Please find below a list of Used Mask and Reticle Manufacturing Equipment for sale by fabsurplus.com .Click on any listed item of Mask and Reticle Manufacturing Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 61532 | Canon | 7" Focus Mask | FOCUS MASK FOR THE CANON MPA600FA | 7 INCH | 2 | as is where is | immediately | |
| 61535 | Canon | 6" Focus Mask | MPA500FAb | Spares | 2 | as is where is | immediately | |
| 61536 | Canon | 6" DR Mask | MPA500FAb | 4 | as is where is | |||
| 61539 | Canon | Reticle 325-02 | For Stepper | 3 | as is where is | |||
| 61540 | Canon | Reticel 320-04 | For Stepper | 2 | as is where is | |||
| 61541 | Canon | 365-06 | Retcile For Stepper | 1 | as is where is | |||
| 61542 | Canon | 365-04 | Reticle For Stepper | 1 | as is where is | |||
| 61543 | Canon | 365i (365-01-1) | Reticle For Stepper | 1 | as is where is | |||
| 69904 | Canon | PLA 501 | FA Aligners, 2 inch, 3 inch , 4 inch | 2 | ||||
| 83513 | Entegris | RSPX-EUV-036 | EUV Reticle stocker | Facilities | 01.08.2010 | 1 | as is where is | immediately |
| 87611 | ETEC /Applied Materials | MEBES 4000 | electron beam lithography mask writer / direct write wafer lithography | reticle / 150 mm | 1 | as is where is | immediately | |
| 87825 | Horiba | PD3000 | Reticle inspection system | 200 MM | 01.06.1995 | 1 | as is where is | immediately |
| 69335 | Karl Suss | MA56 | MASK ALIGNER | 1 | inquire | immediately | ||
| 94565 | KLA-TENCOR | SL586H-T3 | RETICLE INSPECTION | RETICLE | 1 | as is where is | ||
| 94566 | LASERTEC | M8351 | RETICLE INSPECTION SYSTEM | RETICLE | 1 | as is where is | ||
| 94567 | N&K | GEMINI | SCATTEROMETER/REFLECTANCE-TRANSMISSION MEASUREMENT OF PHOTOMASK | RETICLE | 1 | as is where is | ||
| 94568 | PLASMATHERM | GEN4 MASK IV | Photomask Dry Etcher | RETICLE | 1 | as is where is | ||
| 93313 | PRI Automation | 7000 | RETICLE STOCKER | 1 | as is where is | immediately | ||
| 95692 | Seiko | SIR7000 | PHOTOMASK | 300 mm | 01.08.2005 | 1 | as is where is | |
| 54208 | Seminet | Infinity SACS 251216-120-CE | Semi-Automatic Carousel Boxed Reticle Stocker | facilities | 01.11.2007 | 1 | as is where is | immediately |
| 94928 | Steag Hamatech | ASP - 5500 | Mask Cleaning System | MASK | 01.06.2002 | 1 | as is where is | |
| 94569 | ZEISS | PROVE | REGISTRATION & OPTICAL CD Measurement of Photomasks | RETICLE | 1 | as is where is | ||
| 95172 | Zeiss | AIMS45 | Mask Simulation System | 300 mm | 01.10.2007 | 1 | as is where is | |
| 95533 | Zeiss | CDC200 | Photomask Trasmittance | 300 mm | 01.06.2010 | 1 | as is where is | immediately |