal Furnace 300 mm 01.06.2005 1 as is where is
96923 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 1 as is where is
96924 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.10.2008 1 as is where is
96925 TEL Tokyo Electron CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.09.2008 1 as is where is
95902 TEL Tokyo Electron Telius SP 305 DRM Dielectric Etch 300 mm 01.06.2004 1 as is where is
96926 TEL Tokyo Electron NS 300 Wafer Scrubber 300 mm 01.06.2006 1 as is where is
96927 TEL Tokyo Electron Tactras RLSA Poly Polysilicon Etch 300 mm 01.06.2012 1 as is where is
96928 TEL Tokyo Electron Tactras Vigus Dielectric Etch 300 mm 01.10.2010 1 as is where is
96929 TEL Tokyo Electron Tactras Vigus RK3 - Chamber Only Dielectric Etch 300 mm 1 as is where is
91042 TEL TOKYO ELECTRON CLEAN TRACK LITHIUS Photoresist Coater and developer track 300 MM 1 as is where is immediately
96930 TEL Tokyo Electron Tactras Vigus RK3 - Chamber Only Dielectric Etch 300 mm 1 as is where is
91043 TEL TOKYO ELECTRON TELINDY PLUS NITRIDE Vertical furnace, nitride process 300 MM 1 as is where is immediately
95907 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.09.2008 1 as is where is
96931 TEL Tokyo Electron Tactras Vigus RK3 - Chamber Only Dielectric Etch 300 mm 1 as is where is
95908 TEL Tokyo Electron Trias W Metal CVD 300 mm 01.10.2013 1 as is where is
96932 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.02.2006 1 as is where is
88485 TEL Tokyo Electron Trias CVD TiN 300 MM 01.06.2004 1 as is where is
96933 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2015 1 as is where is
88486 TEL Tokyo Electron Trias Metal 300 MM 01.06.2012 1 as is where is
96934 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2015 1 as is where is
88487 TEL Tokyo Electron Alpha-303i-H D-Poly 300 MM 01.06.2001 1 as is where is
96935 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.10.2013 1 as is where is
88488 TEL Tokyo Electron Alpha-303i-H D-Poly 300 MM 01.06.2002 1 as is where is
91048 TEL TOKYO ELECTRON TRIAS TI/TIN CVD system 300 MM 1 as is where is
91816 TEL TOKYO ELECTRON UNITY-EP DRY ETCH 01.06.2005 1 as is where is
96936 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2015 1 as is where is
91817 TEL TOKYO ELECTRON TE8500 DRY ETCH 01.06.1998 1 as is where is
96937 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2015 1 as is where is
88490 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2002 1 as is where is
91818 TEL TOKYO ELECTRON TE8500 DRY ETCH 01.06.1998 1 as is where is
96938 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2016 1 as is where is
88491 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2002 1 as is where is
91819 TEL TOKYO ELECTRON TE8500 DRY ETCH 01.06.1996 1 as is where is
96939 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2016 1 as is where is
88492 TEL Tokyo Electron Alpha-303i-H MTO 300 MM 01.06.2001 1 as is where is
91820 TEL TOKYO ELECTRON TE8500 DRY ETCH 01.06.1997 1 as is where is
96940 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2016 1 as is where is
88493 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
96941 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.10.2013 1 as is where is
88494 TEL Tokyo Electron Alpha-303i-K MTO 300 MM 01.06.2004 1 as is where is
96942 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.10.2013 1 as is where is
96943 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.10.2013 1 as is where is
96944 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.10.2013 1 as is where is
96945 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.10.2013 1 as is where is
73138 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 01.02.2004 1 as is where is
93874 TEL TOKYO ELECTRON MARK 8 Photoresist coater and developer track (3D) 200 mm 01.06.1996 1 as is where is immediately
96946 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.09.2003 1 as is where is
88499 TEL Tokyo Electron Formula Nit 300 MM 01.06.2003 1 as is where is
96947 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.09.2003 1 as is where is
88500 TEL Tokyo Electron Formula Nit 300 MM 01.06.2003 1 as is where is
96948 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.09.2003 1 as is where is
88501 TEL Tokyo Electron Formula SiGe-POLY 300 MM 01.06.2003 1 as is where is
