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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 111413 | AMAT | Centura RTP Vantage | 300mm | 1 | as is where is | immediately | |||
| 111617 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300mm | 1 | as is where is | |||
| 111622 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | |||
| 111624 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
| 111625 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
| 111626 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
| 108557 | Applied Materials | Centura EPI | Epitaxial Deposition, reduced pressure, 2 chamber | 300 mm | 01.05.2002 | 1 | as is where is | immediately | |
| 111632 | Applied Materials | Centura Ultima Plus | HDP CVD (Chemical Vapor Deposition) | 200 mm | 1 | as is where is | immediately | ||
| 91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | |||
| 91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | |||
| 108059 | Applied Materials | CENTURA 2 DPS | Deep Trench Etcher, 2 chambers | 150 mm | 1 | as is where is | |||
| 108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | |||
| 110620 | Applied Materials | Centura Enabler | Dry etcher | 300 mm | 1 | as is where is | |||
| 113693 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113949 | Applied Materials | 5200 Centura II | Metal Etch System - with 2 x DPS -DPM chambers | 200 mm | 01.04.2019 | 1 | as is where is | immediately | |
| 113694 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113695 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | ||
| 113193 | Applied Materials | Centura AP AdvantEdge G5 Metal | Dry Etch | 300 mm | 1 | as is where is | |||
| 100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher With 3 poly etch chambers and 1 axiom chamber | 300 mm | 01.01.2015 | 1 | as is where is | immediately | |
| 100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher with 3 x DPS2 and 1 x Axiom CH | 300 mm | 01.04.2015 | 1 | as is where is | immediately | |
| 103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 115505 | Applied Materials | Centura 4.0 Radiance RTP | RTP (Rapid Thermal Processing) | 300 mm | 1 | as is where is | |||
| 103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | ||
| 115506 | Applied Materials | Centura 5200 MxP+ Dielectric | Dielectric Etch | 200 mm | 1 | as is where is | |||
| 103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | ||
| 115507 | Applied Materials | Centura 5200 MxP+ Dielectric | Dielectric Etch | 200 mm | 1 | as is where is | |||
| 103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2010 | 1 | as is where is | ||
| 115508 | Applied Materials | Centura 5200 MxP+ Dielectric | Dielectric Etch | 200 mm | 1 | as is where is | |||
| 103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 115509 | Applied Materials | Centura 5200 MxP+ Poly | Polysilicon Etch | 200 mm | 1 | as is where is | |||
| 103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 115510 | Applied Materials | Centura 5200 WxZ / Sprint W | Metal CVD (Chemical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115511 | Applied Materials | Centura 5200 WxZ / Sprint W | Metal CVD (Chemical Vapor Deposition) | 200 mm | 1 | as is where is | |||
| 115512 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 115513 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115514 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 115515 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 115516 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115517 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115518 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115519 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115520 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115521 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115522 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115523 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115524 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115525 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115526 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115527 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115528 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115529 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115530 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 115531 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 115532 | Applied Materials | Centura AP DPS AdvantEdge Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 115533 | Applied Materials | Centura AP iSprint | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 109134 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 115534 | Applied Materials | Centura AP iSprint | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 109135 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 115535 | Applied Materials | Centura DPS Poly R1 | Polysilicon Etch | 200 mm | 1 | as is where is | |||
| 114005 | Applied Materials | Centura | MXP+ Oxide | 200 MM | 01.06.1998 | 1 | as is where is | ||
| 114006 | Applied Materials | Centura DPS + Metal | Metal 2ch, ASP+ 2ch | 200 MM | 01.06.2000 | 1 | as is where is | ||
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 114007 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.1006 | 1 | as is where is | ||
| 114008 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.2007 | 1 | as is where is | ||
| 114009 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
| 114010 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2008 | 1 | as is where is | ||
| 114266 | Applied Materials | Centura 5200 | HDP-CVD, 3 chamber | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 114011 | Applied Materials | CENTURA DPS 2 | Poly 3ch / Axiom 1ch | 300 MM | 01.06.2010 | 1 | as is where is | ||
| 114012 | Applied Materials | CENTURA DPS 2 | Poly Etcher with 4ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
