Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
111579 | AMAT / Applied Materials | Centris MESA | Dry Etch cluster tool | 300 mm | 01.01.2011 | 4 | as is where is | immediately | |
91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | |||
91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | |||
91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | |||
91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | |||
91287 | Applied Materials | P5000 | DELTA DLH | 150 mm | 31.05.1993 | 1 | as is where is | ||
91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.05.2010 | 1 | as is where is | immediately | |
93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 31.05.2007 | 1 | as is where is | ||
93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 31.05.2010 | 1 | as is where is | ||
100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher With 3 poly etch chambers and 1 axiom chamber | 300 mm | 01.01.2015 | 1 | as is where is | immediately | |
100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher with 3 x DPS2 and 1 x Axiom CH | 300 mm | 01.04.2015 | 1 | as is where is | immediately | |
100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2006 | 1 | as is where is | ||
100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2007 | 1 | as is where is | ||
103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | ||
103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | ||
103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | ||
103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2010 | 1 | as is where is | ||
103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103482 | Applied Materials | DPS SILVIA | Silvia 2ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103483 | Applied Materials | DPS2 | Poly Etcher | 300 mm | 1 | as is where is | |||
103484 | Applied Materials | DPS2 | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103485 | Applied Materials | DPS2 AE | Poly Etcher | 300 mm | 1 | as is where is | |||
103486 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103487 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103488 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103489 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103490 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103491 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 1 | as is where is | |||
103492 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2005 | 1 | as is where is | ||
103493 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2006 | 1 | as is where is | ||
103494 | Applied Materials | DPS2 AE | POLY MESA (Dry Etch) | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
103495 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2014 | 1 | as is where is | ||
103496 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2014 | 1 | as is where is | immediately | |
106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | ||
106615 | Applied Materials | G5-MESA | DRY ETCH EFEM | 300 MM | 1 | as is where is | |||
106616 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | |||
106618 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | |||
106624 | Applied Materials | PRODUCER GT | ACL 1ch / Server X | 300 mm | 1 | as is where is | |||
108059 | Applied Materials | CENTURA 2 DPS | Deep Trench Etcher, 2 chambers | 150 mm | 1 | as is where is | |||
108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | |||
108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | ||
109541 | Applied Materials | Centura AP DPS 2 G5 | Polysilicon etcher, 3 chamber | 300 mm | 01.08.2008 | 1 | as is where is | immediately | |
109542 | Applied Materials | Centura DPS II Advantedge POLY | POLY ETCHER, 4 CHAMBER | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
109543 | Applied Materials | Centura AP DPS 2 Advantedge Mesa | Polysilicon Etcher with 4 chambers | 300 mm | 01.08.2006 | 1 | as is where is | immediately | |
109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
109545 | Applied Materials | Centura AP DPS II Advantedge | Polysilicon Etcher with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
109549 | Applied Materials | Centura DPS2 AE Minos Poly | Dry Etch with 2CH DPS2 and 2 CH Axiom | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
110620 | Applied Materials | Centura Enabler | Dry etcher | 300 mm | 1 | as is where is | |||
110701 | Applied Materials | P5000 | Poly Etcher 2 Chamber | 150 mm | 01.06.1995 | 2 | as is where is | immediately | |
