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Pre-owned and used Dry Etch Equipment for sale by fabsurplus.com

Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
111579 AMAT / Applied Materials Centris MESA Dry Etch cluster tool 300 mm 01.01.2011 4 as is where is immediately
91269 Applied Materials CENTURA 5200 MxP Poly 200 mm 1 as is where is
91277 Applied Materials Centura DPS II CHAMBER Chamber only 300 mm 1 as is where is
91279 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91280 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91281 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91282 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91283 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91284 Applied Materials Etch dry chamber Only AXIOM, DPS 300 mm 1 as is where is
91285 Applied Materials Etch dry chamber Only AXIOM, DPS 300 mm 1 as is where is
91287 Applied Materials P5000 DELTA DLH 150 mm 31.05.1993 1 as is where is
91316 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 1 as is where is
91317 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 1 as is where is
93032 Applied Materials CENTRIS DPS MESA Dry Etch, Twin 3chamber 300 MM 01.05.2010 1 as is where is immediately
93034 Applied Materials CENTURA ENABLER E2 Oxide Etcher /server OS PC 300 MM 31.05.2007 1 as is where is
93035 Applied Materials CENTURA ENABLER E5 Oxide Etcher /server OS PC 300 MM 31.05.2010 1 as is where is
100909 Applied Materials CENTURA DPS ll MESA T2 Poly Etcher With 3 poly etch chambers and 1 axiom chamber 300 mm 01.01.2015 1 as is where is immediately
100910 Applied Materials CENTURA DPS ll MESA T2 Poly Etcher with 3 x DPS2 and 1 x Axiom CH 300 mm 01.04.2015 1 as is where is immediately
100913 Applied Materials DPS II AE Poly G3 dry etcher 300 mm 31.05.2006 1 as is where is
100914 Applied Materials DPS II AE Poly G3 dry etcher 300 mm 31.05.2007 1 as is where is
103473 Applied Materials CENTURA DPS G3 Poly 1ch / Mesa 1ch 300 mm 31.05.2007 1 as is where is
103474 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2003 1 as is where is
103475 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2005 1 as is where is
103476 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2010 1 as is where is
103477 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 1 as is where is
103478 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 1 as is where is
103482 Applied Materials DPS SILVIA Silvia 2ch / Axiom 1ch 300 mm 1 as is where is
103483 Applied Materials DPS2 Poly Etcher 300 mm 1 as is where is
103484 Applied Materials DPS2 Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103485 Applied Materials DPS2 AE Poly Etcher 300 mm 1 as is where is
103486 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103487 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103488 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103489 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103490 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103491 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 1 as is where is
103492 Applied Materials DPS2 AE MINOS (Dry Etch) 300 mm 31.05.2005 1 as is where is
103493 Applied Materials DPS2 AE MINOS (Dry Etch) 300 mm 31.05.2006 1 as is where is
103494 Applied Materials DPS2 AE POLY MESA (Dry Etch) 300 mm 01.05.2013 1 as is where is immediately
