Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 111579 | AMAT / Applied Materials | Centris MESA | Dry Etch cluster tool | 300 mm | 01.01.2011 | 4 | as is where is | immediately | |
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | |||
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.05.2008 | 1 | as is where is | ||
| 91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | |||
| 91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | |||
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
| 93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.05.2010 | 1 | as is where is | immediately | |
| 100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher With 3 poly etch chambers and 1 axiom chamber | 300 mm | 01.01.2015 | 1 | as is where is | immediately | |
| 100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | ||
| 103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | ||
| 103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103482 | Applied Materials | DPS SILVIA | Silvia 2ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103483 | Applied Materials | DPS2 | Poly Etcher | 300 mm | 1 | as is where is | |||
| 103484 | Applied Materials | DPS2 | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103485 | Applied Materials | DPS2 AE | Poly Etcher | 300 mm | 1 | as is where is | |||
| 103486 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103487 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103488 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103489 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103490 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103491 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 1 | as is where is | |||
| 103492 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2005 | 1 | as is where is | ||
| 103493 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 103494 | Applied Materials | DPS2 AE | POLY MESA (Dry Etch) | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
| 103495 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2014 | 1 | as is where is | ||
| 103496 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2014 | 1 | as is where is | immediately | |
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 106615 | Applied Materials | G5-MESA | DRY ETCH EFEM | 300 MM | 1 | as is where is | |||
| 106616 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | |||
| 106618 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | |||
| 106624 | Applied Materials | PRODUCER GT | ACL 1ch / Server X | 300 mm | 1 | as is where is | |||
| 108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | |||
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | ||
| 109541 | Applied Materials | Centura AP DPS 2 G5 | Polysilicon etcher, 3 chamber | 300 mm | 01.08.2008 | 1 | as is where is | immediately | |
| 109542 | Applied Materials | Centura DPS II Advantedge POLY | POLY ETCHER, 4 CHAMBER | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
| 109543 | Applied Materials | Centura AP DPS 2 Advantedge Mesa | Polysilicon Etcher with 4 chambers | 300 mm | 01.08.2006 | 1 | as is where is | immediately | |
| 109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
| 109545 | Applied Materials | Centura AP DPS II Advantedge | Polysilicon Etcher with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 109549 | Applied Materials | Centura DPS2 AE Minos Poly | Dry Etch with 2CH DPS2 and 2 CH Axiom | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 110620 | Applied Materials | Centura Enabler | Dry etcher | 300 mm | 1 | as is where is | |||
| 110701 | Applied Materials | P5000 | Poly Etcher 2 Chamber | 150 mm | 01.06.1995 | 2 | as is where is | immediately | |
| 113009 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 113010 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113012 | Applied Materials | CENTURA DPS2 G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | ||
| 113015 | Applied Materials | CENTURA DPS2 G5 | Metal 3ch, Axiom 1ch | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 113016 | Applied Materials | CENTURA DPS2 G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
