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Pre-owned and used Dry Etch Equipment for sale by fabsurplus.com

Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
89924 Advantest T5335P test 300mm 01.01.1996 1 as is where is
89925 Advantest T5581 test 300mm 1 as is where is
93868 Alcatel AMS 4200 Advanced Multi chamber ICP Plasma Etching System / Bosch Process 150 mm and 200 mm 01.09.2007 1 as is all rebuilt immediately
93883 Alcatel 602E Deep Trench Etcher 150 mm 01.06.1996 1 as is where is immediately
66407 AMAT Centura 5200 eMxP+ 3 chamber dry etcher 200 mm 01.06.1999 1 as is where is immediately
89921 AMAT VERA SEM 300mm 01.10.2002 1 as is where is
94109 AMEC Primo SSC AD-RIIE Dielectric Etch 300 mm 1 as is where is
94110 AMEC Primo SSC AD-RIIE Dielectric Etch 300 mm 1 as is where is
78670 Applied Materials DPS AE Poly G3 Etch POLY 300 MM 01.06.2007 1 as is where is
78671 Applied Materials DPS AE Poly G3 Etch POLY 300 MM 01.06.2007 1 as is where is
79200 Applied Materials Centura 5200 IPS (Spares) qty 3 IPS Process Chambers 200 mm 3 as is where is immediately
79400 Applied Materials Centura 5200 IPS (Spares) DI-ELECTRIC ETCH Process Chamber 200 mm 1 as is where is immediately
84535 Applied Materials CENTURA 5200 DPS+METAL Dry Etch (Metal) 200 mm 01.06.2001 1 as is where is immediately
86146 Applied Materials P5000 MxP METAL(2 METAL & 1 ASP) Metal etcher 150 mm 1 as is where is
86147 Applied Materials P5000 MxP METAL(2 METAL & 1 ASP) Metal etcher 150 mm 01.06.1997 1 as is where is immediately
86711 Applied Materials P5000 2Mark II & 1ASP Metal Etcher 200 mm 01.04.1997 1 as is where is immediately
88508 Applied Materials Centura DPS2 Metal 300 MM 01.06.2005 1 as is where is
89044 Applied Materials DPS+ Metal, Centura 2 Process Chamber 200 mm 1 inquire immediately
91051 APPLIED MATERIALS CENTURA AP DPS II CHAMBER DRY ETCH - 1 as is where is
91052 APPLIED MATERIALS CENTURA E-MAX CT 3CH DRY ETCH 300 mm 1 as is where is
91061 APPLIED MATERIALS CENTURA P2 SUPER-E DRY ETCH 200 mm 01.06.1998 1 as is where is
91062 APPLIED MATERIALS P5000 Mark II (3CH) DRY ETCH 200 mm 1 as is where is
91260 Applied Materials CENTURA 5200 MxP+ Oxide 200 mm 1 as is where is
91261 Applied Materials CENTURA 5200 MXP Metal 150 mm 1 as is where is
91262 Applied Materials CENTURA 5200 MxP+ Oxide 200 mm 1 as is where is
91263 Applied Materials CENTURA 5200 DPS POLY 200 mm 01.06.2000 1 as is where is
91264 Applied Materials CENTURA 5200 SUPER-E 200 mm 01.06.2000 1 as is where is
91269 Applied Materials CENTURA 5200 MxP Poly 200 mm 1 as is where is
91270 Applied Materials CENTURA 5200 MxP Poly 200 mm 1 as is where is
91276 Applied Materials Centura DPS II NT OS 300 mm 1 as is where is
91277 Applied Materials Centura DPS II CHAMBER Chamber only 300 mm 1 as is where is
91278 Applied Materials Centura DPS Metal ASP chamber only / Server OS 300 mm 1 as is where is
91279 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 01.06.2008 1 as is where is
91280 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 01.06.2008 1 as is where is
91281 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 01.06.2008 1 as is where is
91282 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 01.06.2008 1 as is where is
91283 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 01.06.2008 1 as is where is