103495 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 01.06.2014 1 as is where is
103496 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 01.06.2014 1 as is where is immediately
106583 Applied Materials CENTURA 5200 DPS Poly Etcher 200 mm 01.06.1999 1 as is where is
106615 Applied Materials G5-MESA DRY ETCH EFEM 300 MM 1 as is where is
106616 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106618 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106624 Applied Materials PRODUCER GT ACL 1ch / Server X 300 mm 1 as is where is
108060 Applied Materials Centura 5300 HDP Omega Dry etch cluster tool with 2 Chambers SIO2 etch 200 mm 1 as is where is
108705 Applied Materials Centura 5200 MxP Chamber MxP Etching Chamber 200 mm 1 inquire immediately
109541 Applied Materials Centura AP DPS 2 G5 Polysilicon etcher, 3 chamber 300 mm 01.08.2008 1 as is where is immediately
109542 Applied Materials Centura DPS II Advantedge POLY POLY ETCHER, 4 CHAMBER 300 mm 01.06.2010 1 as is where is immediately
109543 Applied Materials Centura AP DPS 2 Advantedge Mesa Polysilicon Etcher with 4 chambers 300 mm 01.08.2006 1 as is where is immediately
109544 Applied Materials Centura 5200 AP DPS2 Advantedge Carina Mesa Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS 300 mm 01.05.2013 1 as is where is immediately
109545 Applied Materials Centura AP DPS II Advantedge Polysilicon Etcher with 4 chambers 300 mm 01.06.2006 1 as is where is immediately
109549 Applied Materials Centura DPS2 AE Minos Poly Dry Etch with 2CH DPS2 and 2 CH Axiom 300 mm 01.06.2006 1 as is where is immediately
110620 Applied Materials Centura Enabler Dry etcher 300 mm 1 as is where is
110701 Applied Materials P5000 Poly Etcher 2 Chamber 150 mm 01.06.1995 2 as is where is immediately
113009 Applied Materials CENTURA DPS 2 Metal 2ch / ASP 2ch 300 mm 01.06.2011 1 as is where is
113010 Applied Materials CENTURA DPS 2 Metal 2ch / ASP 2ch 300 mm 01.06.2007 1 as is where is
113012 Applied Materials CENTURA DPS2 G3 Poly 2ch / Mesa 1ch 300 mm 01.06.2001 1 as is where is
113015 Applied Materials CENTURA DPS2 G5 Metal 3ch, Axiom 1ch 300 mm 01.06.2008 1 as is where is
113016 Applied Materials CENTURA DPS2 G5 MESA Poly 3ch / AXIOM 1ch / Server OS Type 300 mm 01.06.2011 1 as is where is immediately
113020 Applied Materials DPS2 G5-MESA EFEM ONLY 300 mm 1 as is where is
113026 Applied Materials P5000 2 Metal 1 as is where is
113027 Applied Materials P5000 2 MXP oxide 200 mm 1 as is where is
113309 Applied Materials Centura AP Enabler E5 Dielectric Etcher with 4 process chambers 300 mm 01.04.2010 1 as is where is immediately
113693 Applied Materials P5000 Mk II MXP Dry Etch Poly/trench Etcher with 3 x MxP chambers 150 mm 01.06.1995 1 as is where is immediately
113694 Applied Materials P5000 Mk II MXP Dry Etch Poly/trench Etcher 3 x MxP chamber 150 mm 01.06.1995 1 as is where is immediately
113695 Applied Materials P5000 Mk II MXP Dry Etch Poly/trench Etcher 3 x MxP chamber 150 mm 01.06.1995 1 as is where is immediately
113949 Applied Materials 5200 Centura II Metal Etch System - with 2 x DPS -DPM chambers 200 mm 01.04.2019 1 as is where is immediately
114005 Applied Materials Centura MXP+ Oxide 200 MM 01.06.1998 1 as is where is
114006 Applied Materials Centura DPS + Metal Metal 2ch, ASP+ 2ch 200 MM 01.06.2000 1 as is where is
