JST CLV IPA Wafer Dryer for Sale

-still installed and in working condition

-has CE mark

-400 VAC 3 PHASE 24 A

The Closed Loop Vapor Dryer (CLV) is a patented ultra-clean IPA Drying technology designed and built
to provide optimal wafer drying performance.
The CLV is a combination of two proven drying technologies: vacuum and isopropyl alcohol IPA drying.

In the CLV Dryer, IPA vapor is remotely generated and introduced into the drying chamber where it mixes with and displaces the water.
The vapor is then pulled out of the chamber and replaced with ultrapure nitrogen.
The closed loop process provides low particle drying for blind holes, vias, and high aspect ratios while reducing IPA usage and emissions.

Applications for the CLV Dryer include silicon wafer, II-VI compound wafer, MEMS, glass substrates, and optics, among others.
In a typical performance, the CLV’s dry cycle lasts between 10 and 20 minutes, depending on carrier and product type.
It consumes an average of 60mL IPA per drying cycle. Typical particle performance of < 20 adders @ 0.16um or greater per drying cycle.
The CLV Dryer emits less than a pound of vapor emissions a day.

Standard features
304L stainless steel shell and containment
316L electropolished stainless steel process chamber
No IPA vapor present during load/unload
Sealed vessel with closed loop process
Indirect heating of IPA to create vapor
CO2 fire suppression system
Designed with a programmable logic controller (PLC) in addition to an industrial color touchscreen
Modular design for quick replacements and minimal down time
Automated lid with two hand safety control
Front, side, and rear access maintenance with lift-off panels
Recessed dry chamber design pulls chemical fumes through the exhausted dual containment plenum
Meets NEC, NFPA, and FM Codes for processing with flammable solvents (IPA)
SEMI S2 certification
CE marked

Optional Features
Flexible dry chamber sizes available
Facility bulk chemical dispense of IPA
GEM/SECSII factory automation interface
3rd party electrical inspections
Heated N2 blow-off for reduced dry cycle time
External high volume vacuum pump for reduced dry cycle time
Available as a standalone configuration or integrated into a JST Automated Wet Bench for dry-to-dry processing