SDI fabsurplus.com is pleased to announce the availability of the following listed used TAINICS TE3100 ICP Etching Equipment (for GaN Etching).
Please click on the "Send More Details" button at the end of the TE3100 description, if you'd like to get more details, photos and specifications of this ICP Etching Equipment (for GaN Etching), and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This TAINICS TE3100 ICP Etching Equipment (for GaN Etching) is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|Description:||ICP Etching Equipment (for GaN Etching)|
|Version:||2 inch and 4 inch|
|Sales Condition:||as is where is|
-Still installed in the fab. -Shut down and powered off. -Can be inspected by appointment. -The equipment is in excellent condition, with no missing parts. -The equipment was lightly used in an R and D environment for around 2-3 years. -The equipment ran 4 inch Sapphire wafers , but other , larger wafer sizes may be possible with this equipment.
Please check pictures below.
More specs available on request.
TAINICS TE3100 ICP Etcher (for GaN etching)
2" Wafer No/Tray : 20pcs
4"wafer No/Tray : 5pcs
Gas : Cl2 based
Cleaning Gas : CF4, O2
Selectivity : ≥0.8 at PR
Non Uniformity (%nu) : ≤±5%(Mass Production) ≤±3%(Process Test)
Adventage : High Throughput & Etching Rate, Good uniformity, Easy handling and long life time of wafer holder .
Wafer Holder No. : TWH-12AC-A
Send Me More Details about this item.
The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.
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