Please find below a list of FAB PVD SPUTTERS for sale by fabsurplus.com .All items are sold in "AS IS , WHERE IS" conditions unless otherwise indicated.Click on any list item to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 112626 | Airco Temescal | BJD-1800 | Filament Evaporator | 1 | as is where is | ||||
| 112627 | Airco Temescal | VES 2550 | E Beam Deposition System, 4 Pocket | 1 | as is where is | ||||
| 112628 | AKT APPLIED MATERIALS | 1600 | Cluster Sputtering Tool | 300 mm square | 1 | as is where is | |||
| 111578 | AMAT / Applied Materials | ENDURA CL MF | PVD Cluster tool mainframe and chambers for spares use | 300 mm | 01.01.2009 | 4 | as is where is | immediately | |
| 91199 | Applied Materials | P5000 Mark-II CVD+PVD | TEOS 2Ch, SPUTTER 2Ch | 200 mm | 01.05.1997 | 1 | as is where is | ||
| 91201 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Sputter 2Ch | 200 mm | 01.05.2000 | 1 | as is where is | ||
| 91616 | Applied Materials | ENDURA CL Chamber Only | AL | 300 mm | 1 | as is where is | |||
| 91618 | Applied Materials | ENDURA CL Chamber Only | Chamber 1 (Ver. 001) CPI-VMO | 300 mm | 1 | as is where is | |||
| 97053 | Applied Materials | ENDURA2 Chamber only | Amber-(Ti) chamber | 300 mm | 1 | as is where is | immediately | ||
| 97054 | Applied Materials | ENDURA2 Chamber only | ESIP chamber | 300 mm | 1 | as is where is | immediately | ||
| 97061 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | ||
| 97062 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | ||
| 103506 | Applied Materials | ENDURA CL | PVD | 300 mm | 31.05.2010 | 1 | as is where is | ||
| 106587 | Applied Materials | ENDURA 2 CHAMBER ONLY | PCXT | 300 mm | 01.06.2019 | 1 | as is where is | ||
| 106589 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2018 | 1 | as is where is | ||
| 106592 | Applied Materials | ENDURA 2 CHAMBER ONLY | RPC | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 106593 | Applied Materials | ENDURA 2 CHAMBER ONLY | SIP Ti | 300 mm | 1 | as is where is | |||
| 106598 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | |||
| 106599 | Applied Materials | ENDURA 2 CHAMBER ONLY | TXZ ALD chamber | 300 mm | 1 | as is where is | immediately | ||
| 106602 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 01.06.2010 | 5 | as is where is | immediately | |
| 106605 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | |||
| 106606 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | |||
| 106609 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN CHAMBER | 300 mm | 01.06.2002 | 1 | as is where is | immediately | |
| 106610 | Applied Materials | ENDURA CL Chamber Only | RPC | 300 mm | 01.06.2002 | 1 | as is where is | immediately | |
| 106614 | Applied Materials | ENDURA2 VOLTA CO | CHAMBER QTY 2 SETS | 300 mm | 1 | as is where is | |||
| 106638 | Applied Materials | ENDURA 2 Chamber Only | EXTENSA Ti | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 108134 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Cu) Chamber only | 300 mm | 1 | as is where is | |||
| 108135 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Cu) Chamber only | 300 mm | 1 | as is where is | |||
| 108136 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Ta) Chamber only | 300 mm | 1 | as is where is | |||
| 108137 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Ta) Chamber only | 300 mm | 1 | as is where is | |||
| 108138 | Applied Materials | ENDURA 2 CHAMBER Only | PCXT Chamber only | 300 mm | 01.06.2019 | 1 | as is where is | ||
| 108141 | Applied Materials | ENDURA CL Chamber Only | ESIP TAN (No Target) Chamber only | 300 mm | 1 | as is where is | |||
| 108558 | Applied Materials | ENDURA CL | PVD Cluster tool | 300 mm | 01.05.2002 | 1 | as is where is | ||
| 108559 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2006 | 1 | as is where is | immediately | |