| 113026 | Applied Materials | P5000 | 2 Metal | 1 | as is where is | ||||
| 113027 | Applied Materials | P5000 | 2 MXP oxide | 200 mm | 1 | as is where is | |||
| 113309 | Applied Materials | Centura AP Enabler E5 | Dielectric Etcher with 4 process chambers | 300 mm | 01.04.2010 | 1 | as is where is | immediately | |
| 113693 | Applied Materials | P5000 Mk II MXP | Dry Etch Poly/trench Etcher with 3 x MxP chambers | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113694 | Applied Materials | P5000 Mk II MXP | Dry Etch Poly/trench Etcher 3 x MxP chamber | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113695 | Applied Materials | P5000 Mk II MXP | Dry Etch Poly/trench Etcher 3 x MxP chamber | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113949 | Applied Materials | 5200 Centura II | Metal Etch System - with 2 x DPS -DPM chambers | 200 mm | 01.04.2019 | 1 | as is where is | immediately | |
| 114006 | Applied Materials | Centura DPS + Metal | Metal 2ch, ASP+ 2ch | 200 MM | 01.06.2000 | 1 | as is where is | ||
| 114007 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.1006 | 1 | as is where is | ||
| 114008 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.2007 | 1 | as is where is | immediately | |
| 114009 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2006 | 1 | as is where is | immediately | |
| 114010 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2008 | 1 | as is where is | ||
| 114012 | Applied Materials | CENTURA DPS 2 | Poly Etcher with 4ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
| 114013 | Applied Materials | DPS | Poly Etcher with 3ch | 200 MM | 01.06.2000 | 1 | as is where is | ||
| 114560 | Applied Materials | PRODUCER GT 12 CHAMBER | AMAT 300MM PRODUCER GT 12 CHAMBER | 300 MM | 1 | as is where is | |||
| 114563 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27576W 0190-27577W | 300 MM | 1 | as is where is | |||
| 114564 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
| 114565 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
| 114566 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-23623 0190-27576W | 300 MM | 1 | as is where is | |||
| 114567 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27577W | 300 MM | 1 | as is where is | |||
| 114568 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27595 0190-27577 | 300 MM | 1 | as is where is | |||
| 114569 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
| 114570 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
| 114571 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
| 114572 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
| 114573 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
| 114574 | Applied Materials | PRODUCER GT 12 CHAMBER | AMAT 300MM PRODUCER GT 12 CHAMBER | 300 MM | 1 | as is where is | |||
| 114580 | Applied Materials | CENTURA DPS II AE MESA | Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
| 114581 | Applied Materials | CENTURA DPS II AE MINOS | Poly Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
| 114582 | Applied Materials | CENTURA EMAX CT+ | Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
| 116903 | Applied Materials | Centura DPS METAL | Dry Etcher | 6 INCH | 1 | as is where is | |||
| 116904 | Applied Materials | Centura DPS+ POLY | Dry Etcher with 2 chambers | 6 INCH | 01.11.2006 | 1 | as is where is | immediately | |
| 116905 | Applied Materials | P5000 | Dry Etcher | 6 INCH | 01.06.1992 | 1 | as is where is | ||
| 117020 | Applied Materials | Producer GT chr A SiCoNi, chr B Fronti | Dry Etch | 300mm | 1 | as is where is | |||
| 118344 | Applied Materials | Axiom CHAMBER ONLY | Chamber Only | 300 MM | 1 | as is where is | |||
| 118345 | Applied Materials | Axiom CHAMBER ONLY | Chamber Only | 300 MM | 1 | as is where is | |||
| 118346 | Applied Materials | Axiom CHAMBER ONLY | Chamber Only | 300 MM | 1 | as is where is | |||
| 118351 | Applied Materials | CENTURA AP EMAX CT+ | Chamber Only | 300 MM | 1 | as is where is | |||
