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Oxford Plasma Technology DP80 PE CVD for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used Oxford Plasma Technology DP80 PE CVD.
Please click on the "Send More Details" button at the end of the DP80 description, if you'd like to get more details, photos and specifications of this PE CVD, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Oxford Plasma Technology DP80 PE CVD is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


Oxford Plasma Technology DP80 Equipment Details

SDI ID: 71760
Manufacturer: Oxford Plasma Technology
Model: DP80
Description: PE CVD
Version: UP TO 8 INCH
Vintage: 01.12.1989
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: 27,500 USD
Comments:

For PE-CVD thin film deposition . A Plasma Technology DP-80 parallel chamber system. SiH4 and NH3 was used as reactant gases.
PLC control system with Touch screen interface which allows the system to operate in manual and automatic mode
300W 13.56MHz RF Generator
240mm Heated substrate electrode with PID temperature controller
External gas box with 6 mass flow controlled gas lines and a Nitrogen
purging facility
For depositing a-si(H), SiOx, SiNx
Applications include dielectric isolation, hard masks, diffusion masks and
anti-reflection coatings
Sample sizes from a few mm2 up to 8” wafers
Gases available SiH4, NH3, N20, CF4, O2 and N2       

Currently located in Texas and available for inspection.

Categories:
Attachments: 12 Files
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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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