SDI fabsurplus.com is pleased to announce the availability of the following listed used TEL Tokyo Electron Tactras RLSA (Chamber) Polysilicon Dry Etch Chamber.
Please click on the "Get Quote" button at the end of the Tactras RLSA (Chamber) description, if you'd like to get a quotation, photos and specifications of this Polysilicon Dry Etch Chamber, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This TEL Tokyo Electron Tactras RLSA (Chamber) Polysilicon Dry Etch Chamber is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|TEL Tokyo Electron
|Tactras RLSA (Chamber)
|Polysilicon Dry Etch Chamber
TEL Tactras RLSA Etch Chamber TactrasTM RLSATM provides an innovative, new plasma technology that TEL has been optimizing for years. Microwave technology provides high selectivity and excellent etch- profile control with low electron temperature of the radical-rich process by diffusion plasma. In addition, the output microwave stability, high repeatability, and process operation range has been improved with microwave broadband technology which enables precise control of the radical/ion ratio for high profile controllability. TactrasTM RLSATM has a high market share for a critical application in leading-edge logic devices. RLSA Chamber information :ESC for wafer with Dual He Cooling Nihon Koshuha Microwave Generator / Model is MKS 050B04C-OSC-V Turbo Pump:SHIMADZU / Model is FT2301D Generator Details:Top MKS-050B04 PS-V Bottom Daihen RGA-20C Gas Box Configuration : 1 N2 2 TSA 3 Ar 4 H2 5 NF3 6 SiH4
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