ASML XT1400E 193 nm DUV SCANNER(ARF) for Sale

SDI fabsurplus.com is pleased to announce the availability of the following listed used ASML XT1400E 193 nm DUV SCANNER(ARF).
Please click on the "Get Quote" button at the end of the XT1400E description, if you'd like to get a quotation, photos and specifications of this 193 nm DUV SCANNER(ARF), and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This ASML XT1400E 193 nm DUV SCANNER(ARF) is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.

ASML XT1400E Equipment Details

SDI ID: 108151
Manufacturer: ASML
Model: XT1400E
Description: 193 nm DUV SCANNER(ARF)
Version: 300 mm
Vintage: 01.06.2005
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire

-Was operational and under service until July 2020.
-The equipment was professionally de-installed in May, 2022.
-The equipment has been auditted prior to removal.
-A copy of the audit report is available on request.
-The machine is currently warehoused, and it can be inspected by appointment.

Valid ATP-document    X1400E
1: Software release Twinscan    Sw rel. 4.1.0
Power    400 Volt
Wafer size    300 mm
Wafer type    Flat
Laser MODEL    CYMER XLA 160+/165 (45W)
Laser type    Cymer Laser
OIU/Reticle-/Waf.aux.port    Left Configuration
Machine Location    Customer-site
MES machine type    XT1400E
FOUP mechan. door sensor    No
CSR's for XT1400E various    CSR 8004
CSR: AT Multilingual UI    No
Pellicle Safeguard (CSR)    No
CSR: LS M2M P2P    No
WH Carrier Interface    25 Wafer Open Cassette kit
Wafer Track Interface    TEL Cleantrack Lithius/200
Mark sensor (WH opt.pre-align)    Yes
Integrated Reticle Library    Yes
 IRIS-6 Inch Reticles Twinscan    ATASF ASF: IRIS-XT with PPD2_1
Reticle CIDRW (Tag Reader)    No
FOUP Lockout system    No
Second Laser paddle    Yes
ASF: MDL View    CUST Site View
24 char Reticle Barcode Reader    Yes
Reorder Lot Service    No
Universal Prealignment    No
Recipe Creator    Recipe Creator "Light"
Automated Reticle Transport    No
WH PEP option (XT1400E), 200mm    PEP-Upgraded tpt 200mm, 180wph
Proximity matching (CSR!)    Yes (check additional text)
CSR: L1L7 Type_1    No
ASF: LS Area Extension    No
Chemical Sampling ports    No
ExpoSure    Yes
ASF: LS Spot Coverage    Yes
Aerial-P / Polarization    No
BAM: Bandwidth Analysis Module     No
InformPro/SystemPerf.Ind.Focus    No
Equipment Constants    No
Image Tuner    No
2D Barcode Reader    No
ASF: Echuck Flatness Qualific.    No
Wait Watcher    No
Reticle Streaming    Yes (Reticle Streaming)
CSR: Use UIP Ranges    No
Gridmapper    Yes (LCP needed @ Fab)
SpotLess    Yes (NOT XT:1700Fi, XT:19x0xi)
Chuck Dedication    Yes
Active Contrast Control    No
TOP PACKAGES    Standard (TOP 2)
ASF: Enh TPT Reticle Align Ext    Yes
ASF: Intel XT:1400E/F    No
2DE Grid Calibration    Yes
Gas Life Extension GLX    YES (purchased)
Dosemapper    Standard (LCP needed @Fab)
CCD Option    No
Sourcing Level    LPA Local Sourcing

Standard Specification Performance for ASML XT1400E:-

 CATEGORY     ITEMS     SPEC       
1. DynamicPerformance    1.1 MA X & Y (mean+3sig) [nm]    ≤ 1.7
    1.2 MSD X& Y (max of mean per field) [nm]    ≤ 6.50
2 Overlay Performance    2.1 Stage repeatability [nm]    ≤  4.0
    2.2 Single machine overlay (Setting 1, chuck A to chuck B) nm    ≤  8
   3. Productivity    3.1 Wafer throughput: 125 exposures,    30mJ/cm2
    16x32mm(dose30mJ/cm2),Setting1[w/h]    ≥ 122
    3.3 Reticle exchange time   
    setting 1 --> setting 2 [s]    ≤  13
    3.4 Lot overhead (incl. Reticle Exchange)   
    setting 1 --> setting 2 [s]    ≤  13
4. Intensity    4.1Illumination intensity,11 scans in 26mm Setting 1[mW/cm2]    ≥ 2260*
      5. Projection Lens    5.1 RMS Z5-Z37 [nm]    ≤  1.7
    5.2 RMS spherical [nm]    ≤  1.0
    5.3 RMS coma [nm]    ≤  0.9
    5.4 RMS astigmatism [nm]    ≤  0.9
    5.5 RMS 3-foil [nm]    ≤  0.9
    5.6 Non correctable error after correction for reticle error Setting1[nm]    ≤  7.0
    5.7 Image plane deviation at 65nm, Setting 1 [nm]    ≤  43
    5.8 Astigmatism at 65nm, Setting 1 [nm]    ≤  25
    5.9 Long range straylight [SAMOS %]    ≤ 0.9
    5.10 Short range straylight [SAMOS %]    ≤  1.2
   6. Dose control    5.1 Dose system performance, Setting 1 [%]    ≤ 1.2
    5.2 Integrated slit uniformity, Setting 1 [%]    ≤ 0.30
    5.3 Integrated scan uniformity, Setting 1 [%]    ≤ 0.2
    5.4 Dose reproducibility [%]    ≤ 0.25
    5.5 Dose accuracy, setting1 [%]    ± 1.0
    5.6 Dose stability, 3day [%]    ≤ 0.5
6. Pupil Verification    6.1 Ellipticity, Setting1 [|mean|]    ≤ 2.0
    6.2 Sigma variation, Setting1 [range]    ≤ 0.010
  7. Focus and Leveling    7.1 Wafer map repeatability (99.7%) [nm]    ≤ 10
    7.2 Leveling verification   
    Chuck to chuck focus difference [nm]    ≤ 10
    Full focus uniformity [nm]    ≤ 50

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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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