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TEL Tokyo Electron Clean Track ACT 8 Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used TEL Tokyo Electron Clean Track ACT 8 Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F.
Please click on the "Send More Details" button at the end of the Clean Track ACT 8 description, if you'd like to get more details, photos and specifications of this Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This TEL Tokyo Electron Clean Track ACT 8 Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


TEL Tokyo Electron Clean Track ACT 8 Equipment Details

SDI ID: 102908
Manufacturer: TEL Tokyo Electron
Model: Clean Track ACT 8
Description: Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F
Version: 200 mm
Vintage: 01.06.1999
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

Summary: TEL Clean Track ACT 8 Single Block (200mm, 8") with 2Coat(1COT+1TCT) + 2Develop + 1Interface
4UNCs/Uni-Cassettes (Open Cassette) Indexers, Canon Interfaced, Left to Right Wafer Flow - 1 set

1. Maker : TEL/Tokyo Electron Limited
2. Model : Clean Track ACT 8
3. Description : Photo Resist Coat and Develop System
4. Vintage : 1998
5. Serial Number : TBA
6. Configuration

1. Block Diagram (left to Right Wafer Flow)
    2,290 x 1,570 x 2,685 (L x W x H by mm)

 

    2-24 LHP     2-14 LHP 3-4 WEE  
UNC   2-23 CHP     2-13 LHP    
    2-22 CHP     2-12 LHP    
(1-4) CRA 1-0 2-21 CHP     2-11 RSV    
    2-20 CWH     2-10 RSV 3-0 IRA 3-5 EIS
UNC   2-19 CPL     2-09 RSV    
    2-18 TRS 2-0 2-08 RSV    
(1-3)   2-17 TRS PRA 2-07 CPL    
    2-16 RSV   2-06 TRS    
    2-15 ADH     2-05 CPL    
    2-3   2-4   3-3 SBU  
UNC              
    DEV     DEV    
(1-2)           3-2 SBU  
    2-1   2-2      
UNC              
  PUP COT     TCT    
(1-1)           3-1 THS  
  (1-5)            



Chemical Supply System
Develop, Solvent and HMDS Supply
1,400 x 700 x 1,810 (L x W x H, mm)

Thermo Control Unit
SMC INR-244-211D-45
450 x 1,050 x 1,400 (L x W x H, mm)

Temp & Humidity Controller
TEL OEM Shinwa T&H-ESA-2
600 x 1200 x 1000 (L x W x H, mm)

AC Power Rack
600 x 600 x 1,600 (L x W x H, mm)

2) Cable Lengths

No. From            To      Length
                            Power   Signal
1.  AC Power Rack   PRB2    13 M
    AC Power Rack   TCU     13 M
    AC Power Rack   T + H   13 M
2   Chemical Cab.   PRB2    13 M
    Chemical Cab.   TCU              13 M
    Chemical Cab.   T + H            13 M

3) Chemical Cabinet Layout Details

1           2           3           4
2-5 ADH     Solvent     2-3 DEV     2-4 DEV
HMDS        Filter      Filter      Filter
Buffer      Tray        Tray        Tray
Tank Tray   

4           5           6           7
Solvent     10L                     DEV
3L Buffer   Drain                   3L Buffer
Tank 2ea    Tank Tray               Tank 2ea

4) General Configuration
 A. Wafer Size : 200mm, DUV/Deep UV Application, Single Block System
 B. Wafer Flow : Left to Right (CSB Unit is on left side and Interface Station Unit is on Right side)
 C. Process Block : 1ea (Single Block System)
 D. Block #1
  a. TEL Clean Track ACT 8 EC/Equipment Controller #2
  b. Stage/Indexer : Open Uni-Cassette CSB/Cassette Stage Block
  c. CRA/Cassette Block Robotics Arm : 1ea
  d. FFU: N/A

 E. Block #2
  a. 2-1 Standard Coat Unit including:
    1. 4 Standard Photo Resist Dispense Nozzles
    2. 4 TEL OEM RRC F-T201 Photo Resist Pumps
    3. 1 Solvent Pre-wet RRC/Reduced Resist Coat Nozzle
    4. 1 Side Rinse Nozzle (Programmable Side Rinse EBR)
    5. Dual Back Rinse Nozzles
    6. Coat Cup Temperature Synchronized Control System
    7. Photo Resist Temperature Control
    8. Motor Flange Temperature Control
    9. Photo Resist Drain Type : Auto Drain (SMC Drain Pump Type)
   10. Auto Dummy Dispense System
   11. Photo Resist Bottle Configuration:
            Resist#1 Resist#2 Resist#3 Resist#4
Coater 2-1  1 Bottle 1 Bottle 1 Bottle 1 Bottle
Coater 2-2  N/A      1 Bottle 1 Bottle N/A

