ASML PAS 5500 -300C DUV scanner - 248 nm for Sale

-Professionally de-installed from working condition
-Please refer to the below lens data showing the system is working, which data was taken before removal.
-Moved to warehouse and crated
-Can be inspected at the warehouse by appointment.
-See attached photos showing the tool at the warehouse.
-Laser type: Cymer
Lens data , obtained prior to removal:-
Release:8.9.0 
Date:12/05/2023 Time:08:17
Uniformity Measurement
Comment
: post patch upgrade
Image Field Size [mm]
x: 22.0 y : 22.0 Diameter : 31.1
Steps
x: 11 y : 11
Measurement Type
Pulses
: Pulse Mode
: 100
Pulse Frequency [Hz] : 1000
Pulse Energy [mJ] : 10.00
Apply REMA Window : Yes
Load Reticle
:N
Illumination Mode
: Conventional
Numerical Aperture
: 0.57
Sigma Outer
: 0.750
Illumination mode name : conventional
Version : 1.0.0
Uniformity Measurement Result
Uniformity [%] : 2.85
Logfile
: LI/LIUM/waf.14075
Tilt X [%/field] : -0.03 Y [%/field] : -1.14
Overall Average of
Ratio
: 1.02 Standard Deviation : 0.02
Intensities Spot Sensor [mW/cm2] : 184.10 Standard Deviation : 3.01
Intensities Energy Sensor [mW/cm2] : 180.08 Standard Deviation : 0.09
Estimated Uniformity from measured data [%]
If corrected for actual tilts
: 2.74
If corrected with gradient filter
: 3.18
If corrected for tilts and with gradientfilter : 2.89
Total Nr of Laserpulses since Installation [* 10^6] :15440
Symmetric Uniformity Value
[%] : -1.64


Stray Light Measurement
Comment
: Uniformity stray light measurement
Image Field Size [mm]
x
:22.0y :22.0
Steps
x11y :11
:
Apply REMA Window : Yes
Load Reticle
: N
Illumination Mode
Numerical Aperture
Sigma Outer
Illumination mode name
: Conventional
: 0.57
: 0.750
: conventional
Version : 1.0.0
Stray Light Measurement
Maximum Stray Light Number [%] :
2.46
Stray Light Variation
[%] :
1.42
Log Files
: LI/LIUM/waf.13966, LI/LIUM/waf.13967

Generic Performance Specifications for the ASMl PAS-5500-300C:-
Illumination: 248 nm
NA: 0.40 - 0.57
Field Size: Diameter: 31.1 mm
Max X: 22 mm
Max Y: 27.4 mm
UDOF @ 0.25 um
-Conventional > 0.7 um
-Annular > 0.9 um
Illumination Intensity: > 250 mW/cm2 @ NA 0.57
Overlay
Single machine: < 45 nm
Matched < 75 nm

Throughput
200 mm wafers, 30 mJ/cm2, 70 shots > 88 wph

-This system is fitted with ARMS