91284 Applied Materials Etch dry chamber Only AXIOM, DPS 300 mm 1 as is where is
91285 Applied Materials Etch dry chamber Only AXIOM, DPS 300 mm 1 as is where is
91286 Applied Materials P5000 DELTA DLH 150 mm 1 as is where is
91287 Applied Materials P5000 DELTA DLH 150 mm 01.06.1993 1 as is where is
91288 Applied Materials P5000 Etch Mark II Poly 200 mm 01.06.1995 1 as is where is
91289 Applied Materials P5000 Etch Mark II OXIDE 150 mm 1 as is where is
91307 Applied Materials P5000 Etch Mark II Metal 150 mm 1 as is where is
91308 Applied Materials P5000 Mark II Etch Oxide 150 mm 1 as is where is
91311 Applied Materials P5000 Mark-II Etch Oxide 200 mm 1 as is where is
91313 Applied Materials P5000-Mark II Etch Metal 1 as is where is
91316 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 1 as is where is
91317 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 1 as is where is
91813 APPLIED MATERIALS EMAX_CT+ DRY ETCH 300 MM 01.06.2007 1 as is where is
91981 Applied Materials Centura 5200 IPS Chamber Only Oxide etch 3 as is where is immediately
92063 Applied Materials P5000 Metal Etcher with two Indexer, L/L CH, Orienter CH, two Process CH, ASP CH, 200 mm 01.06.1995 1 as is where is immediately
92064 Applied Materials P5000 Dry etcher, Poly, with 3 process chambers 200 mm 01.06.1995 1 as is where is immediately
93032 Applied Materials CENTRIS DPS MESA Dry Etch, Twin 3chamber 300 MM 01.06.2010 1 as is where is
93034 Applied Materials CENTURA ENABLER E2 Oxide Etcher /server OS PC 300 MM 01.06.2007 1 as is where is
93035 Applied Materials CENTURA ENABLER E5 Oxide Etcher /server OS PC 300 MM 01.06.2010 1 as is where is
93036 Applied Materials P5000 Etch no chamber (PLIS type) 200 mm 1 as is where is
93037 Applied Materials PRODUCER GT Fox/eHarp 300 mm 01.06.2009 1 as is where is
93896 Applied Materials ENABLER_E2 Etcher 300 mm 01.06.2009 1 as is where is
94434 Applied Materials CENTURA 5200 EMAX 200 mm 1 as is where is
94435 Applied Materials CENTURA DPS G5 1Process Chamber / 1Mesa Chamber 300 mm 1 as is where is
94508 Applied Materials Centura DPS2 Poly Poly Etch 300 mm 01.06.2006 1 as is where is
94509 Applied Materials Centura DPS2 Poly Poly Etch 300 mm 01.06.2007 1 as is where is
94510 Applied Materials Centura Enabler Oxide etch 300 mm 01.06.2008 1 as is where is
94511 Applied Materials Centura Enabler Oxide etch 300 mm 01.06.2010 1 as is where is
95091 APPLIED MATERIALS CENTURA E-MAX 3CH ETCH 8" 1 as is where is
95092 APPLIED MATERIALS CENTURA P2 SUPER-E ETCH 8" 01.06.1998 1 as is where is
95259 Applied Materials Centura AP Enabler Dielectric Etch 300mm 1 as is where is
95506 Applied Materials CENTURA EMAX Dielectric Etch 200mm 01.01.2009 1
95740 Applied Materials Centura AP AdvantEdge G5 Minos Poly Polysilicon Etch 300 mm 01.11.2014 1 as is where is
95741 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
95742 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
95743 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
95744 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
95926 Applied Materials Centura AP DPS2 AdvantEdge Poly Polysilicon Etcher, 4 chamber 300 mm 01.10.2006 1 as is where is immediately
95927 Applied Materials Centura AP DPS2 AdvantEdge Poly Poly Etcher, 4 chamber 300 mm 01.07.2006 1 as is where is immediately
