Hitachi HS-9050 Plasma Asher, 5CH + 2 cooling chambers for Sale

-Recently professionally de-installed (Mar 2026)
-Warehoused and crated
-Can be inspected by appointment
-Five Asher / Etch chambers
-Two Cooling chambers
-Integrated transfer modules
-Mini-Environment Wafer Loading Module (EFEM)
-The system is configured for Copper processing and has been used for Copper process. 
-HDD has been removed and no software is included.
-See attached photos for details.

Process Modules
7 chamber tool = Five (5) Ashing Units

 - HS-9050 Ashing Unit Items:

 - Lambda Source Unit
 - Capacitance Manometer (722B11TCD2FA) DG1
 - RF Power Supply(AXG-5000II-27M-KE)
 - Multiwavelength EPD 0.1s sampling (Spectrometer)

 - MFC Configuration for Ashing Unit
 - MFC#N N2 Max Flow 20 L/min (SEC-Z522MG XN)
 - MFC#1(*) O02  MaxFlow20L/min  (SEC-Z522MGXN)
 - MFC#2 Ar Max Flow 20 L/min (SEC-Z522MG XN)
 - MFC#3 H2 Max Flow 5 L/min (SEC-Z512MG x)
 - MFC#4 N2 Max Flow 20 L/min (SEC-Z522MG XN)
 - MFC#5(*) CF4 Max Flow 1 L/min (SEC-Z512MG xX)
 - MFC#6 (**) CO2 Max Flow0.4L/min  (SEC-Z512MGX)
 - MFC#7 He Max Flow 20 L/min (SEC-Z522MG XN)
 - MFC#S8: Without gasline, without MFC
 - MFC#9: Without gasline, without MFC
 - MFC#10: Without gasline, without MFC

(*) Requires HW interlocks against H2

(**) Requires HW interlock removal for lines previously with NF3

Process Modules - Two (2) Cooling Units

 - Cooling Unit Items:

 - Capacitance Manometer (722B11TCD2FA) DG1

 - MFC Configuration for Cooling Unit A

 - MFC#I N2 Max Flow 20 L/min  (SEC-Z522MGXN)

 - MFC#2 Without gasline, without MFC

 - MFC#3 Without gasline, without MFC

 - MFC#4 He Max Flow 10 L/min (SEC-Z512MGX)