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SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
103483 | Applied Materials | DPS2 | Poly Etcher | 300 mm | 1 | as is where is | |||
103484 | Applied Materials | DPS2 | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103485 | Applied Materials | DPS2 AE | Poly Etcher | 300 mm | 1 | as is where is | |||
103486 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103487 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103488 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103489 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103490 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103491 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 1 | as is where is | |||
103492 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2005 | 1 | as is where is | ||
103493 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2006 | 1 | as is where is | ||
103494 | Applied Materials | DPS2 AE | POLY MESA (Dry Etch) | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
103495 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2014 | 1 | as is where is | ||
103496 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2014 | 1 | as is where is | immediately | |
113012 | Applied Materials | CENTURA DPS2 G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | ||
113015 | Applied Materials | CENTURA DPS2 G5 | Metal 3ch, Axiom 1ch | 300 mm | 01.06.2008 | 1 | as is where is | ||
113016 | Applied Materials | CENTURA DPS2 G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
113020 | Applied Materials | DPS2 G5-MESA EFEM ONLY | 300 mm | 1 | as is where is | ||||
112089 | Applied Materials | Centura DPS2 4 chamber | Etch Poly 4x (D4) SILICON DPS II chamber,12 gas line ( Standard gas Line ) | 300 mm | 01.06.2005 | 1 | as is where is | ||
112090 | Applied Materials | Centura DPS2 532 Metal 3 chamber | Etch Metal with EFEM (Yaskawa, NT), TM, 2xDPS532, 1xAxiom, AC Rack, | 300 mm | 01.06.2006 | 1 | as is where is | ||
112091 | Applied Materials | Centura DPS2 AdvantEdge G5 Mesa HP 4 chamber | Etch Poly with EFEM(Server, Single Kawasaki), 3x Mesa HP, Axiom Chamber, AC Rack, Generator Rack, Accessories | 300 mm | 01.06.2014 | 1 | as is where is | ||
112092 | Applied Materials | Centura DPS2 AdvantEdge G5 Mesa HP 4 chamber | Etch Poly with EFEM(Server, Single Kawasaki), 3x Mesa HP, Axiom Chamber, AC Rack, Generator Rack, Accessories | 300 mm | 01.06.2015 | 1 | as is where is | ||
112093 | Applied Materials | Centura DPS2 Metal 3 chamber | Etch Metal with EFEM(Kawasaki, Server), TM, 3x G2 Metal, AC Rack, 1x Side Storage, 2x SMC Chiller, 3x Cathode Chiller, Utility Box, Tote | 300 mm | 01.06.2005 | 1 | as is where is | ||
112094 | Applied Materials | Centura DPS2 Metal 4 chamber | Etch Metal with Windows NT, DPS2 Metal x2CH, ASP2 x2CH | 300 mm | 1 | as is where is | |||
112095 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM(Kawasaki, Server), TM, 3x G5, 1x Axiom(No VODM), AC Rack, Chiller | 300 mm | 01.06.2006 | 1 | as is where is | ||
112096 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM, TM, 3x DPS2 Poly; 1x Axiom, AC Rack, Side Storage, EE-EAS-12 | 300 mm | 01.06.2007 | 1 | as is where is | ||
112097 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM(Kawasaki, Server), TM, 3x G5 Poly, 1x Axiom, AC Rack, Chiller | 300 mm | 01.06.2007 | 1 | as is where is | ||
112098 | Applied Materials | Centura DPS2 Poly 3 chamber | Etch Poly with EFEM, TM, 2x DPS2 Poly, 1x Axiom, AC Rack | 300 mm | 01.06.2006 | 1 | as is where is | ||
112103 | Applied Materials | DPS2 532 Metal Chamber | Etch Metal Chamber Only | 300 mm | 01.06.2004 | 1 | as is where is | ||
109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
109549 | Applied Materials | Centura DPS2 AE Minos Poly | Dry Etch with 2CH DPS2 and 2 CH Axiom | 300 mm | 01.06.2006 | 1 | as is where is | immediately |