95928 Applied Materials Centura Advantedge Carina Mesa Dry Etch Cluster Tool 300 mm 01.06.2013 1 as is where is immediately
96412 Applied Materials DPS Polysilicon Etch 300mm 01.05.2005 1 as is where is
96413 Applied Materials DPS G5 Polysilicon Etch 300mm 01.05.2005 1 as is where is
96414 Applied Materials DPS G5 Polysilicon Etch 300mm 01.06.2010 1 as is where is
96415 Applied Materials DPS G5 Polysilicon Etch 300mm 01.07.2006 1 as is where is
96416 Applied Materials DPS G5 MESA Polysilicon Etch 300mm 01.02.2013 1 as is where is
96417 Applied Materials ENABLER E2 Dielectric Etch Process 300mm 01.11.2009 1 as is where is
96418 Applied Materials ENABLER E5 Oxide Etcher 300mm 01.11.2010 1 as is where is
96804 Applied Materials Centura AP AdvantEdge G5 Mesa Poly Polysilicon Etch 300 mm 01.01.2015 1 as is where is
96805 Applied Materials Centura AP AdvantEdge G5 Mesa T2 Poly Polysilicon Etch 300 mm 01.01.2015 1 as is where is
96806 Applied Materials Centura AP AdvantEdge G5 Mesa T2 Poly Polysilicon Etch 300 mm 01.01.2015 1 as is where is
96807 Applied Materials Centura AP AdvantEdge G5 Mesa T2 Poly Polysilicon Etch 300 MM 01.01.2015 1 as is where is
96808 Applied Materials Centura AP AdvantEdge G5 Mesa T2 Poly Polysilicon Etch 300 MM 01.01.2015 1 as is where is
96809 Applied Materials Centura AP AdvantEdge G5 Metal Metal Etch 300 mm 01.12.2013 1 as is where is
96810 Applied Materials Centura AP AdvantEdge G5 Metal Metal Etch 300 mm 01.12.2013 1 as is where is
96811 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
96812 Applied Materials Centura AP DPS II Polysilicon Polysilicon Etch 300 mm 1 as is where is
96813 Applied Materials Centura AP eMax CT Dielectric Etch 300 mm 1 as is where is
96814 Applied Materials Centura AP eMax CT Dielectric Etch 300 mm 1 as is where is
96815 Applied Materials Centura AP eMax CT Dielectric Etch 300 mm 1 as is where is
96816 Applied Materials Centura AP eMax CT Dielectric Etch 300 mm 1 as is where is
96969 Applied Materials Centura DPS Poly Etcher 200 mm 01.06.2001 2 inquire
96970 Applied Materials Centura DPS Metal Etcher 200 mm 01.06.2002 1 inquire
96971 Applied Materials Centura DPS II Poly Etcher 200 mm 01.06.2005 1 inquire
96972 Applied Materials Centura DPS II Metal Etcher 200 mm 01.06.2005 1 inquire
89923 Canon Anelva I-2300SRE Thin Film 300mm 01.01.2004 1 as is where is
87501 DRYTEK 384T Plasma Metal Etcher 1 as is where is
92713 FEI Dual beam 820 FIB SEM 200 mm 01.06.1997 1 as is where is immediately
69945 Gasonics AE 2001 Single wafer etch system 1
82891 Gasonics Strata Oxide Etch System 200 01.06.1997 1 as is where is immediately
89926 GSI M430 Laser Repair 300mm 01.10.2003 2 as is where is
89927 GSI M435 Laser Repair 300mm 01.10.2004 1 as is where is
81831 Hitachi M712E ECR Plasma Etcher 200mm 1 as is where is immediately
86030 HITACHI M712XT ETCHER 300 mm 1 as is where is
89915 Hitachi U-722 Etch 300mm 300mm 3 as is where is
90760 Hitachi U-702 Metal Etch 300mm 01.06.2004 1 as is where is
95811 Hitachi U-7050A Metal Etch 300 mm 01.06.2005 1 as is where is
95816 Hitachi U-7050A Metal Etch 300 mm 1 as is where is
96865 Hitachi U-7050A Metal Etch 300 mm 01.06.2005 1 as is where is
97013 Hitachi M712XT Dry Etcher 300 mm 01.06.2007 1 as is where is