96949 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 1 as is where is
96950 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 01.06.2010 1 as is where is
96951 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
96952 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 1 as is where is
96953 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 01.06.2010 1 as is where is
96954 TEL Tokyo Electron TELINDY Plus ALD High-K Vertical Furnace - Other 300 mm 01.06.2010 1 as is where is
96955 TEL Tokyo Electron TELINDY Plus IRAD Oxide Vertical LPCVD Furnace 300 mm 01.06.2013 1 as is where is
92348 TEL Tokyo Electron WDF DP Prober 200 mm 01.12.2004 1 inquire immediately
92604 TEL Tokyo Electron Telius 305 SCCM Dielectric Etch 300mm 01.09.2003 1 as is where is
96956 TEL Tokyo Electron Telius 305 DRM Dielectric Etch 300 mm 01.06.2003 1 as is where is
96957 TEL Tokyo Electron Telius 305 DRM Dielectric Etch 300 mm 01.04.2003 1 as is where is
96958 TEL Tokyo Electron Telius SP 305 DRM Dielectric Etch 300 mm 01.06.2005 1 as is where is
96959 TEL Tokyo Electron Telius SP 305 DRM Chamber Dielectric Etch 300 mm 01.06.2006 1 as is where is
96960 TEL Tokyo Electron Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) 300 mm 01.06.2003 1 as is where is
90817 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
96961 TEL Tokyo Electron Trias Ti/TiN Chamber CHAMBER 300 mm 1 as is where is
96962 TEL Tokyo Electron UW200Z Batch Wafer Processing 200mm 01.04.2003 1 as is where is
96963 TEL Tokyo Electron UW300Z Batch Wafer Processing 300 mm 1 as is where is
90820 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 1 as is where is
93892 TEL Tokyo Electron ACT-12(PRB) 1C3D Photoresist Coater and Developer track 300 mm 1 as is where is
90823 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
91335 TEL TOKYO ELECTRON SCCM SHIN Dry ETCHER 200 mm 1 as is where is
90824 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300mm 1 as is where is
91336 TEL TOKYO ELECTRON SCCM SHIN Dry ETCHER 200 mm 1 as is where is
92360 TEL TOKYO ELECTRON P12XLn+ PROBER, with Ambient and hot Nickel chuck 300 mm 01.11.2004 1 as is where is immediately
96968 TEL Tokyo Electron UW200Z Wet Cleaning System 200 mm 1 as is where is immediately
91337 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.2006 1 as is where is
18890 TEL TOKYO ELECTRON 201345 Operations manual 1 as is where is
91338 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.1994 1 as is where is
91594 TEL TOKYO ELECTRON P-8 AUTOMATIC WAFER PROBER 200 mm 01.06.2002 1 as is where is
18891 TEL TOKYO ELECTRON 201336 Operations manual 1 as is where is
91339 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.1995 1 as is where is
83660 TEL Tokyo Electron ACT 12 Clean Track, 2 block, 2C / 4D 200 mm 01.06.2001 1 inquire immediately
18892 TEL TOKYO ELECTRON 201341 Operations manual 1 as is where is
91340 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.2006 1 as is where is
18893 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
91341 TEL TOKYO ELECTRON TELIUS SCCM T-3044SS DRY ETCHER 300 mm 01.06.2007 1 as is where is
18894 TEL TOKYO ELECTRON 201339 Operations manual 1 as is where is
18895 TEL TOKYO ELECTRON 201335 Operations manual 1 as is where is
18896 TEL TOKYO ELECTRON 201342 Operations manual 1 as is where is
89040 TEL Tokyo Electron ACT 12 DUV DUAL BLOCK COATER AND DEVELOPER TRACK 300 MM 1 as is where is
92368 TEL Tokyo Electron P12XLn+ Fully Automatic Prober 300 mm 01.08.2006 1 inquire 1 month
18897 TEL TOKYO ELECTRON 201346 Operations manual 1 as is where is
88530 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
88531 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
88532 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2004 1 as is where is
96724 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
88533 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
96725 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
88534 TEL Tokyo Electron Unity SCCM Shin Oxide Etch 300 MM 01.06.2003 1 as is where is
96726 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96727 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96728 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96729 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96730 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96986 TEL Tokyo Electron ACT 8 Track 200 mm 01.06.1997 1 inquire
