KLA-Tencor 6220 Bare Wafer Particle Detection System for Sale

SDI fabsurplus.com is pleased to announce the availability of the following listed used KLA-Tencor 6220 Bare Wafer Particle Detection System.
Please click on the "Get Quote" button at the end of the 6220 description, if you'd like to get a quotation, photos and specifications of this Bare Wafer Particle Detection System, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This KLA-Tencor 6220 Bare Wafer Particle Detection System is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.

KLA-Tencor 6220 Equipment Details

SDI ID: 102472
Manufacturer: KLA-Tencor
Model: 6220
Description: Bare Wafer Particle Detection System
Version: 150 mm / 200 mm
Vintage: Inquire
Quantity: 1
Sales Condition: inquire
Lead Time: immediately
Sales Price: Inquire

The Surfscan ® 6220 is used for the detection, quantification and sizing of particulate matter, glass defects and scratches on un-patterned wafers and wafers coated with smooth films, and for quantifying haze on a wide variety of substrate materials. The system can see dust down to 90nm levels on well-polished silicon. Low false defect numbers are achived via a software algorithm that separates actual defects from noise.The Surfscan 6220 features a Windows-based UI.
Automatic film curves
The Surfscan 6220 software generates film curves automatically, eliminating the need to deposit spheres on test wafers for each new calibration curve.

Wide dynamic range
The Surfscan 6220 has a wide dynamic range allowing a broad range of particles to be accurately sized in a single scan,more repeatable results and faster throughput. Repeatability of measurements is high, due to the system's high sampling rate.due to the system's significantly increased
sampling rate.
The throughput is up to 130 wafers per hour on 200 mm wafers.

Direct export of defect data
Defect data can be exported directly into popular spreadsheet and word processing applications.

System-to-system matching
Calibration software that lets users teach the instrument how to assign sizes to particles on their process wafers to improve performance. Using the same parameters accross different tools allows better matching.

Enhanced MicroView
MicroView allows areas of the wafer to be zoomed for high resolution review. Data can be viewed using different threshold settings for easier system set-up and more detailed data analysis.
Individual scattered field sizes can be measured and identified by their coordinates for easier subsequent
location. Precise X-Y coordinates for defects can be easily exported to optical or SEM review stations.

Networking and SECS-GEM is available as an option.
An Optional Statistical process control is provided via a basic SPC package installed on the Surfscan


Sensitivity: 0.09 μm at >80% capture rate
(latex spheres on bare silicon)

Throughput: >100 wph (200 mm wafers) at
0.12 μm

Repeatability: Within 0.5%, 1σ (mean count
>500, 0.364 μm diameter latex

Illumination Source: 30mW Argon-Ion laser, 488 nm
Sample Sizes: 100 mm to 200 mm (smaller sizes
upon request); round or square samples

Height:168 cm (66")
Width:75 cm (29.5")
Depth:77 cm (30.25")
Instrument Weight: 240kg (530 lbs)
Shipping Weight: 300kg (670 lbs)

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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