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ASML AT1100B Twinscan DUV Lithography exposure system 193 nm for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used ASML AT1100B Twinscan DUV Lithography exposure system 193 nm.
Please click on the "Get Quote" button at the end of the AT1100B Twinscan description, if you'd like to get a quotation, photos and specifications of this DUV Lithography exposure system 193 nm, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This ASML AT1100B Twinscan DUV Lithography exposure system 193 nm is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


ASML AT1100B Twinscan Equipment Details

SDI ID: 110703
Manufacturer: ASML
Model: AT1100B Twinscan
Description: DUV Lithography exposure system 193 nm
Version: 200 mm and 300 mm
Vintage: 01.06.2001
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

-STILL INSTALLED

-NOT WORKING AND HAS MISSING/BROKEN PARTS

-SEE ATTACHED PHOTOS TO SEE THE CURRENT CONDITION

The ASML AT 1100 Twinscan lithography system is designed to enable 100 nm volume manufacturing of 300 mm wafers.
The Zeiss Starlith 1100 lens uses ArF illumination, has 80,000 pixels and a numerical aperture variable between 0.75 to 0.50.
Calcium Fluoride (CaF2) is used for critical lens elements.
High transmission coatings are used to increase available illumination.
The lens is designed for low aberrations.
With a a 20 watt, 4 kHz laser, throughput is around 100 wph for a 10 mJ/cm2 dose.
The system uses a Twinscan stage, which is designed to allow better focusing by pre-scanning the wafer at a separate metrology position where the wafer is fully mapped in 3D prior to the second exposure stage. By aligning the wafer on the metrology stage, better throughput and intensity are also achieved.The scan speed of the twinscan stage is 320 mm. The system features z- interferometers for focus control.
The lens is balanced to allow 70 nm dynamics.

Key performance specifications:-

  • Variable NA 0.75 to 0.50
  • Resolution better than or equal to 100 nm
  • Field size 26 mm x 32 mm
  • Laser: 20 Watt 4 kHz
  • Overlay to within 20 nm
  • Throughput 93 wph or better

Laser type: Cymer Nanolith 7600A


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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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