Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
---|---|---|---|---|---|---|---|---|
93868 | Alcatel | AMS 4200 | Advanced Multi chamber ICP Plasma Etching System / Bosch Process | 150 mm and 200 mm | 01.09.2007 | 1 | as is all rebuilt | immediately |
93883 | Alcatel | 602E | Deep Trench Etcher | 150 mm | 01.06.1996 | 1 | as is where is | immediately |
66407 | AMAT | Centura 5200 eMxP+ | 3 chamber dry etcher | 200 mm | 01.06.1999 | 1 | as is where is | immediately |
94110 | AMEC | Primo SSC AD-RIIE | Dielectric Etch | 300 mm | 1 | as is where is | ||
100074 | AMEC | Primo SSC AD-RIE | Dielectric Etch | 300mm | 1 | as is where is | ||
79200 | Applied Materials | Centura 5200 IPS (Spares) | qty 3 IPS Process Chambers | 200 mm | 3 | as is where is | immediately | |
79400 | Applied Materials | Centura 5200 IPS (Spares) | DI-ELECTRIC ETCH Process Chamber | 200 mm | 1 | as is where is | immediately | |
84535 | Applied Materials | CENTURA 5200 DPS+METAL | Dry Etch (Metal) | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
86146 | Applied Materials | P5000 MxP METAL(2 METAL & 1 ASP) | Metal etcher | 150 mm | 1 | as is where is | ||
86147 | Applied Materials | P5000 MxP METAL(2 METAL & 1 ASP) | Metal etcher | 150 mm | 01.06.1997 | 1 | as is where is | immediately |
86711 | Applied Materials | P5000 | 2Mark II & 1ASP Metal Etcher | 200 mm | 01.04.1997 | 1 | as is where is | immediately |
88508 | Applied Materials | Centura DPS2 | Metal | 300 MM | 01.06.2005 | 1 | as is where is | |
89044 | Applied Materials | DPS+ Metal, Centura 2 | Process Chamber | 200 mm | 1 | inquire | immediately | |
91051 | APPLIED MATERIALS | CENTURA AP DPS II CHAMBER | DRY ETCH | - | 1 | as is where is | ||
91052 | APPLIED MATERIALS | CENTURA E-MAX CT 3CH | DRY ETCH | 300 mm | 1 | as is where is | ||
91061 | APPLIED MATERIALS | CENTURA P2 SUPER-E | DRY ETCH | 200 mm | 01.06.1998 | 1 | as is where is | immediately |
91260 | Applied Materials | CENTURA 5200 | MxP+ Oxide | 200 mm | 1 | as is where is | ||
91261 | Applied Materials | CENTURA 5200 | MXP Metal | 150 mm | 1 | as is where is | ||
91262 | Applied Materials | CENTURA 5200 | MxP+ Oxide | 200 mm | 1 | as is where is | ||
91263 | Applied Materials | CENTURA 5200 | DPS POLY | 200 mm | 01.06.2000 | 1 | as is where is | |
91264 | Applied Materials | CENTURA 5200 | SUPER-E | 200 mm | 01.06.2000 | 1 | as is where is | |
91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
91270 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
91276 | Applied Materials | Centura DPS II | NT OS | 300 mm | 1 | as is where is | ||
91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | ||
91278 | Applied Materials | Centura DPS Metal | ASP chamber only / Server OS | 300 mm | 1 | as is where is | ||
91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
91286 | Applied Materials | P5000 | DELTA DLH | 150 mm | 1 | as is where is | ||
91287 | Applied Materials | P5000 | DELTA DLH | 150 mm | 01.06.1993 | 1 | as is where is | |
91288 | Applied Materials | P5000 Etch | Mark II Poly | 200 mm | 01.06.1995 | 1 | as is where is | |
91289 | Applied Materials | P5000 Etch | Mark II OXIDE | 150 mm | 1 | as is where is | ||
91307 | Applied Materials | P5000 Etch | Mark II Metal | 150 mm | 1 | as is where is | ||
91308 | Applied Materials | P5000 Mark II Etch | Oxide | 150 mm | 1 | as is where is | ||
91311 | Applied Materials | P5000 Mark-II Etch | Oxide | 200 mm | 1 | as is where is | ||
91313 | Applied Materials | P5000-Mark II Etch | Metal | 1 | as is where is | |||
91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
92063 | Applied Materials | P5000 | Metal Etcher with two Indexer, L/L CH, Orienter CH, two Process CH, ASP CH, | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