111613 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
111614 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
111617 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300mm | 1 | as is where is | |||
111622 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | |||
111624 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
111625 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
111626 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
113009 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2011 | 1 | as is where is | ||
113010 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2007 | 1 | as is where is | ||
113012 | Applied Materials | CENTURA DPS2 G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | ||
113015 | Applied Materials | CENTURA DPS2 G5 | Metal 3ch, Axiom 1ch | 300 mm | 01.06.2008 | 1 | as is where is | ||
113016 | Applied Materials | CENTURA DPS2 G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
113020 | Applied Materials | DPS2 G5-MESA EFEM ONLY | 300 mm | 1 | as is where is | ||||
113026 | Applied Materials | P5000 | 2 Metal | 1 | as is where is | ||||
113027 | Applied Materials | P5000 | 2 MXP oxide | 200 mm | 1 | as is where is | |||
113193 | Applied Materials | Centura AP AdvantEdge G5 Metal | Dry Etch | 300 mm | 1 | as is where is | |||
113309 | Applied Materials | Centura AP Enabler E5 | Dielectric Etcher with 4 process chambers | 300 mm | 01.04.2010 | 1 | as is where is | immediately | |
113693 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
113694 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
113695 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
113949 | Applied Materials | 5200 Centura II | Metal Etch System - with 2 x DPS -DPM chambers | 200 mm | 01.04.2019 | 1 | as is where is | immediately | |
114005 | Applied Materials | Centura | MXP+ Oxide | 200 MM | 01.06.1998 | 1 | as is where is | ||
114006 | Applied Materials | Centura DPS + Metal | Metal 2ch, ASP+ 2ch | 200 MM | 01.06.2000 | 1 | as is where is | ||
114007 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.1006 | 1 | as is where is | ||
114008 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.2007 | 1 | as is where is | ||
114009 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
114010 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2008 | 1 | as is where is | ||
114011 | Applied Materials | CENTURA DPS 2 | Poly 3ch / Axiom 1ch | 300 MM | 01.06.2010 | 1 | as is where is | ||
114012 | Applied Materials | CENTURA DPS 2 | Poly Etcher with 4ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
114013 | Applied Materials | DPS | Poly Etcher with 3ch | 200 MM | 01.06.2000 | 1 | as is where is | ||
114049 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114050 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
114051 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
114052 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114270 | Applied Materials | Centura DPS | Poly Dry Etch Cluster tool with 3x DPS | 200 mm | 01.06.1997 | 1 | as is where is | ||
114271 | Applied Materials | Centura DPS2 | Metal etch (chamber) | 300 mm / 200 mm | 01.06.2001 | 1 | as is where is | ||
114273 | Applied Materials | Centura II DPS | POLY Dry Etch Cluster tool with 3 X DPS | 200 mm | 01.06.2003 | 1 | as is where is | ||
114275 | Applied Materials | Centura Metal | Dry Etcher, 2 Chamber dps Metal, 2 Chamber asp+ | 200 mm | 01.06.2000 | 1 | as is where is | ||
114276 | Applied Materials | Centura MXP Etch | Dry etcher, 2CH | 200 mm | 01.06.1997 | 1 | as is where is | ||
114560 | Applied Materials | PRODUCER GT 12 CHAMBER | AMAT 300MM PRODUCER GT 12 CHAMBER | 300 MM | 1 | as is where is | |||
114563 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27576W 0190-27577W | 300 MM | 1 | as is where is | |||
114564 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
114565 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
114566 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-23623 0190-27576W | 300 MM | 1 | as is where is | |||
114567 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27577W | 300 MM | 1 | as is where is | |||
114568 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27595 0190-27577 | 300 MM | 1 | as is where is | |||
114569 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
114570 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