89918 JEC PC-KM153R2 150mm 1 as is where is
60923 LAM 4720 1 as is where is immediately
76945 LAM 590 Etcher 1
79159 Lam 4420 Dry etcher 200 mm 2 as is where is immediately
79843 LAM 4420 etch 200mm 2
88527 Lam R4720 Oxide 200 MM 1 as is where is
90946 Lam 2300 Exelan Oxide Etcher 300 mm 01.06.2003 1 as is where is
91129 LAM TCP9400SE Etcher 200mm non-SMIF 01.06.2018 2 inquire 4 months
91130 LAM TCP9400SE Etcher 200mm SMIF 01.06.2018 2 inquire 4 months
94537 Lam 2300 Exelan Flex Oxide etcher 300 mm 01.06.2007 1 as is where is
95505 LAM Alliance Exelan Dielectric Etch 01.01.1999 0 as is where is immediately
71831 LAM RESEARCH A6 EXELAN OXIDE ETCHER (refurbished) 1 as is where is immediately
77173 LAM Research 9600 TCP SE metal etcher 150 mm 1 as is all rebuilt immediately
78676 Lam Research 2300 METAL Etch METAL 300 MM 01.06.2009 1 as is where is immediately
82252 Lam Research TCP9600SE Dry etcher 8" 1 as is where is immediately
82257 Lam Research 2300 EXELAN Dry etcher 8" 01.06.2004 1 as is where is immediately
82258 Lam Research 2300 EXELAN Dry etcher 8" 01.06.2004 1 as is where is immediately
86150 LAM Research A4 4520 PM Dry etch Chamber 200 mm 1 as is where is
86154 LAM Research A4 9600SE PM Dry etch Chamber 200 mm 1 as is where is
86155 LAM Research A4 TM(Alliance) DRY ETCHER – HUB 200 mm 1 as is where is
86156 LAM Research A4 TM(Alliance) DRY ETCHER – HUB 200 mm 1 as is where is
86158 LAM Research Alliance4 9400SE dry etcher 200 mm 1 as is where is
90506 LAM Research 2300 Exelan Flex 45 Oxide Etcher, 3 chamber 300 mm 01.06.2007 1 as is where is immediately
91028 Lam Research Alliance4 9400SE Etcher 150mm 01.06.1996 1 as is where is immediately
91069 Lam Research Alliance4 4420XL DRY ETCHER 150 mm 01.06.1996 1 as is where is
91070 Lam Research Alliance4 9400SE DRY ETCHER 200 mm 01.06.1996 1 as is where is
91071 Lam Research RAINBOW 4520i DRY ETCHER 200 mm 01.06.1996 1 as is where is
91072 Lam Research TCP9600SE DRY ETCHER 150 mm/200 mm 1 as is where is
91073 Lam Research TCP9600SE DRY ETCHER 150 mm/200 mm 1 as is where is
91074 Lam Research TCP9600SE DRY ETCHER 200 mm 1 as is where is
91075 Lam Research TCP9600SE DRY ETCHER 200 mm 1 as is where is
91318 LAM Research 2300 Exelan Chamber Only OXIDE ETCH 300 mm 01.06.2004 1 as is where is
91319 LAM Research 2300 Exelan SYSTEM OXIDE ETCH 300 mm 01.06.2003 1 as is where is
91320 LAM Research EXELAN 2300 OXIDE ETCH 300 mm 1 as is where is
91322 LAM Research LAM 4520 OXIDE ETCH 1 as is where is
91323 LAM Research LAM 4520 OXIDE ETCH 1 as is where is
91324 LAM Research LAM 4520 OXIDE ETCH 1 as is where is
91325 LAM Research LAM 4520 OXIDE ETCH 1 as is where is
91326 LAM Research LAM 4528 OXIDE ETCH 1 as is where is
91328 LAM Research STAR Chamber Only DRY ETCH 300 mm 1 as is where is
91692 Lam Research 2300 Exelan Flex Cu Dry Etch 300mm 01.06.2007 1 as is where is immediately
91693 Lam Research 2300 Exelan Flex Cu Dry Etch 300mm 01.06.2007 1 as is where is immediately
91814 LAM RESEARCH A9608PTX DRY ETCHER 200 MM 01.06.1998 1 as is where is
91914 Lam Research TCP9600 Etcher 200 MM 01.06.1995 1 as is where is immediately
92593 LAM Research 2300 Exelan Flex 45 Dielectric Etch 300 mm 01.06.2006 1 as is where is immediately