92064 | Applied Materials | P5000 | Dry etcher, Poly, with 3 process chambers | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.06.2010 | 1 | as is where is | |
93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 01.06.2007 | 1 | as is where is | |
93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 01.06.2010 | 1 | as is where is | |
93036 | Applied Materials | P5000 Etch | no chamber (PLIS type) | 200 mm | 1 | as is where is | ||
93037 | Applied Materials | PRODUCER GT | Fox/eHarp | 300 mm | 01.06.2009 | 1 | as is where is | |
93896 | Applied Materials | ENABLER_E2 | Etcher | 300 mm | 01.06.2009 | 1 | as is where is | |
94434 | Applied Materials | CENTURA 5200 | EMAX | 200 mm | 1 | as is where is | ||
94435 | Applied Materials | CENTURA DPS G5 | 1Process Chamber / 1Mesa Chamber | 300 mm | 1 | as is where is | ||
94508 | Applied Materials | Centura DPS2 Poly | Poly Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
94509 | Applied Materials | Centura DPS2 Poly | Poly Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
94511 | Applied Materials | Centura Enabler | Oxide etch | 300 mm | 01.06.2010 | 1 | as is where is | |
95092 | APPLIED MATERIALS | CENTURA P2 SUPER-E | ETCH | 8" | 01.06.1998 | 1 | as is where is | |
95259 | Applied Materials | Centura AP Enabler | Dielectric Etch | 300mm | 1 | as is where is | ||
95928 | Applied Materials | Centura Advantedge Carina Mesa | Dry Etch Cluster Tool | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
96805 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.01.2015 | 1 | as is where is | |
96806 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.01.2015 | 1 | as is where is | |
97215 | Applied Materials | CENTURA DPS G5 MESA | Polysilicon Etch | 300 mm | 01.07.2013 | 1 | as is where is | |
97218 | Applied Materials | CENTURA DPS G5 | Dry etch | 300 mm | 01.05.2008 | 1 | as is where is | |
97219 | Applied Materials | CENTURA DPS G5 | Dry Etch | 300 mm | 01.03.2006 | 1 | as is where is | |
97523 | Applied Materials | Centura AdvantEdge Mesa2 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
97527 | Applied Materials | Centura AP Enabler | Dielectric Etch | 300 mm | 1 | as is where is | ||
97849 | Applied Materials | Centura 5200 DPS2 Poly | Poly Etcher | 300 mm | 01.06.2010 | 1 | as is where is | |
98022 | Applied Materials | ENABLER_E2 | Oxide Etch | 300 mm | 01.06.2009 | 1 | as is where is | |
98026 | Applied Materials | P5000 MxP Poly | CVD | 200 mm | 01.06.1995 | 1 | as is where is | |
98068 | Applied Materials | Centura Carina | 1 Carina CHM | 300 mm | 01.06.2012 | 1 | as is where is | |
98069 | Applied Materials | Centura eMax CT+ | ETCH | 300 mm | 01.06.2004 | 1 | as is where is | |
98070 | Applied Materials | Centura eMax CT+ | ETCH | 300 mm | 01.06.2007 | 1 | as is where is | |
98071 | Applied Materials | Centura eMax CT+ | Oxide Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
98072 | Applied Materials | Centura Enabler | Oxide Etch | 300 mm | 01.06.2004 | 1 | as is where is | |
98073 | Applied Materials | Centura Enabler E2 | Oxide Etch | 300 mm | 01.06.2010 | 1 | as is where is | |
98258 | Applied Materials | DPS G5 | Dry Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
98259 | Applied Materials | DPS G5 | Dry Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
98260 | Applied Materials | DPS G5 | Dry Etch | 300 mm | 01.06.2010 | 1 | as is where is | |
98261 | Applied Materials | DPS G5 MESA | Polysilicon Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
98328 | Applied Materials | P5000 MxP METAL | ETCH (Mainbody only) | 150 mm | 1 | inquire | ||
98374 | Applied Materials | DPS Chambers | Dry Etch | 300 mm | 2 | as is where is | ||
98375 | Applied Materials | Enabler Chamber System | Dry Etch | 300 mm | 1 | as is where is | ||
98555 | Applied Materials | Centura DPS II (AE) POLY | POLY ETCHER | 300 mm | 1 | as is where is | ||