  b. 2-2 TCT (Top ARC/Anti-Reflecting Coat) Unit including:
    1. 2 Standard Photo Resist Dispense Nozzles
    2. 2 TEL OEM RRC F-T201 Photo Resist Pumps
    3. 1 Solvent Pre-wet RRC/Reduced Resist Coat Nozzle
    4. 1 Side Rinse Nozzle (Programmable Side Rinse EBR)
    5. Dual Back Rinse Nozzles
    6. Coat Cup Temperature Synchronized Control System
    7. Photo Resist Temperature Control
    8. Motor Flange Temperature Control
    9. Photo Resist Drain Type : Auto Drain (SMC Drain Pump Type)
   10. Auto Dummy Dispense System
   11. Photo Resist Bottle Quantity :
            Resist#1 Resist#2 Resist#3 Resist#4
Coater 2-1  1 Bottle 1 Bottle 1 Bottle 1 Bottle
Coater 2-2  N/A      1 Bottle 1 Bottle N/A

  c. 2-3 Develop Unit, including:
    1. 1 H Nozzle
    2. Develop Temperature Control
    3. Motor Flange Temperature Control
    4. Drain Type : Direct Gravity Drain Type
    5. Top Rinse Nozzle
    6. Dual Back Rinse Nozzle
    7. Auto Damper
    8. Auto Dummy Dispense System
  d. 2-4 Develop Unit : Same as 2-3 Develop Unit
  e. PRA/Process Block Robotics Arm : 1ea
  f. ADH/Adhesion Process Station : 1ea
  g. LHP/Low Temperature Hot Plate Station : 4ea
  h. CPL/Chilling Pate Process Station : 3ea
  i. TRS/Transition Stage Unit : 3ea
  j. CHP/Chilling Hot Plate Process Station : 3ea.
  k. PHP/High Precision Hot Plate Process Station : N/A
  l. CWH/Cup Washer Holder Unit : 1ea

 F. Block #3 : Normal Speed Interface Block, including:
  a. IRA/Interface Robotics Arm : 1ea
  b. Interface for CANON(FPA5000EX5) Scanner.
  c. WEE/Wafer Edge Exposure Process Station :1ea (Deep UV, 365nm)
  d. THS/Temporary Holding Stage : 1ea
  e. SBU/Stationary Buffer Unit : 2ea
  f. TRS/Transition Stage Unit : N/A
  g. CPL/Chill Plate Process Station : N/A
  h. EIS/Interface Stage Module : N/A
  i. FFU: Installed

 G. T&H/Temperature and Humidity Controller : 1ea
   - 1ea of TEL OEM Shinwa T&H-ESA-2

 H. External Chemical Supply System/Cabinet (HMDS, Solvent, Developer)
   a.HMDS Supply System
    1. HMDS Chemical Type: 1ea
    2. Bulk-Fill CSS/Central Chemical Supply Type with 3 Liter Teflon Buffer Tanks (1)
    3. 1 Buffer Tanks (3 Liter/Tank, Teflon, N2 Bubbling) for 1 ADH Unit
   b.Solvent Supply System for 1 Standard COT (2-1) and 1 TCT (2-2)
    1. Solvent Chemical Type: 1ea
    2. Bulk-fill CSS/Central Chemical Supply Type with 3Liter Teflon Buffer Tanks (2)
    3. 2 Buffer Tanks (3 Liter/Tank, Teflon) to support 1Standard of COT and 1 TCT
   c.Developer Supply System for 2 Develop Units (2-3 and 2-4)
    1. Developer Chemical Type: 1ea
    2. Bulk-Fill CSS/Central Chemical Supply Type with 3 Liter Teflon Buffer Tanks (2)
    3. 2 Buffer Tanks (3 Liter/Tank, Teflon) to support 2 Develop Units (2-3 and 2-4)

 I. TEL OEM TCU/Temperature Control Unit : 1ea
    (SMC Circulator Pumps and Thermo Controller with 7 Channels)
     a. 2 Chilling Channels for 2 Coat Spin Units (COAT and TARC Spin Unit)
     b. 2 Chilling Channels for 2 Develop Units
     c. 3 Chilling Channel for 3 CPL/Chill Plate Process Station Units

 J. Robots : Total 3 Robots (1 CSB Robot, 1 Main Arm Robots and 1 Interface Station Robot)

 K. Power Transformer AC Cabinet : 208VAC, 3 Phases, 50/60Hz

 L. Software
  a. Software Version : 1.18

 M. Safety Regulation Compliance : TEL S2-93 Safety Specification

 N. Utility connection Position
  a.Connection Position : Bottom/Back Side

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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