| 118352 | Applied Materials | CENTURA Ⅱ | DPS+ Metal 2CH, ASP+ 2CH | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 118353 | Applied Materials | CENTURA Ⅱ | DPS+ Poly | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 118354 | Applied Materials | CENTURA Ⅱ | DPS+ Poly | 150 mm | 01.06.2001 | 1 | as is where is | ||
| 118355 | Applied Materials | CENTURA Ⅱ | DPS+ Poly | 150 mm | 01.06.2001 | 1 | as is where is | ||
| 118356 | Applied Materials | CENTURA Ⅱ | DPS+ Poly | 150 mm | 01.06.2003 | 1 | as is where is | ||
| 118357 | Applied Materials | CENTURA Ⅱ | DPS+ Poly | 150 mm | 01.06.1999 | 1 | as is where is | ||
| 118359 | Applied Materials | CENTURA DPS2 G3 | ETCH Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 118360 | Applied Materials | CENTURA DPS2 G3 | ETCH Poly 3ch / Axiom 1ch | 300 mm | 01.06.2013 | 1 | as is where is | ||
| 118361 | Applied Materials | CENTURA DPS 2 | ETCH Metal 2ch / ASP 2ch | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 118362 | Applied Materials | CENTURA DPS 2 | ETCH Metal 2ch / ASP 2ch | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 118363 | Applied Materials | CENTURA DPS 2 | ETCH Metal 2ch / ASP 2ch | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 118364 | Applied Materials | CENTURA DPS 2 | ETCH Poly 2ch / Axiom 1ch | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 118365 | Applied Materials | CENTURA DPS 2 | ETCH Poly 3ch / Axiom 1ch | 300 mm | 01.06.2014 | 1 | as is where is | ||
| 118366 | Applied Materials | Centura DPS II CHAMBER | Chamber Only | 300 MM | 1 | as is where is | |||
| 118367 | Applied Materials | Centura E-Max CT+ | Chamber Only | 300 MM | 1 | as is where is | |||
| 118368 | Applied Materials | CENTURA ENABLER | ETCH Oxide ETCH / Server OS Type | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 118369 | Applied Materials | CENTURA ENABLER | ETCH Oxide ETCH / Server OS Type | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 118370 | Applied Materials | CENTURA ENABLER | ETCH Oxide ETCH / Server OS Type | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 118371 | Applied Materials | CENTURA ENABLER | ETCH Oxide ETCH / Server OS Type | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 118372 | Applied Materials | CENTURA ENABLER | ETCH Oxide ETCH / Server OS Type | 300 mm | 01.06.2009 | 1 | as is where is | ||
| 118373 | Applied Materials | CENTURA ENABLER_E2 | ETCH Oxide ETCH / Server OS Type | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 118374 | Applied Materials | CENTURA ENABLER_E5 | ETCH Oxide ETCH / Server OS Type | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 118375 | Applied Materials | Centura I P2 | R1 DPS Metal 2CH ASP+ 2CH | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 118376 | Applied Materials | Centura I P2 | R1 DPS Metal 2CH ASP+ 2CH | 200 mm | 01.06.2002 | 1 | as is where is | ||
| 118382 | Applied Materials | DPS | ETCH G5 MESA EFEM ONLY | 300 mm | 01.06.2013 | 1 | as is where is | ||
| 118383 | Applied Materials | DPS | ETCH G5 MESA PULSE POLY | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 118384 | Applied Materials | DPS II | ETCH | 300 mm | 1 | as is where is | |||
| 118385 | Applied Materials | DPS II | ETCH | 300 mm | 1 | as is where is | |||
| 118386 | Applied Materials | DPS II | ETCH Poly | 300 mm | 1 | as is where is | |||
| 118387 | Applied Materials | DPS II | ETCH 3 Poly, 1 Axiom | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 118388 | Applied Materials | DPS II | ETCH Poly | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 118390 | Applied Materials | EMAX CT+ | ETCH 3CH | 300 mm | 1 | as is where is | |||
| 118461 | Applied Materials | ETCH Dry Chamber Only | Chamber Only AXIOM, DPS | 300 MM | 1 | as is where is | |||
| 118462 | Applied Materials | ETCH Dry Chamber Only | Chamber Only AXIOM, DPS | 300 MM | 1 | as is where is | |||
| 118463 | Applied Materials | G5 MESA PULSE | ETCH | 300 mm | 1 | as is where is | |||
| 114022 | BMR | GAN (A49-3) | ETCH | 100 mm | 1 | as is where is | |||
| 113829 | Gasonics | AURA 2000 | Dry Etch Silicon isotropic | 150 mm | 1 | as is where is | immediately | ||