98556 | Applied Materials | Centura DPS II (AE) POLY | POLY ETCHER | 300 mm | 1 | as is where is | ||
98557 | Applied Materials | Centura DPS II (AE) POLY | POLY ETCHER | 300 mm | 1 | as is where is | ||
98801 | Applied Materials | ENDURA 2 | Metal Etch HT-Al 2ch / SIP-Ti 1ch | 300 mm | 01.05.2003 | 1 | as is where is | |
98802 | Applied Materials | G5 | Polysilicon Etch | 300 mm | 01.02.2008 | 1 | as is where is | |
98803 | Applied Materials | G5-MESA-T2 | Polysilicon Etch | 300 mm | 01.01.2014 | 1 | as is where is | |
98991 | Applied Materials | DPS | Dry Etch | 300 mm | 01.05.2006 | 1 | as is where is | |
98992 | Applied Materials | DPS_G5_Mesa | Dry Etch | 300 mm | 01.01.2006 | 1 | as is where is | |
98993 | Applied Materials | EMAX-CT-PLUS | Dry Etch | 300 mm | 01.07.2004 | 1 | as is where is | |
98998 | Applied Materials | G5 | Polysilicon Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
99089 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal - Chamber Only | Metal Etch | 300mm | 1 | as is where is | ||
99090 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal - Chamber Only | Metal Etch | 300mm | 1 | as is where is | ||
99091 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300mm | 01.05.2006 | 1 | as is where is | |
99943 | Applied Materials | Centura 5200 DPS Metal | Metal Etch | 200 mm | 1 | as is where is | ||
100031 | Applied Materials | Centura DPS 2 Advantedge Mesa | Dry Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
100032 | Applied Materials | Centura DPS 2 G5 | Dry Etch | 300 mm | 01.06.2008 | 1 | as is where is | immediately |
100757 | Applied Materials | Axiom HT plus | Axiom HT+ strip chamber | 300 mm | 01.06.2007 | 1 | inquire | |
100758 | Applied Materials | eMax CT | eMax CT Dielectric etch chamber | 300 mm | 01.06.2003 | 1 | inquire | |
100759 | Applied Materials | eMax CT plus | eMax CT+ Dielectric etch chamber | 300 mm | 01.06.2007 | 1 | inquire | |
100760 | Applied Materials | eMax CT plus | eMax CT+ Dielectric etch chamber | 300 mm | 01.06.2007 | 1 | inquire | |
100761 | Applied Materials | Enabler | Enabler Dielectric etch chamber | 300 mm | 01.06.2007 | 1 | inquire | |
100762 | Applied Materials | Enabler | Enabler Dielectric etch chamber | 300 mm | 01.06.2007 | 1 | inquire | |
100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 01.06.2015 | 1 | as is where is | |
100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 01.06.2015 | 1 | as is where is | |
100911 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 01.06.2016 | 1 | as is where is | |
100912 | Applied Materials | DPS G5 Mesa | Poly Etcher | 300 mm | 01.06.2006 | 1 | as is where is | |
100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 01.06.2006 | 1 | as is where is | |
100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
101014 | Applied Materials | Centura ACP DPN HD | Gate Stack Decoupled plasma Nitride | 300 mm | 01.06.2018 | 1 | as is where is | immediately |
101394 | Applied Materials | Centura ACP DPN HD Gate Stack | Decoupled Plasma Nitride | 300mm | 1 | as is where is | ||
101395 | Applied Materials | Centura ACP DPN HD Gate Stack | Decoupled Plasma Nitride | 300mm | 1 | as is where is | ||
101396 | Applied Materials | Centura ACP DPN HD Gate Stack | Decoupled Plasma Nitride | 300mm | 01.06.2018 | 1 | as is where is | |
101397 | Applied Materials | Centura ACP DPN HD Gate Stack | Decoupled Plasma Nitride | 300mm | 01.06.2018 | 1 | as is where is | |
101398 | Applied Materials | Centura ACP DPN HD Gate Stack | Decoupled Plasma Nitride | 300mm | 01.03.2015 | 1 | as is where is | |
101399 | Applied Materials | Centura ACP DPN HD Gate Stack | Decoupled Plasma Nitride | 300mm | 01.06.2017 | 1 | as is where is | |
101400 | Applied Materials | Centura ACP DPN HD Gate Stack | Decoupled Plasma Nitride | 300mm | 01.06.2017 | 1 | as is where is | |
