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Second hand, used and surplus CMP Chemical Mechanical Planarization Equipment for sale by fabsurplus.com

Please find below a list of Used , surplus and pre-owned CMP Equipment (Chemical mechanical planarization equipment) for sale by fabsurplus.com -Click on any list item to see further data. Chemical mechanical polishing, or CMP, also known as chemical mechanical planarization, is a process of smoothing and thinning surfaces with a mixture of chemical and mechanical forces. We can consider it to be a hybrid of chemical etching and abrasive polishing. It is used in the semiconductor industry to polish and thin semiconductor wafers as part of the IC manufacturing process.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
111447 Accretech / TSK HRG-200X Fully Automatic Grinder 200 mm 01.12.2022 1 as is where is immediately
96534 Applied Materials Mirra Mesa CMP system 200 mm 1 inquire
96537 Applied Materials Mirra Ontrak Poly/STI CMP 200 mm 01.05.1999 1 inquire
96538 Applied Materials Mirra Ontrak Poly/STI CMP 200 mm 31.05.1999 1 inquire
100868 Applied Materials Mirra Mesa CMP System 200 mm 1 inquire 5 months
100873 Applied Materials Mirra Mesa Integrated Oxide/STI CMP 200 mm 01.05.1999 1 inquire
105881 Applied Materials Reflexion GT CMP system with integrated cleaner 300 MM 01.05.2011 1 as is where is immediately
106065 Applied Materials Mirra ® 3400 Stand-Alone CMP System 200 mm 01.06.2001 1 as is all rebuilt immediately
106203 Applied Materials Mirra 3400 Stand-Alone Oxide/STI CMP 200 mm 01.06.1998 1 inquire
106980 Applied Materials Reflexion CMP system 300 mm 1 inquire immediately
106981 Applied Materials Reflexion LK CMP system 300 mm 1 inquire immediately
106982 Applied Materials Mesa CMP cleaning system 300 mm 1 inquire immediately
106983 Applied Materials Desica CMP Cleaning system 300 mm 1 inquire immediately
106984 Applied Materials Kawasaki 4.0 Fab Interface Module 300 mm 1 inquire immediately
109063 Applied Materials Mirra Mesa Oxide CMP system, with SMIF 200 mm 1 inquire
114073 Applied Materials Reflexion LK - Poly/STI Poly/STI CMP 300 mm 1 as is where is
114074 Applied Materials Reflexion LK Copper Copper CMP 300 mm 1 as is where is
114075 Applied Materials Reflexion LK Oxide Dielectric CMP 300 mm 1 as is where is
114254 Applied Materials MIRRA 3400 Integrated CMP Polishing system configured for use with a DNS-AS2000 cleaner (Also available for purchase) 200 mm 01.08.1998 1 as is where is immediately
114258 Applied Materials MIRRA 3400 Integrated CMP Polishing system configured for use with a DNS-AS2000 cleaner (Also available for purchase) 200 mm 01.05.1999 1 as is where is immediately
115549 Applied Materials Mirra - Tungsten Tungsten CMP 200 mm 1 as is where is
115550 Applied Materials Mirra - Tungsten Tungsten CMP 200 mm 1 as is where is
115551 Applied Materials Mirra Dielectric Dielectric CMP 200 mm 1 as is where is
115579 Applied Materials Reflexion - Dielectric Dielectric CMP 300 mm 1 as is where is
115580 Applied Materials Reflexion LK Multi-Process CMP 300 mm 1 as is where is
115581 Applied Materials Reflexion LK Copper Copper CMP 300 mm 1 as is where is
115582 Applied Materials Reflexion LK Oxide Dielectric CMP 300 mm 1 as is where is
115583 Applied Materials Reflexion LK Oxide Dielectric CMP 300 mm 1 as is where is
111438 Buehler Beta Series Twin Variable Speed Grinder-Polisher GRINDER-POLISHER 01.04.2008 1 as is where is immediately
111443 Buehler 49-5102-230 Twin Variable Speed Grinder Polisher with Vector Power Head 01.06.2001 1 as is where is immediately