114571 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
114572 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
114573 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
114574 | Applied Materials | PRODUCER GT 12 CHAMBER | AMAT 300MM PRODUCER GT 12 CHAMBER | 300 MM | 1 | as is where is | |||
114580 | Applied Materials | CENTURA DPS II AE MESA | Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
114581 | Applied Materials | CENTURA DPS II AE MINOS | Poly Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
114582 | Applied Materials | CENTURA EMAX CT+ | Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
115503 | Applied Materials | Centris AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115504 | Applied Materials | Centris SYM3 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115506 | Applied Materials | Centura 5200 MxP+ Dielectric | Dielectric Etch | 200 mm | 1 | as is where is | |||
115507 | Applied Materials | Centura 5200 MxP+ Dielectric | Dielectric Etch | 200 mm | 1 | as is where is | |||
115508 | Applied Materials | Centura 5200 MxP+ Dielectric | Dielectric Etch | 200 mm | 1 | as is where is | |||
115509 | Applied Materials | Centura 5200 MxP+ Poly | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115512 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115513 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115514 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115515 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115516 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115517 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115518 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115519 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115520 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115521 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115522 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115523 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115524 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115525 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115526 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115527 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115528 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115529 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115530 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115531 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115532 | Applied Materials | Centura AP DPS AdvantEdge Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115535 | Applied Materials | Centura DPS Poly R1 | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115559 | Applied Materials | P-5000 Mark II MxP Poly | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115560 | Applied Materials | P-5000 Mark II MxP+ Dielectric | Dielectric Etch | 200 mm | 1 | as is where is | |||
115571 | Applied Materials | Producer GT Selectra - Chamber Only | Selective Etch | 300 mm | 1 | as is where is | |||
116466 | Applied Materials | P5000 | Plasma Etch WITH 3 CHAMBERS | 200 mm | 01.06.1995 | 1 | as is where is | immediately | |
116467 | Applied Materials | P5000 MxP | 2 Chamber Dry Etcher with 2 x MxP chambers | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
116195 | APTS | CPX ICP | ICP etcher | 150 mm | 1 | as is where is | |||
114022 | BMR | GAN (A49-3) | ETCH | 100 mm | 1 | as is where is | |||
113829 | Gasonics | AURA 2000 | DRY ETCH Dry Etch Silicon isotropic gasonic | 150 mm | 1 | as is where is | |||
113830 | Gasonics | AURA 2000 | DRY ETCH Dry Etch Silicon isotropic gasonic | 150 mm | 1 | as is where is | |||
106691 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2010 | 1 | as is where is | ||
106695 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2014 | 1 | as is where is | ||
106696 | LAM | 2300 FX EX+ CHAMBER ONLY | PLASMA OXIDE ETCH | 300 mm | 01.06.2013 | 1 | as is where is | immediately | |
106697 | LAM | 2300 MWAVE STRPR CHAMBER | MWAVE STRIP (POLY) | 300 mm | 01.06.2018 | 1 | as is where is | ||
106699 | LAM | FLEX FX CHAMBER ONLY | PLASMA OXIDE ETCH | 300 mm | 01.06.2013 | 1 | as is where is | ||
106701 | LAM | TORUS300K | DRY Bevel Etcher | 300 mm | 01.06.2006 | 1 | as is where is | ||
106874 | Lam | 2300 Exelan Flex | Dry Etcher with 3 chambers | 300 mm | 01.07.2004 | 1 | as is where is | immediately | |
113090 | LAM | TORUS300K | DRY Bevel Etcher | 300 mm | 01.06.2006 | 1 | as is where is | ||