| 108560 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2018 | 1 | as is where is | immediately | |
| 108561 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2018 | 1 | as is where is | immediately | |
| 110802 | Applied Materials | Endura | IMP Ti / TiN Physical Vapor Deposition System | 200 mm | 01.06.2000 | 1 | as is where is | immediately | |
| 111521 | Applied Materials | Endura CL | PVD | 300 mm | 01.06.2001 | 1 | as is where is | ||
| 111577 | Applied Materials | Endura (Chamber) | Process chamber (Suitable for spares use) | 300 mm | 01.01.2009 | 2 | as is where is | immediately | |
| 111633 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 113019 | Applied Materials | CENTURA PVD | Ti 2CH, Cu 1CH, Preclean 1CH | 200 mm | 01.06.2005 | 1 | as is where is | ||
| 113021 | Applied Materials | ENDURA 2 (Blue Rack) | ALPS ESI 2CH, PcXT 1CH, Degas (STD) 2CH | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 113022 | Applied Materials | ENDURA 2 (Gray Rack) | AL 2CH, TTN 1CH, SIP 2CH, ALPS 1CH, PcXT 1CH, Degas (STD) 2CH | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113023 | Applied Materials | ENDURA 2 (Gray Rack) | SIP 1CH, ALPS 3CH, PcXT 2CH, Degas (DMD) 2CH | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 114014 | Applied Materials | ENDURA 2 | VOLTA XT CO | 300 mm | 1 | as is where is | |||
| 114015 | Applied Materials | ENDURA 6" | TTN *5CH | 150 MM | 01.06.1996 | 1 | as is where is | ||
| 114016 | Applied Materials | ENDURA 6" | TTN *5CH | 150 MM | 01.06.1994 | 1 | as is where is | ||
| 114017 | Applied Materials | ENDURA CL | SIP Ti (No Target) | 300 mm | 1 | as is where is | |||
| 114059 | Applied Materials | Endura II Aluminum Interconnect | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114062 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114281 | Applied Materials | Endura 5500 | PVD cluster tool with Process chambers for Al, Cr, Cr and 1 chamber not used. | 200 mm | 01.06.2001 | 1 | as is where is | ||
| 114557 | Applied Materials | ENDURA CL SIP CHAMBER | AMAT 300MM ENDURA CL SIP CHAMBER 0010-16858 0190-27350 8113192G001 10846-XE28-AAX2 | 300 MM | 1 | as is where is | |||
| 114558 | Applied Materials | ENDURA CL SIP CHAMBER | AMAT 300MM ENDURA CL SIP CHAMBER 0010-16858 0190-27350 8113192G001 10846-XE28-ANL1 | 300 MM | 1 | as is where is | |||
| 114559 | Applied Materials | ENDURA CL ALD CHAMBER | AMAT 300MM ENDURA CL ALD CHAMBER 800170V2106 26340-QA21-0002 | 300 MM | 1 | as is where is | |||
| 114561 | Applied Materials | ENDURA CL ALD CHAMBER | AMAT 300MM ENDURA CL ALD CHAMBER 800170V2106 26340-QA21-0002 | 300 MM | 1 | as is where is | |||
| 114562 | Applied Materials | ENDURA CL PRECLEAN CHAMBER | AMAT 300MM ENDURA CL PRECLEAN CHAMBER 0190-12085 8113160G001 10846-XE28-ANL1 | 300 MM | 1 | as is where is | immediately | ||
| 114575 | Applied Materials | ENDURA CL SIP CHAMBER | AMAT 300MM ENDURA CL SIP CHAMBER 0010-16986 0190-27350 0010-22569 8113192G001 10846-XE28-AAX2 | 300 MM | 1 | as is where is | |||
| 114576 | Applied Materials | ENDURA CL TI CHAMBER | AMAT 300MM ENDURA CL TI CHAMBER 0190-27350 8113192G001 10846-XE28-AAX2 | 300 MM | 1 | as is where is | |||
| 114577 | Applied Materials | ENDURA CL PVD CHAMBER | AMAT 300MM ENDURA CL PVD CHAMBER 0010-23066 0190-12086 8113212G001 10846-XE28-ANL1 | 300 MM | 1 | as is where is | |||
| 114578 | Applied Materials | ENDURA CL PRECLEAN CHAMBER | AMAT 300MM ENDURA CL PRECLEAN CHAMBER TURBOVAC 100C 10846-XE28-ANL1 3870-03969 0010-31158 0010-17690 0010-21748W | 300 MM | 1 | as is where is | |||
| 114579 | Applied Materials | ENDURA CL PRECLEAN CHAMBER | AMAT 300MM ENDURA CL PRECLEAN CHAMBER TURBOVAC 100C | 300 MM | 1 | as is where is | |||
| 115536 | Applied Materials | Endura 5500 | PVD (Physical Vapor Deposition) | 150 MM | 01.06.1998 | 1 | as is where is | ||