92635 TEL Tokyo Electron NEXX Apollo Sputtering System 01.07.1905 1 as is where is
96731 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
92636 TEL Tokyo Electron NEXX Apollo Sputtering System 300mm 01.07.1905 1 as is where is
96732 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96733 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
88542 TEL Tokyo Electron ACT8 COT/DEV 150 MM 01.06.1999 1 as is where is
96734 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96735 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96736 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96737 TEL Tokyo Electron 19S Wafer PROBER 200 mm 1 inquire
96738 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
92131 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2015 1 as is where is
96739 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
92132 TEL Tokyo Electron TELFORMULA ALD High-K Vertical LPCVD Furnace 300 mm 01.06.2015 1 as is where is
96740 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
88549 TEL Tokyo Electron Mark7 Coater and Developer Track 200 MM 01.06.1998 1 as is where is
96741 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
96742 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
90599 TEL Tokyo Electron LITHIUS Multi Block (Resist Coater/Developer) 300 mm 01.07.2008 1 as is where is
96743 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
96744 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2003 1 inquire
96745 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
83690 TEL Tokyo Electron UNITY M 85TD Oxide Etcher 200 mm 1 as is where is immediately
96746 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
95979 TEL Tokyo Electron Alpha 8 Diffusion Furnace (LPCVD) 200 mm 01.06.1996 2 as is where is
96747 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
95980 TEL Tokyo Electron Alpha 8 Diffusion Furnace (Ox) 200 mm 01.06.1996 3 as is where is
96748 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
86253 TEL TOKYO ELECTRON 2985-429208-W4 ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE 300 mm 1 as is where is immediately
96749 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
96750 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
96751 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
96752 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2003 1 inquire
96753 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 01.06.2004 1 inquire
96754 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 1 inquire
78323 TEL Tokyo Electron P12XL PROBER 1 as is where is
95987 TEL Tokyo Electron P12XL ( WAT ) Fully Automatic Prober with Gold Hot Chuck and WAT 300 MM 01.10.2008 1 inquire immediately
96755 TEL Tokyo Electron P8XL Wafer PROBER 200 mm 1 inquire
82679 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87287 TEL Tokyo Electron TELFORMULA Nitride Vertical LPCVD Furnace 300 mm 01.06.2004 1 as is where is immediately
82680 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87288 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82681 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87289 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82682 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
87290 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
87291 TEL Tokyo Electron TELINDY Oxide Vertical LPCVD Furnace 300 mm 1 as is where is
82173 TEL Tokyo Electron Expedius SC1 and SC2 wafer wet cleaning 200 mm 01.03.2007 1 inquire immediately
83831 TOKYO ELECRON 015 RELAY SPARES 1 as is where is immediately
83833 TOKYO ELECRON 011 SUPPORT.PCB..SQ-80 SPARES 1 as is where is immediately
83641 TOKYO ELECTRON 1D10-317R09-12 PLATE,GALDEN FLOW CHECKER SPARES 1 as is where is immediately
83640 TOKYO ELECTRON / CONTEC FC-SD70 flow meter FLOW CHECKER 1 as is where is immediately
96665 Tokyo Seimitsu A-PM-90A Prober 01.09.1997 1 as is where is immediately


Not the item you were looking for?



Ask SDI fabsurplus.com!

If you can't find what you need, or are looking for a specific piece of semiconductor equipment let us know what type of semiconductor manufacturing equipment you would like to buy, and we will conduct a search for what you are looking for.

Inquiry