113806 | LAM | 4400 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113807 | LAM | 4400 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113808 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113809 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113810 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113811 | LAM | 4500 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113812 | LAM | 4500 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113813 | LAM | 4500 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113814 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113815 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113816 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113817 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113818 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
113819 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
113820 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
113821 | LAM | 9400 SE | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113822 | LAM | 9400 SE | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113823 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113824 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113825 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113826 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113827 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113828 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
102568 | LAM Research | TORUS 300K | Dry Etch | 2 | inquire | ||||
102569 | LAM Research | TORUS 300S | Dry Etch | 2 | inquire | ||||
108167 | LAM Research | 2300 MWAVE STRPR | Chamber only | 300 mm | 01.06.2012 | 1 | as is where is | ||
108704 | Lam Research | 490 Autoetch | Polysilicon Dry Etcher | 150 mm | 01.06.1990 | 3 | inquire | immediately | |
109207 | LAM Research | 2300 Exelan Flex FX - Chamber Only | Dielectric Etch | 300mm | 1 | as is where is | |||
111576 | LAM RESEARCH | 2300 EXELAN FLEX | Dry Etching Chamber (Suitable for spares use) | 300 mm | 01.01.2013 | 5 | as is where is | immediately | |
113234 | LAM Research | 2300e4 KIYO MCX | Dry Etch | 300 mm | 1 | as is where is | |||
113536 | Lam Research | 4506I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113537 | Lam Research | 4506I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
113538 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113545 | Lam Research | 4526XL | Plasma Etch | 150 mm | 01.06.2000 | 1 | as is where is | immediately | |
113547 | Lam Research | 4528I | Plasma Etch | 200 mm | 1 | as is where is | |||
113548 | Lam Research | 4528XL | Plasma Etch | 200 mm | 1 | as is where is | |||
113559 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.2005 | 1 | as is where is | ||
114028 | LAM Research | 2300 EXELAN | FLEX 4CH Silicon Etcher | 300 MM | 01.06.2005 | 1 | as is where is | ||
114134 | LAM Research | 2300 KIYO EX | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114135 | LAM Research | 2300 Versys Metal H | Metal Etch | 300 mm | 1 | as is where is | |||
114136 | LAM Research | 2300 Versys Metal H | Metal Etch | 300 mm | 1 | as is where is | |||
115915 | LAM Research | 2300 Coronus | Wafer Edge Cleaning - Plasma | 300 mm | 1 | as is where is | |||
115916 | LAM Research | 2300 Exelan Flex | Dielectric Etch | 300 mm | 1 | as is where is | |||
115917 | LAM Research | 2300 KIYO EX Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115918 | LAM Research | 2300 KIYO EX Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115919 | LAM Research | 2300 KIYO EX Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115920 | LAM Research | 2300 KIYO EX Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115921 | LAM Research | 2300 KIYO EX Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115922 | LAM Research | 2300 Versys Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115923 | LAM Research | 2300 Versys Metal H | Metal Etch | 300 mm | 1 | as is where is | |||
115924 | LAM Research | 2300 Versys Metal H | Metal Etch | 300 mm | 1 | as is where is | |||
115925 | LAM Research | 2300 Versys Metal H | Metal Etch | 300 mm | 1 | as is where is | |||
115926 | LAM Research | 2300 Versys Metal H | Metal Etch | 300 mm | 1 | as is where is | |||
