ASML TWINSCAN XT1250D 193nm (ArF) Scanner for Sale

-STILL INSTALLED
-CAN BE INSPECTED BY APPOINTMENT
-Configured in-line with a wafer track
-Wafer flow is left to right (Scanner is on the righthand side)
-Has CE Mark
-Laser Type: Cymer XLA165
-Laser Date: May 2004

The TWINSCAN XT:1250
-A 193-nm volume production tool for the 65-nm node
-Aimed at the 200-mm and 300-mm markets
-Ultra-k 1 solutions portfolio as standard
-A modular configuration
Ultra-k 1 products Standard on the XT:1250:
-Mask design optimization
-Aberration measurement and control
-Process variability compensation
-Optional Customized illumination
XT:1250 imaging results:
dense lines 70 nm (BIM) 140-nm pitch through focus. Binary mask. 70-nm lines: dipole NA=0.85, sigma 0.93/0.69. TArF6111, Ft=175 nm on Arc28 65 nm (AttPSM) Design onmask: 65-nm 1:1 pitch 6% AttPSM Dipole 35X illumination setting NA=0.85, sigma 0.93/0.69 TArF6111, Ft=175 nm on Arc28 XT:1250 imaging results: dense contact holes 85 nm (AttPSM) 170-nm pitch 6% AttPSM NA=0.85, sigma 0.93/0.69 QUASAR TM -30 Process: 250-nm TArF 7047, 82-nm AR19
-XT built on established TWINSCAN platform
-Fab requirement specifications lowered Up to 50% reduction in facility requirements