| 114268 | Applied Materials | Centura 5200 | HDP-CVD, Ultima Plus, 3 chambers | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 114270 | Applied Materials | Centura DPS | Poly Dry Etch Cluster tool with 3x DPS | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 114271 | Applied Materials | Centura DPS2 | Metal etch (chamber) | 300 mm / 200 mm | 01.06.2001 | 1 | as is where is | ||
| 114273 | Applied Materials | Centura II DPS | POLY Dry Etch Cluster tool with 3 X DPS | 200 mm | 01.06.2003 | 1 | as is where is | ||
| 114275 | Applied Materials | Centura Metal | Dry Etcher, 2 Chamber dps Metal, 2 Chamber asp+ | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 114276 | Applied Materials | Centura MXP Etch | Dry etcher, 2CH | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 114277 | Applied Materials | Centura RTP | RTP, 2 chamber XE and 2 cool down | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 114278 | Applied Materials | Centura RTP | RTP, 2 chamber XE and 2 cool down | 200 mm | 01.06.2004 | 1 | as is where is | ||
| 93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 31.05.2007 | 1 | as is where is | ||
| 93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 31.05.2010 | 1 | as is where is | ||
| 113008 | Applied Materials | CENTURA | DXZ | 200 mm | 1 | as is where is | |||
| 113009 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 113010 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113012 | Applied Materials | CENTURA DPS2 G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | ||
| 113015 | Applied Materials | CENTURA DPS2 G5 | Metal 3ch, Axiom 1ch | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 110712 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1996 | 1 | as is where is | immediately | |
| 113016 | Applied Materials | CENTURA DPS2 G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
| 110713 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1999 | 1 | as is where is | immediately | |
| 113017 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 113018 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2002 | 1 | as is where is | ||
| 113019 | Applied Materials | CENTURA PVD | Ti 2CH, Cu 1CH, Preclean 1CH | 200 mm | 01.06.2005 | 1 | as is where is | ||
| 114049 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 114050 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 114051 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 114563 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27576W 0190-27577W | 300 MM | 1 | as is where is | |||
| 114052 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 114564 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | |||
| 114565 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
| 114566 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-23623 0190-27576W | 300 MM | 1 | as is where is | |||
| 114567 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27577W | 300 MM | 1 | as is where is | |||
| 114056 | Applied Materials | Centura SiNgen Chamber | LPCVD | 200 mm | 1 | as is where is | |||
| 114568 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 0190-27595 0190-27577 | 300 MM | 1 | as is where is | |||
| 114569 | Applied Materials | CENTURA DPS II AE-MINOS CHAMBER | AMAT 300MM CENTURA DPS II POLY AE MINOS CHAMBER STP-A2503PV 65048-PH52-AFS1 | 300 MM | 1 | as is where is | |||
| 114570 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
| 114571 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
| 114572 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | |||
| 114573 | Applied Materials | CENTURA DPS II AE-MINOS GAS BOX | AMAT 300MM CENTURA DPS II POLY AE MINOS GAS BOX | 300 MM | 1 | as is where is | |||
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 114580 | Applied Materials | CENTURA DPS II AE MESA | Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
| 114581 | Applied Materials | CENTURA DPS II AE MINOS | Poly Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
| 114582 | Applied Materials | CENTURA EMAX CT+ | Dry Etcher with qty 3 process modules | 300 MM | 1 | as is where is | |||
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | ||
| 113309 | Applied Materials | Centura AP Enabler E5 | Dielectric Etcher with 4 process chambers | 300 mm | 01.04.2010 | 1 | as is where is | immediately | |
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | ||
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
| 91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
| 116422 | Applied Materials | Centura 5200 EPI | Epitaxial Deposition, 3 standard chambers | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 116423 | Applied Materials | HDP Centura 5200 | 3 chamber HDP CVD | 200 mm | 01.06.2011 | 1 | as is where is | ||
| 109541 | Applied Materials | Centura AP DPS 2 G5 | Polysilicon etcher, 3 chamber | 300 mm | 01.08.2008 | 1 | as is where is | immediately | |
| 109542 | Applied Materials | Centura DPS II Advantedge POLY | POLY ETCHER, 4 CHAMBER | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
| 94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | |||
| 109543 | Applied Materials | Centura AP DPS 2 Advantedge Mesa | Polysilicon Etcher with 4 chambers | 300 mm | 01.08.2006 | 1 | as is where is | immediately | |
| 109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
| 109545 | Applied Materials | Centura AP DPS II Advantedge | Polysilicon Etcher with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 109549 | Applied Materials | Centura DPS2 AE Minos Poly | Dry Etch with 2CH DPS2 and 2 CH Axiom | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 111613 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
| 111614 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
| 108162 | HYPERFLOW | CENTURA WET | Wafer Carrier Boat Wash System | 150 mm | 1 | as is where is |