114420 Disco DGP 8761 Fully Automatic Back Grinder / Polisher with universal chuck 200 mm / 300 mm 01.07.2019 1 as is where is immediately
116500 DISCO DGP 8761 + DFM2800 Back grinder 300 MM 01.06.2012 1 as is where is immediately
114256 DNS AS-2000 Post CMP cleaning system 200 mm 01.08.1998 1 as is where is immediately
114257 DNS AS-2000 Post CMP cleaning system 200 mm 01.06.1999 1 as is where is immediately
114294 DNS AS-2000 Post CMP wafer scrubber 200 mm 01.01.1999 1 as is where is
114295 DNS AS-2000 Post CMP wafer scrubber 200 mm 01.06.1999 1 as is where is
98460 Ebara Frex 300 Tungsten CMP tool 300 mm 1 as is where is immediately
98461 Ebara Frex 300 STI CMP ( missing front end robot and load port) 300 mm 1 as is where is immediately
108409 Ebara FREX300S Poly/STI Poly/STI CMP 300 mm 1 as is where is
110757 Ebara FREX 300 Tungsten CMP system 300 mm 2 as is where is immediately
110796 Ebara FREX 300 Tungsten CMP tool 300 mm 01.05.2005 2 as is where is immediately
111726 Ebara FREX300S Dielectric Dielectric CMP 300mm 1 as is where is
114092 Ebara EPO-222 Tungsten Tungsten CMP 200 mm 1 as is where is
114093 Ebara FREX300 Tungsten Tungsten CMP 300 mm 1 as is where is
114096 Ebara FREX300S Tungsten Tungsten CMP 300 mm 1 as is where is
115714 Ebara FREX300S Tungsten Tungsten CMP 300 mm 1 as is where is
115715 Ebara FREX300S Tungsten Tungsten CMP 300 mm 1 as is where is
115716 Ebara FREX300S2 Multi-Process CMP 300 mm 1 as is where is
71907 Hamamatsu C7103 PC Controlled IC Back-side Lapping and Wafer Grinding System 200 mm and packages 01.09.2001 1 as is where is immediately
98465 IPEC 472 CMP Polishing system 150 MM / 200 mm 3 as is where is immediately
98466 IPEC 472 CMP 150 mm 2 as is where is immediately
109184 IPEC 372M Multi-Process CMP 200mm 1 as is where is
116126 IPEC IPEC 472 - Dielectric Dielectric CMP 200 mm 1 as is where is
116127 IPEC IPEC 472 - Dielectric Dielectric CMP 200 mm 1 as is where is
116128 IPEC IPEC 472 - Tungsten Tungsten CMP 200 mm 1 as is where is
113803 LAM Avangard 776 TF CMP Oxide POLISH OX 150 mm 01.06.1996 1 as is where is immediately
113804 LAM Avangard 776 TF CMP Oxide POLISH OX 150 mm 01.06.1996 1 as is where is immediately
113805 LAM Avangard 776 TF CMP Tungsten POLISH W 150 mm 01.06.1996 1 as is where is immediately
113831 LAM DSS-200 POST CMP CLEANER 150 mm 01.06.1996 1 as is where is immediately
113835 LAM Synergy Integra Post CMP Wafer Cleaner 150 mm 1 as is where is immediately
113836 LAM Synergy Integra Post CMP Wafer Cleaner 150 mm 1 as is where is immediately
106820 Lam Research Ontrak Synergy Post CMP cleaner with HEPA mini-environment 200 mm 1 as is where is immediately
111584 Lam Research Ontrak Synergy Post CMP cleaner with HEPA mini-environment 200 mm 1 as is where is immediately
108846 MICROAUTOMATION M-1100 Wafer Dicing Saw, for up to 6" Wafers 150 MM 1 inquire
108191 NOVELLUS 676 CMP System Polisher 200 mm 01.06.1997 1 as is where is
116036 OnTrak DSS-200 Series I Wafer Scrubber - Post CMP 200 mm 1 as is where is
116037 OnTrak DSS-200 Series I Wafer Scrubber - Post CMP 200 mm 1 as is where is
116038 OnTrak DSS-200 Series I Wafer Scrubber - Post CMP 200 mm 1 as is where is
116039 OnTrak DSS-200 Series I Wafer Scrubber - Post CMP 200 mm 1 as is where is
116040 OnTrak DSS-200 Series I Wafer Scrubber - Post CMP 200 mm 1 as is where is
116041 OnTrak DSS-200 Series I Wafer Scrubber - Post CMP 200 mm 1 as is where is
116450 Speedfam Auriga C Wafer Edge Cleaning System 200 mm 01.06.1999 1 as is where is
111884 Strasbaugh 6DS-SP Multi-Process CMP 200 mm 01.06.1995 12 as is where is immediately
114350 Strasbaugh Grinder 7AF Wafer Grinder 200 mm 1 as is where is


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