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Nikon NSR-S208D 248 nm (KrF) excimer exposure system for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used Nikon NSR-S208D 248 nm (KrF) excimer exposure system.
Please click on the "Get Quote" button at the end of the NSR-S208D description, if you'd like to get a quotation, photos and specifications of this 248 nm (KrF) excimer exposure system, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Nikon NSR-S208D 248 nm (KrF) excimer exposure system is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


Nikon NSR-S208D Equipment Details

SDI ID: 109072
Manufacturer: Nikon
Model: NSR-S208D
Description: 248 nm (KrF) excimer exposure system
Version: 300 mm
Vintage: 01.06.2010
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

-Still installed and operational
-Software Version
MCSW ver.180-P12/OCSW ver.180-P10
-See attached photos of system parts
-See below for system data.
Generic Performance Specifications:-
Resolution ≦ 110 nm
NA 0.82
Exposure light source KrF excimer laser (248 nm wavelength)
Reduction ratio 1:4
Exposure field 26 × 33 mm
Alignment accuracy ≦ 10 nm
Throughput ≧ 147 wafers/hour (300 mm wafer, 76 shots)

Specific System performance data:-

Parameter   Specification and Units Measurement
Reticle Blind      
       
XM Outside   400 ~ 800 um 650
       
XP Inside   400 ~ 800 um 650
       
YM Outside   400 ~ 800 um 610
       
YP Inside   400 ~ 800 um 620
       
Lens performance Data      
       
Illumination Check      
       
ID1 Uniformity ≤0.8% 0.0056
       
  Power > 3000 mw/cm2 3177
       
ID13 Uniformity ≤0.8% 0.00346
       
  Power > 3000 mw/cm2 2533
       
ID15 Uniformity ≤0.8% 0.00433
       
  Power > 3000 mw/cm2 2544
       
ID17 Uniformity ≤0.8% 0.00592
       
  Power > 3000 mw/cm2 2568
       
ID21 Uniformity ≤0.8% 0.00508
       
  Power > 3000 mw/cm2 3129
       
Wafer Stage Mirror Bow      
       
Upper Sub value X ≤ 8 nm 1.695
       
  Sub value Y ≤ 8 nm 1.053
       
Lower Sub value X ≤ 8 nm 1.133
       
  Sub value Y ≤ 8 nm 0.919
       
Twist Sub value X ≤ 8 nm 5.337
       
  sub value Y ≤ 8 nm 4.39
       
       
       
Projection Lens Image Plane Angle X 0 ± 1 urad -0.051
       
  Angle Y 0 ± 3 urad 0.511
       
Field Inclination TFD max - min ≤ 0.080 um 0.0675
       
  All reading have? Yes / No YES
       
Flare check(Please inform EE when E0<=240mj) E0 >=240 mj 360
       
Best Focus   0 ± 0.015 um 0.004
       
Wafer Loader Repeatability (Front)      
       
Y 3Sigma   ≤ 15 um 3.955
       
Rot 3Sigma   ≤ 200 um 112.742
       
X 3Sigma   ≤ 15 um 7.137
       
Rot mean   0 ± 200 um 141.461
       
Y mean   0 ± 10 um 1.758
       
X mean   0 ± 10 um 1.906
       
FIA Overlay Matching      
       
Residual X 3Sigma   < 20nm 15.6
       
Residual Y 3Sigma   < 20nm 12.8
       
Plus/Minus Difference X   < 10nm 1.4
       
Plus/Minus Difference Y   < 10nm 4.5
       


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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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