fabsurplus.com is pleased to announce the availability of the following listed used ETEC /Applied Materials MEBES 4000 electron beam lithography mask writer / direct write wafer lithography. This ETEC /Applied Materials MEBES 4000 electron beam lithography mask writer / direct write wafer lithography is available for immediate sale. Please click on the "More Details" button if you'd like to get more details, photos and specifications of this electron beam lithography mask writer / direct write wafer lithography and your request will be forwarded to our customer representatives automatically. Crating, refurbishment and delivery can be quoted on request.
| SDI ID: | 87611 |
|---|---|
| Manufacturer: | ETEC /Applied Materials |
| Model: | MEBES 4000 |
| Description: | electron beam lithography mask writer / direct write wafer lithography |
| Version: | reticle / 150 mm |
| Vintage: | |
| Quantity: | 1 |
| Sales Condition: | as is where is |
| Lead Time: | immediately |
| Sales Price (each): | 399,000 USD |
| Comments: | -Includes installation and calibration (Within Continental USA). -Includes 150 mm wafer pallets for direct write. -The system is currently fitted with an LaB6 gun. -TFE Gun upgrade also available (At extra cost). Please inquire for more details. Basic Specifications:- Parameter Specification Min Feature size: 0.2 um Positional accuracy: 0.08 um (3 sigma) Overlay accuracy: 0.05 um Stripe butting: 0.05 to 0.06 um (Mean plus 3 sigma) Write Scan linearity (max): 0.04 um System to system overlay: 0.10 um (3 sigma) Linewidth control (mean to nominal): 0.07 um Linewidth uniformity (mean to max): 0.07 um Line edge roughness : 0.05 um (3 sigma) Array placement accuracy: 150 um Resolution: 0.35 or 4 x address Writing rate: 160 MHz Spot size: 0.08 to 0.27 um |
| Attachments: | 0 Files |
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