| 113830 | Gasonics | AURA 2000 | DRY ETCH Dry Etch Silicon isotropic gasonic | 150 mm | 1 | as is where is | immediately | ||
| 117034 | HITACHI | M712 / M711 Alu (Chamber) | Dry Etcher Process chamber | 300mm | 1 | as is where is | |||
| 117035 | HITACHI | M712 / M711 (chamber) | Strip Chamber | 300mm | 1 | as is where is | |||
| 118305 | Hitachi | HS-9050 | Plasma Asher, 5CH + 2 cooling chambers | 300 mm | 01.06.2019 | 1 | as is where is | immediately | |
| 106874 | Lam | 2300 Exelan Flex | Dry Etcher with 3 chambers | 300 mm | 01.07.2004 | 1 | as is where is | immediately | |
| 113806 | LAM | 4400 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 113807 | LAM | 4400 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 113808 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 113809 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 113810 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 113811 | LAM | 4500 | Oxide Dry Etcher | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113812 | LAM | 4500 | Oxide Dry Etcher | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113813 | LAM | 4500 | Oxide Dry Etcher | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113814 | LAM | 4520 | Oxide Dry Etcher | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113815 | LAM | 4520 | Oxide Dry Etcher | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113816 | LAM | 4520 | Oxide Dry Etcher | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113817 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113818 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113819 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113820 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 113821 | LAM | TCP 9400 SE | Poly Dry Etcher | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 113822 | LAM | TCP 9400 SE | Poly Dry Etcher | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 113823 | LAM | TCP 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113824 | LAM | TCP 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113825 | LAM | TCP 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113826 | LAM | TCP 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 113827 | LAM | TCP 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
| 113828 | LAM | TCP 9600 SE | 5Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | immediately | |
| 116592 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116593 | Lam | TCP 9400 SE | Poly Dry Etcher | 150 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 118608 | LAM | 2300 | ETCH | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 118609 | LAM | 2300FLEX_DS | ETCH | 300 mm | 01.06.2012 | 1 | as is where is | ||
| 118623 | LAM | FLEX | ETCH | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 118624 | LAM | FLEX | ETCH | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 118625 | LAM | FLEX | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 118626 | LAM | FLEX 45 | ETCH | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 118627 | LAM | FLEX 45 | ETCH | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 118628 | LAM | KIYO | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 118629 | LAM | KIYO | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 118630 | LAM | KIYO | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 118638 | LAM | STRIKER | ETCH | 300 mm | 01.06.2018 | 1 | as is where is | ||
| 118639 | LAM | TCP9600 | Dry etch | 200 mm | 1 | as is where is | |||
| 118649 | LAM | VERSYS METAL | ETCH | 300 mm | 1 | as is where is | |||
| 118650 | LAM | VERSYS METAL | ETCH | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 118651 | LAM | VERSYS METAL | ETCH | 300 mm | 1 | as is where is | |||
| 118652 | LAM | VERSYS METAL | ETCH | 300 mm | 1 | as is where is | |||
| 118653 | LAM | VERSYS METAL | ETCH | 300 mm | 1 | as is where is | |||
| 118654 | LAM | VERSYS METAL | ETCH | 300 mm | 1 | as is where is | |||
| 118655 | LAM | VERSYS METAL | ETCH | 300 mm | 1 | as is where is | |||
