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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 116706 | RENA | BatchW | Wet Bench – Acid Wet Etch | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116707 | RENA | BatchW | Wet Bench – Acid Wet Etch | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116708 | RENA | BatchW | Wet Bench – Acid Wet Etch | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116709 | RENA | BatchW | Wet Bench – GaAs Acid Wet Etch | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116710 | RENA | BatchW | Wet bench – incoming wafer clean CHIP | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116711 | RENA | BatchW | Wet Bench – Wet Etch KOH | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116712 | RENA | BatchW | Wet Bench – Wet Clean – Post Dry Etch (DI Rinse) | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116713 | RENA | BatchW | Wet Bench – Wet Clean – Post Dry Etch (DI Rinse) | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116714 | RENA | BatchW | Wet Bench – Resist Strip | 200 mm | 01.06.2024 | 1 | as is where is | ||
| 116715 | RENA | BatchW | Wet Bench – Resist Strip | 200 mm | 01.06.2024 | 1 | as is where is |