SDI fabsurplus.com is pleased to announce the availability of the following listed used TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, 2C,2D,ASML.
Please click on the "Get Quote" button at the end of the ACT 8 description, if you'd like to get a quotation, photos and specifications of this DUV Photo Resist Coat and Develop System, 2C,2D,ASML, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This TEL Tokyo Electron ACT 8 DUV Photo Resist Coat and Develop System, 2C,2D,ASML is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|Manufacturer:||TEL Tokyo Electron|
|Description:||DUV Photo Resist Coat and Develop System, 2C,2D,ASML|
|Sales Condition:||as is where is|
|Sales Price (each):||Inquire|
DUV, Single Block, 2C2D1IFB, 3PHP, Right to Left Flow, 4UNCs, ASML PAS5500.
1. Maker : TEL/Tokyo Electron Limited
The data provided herein is not an offer capable of acceptance.
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