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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 109595 | Oxford | NGP 1000 | PECVD | 150 mm | 01.06.2012 | 1 | inquire | ||
| 109097 | Oxford | Plasmalab System 100 | PECVD TEOS with Load Lock | 200 mm | 01.05.2001 | 1 | as is where is | immediately | |
| 99398 | Oxford | Micro-etch 300 | Dry Etcher | 1 | as is where is | immediately | |||
| 91329 | OXFORD | 800+ | RIE (Reactive Ion Etcher) | 1 | as is where is | immediately | |||
| 113117 | OXFORD | 800 | RIE | 125 mm | 1 | as is where is | |||
| 111600 | Oxford | Plasmalab 100 | Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock | 150 mm | 1 | as is where is | immediately | ||
| 111358 | OXFORD | Plasmalab 100 | ICP Etcher | 1 | as is where is | immediately | |||
| 110358 | Oxford Instruments | OPT AMU | Match | SPARES | 1 | inquire | |||
| 112600 | Oxford Instruments | OpAL | Laboratory ALD tool used for Al2O3 deposition | up to 200 mm | 01.06.2016 | 1 | as is where is | immediately | |
| 112895 | Oxford Instruments | Plasmalab System 100 | pecvd teos with load lock | 1 | as is where is | ||||
| 111372 | Oxford Plasmalab | ICP 380 | 1 | as is where is | immediately | ||||
| 111373 | Oxford Plasmalab | 100 PECVD | Etcher Asher | 1 | as is where is | immediately |