114007 Applied Materials CENTURA DPS 2 Metal 2ch / ASP 2ch 300 MM 01.06.1006 1 as is where is
114008 Applied Materials CENTURA DPS 2 Metal 2ch / ASP 2ch 300 MM 01.06.2007 1 as is where is
114009 Applied Materials CENTURA DPS 2 Metal 3ch / ASP 1ch 300 MM 01.06.2006 1 as is where is
114010 Applied Materials CENTURA DPS 2 Metal 3ch / ASP 1ch 300 MM 01.06.2008 1 as is where is
114011 Applied Materials CENTURA DPS 2 Poly 3ch / Axiom 1ch 300 MM 01.06.2010 1 as is where is
114012 Applied Materials CENTURA DPS 2 Poly Etcher with 4ch 300 MM 01.06.2006 1 as is where is
114013 Applied Materials DPS Poly Etcher with 3ch 200 MM 01.06.2000 1 as is where is
114270 Applied Materials Centura DPS Poly Dry Etch Cluster tool with 3x DPS 200 mm 01.06.1997 1 as is where is
114271 Applied Materials Centura DPS2 Metal etch (chamber) 300 mm / 200 mm 01.06.2001 1 as is where is
114273 Applied Materials Centura II DPS POLY Dry Etch Cluster tool with 3 X DPS 200 mm 01.06.2003 1 as is where is
114275 Applied Materials Centura Metal Dry Etcher, 2 Chamber dps Metal, 2 Chamber asp+ 200 mm 01.06.2000 1 as is where is
114276 Applied Materials Centura MXP Etch Dry etcher, 2CH 200 mm 01.06.1997 1 as is where is
114560 Applied Materials PRODUCER GT 12 CHAMBER AMAT 300MM PRODUCER GT 12 CHAMBER 300 MM 1 as is where is
114563 Applied Materials CENTURA DPS II AE-MINOS CHAMBER AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27576W 0190-27577W 300 MM 1 as is where is
114564 Applied Materials CENTURA DPS II AE-MINOS CHAMBER AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 300 MM 1 as is where is
114565 Applied Materials CENTURA DPS II AE-MINOS CHAMBER AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 300 MM 1 as is where is
114566 Applied Materials CENTURA DPS II AE-MINOS CHAMBER AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-23623 0190-27576W 300 MM 1 as is where is
114567 Applied Materials CENTURA DPS II AE-MINOS CHAMBER AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27577W 300 MM 1 as is where is
114568 Applied Materials CENTURA DPS II AE-MINOS CHAMBER AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27595 0190-27577 300 MM 1 as is where is
114569 Applied Materials CENTURA DPS II AE-MINOS CHAMBER AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 300 MM 1 as is where is
114570 Applied Materials CENTURA DPS II AE-MINOS GAS BOX AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX 300 MM 1 as is where is
114571 Applied Materials CENTURA DPS II AE-MINOS GAS BOX AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX 300 MM 1 as is where is
114572 Applied Materials CENTURA DPS II AE-MINOS GAS BOX AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX 300 MM 1 as is where is
114573 Applied Materials CENTURA DPS II AE-MINOS GAS BOX AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX 300 MM 1 as is where is
114574 Applied Materials PRODUCER GT 12 CHAMBER AMAT 300MM PRODUCER GT 12 CHAMBER 300 MM 1 as is where is
114580 Applied Materials CENTURA DPS II AE MESA Dry Etcher with qty 3 process modules 300 MM 1 as is where is
114581 Applied Materials CENTURA DPS II AE MINOS Poly Dry Etcher with qty 3 process modules 300 MM 1 as is where is
114582 Applied Materials CENTURA EMAX CT+ Dry Etcher with qty 3 process modules 300 MM 1 as is where is
116466 Applied Materials P5000 Plasma Etcher WITH 3 CHAMBERS 200 mm 01.06.1995 1 as is where is immediately