92594 LAM Research 2300 Exelan Flex 45 Dielectric Etch 300 mm 01.06.2006 1 as is where is immediately
92712 Lam Research TCP 9600 Dry Etch (Metal) 200 mm 01.06.2003 1 as is where is immediately
92770 Lam Research R4420 Poly etcher (Etch) 200 mm 01.06.2004 1 as is where is
92771 Lam Research R4520 Oxide etcher (Etch) 200 mm 01.06.1998 1 as is where is
92772 Lam Research R4520 Oxide etcher (Etch) 200 mm 01.06.1998 1 as is where is
92773 Lam Research TCP9600SE Metal etcher 200 mm 1 as is where is immediately
93038 LAM Research RAINBOW4500 Etcher 125 mm 1 as is where is
93845 LAM RESEARCH 9600 TCP SE Metal Etch 150mm 1 as is where is
94239 LAM Research 2300 Exelan Flex Cu Dielectric Etch - Used for Copper Process 300 mm 01.06.2001 1 as is where is immediately
94240 LAM Research 2300 Exelan Flex 45 Dielectric Etch, 3 CHAMBER 300 MM 01.06.2008 1 as is where is immediately
94241 LAM Research 2300 Exelan Flex 45 Dielectric Etch 300 mm 01.06.2008 1 as is where is immediately
94242 LAM Research 2300 Exelan Flex 45 Dielectric Etch 300 mm 01.06.2006 1 as is where is immediately
94243 LAM Research 2300 KIYO FX Polysilicon Etcher 300 mm 01.06.2005 1 as is where is immediately
94580 Lam Research Rainbow 4420 POLY Etcher 200mm 1 as is where is immediately
94581 Lam Research Rainbow 4520 (ENVISION) Oxide Etcher 200mm 1 as is where is immediately
95099 Lam Research A4 4520 PM ETCH 8" 1 as is where is
95100 Lam Research A6 TM(Alliance) DRY ETCH CLUSTER TOOL HUB WITH NO CHAMBERS ATTACHED 200 mm 01.06.2000 1 as is where is immediately
95101 Lam Research Rainbow 4420 ETCH 8" 1 as is where is
95105 Lam Research TCP9600SE ETCH 8" 1 as is where is
95243 Lam Research 9600PTX Dry Etch 200 mm 01.01.1998 1 immediately
95297 LAM Research 2300 Exelan Flex FX - Chamber Only Dielectric Etch (Chamber Only) 300 mm 1 as is where is immediately
95825 LAM Research 2300 Exelan Flex 45 Dielectric Etch 3 Chamber 300 mm 01.06.2007 1 as is where is immediately
95826 LAM Research 2300 Exelan Flex 45 Dielectric Etch, 3 chamber 300 mm 01.06.2013 1 as is where is immediately
95963 LAM Research 4420 Polysilicon Etch 200 mm 01.06.1994 1 as is where is
95964 LAM Research 4520 Oxide Etch 200 mm 01.06.1996 1 as is where is
95965 LAM Research TCP9400 Dry Etcher 200 mm 01.06.1997 1 as is where is
96461 LAM Research 2300FLEX45 Dielectric Etch Process 300mm 01.07.2007 1 as is where is immediately
96462 LAM Research 2300FLEX45 Dry Etch 300mm 01.11.2007 1 as is where is
96463 LAM Research 2300FLEX45 Dry Etch 300mm 01.12.2007 1 as is where is
96464 LAM Research 2300FLEX45 Dry Etch 300mm 01.12.2008 1 as is where is
96465 LAM Research 2300FLEX45 Dry Etch 300mm 01.08.2013 1 as is where is
96466 LAM Research 2300FLEX45 Dry Etch 300mm 01.09.2013 1 as is where is
96467 LAM Research 2300KIYO45 Dry Etch 300mm 01.01.2011 1 as is where is
96468 LAM Research 2300KIYO45 Dry Etch 300mm 01.01.2011 1 as is where is
96469 LAM Research 2300KIYO45 Dry Etch 300mm 01.09.2010 1 as is where is
96470 LAM Research 2300KIYO45 Dry Etch 300mm 01.05.2013 1 as is where is
96472 LAM Research FLEX GX E6 Dielectric Etch Process 300mm 01.11.2008 1 as is where is
96473 LAM Research FLEX GX E6 Dielectric Etch Process 300mm 01.11.2008 1 as is where is
96474 LAM Research TORUS300S Plasma etcher 300mm 01.10.2010 1 as is where is
96879 LAM Research 2300 Exelan Flex Dielectric Etch 300 mm 01.06.2006 1 as is where is
