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AKT / Applied Materials G5 15K PECVD system for FPD Amorphous Si Process for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used AKT / Applied Materials G5 15K PECVD system for FPD Amorphous Si Process. This AKT / Applied Materials G5 15K PECVD system for FPD Amorphous Si Process is available for immediate sale. Please click on the "Send More Details" button if you'd like to get more details, photos and specifications of this PECVD system for FPD Amorphous Si Process and your request will be forwarded to our customer representatives automatically. Crating, refurbishment and delivery can be quoted on request.


AKT / Applied Materials G5 15K Equipment Details

SDI ID: 95119
Manufacturer: AKT / Applied Materials
Model: G5 15K
Description: PECVD system for FPD Amorphous Si Process
Version: G5 (1100 mm x 1300 mm)
Vintage:
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price (each): Inquire
Comments:

-Still installed , available immediately, aSi chambers.

-The tool was running up until 8 months ago, when it was shut down.

-Prior to shut down, the tool was working without problems.

-Deposits insulating film on large-area glass substrates

Technical summary:

-The 15K system is used for the deposition of silicon-based films on Generation 5 Amorphous Silicon Flat Panel Display and Solar Cell substrates approximately 1.1m x 1.3m in size.

The AKT 15K PECVD system accomodates up to five process chambers, allowing a throughput of greater than 50 substrates per hour. -Features:-
-excellent deposition uniformity and superior temperature uniformity across the large substrate area.
-a standard software/hardware interface for connectivity to multiple factory interfaces.

The 15K system can be used for multiple applications, including both doped and undoped amorphous silicon (a-Si), silicon oxide, silicon oxynitride (SiON), silicon nitride, and in-situ multi-layer depositions. The system is equipped with Remote Plasma Source Clean technology for chamber cleaning, enabling highly repeatable deposition for over one month of full production without wet cleaning.

G5 AKT-15K PECVD

PECVD - Plasma Enhanced Chemical Vapor Deposition

  • DSSL: Dual Single Slot Loadlock (loading, cooling, unloading)

  • T/C : Transfer Chamber

  • P/C : Process Chamber

  • MCC: Master Cluster Controller

  • Remote support system: such as RF generator, Pump, Abatement, Heat exchanger, Remote plasma source clean etc.

System Layout

Min Maintenance area: 8,317mmX9,281mm

System height: 2,582mm

Min Crane area: 7,659X9,846mm

Min Crane service height: 3,350mm

System Configuration

Items

Configurations

Quantity

Process Chambers

A-Si

3

Substrate Size

1100mmx1300mm

1

Susceptor

Temperature <230°C

3

Load Lock

DSSL

3

Vacuum Robot

Dual arm

1

RPSC

MKS

3

Abatement

Edwards Neptune

1

Pump

Edwards iXL500Q

3

Edwards iXH3030

3

RF Generator

40MHz (4KW)

3

Gas Panel

NF3, Ar, N2, SiH4, H2, PH3, B2H6

3

Loader

J&R Automation

1

 

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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