116903 Applied Materials Centura DPS METAL Dry Etcher 6 INCH 1 as is where is
116904 Applied Materials Centura DPS+ POLY Dry Etcher 6 INCH 1 as is where is
116905 Applied Materials P5000 Dry Etcher 6 INCH 01.06.1992 1 as is where is
114022 BMR GAN (A49-3) ETCH 100 mm 1 as is where is
113829 Gasonics AURA 2000 Dry Etch Silicon isotropic 150 mm 1 as is where is immediately
113830 Gasonics AURA 2000 DRY ETCH Dry Etch Silicon isotropic gasonic 150 mm 1 as is where is immediately
106691 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2010 1 as is where is
106695 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2014 1 as is where is
106696 LAM 2300 FX EX+ CHAMBER ONLY PLASMA OXIDE ETCH 300 mm 01.06.2013 1 as is where is immediately
106697 LAM 2300 MWAVE STRPR CHAMBER MWAVE STRIP (POLY) 300 mm 01.06.2018 1 as is where is
106699 LAM FLEX FX CHAMBER ONLY PLASMA OXIDE ETCH 300 mm 01.06.2013 1 as is where is
106701 LAM TORUS300K DRY Bevel Etcher 300 mm 01.06.2006 1 as is where is
106874 Lam 2300 Exelan Flex Dry Etcher with 3 chambers 300 mm 01.07.2004 1 as is where is immediately
113090 LAM TORUS300K DRY Bevel Etcher 300 mm 01.06.2006 1 as is where is
113806 LAM 4400 Poly Etcher 150 mm 01.06.1994 1 as is where is immediately
113807 LAM 4400 Poly Etcher 150 mm 01.06.1994 1 as is where is immediately
113808 LAM 4420 Poly Etcher 150 mm 01.06.1994 1 as is where is immediately
113809 LAM 4420 Poly Etcher 150 mm 01.06.1994 1 as is where is immediately
113810 LAM 4420 Poly Etcher 150 mm 01.06.1994 1 as is where is immediately
113811 LAM 4500 Oxide Dry Etcher 150 mm 01.06.1993 1 as is where is immediately
113812 LAM 4500 Oxide Dry Etcher 150 mm 01.06.1993 1 as is where is immediately
113813 LAM 4500 Oxide Dry Etcher 150 mm 01.06.1993 1 as is where is immediately
113814 LAM 4520 Oxide Dry Etcher 150 mm 01.06.1993 1 as is where is immediately
113815 LAM 4520 Oxide Dry Etcher 150 mm 01.06.1993 1 as is where is immediately
113816 LAM 4520 Oxide Dry Etcher 150 mm 01.06.1993 1 as is where is immediately
113817 LAM 4520 Oxide Etcher 150 mm 01.06.1993 1 as is where is immediately
113818 LAM 4520i Oxide Etcher (Isotropic) 150 mm 01.06.1995 1 as is where is immediately
113819 LAM 4520i Oxide Etcher (Isotropic) 150 mm 01.06.1995 1 as is where is immediately
113820 LAM 4520i Oxide Etcher (Isotropic) 150 mm 01.06.1995 1 as is where is immediately
113821 LAM TCP 9400 SE Poly Dry Etcher 150 mm 01.06.1994 1 as is where is immediately
113822 LAM TCP 9400 SE Poly Dry Etcher 150 mm 01.06.1994 1 as is where is immediately
113823 LAM TCP 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is immediately
113824 LAM TCP 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is immediately
113825 LAM TCP 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is immediately
113826 LAM TCP 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is immediately
113827 LAM TCP 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is
113828 LAM TCP 9600 SE 5Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is immediately
116592 LAM 4520i Oxide Etcher (Isotropic) 150 mm 01.06.1995 1 as is where is immediately
116593 Lam TCP 9400 SE Poly Dry Etcher 150 mm 01.06.1994 1 as is where is immediately
116649 Lam 2300 kiyo GX PM3 Polysilicon Dry Etcher, Process Module 3 300 mm 01.10.2024 1 as is where is immediately
