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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 99398 | Oxford | Micro-etch 300 | Dry Etcher | 1 | as is where is | immediately | ||
| 99399 | Oxford | Micro-dep 300 | PE CVD system (For spares use) | 1 | as is where is | immediately | ||
| 99401 | Oxford | Flex AL-II | ALD system | 150 mm | 01.06.2012 | 1 | as is where is | immediately |
| 98419 | Oxford | 100 Plus | PECVD Nitride System | 150 mm | 1 | as is where is | ||
| 103040 | Oxford | Plasmalab 800 Plus | Plasma Enhanced Chemical Vapor Deposition Automatic pressure control | 200 mm | 1 | as is where is | ||
| 100233 | Oxford | X-Strata980 | X-ray Fluorescence Spectrometer | 01.06.2010 | 1 | as is where is | ||
| 91329 | OXFORD | 800+ | RIE (Reactive Ion Etcher) | 1 | as is where is | immediately | ||
| 94401 | Oxford | CMI 950 | Xray fluorescence spectrometer | 01.06.2000 | 1 | as is where is | ||
| 101347 | Oxford | PlasmaLab 100 | ICP Etcher | 150mm | 01.03.2000 | 1 | as is where is | immediately |
| 103432 | Oxford Instruments | Ionfab300Plus | Ion Beam Etch and Deposition System | 200 mm | 01.06.2013 | 1 | inquire | immediately |
| 103007 | Oxford Instruments | Plasmalab System 100 | PECVD TEOS with Load Lock | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
| 103269 | Oxford Instruments | Ionfab300Plus | Ion Beam Etch and Deposition System | 200 mm | 01.06.2013 | 1 | inquire | immediately |
| 102760 | Oxford Instruments | Plasmalab 80 Plus | Dry etcher | 300 mm | 1 | as is where is | ||
| 102579 | Oxford Instruments | X-Strata 980 | XRF Coating thickness and element analyzer | 01.09.2009 | 1 | as is where is | ||
| 100345 | Oxford Instruments | FlexAL-II | Atomic Layer Deposition System | 150 mm | 01.06.2012 | 1 | as is where is | immediately |
| 99868 | Oxford Plasmalab | 800 RIE | Ion Etching System | 1 | inquire | |||
| 79566 | Oxford Plasmalab | Phoenix 133 - ICP 380 | Etcher | 200 mm | 1 | as is where is | immediately |