115927 | LAM Research | 2300v2 KIYO EX Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115928 | LAM Research | 2300v2 KIYO EX Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115929 | LAM Research | 2300v2 KIYO EX Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115930 | LAM Research | 2300v2 KIYO EX Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115931 | LAM Research | 2300e4 Exelan Flex GX | Dielectric Etch | 300 mm | 1 | as is where is | |||
115932 | LAM Research | 2300e4 KIYO EX | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115933 | LAM Research | 2300e4 KIYO EX Metal | Metal Etch | 300 mm | 1 | as is where is | |||
115934 | LAM Research | 2300e5 KIYO EX | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115935 | LAM Research | 2300e5 KIYO EX | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115936 | LAM Research | 2300e6 KIYO EX | Polysilicon Etch | 300 mm | 1 | as is where is | |||
115937 | LAM Research | Alliance (A6) Exelan HP - Spare Parts | Dielectric Etch | 200 mm | 1 | as is where is | |||
115938 | LAM Research | Alliance (A6) TCP 9400DFM | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115939 | LAM Research | Alliance (A6) TCP 9400DFM | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115940 | LAM Research | Alliance (A6) TCP 9400DSiE G | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115941 | LAM Research | Alliance (A6) TCP 9400DSiE III | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115942 | LAM Research | Alliance (A6) TCP 9400DSiE III | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115943 | LAM Research | Rainbow 4520i | Dielectric Etch | 200 mm | 1 | as is where is | |||
115944 | LAM Research | Rainbow 4520i | Dielectric Etch | 200 mm | 1 | as is where is | |||
115945 | LAM Research | Rainbow 4520i | Dielectric Etch | 200 mm | 1 | as is where is | |||
115946 | LAM Research | Rainbow 4520XL | Dielectric Etch | 150 mm | 1 | as is where is | |||
115947 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115948 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115949 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115950 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115951 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115952 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115953 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115954 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115955 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
115956 | LAM Research | TCP 9600SE | Metal Etch | 200 mm | 1 | as is where is | |||
116440 | LAM Research | Alliance 9400 PTX | Plasma etcher with 2 x plasma etch chambers | 200 mm | 01.06.2001 | 1 | as is where is | ||
116458 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
116459 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | immediately | |
116460 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.2000 | 1 | as is where is | immediately | |
116464 | Lam Research | 4526XL | Plasma Etch | 150 mm | 01.06.2000 | 1 | as is where is | immediately | |
113870 | Matrix | 403 | Poly Etcher | 150 mm | 01.06.1996 | 1 | as is where is | ||
98284 | MATTSON | PARADIGME SI | Polysilicon Etch | 300 mm | 1 | as is where is | |||
108578 | MATTSON | PARADIGM_SI | DRY ETCH | 300mm | 01.06.2012 | 1 | as is where is | immediately | |
108579 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.05.2011 | 1 | as is where is | immediately | |
109552 | Mattson | Aspen 3 ICP | Dual Chamber Light Etcher | 300 mm | 01.07.2008 | 1 | as is where is | immediately | |
112865 | Nexx Systems | Cirrus 300 | ECR PECVD RIE SYSTEM | 1 | as is where is | ||||
91329 | OXFORD | 800+ | RIE (Reactive Ion Etcher) | 1 | as is where is | immediately | |||
111600 | Oxford | Plasmalab 100 | Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock | 150 mm | 1 | as is where is | immediately | ||
113117 | OXFORD | 800 | RIE | 125 mm | 1 | as is where is | |||
116042 | Oxford | PlasmaPro 100 | Cluster tool with 3 x PlasmaPro 100 RIE Chambers and 1 x PlasmaPro Cobra 100 Chamber | 200 mm | 01.06.2017 | 1 | as is where is | immediately | |
116043 | Oxford | PlasmaPro NGP80 RIE | Reactive Ion Etch System | UP TO 200 MM | 1 | as is where is | immediately | ||
91330 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | |||
91331 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | |||
108863 | PLASMA-THERM | 790 | Reactive Ion Etcher, Refurbished - Call for Details | 1 | inquire | ||||
108864 | PLASMA-THERM | SLR770 | Inductively Coupled Etcher with Load-Lock, Refurbished - Call for Details | 1 | as is all rebuilt | immediately | |||