102568 LAM Research TORUS 300K Dry Etch 2 inquire
102569 LAM Research TORUS 300S Dry Etch 2 inquire
108167 LAM Research 2300 MWAVE STRPR Chamber only 300 mm 01.06.2012 1 as is where is
108704 Lam Research 490 Autoetch Polysilicon Dry Etcher 150 mm 01.06.1990 3 inquire immediately
111576 LAM RESEARCH 2300 EXELAN FLEX Dry Etching Chamber (Suitable for spares use) 300 mm 01.01.2013 5 as is where is immediately
113537 Lam Research 4506I Plasma Etch 150 mm 01.06.1995 1 as is where is immediately
114028 LAM Research 2300 EXELAN FLEX 4CH Silicon Etcher 300 MM 01.06.2005 1 as is where is
116440 LAM Research Alliance 9400 PTX Plasma etcher with 2 x plasma etch chambers 200 mm 01.06.2001 1 as is where is
113870 Matrix 403 Poly Etcher 150 mm 01.06.1996 1 as is where is immediately
98284 MATTSON PARADIGME SI Polysilicon Etch 300 mm 1 as is where is
108578 MATTSON PARADIGM_SI DRY ETCH 300mm 01.06.2012 1 as is where is immediately
108579 MATTSON PARADIGM_SI Poly-silicon etcher 300 mm 01.05.2011 1 as is where is immediately
109552 Mattson Aspen 3 ICP Dual Chamber Light Etcher 300 mm 01.07.2008 1 as is where is immediately
112865 Nexx Systems Cirrus 300 ECR PECVD RIE SYSTEM 1 as is where is
91329 OXFORD 800+ RIE (Reactive Ion Etcher) up to 200 mm 01.12.1994 1 as is where is immediately
111600 Oxford Plasmalab 100 Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock 150 mm 1 as is where is immediately
116487 Oxford Plasmalab 80+ ICP65 ICP INDUCTIVELY COUPLED PLASMA ETCH TOOL up to 200 mm 1 as is where is immediately
116488 Oxford Plasmalab System 100 ICP 380 ICP Reactive Ion Etcher up to 200 mm 01.06.2011 1 as is where is immediately
116850 Oxford 80 Plus Reactive Ion Etcher 200 mm 1 as is where is
116852 Oxford 80 Plus PE CVD 200 mm 1 as is where is
91330 Plasma Therm Wafer/ Batch 740 DUAL PLASMA ETCH AND RIE 4" 1 as is where is
91331 Plasma Therm Wafer/ Batch 740 DUAL PLASMA ETCH AND RIE 4" 1 as is where is
108863 PLASMA-THERM 790 Reactive Ion Etcher, Refurbished - Call for Details 1 inquire
108864 PLASMA-THERM SLR770 Inductively Coupled Etcher with Load-Lock, Refurbished - Call for Details 1 as is all rebuilt immediately
112902 Plasma-Therm 790 RIE PECVD 1 as is where is
112903 Plasma-Therm 790 ICP Etcher 1 as is where is
112904 Plasma-Therm BT Reactive Ion Etch System 150 mm 1 as is where is
112906 Plasma-Therm VII 734 Reactive Ion Etch System 200 mm 1 as is where is
112907 Plasma-Therm VII 734MF Reactive Ion Etch System 200 mm 1 as is where is
112908 Plasma-Therm Wafer Batch 740/740 Reactive Ion Etch System 200 mm 1 as is where is
112909 Plasma-Therm 73/74 PECVD/Plasma Etch/Reactive Ion Etch 200 mm 1 as is where is
103451 Plasmatherm SLR-770 ICP Silicon Deep Etching 100 mm 01.05.1998 1 as is where is immediately
106759 Plasmatherm SLR 770 Dual Chamber R.I.E. 200 mm 01.06.1994 1 as is where is immediately
109586 Plasmatherm SLR 720 RIE Etcher 150 mm 1 inquire
110613 PlasmaTherm SLR 740 Dual Chamber RIE / Plasma etch 200 mm 01.04.1999 1 as is where is immediately
111602 PlasmaTherm SLR 770 ICP Deep Silicon Etcher 4 inch 01.06.1998 1 as is where is immediately
111603 PlasmaTherm Versaline DSE-III Deep Silicon Etcher 4,6 and 8 inch 01.06.2012 1 as is where is immediately
113118 PSC DES-220-456AVL Dry ETCHing System N/A 1 as is where is
106736 SAMCO RIE-300NR Reactive Ion Etching System 300 mm 01.06.2006 1 as is where is
