SDI fabsurplus.com is pleased to announce the availability of the following listed used Molecular Imprints Imprio 55 Nano Imprint Lithography System.
Please click on the "Send More Details" button at the end of the Imprio 55 description, if you'd like to get more details, photos and specifications of this Nano Imprint Lithography System, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Molecular Imprints Imprio 55 Nano Imprint Lithography System is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|Description:||Nano Imprint Lithography System|
Configuration: Nano-imprint lithography tool, proven resolution down to 30 nm, Fragile substrates like GaAs, InP, or glass can also be imprinted. Molecular Imprints Imprio 55 Nano Imprint Lithography System consisting of: - Model: Imprio 55 - Nano-imprint lithography tool - Proven resolution down to 30 nm. - The Imprio 55 utilizes S-FIL, a bi-layer lithography technique in which a low viscosity, UV-curable liquid is dispensed in droplets onto an underlying standard organic planarization layer, enabling imprinting on a wide range of semiconductor device layers. - The Imprio 55 utilizes a step-and-repeat process has the flexibility to support up to 8 inch wafers with a low-cost single-size template. - Fragile substrates like GaAs, InP, or glass can also be imprinted. - The Imprio 55 can imprint up to a 10 mm square field or a 14 mm diameter round field. - Available for full inspection.
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