112902 | Plasma-Therm | 790 | RIE PECVD | 1 | as is where is | ||||
112903 | Plasma-Therm | 790 ICP | Etcher | 1 | as is where is | ||||
112904 | Plasma-Therm | BT | Reactive Ion Etch System | 150 mm | 1 | as is where is | |||
112906 | Plasma-Therm | VII 734 | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
112907 | Plasma-Therm | VII 734MF | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
112908 | Plasma-Therm | Wafer Batch 740/740 | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
112909 | Plasma-Therm | 73/74 | PECVD/Plasma Etch/Reactive Ion Etch | 200 mm | 1 | as is where is | |||
103451 | Plasmatherm | SLR-770 ICP | Silicon Deep Etching | 100 mm | 01.05.1998 | 1 | as is where is | immediately | |
106759 | Plasmatherm | SLR 770 | Dual Chamber R.I.E. | 200 mm | 01.06.1994 | 1 | as is where is | immediately | |
109586 | Plasmatherm | SLR 720 | RIE Etcher | 150 mm | 1 | inquire | |||
110613 | PlasmaTherm | SLR 740 | Dual Chamber RIE / Plasma etch | 200 mm | 01.04.1999 | 1 | as is where is | immediately | |
111602 | PlasmaTherm | SLR 770 ICP | Deep Silicon Etcher | 4 inch | 01.06.1998 | 1 | as is where is | immediately | |
111603 | PlasmaTherm | Versaline DSE-III | Deep Silicon Etcher | 4,6 and 8 inch | 01.06.2012 | 1 | as is where is | immediately | |
114158 | PlasmaTherm | 790 Etch | Multi-Process Etch | 200 mm | 1 | as is where is | |||
116045 | PlasmaTherm | 7000 | RIE | 150 mm | 1 | as is where is | |||
116046 | PlasmaTherm | Versalock 700 | Multi-Process Etch | 150 mm | 1 | as is where is | |||
116047 | PlasmaTherm | Versalock 700 | Multi-Process Etch | 150 mm | 1 | as is where is | |||
116048 | PlasmaTherm | Versalock 700 | Multi-Process Etch | 150 mm | 1 | as is where is | |||
116049 | Poly Concepts | Custom | 96 INCH Fume Hood | 200 mm | 1 | as is where is | |||
113118 | PSC | DES-220-456AVL | Dry ETCHing System | N/A | 1 | as is where is | |||
106736 | SAMCO | RIE-300NR | Reactive Ion Etching System | 300 mm | 01.06.2006 | 1 | as is where is | ||
106737 | SAMCO | RIE-300NR | Reactive Ion Etching System | 300 mm | 01.06.2006 | 1 | as is where is | ||
111464 | Shibaura | CDE -80 | Dry Etcher | 200 mm | 1 | as is where is | immediately | ||
111879 | Shibaura Engineering Works Ltd. | CDE-300 | Metal Etch | 300mm | 1 | as is where is | |||
102623 | SPTS | Omega 201 | Plasma Dry etcher (For spares use) | 200 mm | 01.05.2010 | 1 | as is where is | immediately | |
112939 | SPTS | MXP Multiplex ICP ASE HR | ICP ETCHER | 01.06.2003 | 1 | as is where is | |||
112940 | SPTS | MXP Multiplex ICP HR | Chlorine Etch | 150 MM | 01.06.2003 | 1 | as is where is | ||
115447 | SPTS | Vision 320 Mark 2 | Reactive Ion Etcher | up to 200 mm | 01.06.2008 | 1 | as is where is | ||
115805 | SPTS | CPX Pegasus | Polysilicon Etch | 200 mm | 1 | as is where is | |||
115806 | SPTS | CPX Pegasus | Polysilicon Etch | 200 mm | 1 | as is where is | |||
116196 | SPTS | CPX ICP | ICP etcher | 150 mm | 1 | as is where is | |||
116482 | SPTS | Omega 201 (Spare parts) | Qty 3 machines parts from a Plasma Dry etcher | 200 mm | 01.05.2010 | 1 | as is where is | immediately | |
116197 | STPS | VPX ICP | ICP etcher | 150 mm | 1 | as is where is | |||
112943 | Technics | Micro Stripper -- Series 200 | Plasma etchert | 100 MM | 1 | as is where is | |||
106150 | Tegal | 903E | Dry Etcher | 150 mm | 1 | as is all rebuilt | immediately | ||
106151 | TEGAL | 900 | Plasma dry etch | 100 mm | 01.10.1984 | 1 | as is where is | immediately | |
106152 | TEGAL | 903E | Plasma dry etch | 100 mm | 01.06.1985 | 1 | as is where is | immediately | |
113623 | Tegal | Tegal 901e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113624 | Tegal | Tegal 901e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113625 | Tegal | Tegal 901e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113626 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113627 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113628 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113629 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113630 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
116209 | Tegal | 901e | Polysilicon Etch | 150 mm | 1 | as is where is | |||
116210 | Tegal | 901e | Polysilicon Etch | 150 mm | 1 | as is where is | |||
116211 | Tegal | 901e | Polysilicon Etch | 150 mm | 1 | as is where is | |||