106737 SAMCO RIE-300NR Reactive Ion Etching System 300 mm 01.06.2006 1 as is where is
111464 Shibaura CDE -80 Dry Etcher 200 mm 1 as is where is immediately
112939 SPTS MXP Multiplex ICP ASE HR ICP ETCHER 01.06.2003 1 as is where is
112940 SPTS MXP Multiplex ICP HR Chlorine Etch 150 MM 01.06.2003 1 as is where is
112943 Technics Micro Stripper -- Series 200 Plasma etchert 100 MM 1 as is where is
106150 Tegal 903E Dry Etcher 150 mm 1 as is all rebuilt immediately
106151 TEGAL 900 Plasma dry etch 100 mm 01.10.1984 1 as is where is immediately
106152 TEGAL 903E Plasma dry etch 100 mm 01.06.1985 1 as is where is immediately
113623 Tegal Tegal 901e Plasma Etch 150 mm 01.06.1995 1 as is where is immediately
113624 Tegal 901e Plasma Etch 150 mm 01.06.1995 1 as is where is immediately
113625 Tegal Tegal 901e Plasma Etch 150 mm 01.06.1995 1 as is where is
113626 Tegal Tegal903e Plasma Etch 150 mm 01.06.1995 1 as is where is immediately
113627 Tegal Tegal903e Plasma Etch 150 mm 01.06.1995 1 as is where is immediately
113628 Tegal 903e Plasma Etch 150 mm 01.06.1995 1 as is where is immediately
113629 Tegal 903e Plasma Etch 150 mm 01.06.1995 1 as is where is immediately
113630 Tegal 903e Plasma Etch 150 mm 01.06.1995 1 as is where is immediately
2181 TEL TOKYO ELECTRON TE 5480 Nitride Plasma Reactive Ion Etch 150 mm 1 as is where is immediately
91341 TEL TOKYO ELECTRON TELIUS SCCM T-3044SS DRY ETCHER 300 mm 31.05.2007 1 as is where is
93040 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.05.2009 1 as is where is immediately
93041 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.05.2010 1 as is where is immediately
93042 TEL TOKYO ELECTRON VIGUS Mask ETCH 300 mm 01.05.2010 1 as is where is immediately
98846 TEL Tokyo Electron VIGUS Mask Oxide Mask Etch 300 mm 01.04.2009 1 as is where is immediately
98847 TEL Tokyo Electron VIGUS PK2 (PARTS) Oxide Etch EFEM ONLY 300 mm 01.07.2013 1 as is where is immediately
106751 TEL TOKYO ELECTRON TEL TRIAS 200 SPA DRY ETCH Cluster tool 300 mm 1 as is where is immediately
108120 TEL Tokyo Electron TE8500 Dry Etch 200 mm 1 as is where is
108707 TEL Tokyo Electron Tactras RLSA (Chamber) Polysilicon Dry Etch Chamber 300 MM 01.06.2012 1 inquire
109565 TEL Tokyo Electron Unity SCCM Shin Oxide Etcher with qty 3 chambers 300 mm 01.05.2005 1 as is where is immediately
110641 TEL Tokyo Electron Telius Dry Etcher 300 mm 1 as is where is
113303 TEL TOKYO ELECTRON VIGUS NEST DRY ETCH 300 mm 01.06.2007 1 as is where is immediately
113304 TEL Tokyo Electron VIGUS PX Dry Etcher 300 mm 01.06.2007 1 as is where is immediately
113324 TEL Tokyo Electron Tactras Vigus (Chamber only) Oxide etcher (Chamber Only) 300 mm 01.06.2010 1 as is where is immediately
116953 TEL TOKYO ELECTRON Unity2e Dry Etcher 8 INCH 1 as is where is
116954 TEL TOKYO ELECTRON Unity2e-855 Dry Etcher 8 INCH 1 as is where is
112951 TRION TECHNOLOGY Oracle RIE Dielectric Etcher 200 mm 01.06.2006 1 as is where is
106567 Ulvac FRE200E XeF2 Etching System 01.06.2018 1 as is where is immediately
112953 ULVAC NE 7800 high-temperature, high-density plasma etching system 01.10.2007 1 as is where is
108610 UNAXIS SLR-720 RIE 150 mm 1 as is where is immediately
109532 UNAXIS SLR-720 REACTIVE ION ETCHER 200mm 01.06.2012 1 as is where is


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