SUSS AS8 Photoresist coater and developer for Sale

Substrates up to 200 mm in diameter and square substrates up to 6" edge length can be processed.The manually loaded AS8 wafer spray coating tool is the ideal platform for R&D and low-volume device fabrication and can be equipped with two independent spray resist coating dispense systems, avoiding cross contamination; SUSS MicroTec’s proprietary spray design, coupled with the sophisticated resist supply system, provides unmatched process stability, repeatability and reproducibility. The spray-coat technology within the AS8 is ideal for use when substrates have a topography with tall existing features; a wide range of textures and high levels of surface roughness. The system is able to achieve uniform coatings of photo-resists required for high resolution photo-lithography. All spray and cleaning parameters are programmed and controlled in the on board recipe; this allows for system program transfer to SUSS MicroTec’s range of automated tools when the customer see the need for higher throughput. For advanced applications requiring automated wafer handling, SUSS also manufacture a the ACS200 range of high-performance fully automatic coat-develop tools, which can be configured with multiple spray coating stations.