96880 LAM Research 2300 Exelan Flex EX+ Dielectric Etch 300 mm 1 as is where is
96881 LAM Research 2300 Exelan Flex EX+ Dielectric Etch 300 mm 1 as is where is
96882 LAM Research 2300 KIYO EX Poly - Chamber Only Polysilicon Etch 300 mm 1 as is where is
96883 LAM Research 2300 KIYO MCX - Chamber Only Metal Etch 300 mm 01.06.2006 1 as is where is
96884 LAM Research 2300 Versys KIYO 45 Polysilicon Etch 300 mm 1 as is where is
96885 LAM Research 2300 Versys KIYO Poly Polysilicon Etch 300 mm 01.06.2009 1 as is where is
96886 LAM Research 2300 Versys KIYO Poly Polysilicon Etch 300 mm 1 as is where is
96887 LAM Research 2300 Versys KIYO Poly Polysilicon Etch 300 mm 1 as is where is
96888 LAM Research 2300 Versys Metal Metal Etch 300 mm 01.06.2004 1 as is where is
96980 LAM Research 4420 Poly Etcher 200 mm 01.06.1992 1 inquire
96981 LAM Research 4520 Oxide Etcher 200 mm 01.06.1992 1 inquire
97004 LAM RESEARCH 2300 Metal 45 Process Chamber (For Spares Use) 300 mm 01.06.2006 1 as is where is immediately
97094 LAM Research TCP9600 Metal Etcher 01.06.1996 1 inquire
93633 March Instruments Jupiter II Tabletop RIE Reactive Ion Etcher 1 as is where is
93634 March Instruments PX 500 Plasma Treatment System 1 as is where is
83977 Mattson Aspen 3 ICP Dual Chamber Asher 300 mm 01.08.2008 5 as is where is immediately
88528 Mattson Paradigme XP Light Etch 300 MM 01.06.2010 1 as is where is immediately
88529 Mattson Paradigme SP Light Etch 300 MM 01.06.2010 1 as is where is
92774 Mattson Aspen 3 Light etch, 3LP + 2 chamber (Asher) 300 mm 01.06.2006 1 as is where is
93899 MATTSON PARADIGM_SI Poly-silicon etcher 300 mm 01.06.2011 1 as is where is
93900 MATTSON PARADIGM_SI Poly-silicon etcher 300 mm 01.06.2011 1 as is where is
93901 MATTSON PARADIGM_SI Poly-silicon etcher 300 mm 01.06.2012 1 as is where is
93902 MATTSON PARADIGM_SI Poly-silicon etcher 300 mm 01.06.2011 1 as is where is
96480 MATTSON PARADIGME SI Light Etch 300mm 01.05.2011 1 as is where is
96481 MATTSON PARADIGME SI Light Etch 300mm 01.03.2011 1 as is where is
96482 MATTSON SUPREMA Plasma Dry Strip 300mm 01.10.2011 1 as is where is
96483 MATTSON SUPREMA IM Plasma Dry Strip 300mm 01.05.2012 1 as is where is
96484 MATTSON SUPREMA IM Plasma Dry Strip 300mm 01.09.2011 1 as is where is
96485 MATTSON SUPREMA IM Plasma Dry Strip 300mm 01.12.2011 1 as is where is
96486 MATTSON SUPREMA IM Plasma Dry Strip 300mm 01.06.2012 1 as is where is
96487 MATTSON SUPREMA IM Plasma Dry Strip 300mm 01.06.2012 1 as is where is
96488 MATTSON SUPREMA IM Plasma Dry Strip 300mm 01.06.2012 1 as is where is
96591 MAXIS 300L ICP Etcher 2-8 INCH 01.06.2011 1 as is where is immediately
83684 Novellus 2000 LL Etch 8" 1 as is where is
90144 Novellus Iridia Poly Etcher 01.05.2005 1 as is where is immediately
96499 NOVELLUS L3500 Asher/Stripper 200mm 01.10.1995 1 as is where is
96500 NOVELLUS L3500 Asher/Stripper 200mm 01.02.1996 1 as is where is
93635 Novellus Gasonics PEP Iridia DL Plasma Asher 1 as is where is
87502 OXFORD 80 Reactive Ion Etcher 1 as is where is
91329 OXFORD 800+ RIE (Reactive Ion Etcher) 1 as is where is immediately
93636 Oxford Instruments 90 Plus RIE RIE Reactive Etcher with Loadlock 1 as is where is