| 118656 | LAM | 2300KIYO_EXP_MRT | ETCH | 300 mm | 01.06.2019 | 1 | as is where is | ||
| 118657 | LAM | EXELAN FLEX | ETCH | 300 mm | 01.06.2014 | 1 | as is where is | ||
| 118658 | LAM | FLEX EX+ | ETCH | 300 mm | 01.06.2013 | 1 | as is where is | ||
| 102568 | LAM Research | TORUS 300K | Dry Etch | 2 | inquire | ||||
| 102569 | LAM Research | TORUS 300S | Dry Etch | 2 | inquire | ||||
| 108704 | Lam Research | 490 Autoetch | Polysilicon Dry Etcher | 150 mm | 01.06.1990 | 3 | inquire | immediately | |
| 111576 | LAM RESEARCH | 2300 EXELAN FLEX | Dry Etching Chamber (Suitable for spares use) | 300 mm | 01.01.2013 | 5 | as is where is | immediately | |
| 113537 | Lam Research | 4506I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
| 116440 | LAM Research | Alliance 9400 PTX | Plasma etcher with 2 x plasma etch chambers | 200 mm | 01.06.2001 | 1 | as is where is | ||
| 117039 | LAM Research | Rainbow 9600SE (CFE) TCP SMIF | Dry Etcher | 200mm | 1 | as is where is | |||
| 117040 | LAM Research | Rainbow 9600SE (CFE) TCP SMIF | Dry Etcher | 200mm | 1 | as is where is | |||
| 117041 | LAM Research | 2300 Exelan Flex (Chamber) | Dry Etcher Process Chamber | 300mm | 1 | as is where is | |||
| 117042 | LAM Research | Rainbow 4528i Envision | Dry Etcher | 200mm | 1 | as is where is | |||
| 117043 | LAM Research | Rainbow 4528XL Envision | Dry Etcher | 200mm | 1 | as is where is | |||
| 117044 | LAM Research | Rainbow 4520XL Envision | Dry Etcher | 150mm | 1 | as is where is | |||
| 117045 | LAM Research | Rainbow 4526i Envision | Dry Etcher | 150mm | 1 | as is where is | |||
| 117046 | LAM Research | Rainbow 4526i Envision | Dry Etcher | 150mm | 1 | as is where is | |||
| 117047 | LAM Research | Rainbow 4520i Classic | Dry Etcher | 150mm | 1 | as is where is | |||
| 117048 | LAM Research | Rainbow 4526i Classic | Dry Etcher | 150mm | 1 | as is where is | |||
| 117049 | LAM Research | Rainbow 4526i Envision | Dry Etcher | 150mm | 1 | as is where is | |||
| 117050 | LAM Research | Rainbow 4526i Classic | Dry Etcher | 150mm | 1 | as is where is | |||
| 117051 | LAM Research | Rainbow 4526XL Envision | Dry Etcher | 150mm | 1 | as is where is | |||
| 117052 | LAM Research | Autoetch 490 Poly | Poly Dry Etcher | 150mm | 1 | as is where is | |||
| 117053 | LAM Research | Autoetch 490 Poly | Poly Dry Etcher | 150mm | 1 | as is where is | |||
| 113870 | Matrix | 403 | Poly Etcher | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 108578 | MATTSON | PARADIGM_SI | DRY ETCH | 300mm | 01.06.2012 | 1 | as is where is | immediately | |
| 108579 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.05.2011 | 1 | as is where is | immediately | |
| 109552 | Mattson | Aspen 3 ICP | Dual Chamber Light Etcher | 300 mm | 01.07.2008 | 1 | as is where is | immediately | |
| 112865 | Nexx Systems | Cirrus 300 | ECR PECVD RIE SYSTEM | 1 | as is where is | ||||
| 91329 | OXFORD | 800+ | RIE (Reactive Ion Etcher) | up to 200 mm | 01.12.1994 | 1 | as is where is | immediately | |
| 111600 | Oxford | Plasmalab 100 | Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock | 150 mm | 1 | as is where is | immediately | ||
| 116487 | Oxford | Plasmalab 80+ ICP65 | ICP INDUCTIVELY COUPLED PLASMA ETCH TOOL | up to 200 mm | 1 | as is where is | immediately | ||
| 116488 | Oxford | Plasmalab System 100 ICP 380 | ICP Reactive Ion Etcher | up to 200 mm | 01.06.2011 | 1 | as is where is | immediately | |
| 116850 | Oxford | 80 Plus | Reactive Ion Etcher | 200 mm | 1 | as is where is | |||
| 116852 | Oxford | 80 Plus | PE CVD | 200 mm | 1 | as is where is | |||
| 118282 | Oxford | Plasmalab System 133 | ICP 380 | 200 mm | 01.01.2009 | 1 | as is all rebuilt | immediately | |
| 118707 | PLASMA THERM | WAFER/ BATCH 740 | Dual Plasma ETCH And RIE | 100 mm | 1 | as is where is | |||
| 118708 | PLASMA THERM | WAFER/ BATCH 741 | Dual Plasma ETCH And RIE | 100 mm | 1 | as is where is | |||
| 108863 | PLASMA-THERM | 790 | Reactive Ion Etcher, Refurbished - Call for Details | 1 | inquire | ||||
