Please find below a list of Used , surplus and pre-owned CMP Equipment (Chemical mechanical planarization equipment) for sale by fabsurplus.com -Click on any list item to see further data. Chemical mechanical polishing, or CMP, also known as chemical mechanical planarization, is a process of smoothing and thinning surfaces with a mixture of chemical and mechanical forces. We can consider it to be a hybrid of chemical etching and abrasive polishing. It is used in the semiconductor industry to polish and thin semiconductor wafers as part of the IC manufacturing process.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 111447 | Accretech / TSK | HRG-200X | Fully Automatic Grinder | 200 mm | 01.12.2022 | 1 | as is where is | immediately | |
| 96534 | Applied Materials | Mirra Mesa | CMP system | 200 mm | 1 | inquire | |||
| 96537 | Applied Materials | Mirra Ontrak | Poly/STI CMP | 200 mm | 01.05.1999 | 1 | inquire | ||
| 96538 | Applied Materials | Mirra Ontrak | Poly/STI CMP | 200 mm | 31.05.1999 | 1 | inquire | ||
| 100868 | Applied Materials | Mirra Mesa | CMP System | 200 mm | 1 | inquire | 5 months | ||
| 100873 | Applied Materials | Mirra Mesa Integrated | Oxide/STI CMP | 200 mm | 01.05.1999 | 1 | inquire | ||
| 105881 | Applied Materials | Reflexion GT | CMP system with integrated cleaner | 300 MM | 01.05.2011 | 1 | as is where is | immediately | |
| 106065 | Applied Materials | Mirra ® 3400 | Stand-Alone CMP System | 200 mm | 01.06.2001 | 1 | as is all rebuilt | immediately | |
| 106203 | Applied Materials | Mirra 3400 Stand-Alone | Oxide/STI CMP | 200 mm | 01.06.1998 | 1 | inquire | ||
| 106980 | Applied Materials | Reflexion | CMP system | 300 mm | 1 | inquire | immediately | ||
| 106981 | Applied Materials | Reflexion LK | CMP system | 300 mm | 1 | inquire | immediately | ||
| 106982 | Applied Materials | Mesa | CMP cleaning system | 300 mm | 1 | inquire | immediately | ||
| 106983 | Applied Materials | Desica | CMP Cleaning system | 300 mm | 1 | inquire | immediately | ||
| 106984 | Applied Materials | Kawasaki 4.0 | Fab Interface Module | 300 mm | 1 | inquire | immediately | ||
| 109063 | Applied Materials | Mirra Mesa | Oxide CMP system, with SMIF | 200 mm | 1 | inquire | |||
| 114254 | Applied Materials | MIRRA 3400 Integrated | CMP Polishing system configured for use with a DNS-AS2000 cleaner (Also available for purchase) | 200 mm | 01.08.1998 | 1 | as is where is | immediately | |
| 114258 | Applied Materials | MIRRA 3400 Integrated | CMP Polishing system configured for use with a DNS-AS2000 cleaner (Also available for purchase) | 200 mm | 01.05.1999 | 1 | as is where is | immediately | |
| 111438 | Buehler | Beta Series Twin Variable Speed Grinder-Polisher | GRINDER-POLISHER | 01.04.2008 | 1 | as is where is | immediately | ||
| 111443 | Buehler | 49-5102-230 | Twin Variable Speed Grinder Polisher with Vector Power Head | 01.06.2001 | 1 | as is where is | immediately | ||
| 114420 | Disco | DGP 8761 | Fully Automatic Back Grinder / Polisher with universal chuck | 200 mm / 300 mm | 01.07.2019 | 1 | as is where is | immediately | |
| 116500 | DISCO | DGP 8761 + DFM2800 | Back grinder | 300 MM | 01.06.2012 | 1 | as is where is | immediately | |
| 114256 | DNS | AS-2000 | Post CMP cleaning system | 200 mm | 01.08.1998 | 1 | as is where is | immediately | |
| 114257 | DNS | AS-2000 | Post CMP cleaning system | 200 mm | 01.06.1999 | 1 | as is where is | immediately | |
| 114294 | DNS | AS-2000 | Post CMP wafer scrubber | 200 mm | 01.01.1999 | 1 | as is where is | ||
| 114295 | DNS | AS-2000 | Post CMP wafer scrubber | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 98460 | Ebara | Frex 300 | Tungsten CMP tool | 300 mm | 01.06.2001 | 1 | as is where is | immediately | |
| 98461 | Ebara | Frex 300 | STI CMP ( missing front end robot and load port) | 300 mm | 01.06.2005 | 1 | as is where is | immediately | |
| 110757 | Ebara | FREX 300 | Tungsten CMP system | 300 mm | 01.06.2005 | 1 | as is where is | immediately | |
| 110796 | Ebara | FREX 300 | Tungsten CMP tool | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
| 116963 | G and P Technology | Cleaner-412R | Post-CMP substrate cleaner | 150 mm | 01.06.2011 | 1 | as is where is | immediately | |
| 71907 | Hamamatsu | C7103 | PC Controlled IC Back-side Lapping and Wafer Grinding System | 200 mm and packages | 01.09.2001 | 1 | as is where is | immediately | |
| 98465 | IPEC | 472 | CMP Polishing system | 150 MM / 200 mm | 3 | as is where is | immediately | ||
| 98466 | IPEC | 472 | CMP | 150 mm | 2 | as is where is | immediately | ||
| 113803 | LAM | Avangard 776 | TF CMP Oxide POLISH OX | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113804 | LAM | Avangard 776 | TF CMP Oxide POLISH OX | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113805 | LAM | Avangard 776 | TF CMP Tungsten POLISH W | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113831 | LAM | DSS-200 | POST CMP CLEANER | 150 mm | 01.06.1996 | 1 | as is where is | immediately | |
| 113835 | LAM | Synergy Integra | Post CMP Wafer Cleaner | 150 mm | 1 | as is where is | immediately | ||
| 113836 | LAM | Synergy Integra | Post CMP Wafer Cleaner | 150 mm | 1 | as is where is | immediately | ||
| 106820 | Lam Research Ontrak | Synergy | Post CMP cleaner with HEPA mini-environment | 200 mm | 1 | as is where is | immediately | ||
| 111584 | Lam Research Ontrak | Synergy | Post CMP cleaner with HEPA mini-environment | 200 mm | 1 | as is where is | immediately | ||
| 108846 | MICROAUTOMATION | M-1100 | Wafer Dicing Saw, for up to 6" Wafers | 150 MM | 1 | inquire | |||
| 108191 | NOVELLUS | 676 | CMP System Polisher | 200 mm | 01.06.1997 | 1 | as is where is | ||
| 116450 | Speedfam | Auriga C | Wafer Edge Cleaning System | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 111884 | Strasbaugh | 6DS-SP | Multi-Process CMP | 200 mm | 01.06.1995 | 12 | as is where is | immediately | |
| 114350 | Strasbaugh | Grinder 7AF | Wafer Grinder | 200 mm | 1 | as is where is | |||
| 116964 | STRASBAUGH | 7AAi | Wafer Grinder | 100 mm and 150 mm | 01.06.2011 | 1 | as is where is | immediately | |
| 116973 | Terra Universal | Laminar Flow Hood | Bench-top 4 foot stainless steeel laminar flow hood | 150 mm | 1 | as is where is | immediately |