SDI fabsurplus.com is pleased to announce the availability of the following listed used Roth & Rau SiNA PECVD System.
Please click on the "Send More Details" button at the end of the SiNA description, if you'd like to get more details, photos and specifications of this PECVD System, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Roth & Rau SiNA PECVD System is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|Manufacturer:||Roth & Rau|
|Sales Condition:||as is where is|
The modular In-line plasma process systems for anti-reflection coating of crystalline solar cells.
SiNA® deposition system consists of one processing module and appropriate buffer modules. SiNA® is used to generate a 100 nm Silicon-Nitride layer on the front side of the wafer and can be integrated into various PERx production processes.
Maximum Capacity [Wafer/h] 2400
Throughput [Wafer/h] 2.400
Uptime [%] 93
Breakage rate [%] 0,10
MTBF [hour] 430
MTTR [hour] 2,6
Wafer orientation [-] Sunny side UP
Noise level [dB] 75
Cycle time [s/part] 67,00
Full configuration and specification available upon request.
Equipment stored in warehouse.
Please check pictures below from more information.
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The data provided herein is not an offer capable of acceptance.
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Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.
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