| 108864 | PLASMA-THERM | SLR770 | Inductively Coupled Etcher with Load-Lock, Refurbished - Call for Details | 1 | as is all rebuilt | immediately | |||
| 112902 | Plasma-Therm | 790 | RIE PECVD | 1 | as is where is | ||||
| 112903 | Plasma-Therm | 790 ICP | Etcher | 1 | as is where is | ||||
| 112904 | Plasma-Therm | BT | Reactive Ion Etch System | 150 mm | 1 | as is where is | |||
| 112906 | Plasma-Therm | VII 734 | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
| 112907 | Plasma-Therm | VII 734MF | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
| 112908 | Plasma-Therm | Wafer Batch 740/740 | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
| 112909 | Plasma-Therm | 73/74 | PECVD/Plasma Etch/Reactive Ion Etch | 200 mm | 1 | as is where is | |||
| 103451 | Plasmatherm | SLR-770 ICP | Silicon Deep Etching | 100 mm | 01.05.1998 | 1 | as is where is | immediately | |
| 106759 | Plasmatherm | SLR 770 | Dual Chamber R.I.E. | 200 mm | 01.06.1994 | 1 | as is where is | immediately | |
| 109586 | Plasmatherm | SLR 720 | RIE Etcher | 150 mm | 1 | inquire | |||
| 110613 | PlasmaTherm | SLR 740 | Dual Chamber RIE / Plasma etch | 200 mm | 01.04.1999 | 1 | as is where is | immediately | |
| 111602 | PlasmaTherm | SLR 770 ICP | Deep Silicon Etcher | 4 inch | 01.06.1998 | 1 | as is where is | immediately | |
| 111603 | PlasmaTherm | Versaline DSE-III | Deep Silicon Etcher | 4,6 and 8 inch | 01.06.2012 | 1 | as is where is | immediately | |
| 111464 | Shibaura | CDE -80 | Dry Etcher | 200 mm | 1 | as is where is | immediately | ||
| 112939 | SPTS | MXP Multiplex ICP ASE HR | ICP ETCHER | 01.06.2003 | 1 | as is where is | |||
| 112940 | SPTS | MXP Multiplex ICP HR | Chlorine Etch | 150 MM | 01.06.2003 | 1 | as is where is | ||
| 117057 | SPTS | Multiplex ICP | Deep Reactive Ion Etcher (Bosch Process) | 200 mm | 01.06.1997 | 1 | as is where is | immediately | |
| 118833 | STS (SPTS) | Multiplex HRM | ICP HRM Etcher | 200 mm | 1 | as is where is | immediately | ||
| 112943 | Technics | Micro Stripper -- Series 200 | Plasma etchert | 100 MM | 1 | as is where is | |||
| 106150 | Tegal | 903E | Dry Etcher | 100 mm | 1 | as is all rebuilt | immediately | ||
| 118316 | Tegal | 903E | Plasma dry etcher | 100 mm | 01.06.1985 | 1 | as is where is | immediately | |
| 118340 | TEL | Tactras Vesta NV3 | Plasma Etcher Asher | 300 mm | 01.02.2018 | 1 | as is where is | immediately | |
| 2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 1 | as is where is | immediately | ||
| 106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | DRY ETCH Cluster tool | 300 mm | 1 | as is where is | immediately | ||
| 108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | |||
| 108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | ||
| 109565 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etcher with qty 3 chambers | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
| 110641 | TEL Tokyo Electron | Telius | Dry Etcher | 300 mm | 1 | as is where is | |||
| 113303 | TEL TOKYO ELECTRON | VIGUS NEST | DRY ETCH | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
| 116953 | TEL TOKYO ELECTRON | Unity2e | Dry Etcher | 8 INCH | 1 | as is where is | |||
| 116954 | TEL TOKYO ELECTRON | Unity2e-855 | Dry Etcher | 8 INCH | 1 | as is where is | |||
| 118333 | TEL Tokyo Electron | Unity ME 8555sss | 3 CHAMBER OXIDE ETCHER | 200 MM | 01.07.2001 | 1 | as is where is | immediately | |
| 117063 | Tokyo Electron | Certas RST (Chamber) | Dry Etcher Process Chamber | 300mm | 1 | as is where is | |||
| 117066 | Tokyo Electron | LEAGA RST (CHAMBER) | Dry Etcher Process Chamber | 300mm | 1 | as is where is | |||
| 112951 | TRION TECHNOLOGY | Oracle | RIE Dielectric Etcher | 200 mm | 01.06.2006 | 1 | as is where is | ||
| 106567 | Ulvac | FRE200E | XeF2 Etching System | 01.06.2018 | 1 | as is where is | immediately | ||
| 112953 | ULVAC | NE 7800 | high-temperature, high-density plasma etching system | 01.10.2007 | 1 | as is where is | |||
| 108610 | UNAXIS | SLR-720 | RIE | 150 mm | 1 | as is where is | immediately | ||
| 109532 | UNAXIS | SLR-720 | REACTIVE ION ETCHER | 200mm | 01.06.2012 | 1 | as is where is |