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KLA Microsense UMA-C200-STR Thin Film Stress Measurement System Wafer stress measurement for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used KLA Microsense UMA-C200-STR Thin Film Stress Measurement System Wafer stress measurement.
Please click on the "Get Quote" button at the end of the Microsense UMA-C200-STR Thin Film Stress Measurement System description, if you'd like to get a quotation, photos and specifications of this Wafer stress measurement, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This KLA Microsense UMA-C200-STR Thin Film Stress Measurement System Wafer stress measurement is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


KLA Microsense UMA-C200-STR Thin Film Stress Measurement System Equipment Details

SDI ID: 116843
Manufacturer: KLA
Model: Microsense UMA-C200-STR Thin Film Stress Measurement System
Description: Wafer stress measurement
Version: 200 mm
Vintage: 01.06.2019
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

-This system was purchased new in 2019 for around $900k USD.
-It was used very little, and is in "Like New" condition.
-See attached photos showing the tool before removal.
-It was recently de-installed, and is now warehoused.
-It can be inspected by appointment.
-configured for loading via SEMI standard open cassettes, 150 mm and 200 mm wafers, with 2 load stations.
Measurement capabilities provided:-
- Wafer Thickness
- Average wafer bow and warp, average wafer radius of curvature
- Average wafer film stress
- 2D Local Stress Map with Min and Max values
- 3D Local Stress Map with Min and Max values
- Local Line Stress Profiles with specified orientation, including Min and Max values.
- Exportable data and maps 

Measurement Parameters Accuracy Repeatability One Sigma Display Resolution
Thickness: Center, Minimum, Maximum, Average 0.10um 0.05 um 10 nm
Global Flatness:
TTV 0.05 um 0.05 um 10 nm
TIR
FPD
Local Flatness: 0.05um 0.05 um 10 nm
Local Thickness Variation (LTV)
Local Total Indicator Reading (LTIR)
Local Focal Plane Deviation (LFPD)
Bow and Warp
Bow 0.25 um + 0.5% of reading 10 nm
Warp
Sori

Measurement Throughput (Wph) - full wafer mapping

150 mm / 65 200 MM / 50
Data Analysis
Measurement Parameters: Thickness, TTV, TIR, LTV, Bow, Warp
Wafer Maps: Contour, 3D Surface, Site LTV, Wafer Stress

Wafer Specifications
Diameters: 150mm, 200mm
Diameter Tolerance: +/- 0.5mm
Thickness Range:
Dynamic Range:
Thickness: +/- 150 um
Bow/Warp: +/- 250 um

Surfaces: Sawn, Lapped, Polished
Fiducials: Semi Flat, Notch

System Configuration: 
Wafer Handling: Robotic
[Measurement Positioning: Precision Air Bearing
Pre-aligner: Included
OCR Reader: Optional
SECS/GEM: Optional
Cassette Stations: 2 cassettes standard
Calibration: Automated Reliability (MTBF):10,000


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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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