| 115537 | Applied Materials | Endura 5500 Aluminum Interconnect | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115538 | Applied Materials | Endura 5500 Aluminum Interconnect | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115539 | Applied Materials | Endura 5500 Aluminum Interconnect | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115540 | Applied Materials | Endura 5500 Front-End Metallization | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115541 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 115542 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 115543 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 115544 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 115545 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 115546 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 115547 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 115548 | Applied Materials | Endura II Liner/Barrier | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 116508 | Applied Materials | ENDURA 2 Chamber Only | ALPS Chamber | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
| 116517 | Applied Materials | Centura PVD | PVD Cluster tool, Refurbished | 200 mm | 1 | inquire | immediately | ||
| 116518 | Applied Materials | Endura 5500 | PVD Cluster tool, Refurbished | 200 mm | 2 | inquire | immediately | ||
| 116519 | Applied Materials | Endura 5500 TxZ | MOCVD Cluster tool, Refurbished, TiN process | 200 mm | 1 | inquire | immediately | ||
| 116640 | Applied Materials | Endura 2 (Cu Chamber Only) | Cu Chamber , position 3 , P/N SEMSYSY-PJ-ECH3 | 300 mm | 01.04.2024 | 1 | as is where is | immediately | |
| 102643 | BPS | Cyberite | Ion Beam Deposition Tool | 125 mm | 31.05.1999 | 1 | inquire | immediately | |
| 108805 | CHA | SEC-1000 | E-Beam Evaporator with CV-8 Power Supply | 1 | inquire | ||||
| 114292 | CHA | SEC-1000-RAP | Vacuum Evaporator | 200 mm | 01.06.2013 | 1 | as is where is | ||
| 112679 | CHA Industries | SEC-1000-RA | Electron Beam Evaporator | 1 | as is where is | ||||
| 112680 | CHA Industries | SEC-600-RAP | Filament Evaporator | 1 | as is where is | ||||
| 108811 | DENTON | DV-502A | Electron-Beam Evaporator with Telemark TT3 P/S, 4 Pocket E-Gun | 1 | inquire | ||||
| 113328 | Evatec | Solaris S151 | Multi-chamber sputtering system for Ag, Al, W, TCO ITO and AZO | 156 mm square (200 mm) | 01.06.2015 | 1 | as is where is | immediately | |
| 114303 | EVATEC | BAK 1400 | Vacuum Evaporator | 150~300 mm | 01.06.2019 | 1 | as is where is | ||
| 115732 | Evatec | Clusterline 200 II | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115733 | Evatec | Clusterline 200E | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115734 | Evatec | Clusterline 200E | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115735 | Evatec | Clusterline 200E | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115736 | Evatec | BAK 911E | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115737 | Evatec | BAK 911E | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 116672 | Evatec | BAK 911E - CB | Evaporator | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116673 | Evatec | BAK 911E - CB | Evaporator | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116674 | Evatec | Clusterline 200 ITO1 | ITO Sputtering | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116675 | Evatec | Clusterline 200 ITO2 | ITO Sputtering | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116676 | Evatec | Clusterline 200 ITO2 | ITO Sputtering | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 108572 | LAM RESEARCH | INOVA | PVD | 300mm | 01.06.2004 | 1 | as is where is | immediately | |
| 108573 | LAM RESEARCH | INOVA | PVD | 300mm | 01.06.2010 | 1 | as is where is | immediately | |
| 112798 | Leybold | LAB 600 EB | E Beam Evaporator--Ion Assist | 1 | as is where is | ||||