93637 Oxford Instruments Plasmalab 180 ICP ICP Inductively Coupled Plasma High Density Etching System 100 MM 1 as is where is
93638 Oxford Instruments Plasmalab 80 Plus RIE Plasma System 1 as is where is
71760 Oxford Plasma Technology DP80 PE CVD UP TO 8 INCH 01.12.1989 1 as is where is immediately
78807 PLASMA ETCH BT-1 PLASMA CLEANER ASSEMBLY 01.06.2004 1 as is where is immediately
91330 Plasma Therm Wafer/ Batch 740 DUAL PLASMA ETCH AND RIE 4" 1 as is where is
91331 Plasma Therm Wafer/ Batch 740 DUAL PLASMA ETCH AND RIE 4" 1 as is where is
61177 PLASMA-THERM Waf'r Batch 74 RIE/Parallel Plasma Etcher 1 as is where is
86447 Plasmatherm 790 RIE 125 mm 1 as is where is immediately
90668 Plasmatherm 790 Dry Etcher / PECVD 200 mm 01.06.1997 1 as is where is immediately
93639 Plasmatherm 790 MF Plasma RIE Reactive Ion Etch System 1 as is where is
93640 Plasmatherm SLR PECVD Plasma Enhanced Chemical Vapor Deposition System 1 as is where is
95112 PSK EVOLITE2 ETCH - 01.06.2011 1 as is where is
95113 PSK EVOLITE2 ETCH - 01.06.2011 1 as is where is
95114 PSK TERA21 ETCH - 01.06.2002 1 as is where is
86163 SAMCO RIE-10N RIE 200 mm 1 as is where is
86164 SAMCO RIE-10N RIE 200 mm 1 as is where is
86165 SAMCO RIE-10NR RIE 200 mm 1 as is where is
89919 SAMCO FA-1 150mm 01.01.1996 1 as is where is
91076 SAMCO RIE-10NR ETCH 200 mm 01.06.2000 1 as is where is
93396 Shibaura CD 80 Dry Etcher 200 mm 1 inquire immediately
89922 SONY IRG-12 DVU Review Station 300mm 01.11.2002 1 as is where is
87626 SPTS Multiplex ASE Dry etcher system 100 mm 01.06.1998 1 as is where is immediately
93314 SPTS Primaxx CET25-CPX DRY ETCH 200 mm 1 as is where is immediately
79584 STS 320 PC Reactive Ion Etcher 200 mm 01.06.1995 1 as is where is immediately
86527 STS Multiplex ICP Advanced Oxide Etching System 150 mm 1 as is where is immediately
95631 STS (SPTS) Multiplex ICP Deep Reactive Ion Etcher 150mm 01.12.2000 1 as is where is immediately
96620 TAINICS TE3100 ICP Etching Equipment (for GaN Etching) 2 inch and 4 inch 01.06.2011 1 as is where is immediately
83689 Tegal TEGAL 981 Nitride Etch 8" 1 as is where is
93039 TEGAL PLASMA 900E Plasma dry etch 100 mm 1 as is where is
93644 Tegal 803 Inline Automatic Plasma Etcher 1 as is where is
93645 Tegal 900E Cassette to Cassette Photoresist Strip/Backside Etching 100 MM 1 as is where is
63723 TEL UNITY 2E 855 DD 2XDRM CHAMBERS 200mm 01.05.1998 1 as is where is immediately
89916 Tel a-303i Furnace 300mm 01.08.2004 5 as is where is
75635 TEL Tokyo Electron Unity Me SCCM (Chamber) Dry oxide etch chamber 200 mm 1 as is where is immediately
75636 TEL Tokyo Electron Unity Me SCCM 85S Oxide etcher (3 chamber) 200 mm 01.10.2003 1 as is where is immediately
82679 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
82680 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
82681 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
82682 TEL Tokyo Electron SCCM TE ETCH 300 mm 01.06.2006 1 as is where is
83690 TEL Tokyo Electron UNITY M 85TD Oxide Etcher 200 mm 1 as is where is immediately
88530 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
88531 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
88532 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2004 1 as is where is
88533 TEL Tokyo Electron Unity SCCM Shin Etch 300 MM 01.06.2007 1 as is where is