116212 | Tegal | 903e | Dielectric Etch | 150 mm | 1 | as is where is | |||
2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately | |
91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | ||
93040 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2009 | 1 | as is where is | immediately | |
93041 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
93042 | TEL TOKYO ELECTRON | VIGUS | Mask ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
98846 | TEL Tokyo Electron | VIGUS Mask | Oxide Mask Etch | 300 mm | 01.04.2009 | 1 | as is where is | immediately | |
98847 | TEL Tokyo Electron | VIGUS PK2 (PARTS) | Oxide Etch EFEM ONLY | 300 mm | 01.07.2013 | 1 | as is where is | immediately | |
106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | DRY ETCH Cluster tool | 300 mm | 1 | as is where is | immediately | ||
108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | |||
108507 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
108508 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
108527 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 4 | as is where is | |||
108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | ||
109269 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
109565 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etcher with qty 3 chambers | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
110641 | TEL Tokyo Electron | Telius | Dry Etcher | 300 mm | 1 | as is where is | |||
110642 | TEL Tokyo Electron | Telius SP-Vesta | Dry Etcher | 300 mm | 1 | as is where is | |||
110645 | TEL Tokyo Electron | UNITY2e-855DD | Dry Etcher | 200 mm | 1 | as is where is | |||
110646 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
110647 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
110648 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
110649 | TEL Tokyo Electron | Unity2e-855II IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
110650 | TEL Tokyo Electron | Unity2e-855PP DP | Dry Etcher | 200 mm | 1 | as is where is | |||
110651 | TEL Tokyo Electron | Unity2e-855SS | Dry Etcher | 200 mm | 1 | as is where is | |||
110652 | TEL Tokyo Electron | Unity2e-85DPA | Dry Etcher | 200 mm | 1 | as is where is | |||
110653 | TEL Tokyo Electron | Unity2E-85IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
110654 | TEL Tokyo Electron | Unity2e-85TPATC | Dry Etcher | 200 mm | 1 | as is where is | |||
111976 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
113303 | TEL TOKYO ELECTRON | VIGUS NEST | DRY ETCH | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
113304 | TEL Tokyo Electron | VIGUS PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
113324 | TEL Tokyo Electron | Tactras Vigus (Chamber only) | Oxide etcher (Chamber Only) | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
116262 | TEL Tokyo Electron | Certas WING | Chemical Dry Etch (CDE) | 300 mm | 1 | as is where is | |||
116263 | TEL Tokyo Electron | Certas WING | Chemical Dry Etch (CDE) | 300 mm | 1 | as is where is | |||
116354 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 1 | as is where is | |||
116355 | TEL Tokyo Electron | Tactras Vigus RK3 | Dielectric Etch | 300 mm | 1 | as is where is | |||
116356 | TEL Tokyo Electron | Tactras Vigus RK3 | Dielectric Etch | 300 mm | 1 | as is where is | |||
116357 | TEL Tokyo Electron | Tactras Vigus RK3 | Dielectric Etch | 300 mm | 1 | as is where is | |||
116369 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116370 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116371 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116372 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116373 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116374 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116375 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116376 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | |||
116377 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | |||
112951 | TRION TECHNOLOGY | Oracle | RIE Dielectric Etcher | 200 mm | 01.06.2006 | 1 | as is where is | ||
106567 | Ulvac | FRE200E | XeF2 Etching System | 01.06.2018 | 1 | as is where is | immediately | ||
112953 | ULVAC | NE 7800 | high-temperature, high-density plasma etching system | 01.10.2007 | 1 | as is where is | |||
108610 | UNAXIS | SLR-720 | RIE | 150 mm | 1 | as is where is | immediately | ||
109532 | UNAXIS | SLR-720 | REACTIVE ION ETCHER | 200mm | 01.06.2012 | 1 | as is where is |