fabsurplus.com is pleased to announce the availability of the following listed used AKT New Aristo G4.5 NAR 1200L Vertical In-line Sputtering Machine for LCD / TFT panel G4.5. This AKT New Aristo G4.5 NAR 1200L Vertical In-line Sputtering Machine for LCD / TFT panel G4.5 is available for immediate sale. Please click on the "More Details" button if you'd like to get more details, photos and specifications of this Vertical In-line Sputtering Machine for LCD / TFT panel G4.5 and your request will be forwarded to our customer representatives automatically. Crating, refurbishment and delivery can be quoted on request.
|Model:||New Aristo G4.5 NAR 1200L|
|Description:||Vertical In-line Sputtering Machine for LCD / TFT panel G4.5|
|Version:||730mm x 920 mm|
|Sales Condition:||as is where is|
|Sales Price (each):||1,300,000 USD|
Technical Specification Vertical In-Line Sputtering Machine
TYPE: NAR 1200 L
Cycle time: 40sec
Glass size: 730mm x 920mm
To meet the present and future demands of LCD / TFT manufacturers, AKT America Inc. has designed and developed a vertical In-Line sputtering system, called NEW ARISTO. With the NEW ARISTO FAMILY, single and multiple layers can be coated on large glass substrates
The following features characterize the machine concept:
Modular design of the chambers
Full range of process options: e.g. heating, cooling, sputtering, glow discharge
Small footprint in the industry
High productivity due to fast cycle time.
Very high collection efficiency
Ease of maintenance
Low particle generation resulting in a superior cost of ownership
All data are based on glass
All data are based on glass
NOTE: max. Mo thickness: 500A
Target Material see Attachment 13.10
Glass specification Corning E2K Display Grade or equal
Throughput: 180 Substrates/h (2 Substrates / carrier) Target utilization: ≥ 40% in average over all targets
All mechanical operations, move of carriers, pump down, venting and process speed are optimized to meet a cycle time of 40sec.
The process data described in chapter 4.2 and 4.3 have to be achieved under a cycle time of 40sec.
for vacuum chamber:
Range: 103 hPa to 1*10-3 hPa
Range: 10-2 hPa to 1*10-9 hPa
in addition for each cathode :
AMAT S400 plus WSU 2001
*Max power of cathode will be limited to 40kW via Software limit.
(3 AC, N, PE)
be kept constant within: ± 2 °C (for TMP’s only)
concentration: max. 10/cm3
Pressure min/max.: 6/8 bar absolute
machine control room: 20 - 30°C
SYSTEM LAYOUT AND PHYSICAL DIMENSIONS INCLUDING KUKA LOADING ROBOT AND CLEANING SYSTEM:-
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Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.
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