Leybold DIS 2000V "Pegasus" PVD Sputtering System for Optical Coatings for Sale

Leybold Optics PVD Sputtering System Model: Pegasus PVD - Buehler Sputter System equipped with two magnetron cathodes for DC- and MF sputtering. Ion source Gpi PPALS 203. (2) Dis 2000V chambers, (2) Huttinger Elektronik TruPlasma DC3050, Advanced Energy DC Pinnacle power supply. (6) Shimadzu EI-D 303M suitable pump controllers, (2) ADL model GSW 300/500 power supplies, Pallets of spare parts cables and platform.

LEYBOLD OPTICS DIS series V.
A powerful solution for all display applications.
Highest target utilization, lowest particle yield, and a straightforward way of exchanging the targets:
LEYBOLD OPTICS DIS series V is Bühler’s production solution for the display industry. The system can process large substrates in sizes of up to Gen 10 (2.88 m x 3.13 m). Depending on the requirements, a contact-free transport system is available, using magnetic linear motor drives. Excellent quality of the coating layers is a key benefit of the LEYBOLD OPTICS DIS series V.

LEYBOLD OPTICS DIS series V initial design is rooted deeply in the display industry, where particle impact is making the difference. With a one-sided load and unload
module and a carrier rotation module at the end of the system, this machine is perfectly designed for clean-room applications, as the LEYBOLD OPTICS DIS series V can
be set up in a gray room, accessing the clean room only with its loading module.
Another major advantage of this approach is the folded design of the machine, which allows for an optimized footprint, as the return track can also be equipped with cathodes and heaters. These unique features make this production solution a smart choice for every vertical in- line sputter application that requires substrate heating and excellent process results, like TCO or carbon coatings.
Applications:
– AR coatings for LCD products
– ITO coatings for color filters
– Touch panel products

Customer benefits
– Excellent target utilization
– Lowest particle contamination
– High production capacity
– Flexible multi-chamber tool
– Easy and fast maintenance
– Optimized target exchange
– Optimized footprint

Technical information:
– Flexible mechanical cycle time:
Starting from 22 sec
– Substrate sizes: Gen 5 up to Gen 10
– Substrate thickness: 0.4– 5.0 mm
– Coating technology: DC planar move-target / MF rotary cathodes
– Substrate heating: Up to 350° C on the substrate
– Optional substrate pretreatment: Linear ion source
– TCO materials: ITO, AZO and many more

Options
– Planar cathodes with extended utilization by moving target technology
– Magnetic linear motor for reduced particle impact during transport
Process environment
– Multi-zone heating elements for optimized temperature uniformity
– Separate gas distribution zones
– Hinged cathodes for easy maintenance