88534 TEL Tokyo Electron Unity SCCM Shin Oxide Etch 300 MM 01.06.2003 1 as is where is
90510 TEL Tokyo Electron Telius 305 SCCM Dielectric Etch 300 mm 01.09.2003 1 as is where is
91017 TEL Tokyo Electron TE8500 Dry Etcher 200mm 01.06.1994 1 as is where is
91335 TEL TOKYO ELECTRON SCCM SHIN Dry ETCHER 200 mm 1 as is where is
91336 TEL TOKYO ELECTRON SCCM SHIN Dry ETCHER 200 mm 1 as is where is
91337 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.2006 1 as is where is
91338 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.1994 1 as is where is
91339 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.1995 1 as is where is
91340 TEL TOKYO ELECTRON TE8500 Etcher 200 mm 01.06.2006 1 as is where is
91341 TEL TOKYO ELECTRON TELIUS SCCM T-3044SS DRY ETCHER 300 mm 01.06.2007 1 as is where is
91816 TEL TOKYO ELECTRON UNITY-EP DRY ETCH 01.06.2005 1 as is where is
91817 TEL TOKYO ELECTRON TE8500 DRY ETCH 01.06.1998 1 as is where is
91818 TEL TOKYO ELECTRON TE8500 DRY ETCH 01.06.1998 1 as is where is
91819 TEL TOKYO ELECTRON TE8500 DRY ETCH 01.06.1996 1 as is where is
91820 TEL TOKYO ELECTRON TE8500 DRY ETCH 01.06.1997 1 as is where is
92604 TEL Tokyo Electron Telius 305 SCCM Dielectric Etch 300mm 01.09.2003 1 as is where is
93040 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2009 1 as is where is
93041 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2010 1 as is where is
93042 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.06.2010 1 as is where is
94559 TEL Tokyo Electron Telius SCCM Shin Oxide etcher 300 mm 01.06.2000 1 as is where is
95902 TEL Tokyo Electron Telius SP 305 DRM Dielectric Etch 300 mm 01.06.2004 1 as is where is
96522 TEL Tokyo Electron SCCM SHIN Oxide Etcher 300mm 01.03.2007 1 as is where is
96526 TEL Tokyo Electron VESTA Plasma Etch System 300mm 01.02.2011 1 as is where is
96927 TEL Tokyo Electron Tactras RLSA Poly Polysilicon Etch 300 mm 01.06.2012 1 as is where is
96928 TEL Tokyo Electron Tactras Vigus Dielectric Etch 300 mm 01.10.2010 1 as is where is
96929 TEL Tokyo Electron Tactras Vigus RK3 - Chamber Only Dielectric Etch 300 mm 1 as is where is
96930 TEL Tokyo Electron Tactras Vigus RK3 - Chamber Only Dielectric Etch 300 mm 1 as is where is
96931 TEL Tokyo Electron Tactras Vigus RK3 - Chamber Only Dielectric Etch 300 mm 1 as is where is
96956 TEL Tokyo Electron Telius 305 DRM Dielectric Etch 300 mm 01.06.2003 1 as is where is
96957 TEL Tokyo Electron Telius 305 DRM Dielectric Etch 300 mm 01.04.2003 1 as is where is
96958 TEL Tokyo Electron Telius SP 305 DRM Dielectric Etch 300 mm 01.06.2005 1 as is where is
96959 TEL Tokyo Electron Telius SP 305 DRM Chamber Dielectric Etch 300 mm 01.06.2006 1 as is where is
93646 Tepla America PlasmaPen Atmospheric High Density Plasma Cleaning/Etching System 1 as is where is
10117 TRION Minilock Single Wafer RIE Etcher with Loadlock, 200mm Wafers 200 mm 1 as is where is immediately
87503 TRION Single Wafer Plasma Etcher, 200mm Wafers 1 as is where is
86679 Trion Technology Phantom II Reactive ion etcher 01.06.0200 1 as is where is immediately
93647 Trion Technology Minilock Single Wafer RIE Etcher 150 MM 1 as is where is
93648 Trion Technology Phantom II ICP Inductively Coupled Plasma Etch System 200 MM 1 as is where is


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