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NIKON NSR-1755i7A i-line Stepper for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used NIKON NSR-1755i7A i-line Stepper.
Please click on the "Send More Details" button at the end of the NSR-1755i7A description, if you'd like to get more details, photos and specifications of this i-line Stepper, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This NIKON NSR-1755i7A i-line Stepper is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


NIKON NSR-1755i7A Equipment Details

SDI ID: 96596
Manufacturer: NIKON
Model: NSR-1755i7A
Description: i-line Stepper
Version: 4 inch-8 inch
Vintage: 01.06.1992
Quantity: 1
Sales Condition: inquire
Lead Time: immediately
Sales Price: Inquire
Comments:

-Still installed in the fab.

-Shut down and powered off.

-Can be inspected by appointemnt.

-The equipment is in excellent condition, with no missing parts.

-The equipment was lightly used in an R and D environment for around 2-3 years. -The equipment ran 4 inch Sapphire wafers.

-5 INCH RETICLE
-5:1 reduction ratio
-17.5 Field
-O.45 Resolution, NA = 0.5
-Global alignment 0.18 um

-The equipment was completely refurbished and converted for use with 4 inch Sapphire wafer in June 2010.

-The equipment can be converted to run up to 8 inch wafers by changing out the wafer chuck.

Nikon NSR-1755i7A - Specification

No.

Item

Specification

1

Resolution

0,50 µm

2

Lens Distortion (including magnification error)

Within ± 0.07 µm

3

Magnification Control

Within ± 0.03 µm

4

Maximum Exposure Area

Within 24.74 mm dia.

17.5 mm x 17.5 mm to

13.41 mm x 20.14 mm

    (hori.)           (ver.)

5

Reticle Bind Setting Accuracy

+ 0.4 + 0.8 mm (on reticle)

6

Exposure Power

600 mW/cm3 or more

7

Integrated Exposure Stability

Within ± 1.4% (30mJ/cm2 or more)

8

Illumination Uniformity

Within ±1.5%

9

Reticle Rotation

Absolute Value within

±0.02 µm of target value

Repeatability within

0.02µm

10

Focus Calibration Repeatability

Within 0.15 µm  (3 ơ)

11

Alignment Accuracy

WGA  X+3 ơ ≤0.18 µm

EGA X+3 ơ ≤0.11 µm

12

Array Orthogonality

Within ± 0.2 sec

13

Stepping Precision

Within 0.8 µm  (3 ơ)

14

Stepping Rate

11 sec or less (100mm)

20 sec or less (125mm)

28 sec or less (150mm)

15

Throughput

WGA

21 min 00 sec or less (125mm)

21 min 00 sec or less (125mm)

22 min 40 sec or less (150mm)

EGA

21 min 00 sec or less (100mm)

21 min 15 sec or less (125mm)

24 min 50 sec or less (150mm)

16

Reticle Prealignment Accuracy

Within ±  2 mm

17

Operational Test

Wafer transfer system

Success rate: 99% or more

Reticle transfer system

Success rate: 100%

18

Interchangeability

±0.12 µm (95% or more)

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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