| 116561 | Leybold | Bühler SyrusPro 700 LT "Lift-Off" | High Vacuum Optical Coating System | Laboratory | 01.04.2023 | 1 | as is where is | immediately | |
| 112856 | MRC | 902 | In-Line Sputtering System | 1 | as is where is | ||||
| 103545 | NOVELLUS | CONCEPT 3 INOVA | NExT | 300 mm | 1 | as is where is | |||
| 108581 | NOVELLUS | MB2 | Metal PVD System | 200 mm | 01.05.1994 | 1 | as is where is | immediately | |
| 108582 | NOVELLUS | MB2 | Metal PVD System | 200 mm | 01.05.1994 | 1 | as is where is | immediately | |
| 108583 | NOVELLUS | MB2 | Metal PVD System | 200 mm | 01.05.1994 | 1 | as is where is | immediately | |
| 114242 | OERLIKON | Clusterline 200 | PVD cluster tool with 6 chambers | 200 mm | 2 | as is where is | immediately | ||
| 113980 | Optorun | OWLS-1800D | Optical Sputter Coater System | 1 | inquire | ||||
| 111382 | PERKIN ELMER | 2400 | Sputtering system | 1 | as is where is | immediately | |||
| 113982 | Perkin Elmer | 4410 | Sputtering System | 1 | inquire | ||||
| 108862 | PERKIN-ELMER | 2400 | Sputtering System | 1 | inquire | ||||
| 116050 | Polyteknik | Flextura 200 | PVD (Physical Vapor Deposition) | 200 mm | 01.06.2020 | 1 | as is where is | immediately | |
| 116110 | Scia Systems | Magna 200 | PVD (Physical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 106516 | SFI | Endeavor AT | PVD cluster tool | 150 mm | 1 | as is where is | immediately | ||
| 106517 | SFI | Endeavor AT | PVD cluster tool | 150 mm | 01.06.1990 | 1 | as is where is | immediately | |
| 113907 | SPTS | SIGMA FXP Rev F | TF Metal PVD Al Metal Sputter | 150 mm | 01.06.1999 | 1 | as is where is | immediately | |
| 113908 | SPTS | SIGMA FXP Rev F | TF Metal PVD Al Metal Sputter | 150 mm | 01.06.2001 | 1 | as is where is | immediately | |
| 113917 | SPTS | SIGMA 200 | TF Metal PVD Al Metal Sputter | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113918 | SPTS | SIGMA 200 | TF Metal PVD Al Metal Sputter | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113919 | SPTS | SIGMA 200 | TF Metal PVD Al Metal Sputter | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113920 | SPTS | SIGMA 200 | TF Metal PVD Al Metal Sputter | 150 mm | 01.06.1997 | 1 | as is where is | immediately | |
| 113921 | SPTS | SIGMA 200 | TF Metal PVD Al Metal Sputter | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113922 | SPTS | SIGMA 200 | TF Metal PVD Al Metal Sputter | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 108883 | TEMESCAL | BJD-1800 | E-Beam Evaporator with CV-14 Power Supply | 1 | inquire | ||||
| 108884 | TEMESCAL | FCE-2500 | E-Beam Evaporator with Simba 2 Power Supply | 1 | inquire | ||||
| 108885 | TEMESCAL | VES-2550 | E-Beam Evaporator with CV-14 Power Supply | 1 | inquire | ||||
| 112944 | Temescal | BJD 1800 | E Beam Evaporator, 10CC Crucible | 1 | as is where is | ||||
| 112945 | Temescal | BJD-1800 | E Beam Evaporator, 7cc Crucible | 1 | as is where is | ||||
| 112946 | Temescal | VES-2550 | High Volume Evaporator | 1 | as is where is | ||||
| 113180 | THERMAL | GYE-12000 | Evaporator System | 200 mm | 1 | as is where is | |||
| 114215 | Ulvac | Entron-EX W300 | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114424 | Ulvac | SME 200 | PVD deposition system | 200 mm | 1 | as is where is | immediately | ||
| 116385 | Ulvac | Entron-EX | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 102642 | Unaxis/Balzers | ZH620 Alumina Fill | Fill Sputter Deposition System | 125 mm | 01.05.2000 | 1 | as is where is | immediately | |
| 110658 | Varian | 3190 | Sputtering System | 100 mm | 1 | as is where is | immediately | ||
| 112956 | Varian | 3190 | Single Wafer Vertical Sputter System | 1 | as is where is | ||||
| 112957 | Varian | Core System | SS 25.5" Diameter X 30" High Vacuum Chamber | 1 | as is where is |