101401 | Applied Materials | Centura ACP DPN Plus Gate Stack | Decoupled Plasma Nitride | 300mm | 1 | as is where is | ||
101402 | Applied Materials | Centura AP AdvantEdge G5 Minos Poly | Polysilicon Etch | 300mm | 01.06.2015 | 1 | as is where is | |
101403 | Applied Materials | Centura AP eMax CT | Polysilicon Etch | 300mm | 1 | as is where is | ||
101404 | Applied Materials | Centura AP Enabler | Polysilicon Etch | 300mm | 1 | as is where is | ||
101408 | Applied Materials | Producer Etch eXT Dielectric | Dielectric Etch | 300mm | 1 | as is where is | ||
101524 | Applied Materials | AdvantEdge G5 | Polysilicon Etch | 300 mm | 01.03.2012 | 1 | as is where is | |
101525 | Applied Materials | AdvantEdge G5 MESA | Polysilicon Etch | 300 mm | 01.05.2005 | 1 | as is where is | |
101526 | Applied Materials | AdvantEdge G5 MESA EFEM | Polysilicon Etch | EFEM | 01.09.2012 | 1 | as is where is | |
101527 | Applied Materials | AdvantEdge G5-MESA | Polysilicon Etch | 300 mm | 01.06.2010 | 1 | as is where is | |
101529 | Applied Materials | AdvantEdge MESA | Polysilicon Etch | 300 mm | 01.01.2020 | 1 | as is where is | |
101530 | Applied Materials | AdvantEdge MESA G5 | Polysilicon Etch | 300 mm | 01.07.2013 | 1 | as is where is | |
101531 | Applied Materials | AVATAR | Dielectric Etch | 300 mm | 01.09.2012 | 1 | as is where is | |
101532 | Applied Materials | AVATAR | Dielectric Etch | 300 mm | 01.11.2013 | 1 | as is where is | |
101792 | Canon | ILD-4100SR | Oxide Dry Etcher | 200 mm | 01.04.1996 | 1 | inquire | |
100725 | Corial | 300IL | ICP Dry Etcher | 1 | as is where is | |||
92713 | FEI | Dual beam 820 | FIB SEM | 200 mm | 01.06.1997 | 1 | as is where is | immediately |
69945 | Gasonics | AE 2001 | Single wafer etch system | 1 | ||||
82891 | Gasonics | Strata | Oxide Etch System | 200 | 01.06.1997 | 1 | as is where is | immediately |
81831 | Hitachi | M712E | ECR Plasma Etcher | 200mm | 1 | as is where is | immediately | |
89915 | Hitachi | U-722 | Etch 300mm | 300mm | 3 | as is where is | ||
90760 | Hitachi | U-702 | Metal Etch | 300mm | 01.06.2004 | 1 | as is where is | |
100164 | Hitachi | U-7050A | Metal Etch | 300mm | 01.10.2013 | 1 | as is where is | |
98814 | IPS | AKRA | Metal Etch | 300 mm | 01.09.2010 | 1 | as is where is | |
60923 | LAM | 4720 | Oxide Etcher | 1 | as is where is | immediately | ||
91129 | LAM | TCP9400SE | Etcher | 200mm non-SMIF | 01.06.2018 | 2 | inquire | 4 months |
91130 | LAM | TCP9400SE | Etcher | 200mm SMIF | 01.06.2018 | 2 | inquire | 4 months |
71831 | LAM RESEARCH | A6 EXELAN | OXIDE ETCHER (refurbished) | 1 | as is where is | immediately | ||
82252 | Lam Research | TCP9600SE | Dry etcher | 8" | 1 | as is where is | immediately | |
82257 | Lam Research | 2300 EXELAN | Dry etcher | 8" | 01.06.2004 | 1 | as is where is | immediately |
82258 | Lam Research | 2300 EXELAN | Dry etcher | 8" | 01.06.2004 | 1 | as is where is | immediately |
86154 | LAM Research | A4 9600SE PM | Dry etch Chamber | 200 mm | 1 | as is where is | ||
86155 | LAM Research | A4 TM(Alliance) | DRY ETCHER – HUB | 200 mm | 1 | as is where is | ||
91028 | Lam Research | Alliance4 9400SE | Etcher | 150mm | 01.06.1996 | 1 | as is where is | immediately |
91069 | Lam Research | Alliance4 4420XL | DRY ETCHER | 150 mm | 01.06.1996 | 1 | as is where is | |
91070 | Lam Research | Alliance4 9400SE | DRY ETCHER | 200 mm | 01.06.1996 | 1 | as is where is | |
91071 | Lam Research | RAINBOW 4520i | DRY ETCHER | 200 mm | 01.06.1996 | 1 | as is where is | |
91318 | LAM Research | 2300 Exelan Chamber Only | OXIDE ETCH | 300 mm | 01.06.2004 | 1 | as is where is | |
91319 | LAM Research | 2300 Exelan SYSTEM | OXIDE ETCH | 300 mm | 01.06.2003 | 1 | as is where is | |
91320 | LAM Research | EXELAN 2300 | OXIDE ETCH | 300 mm | 1 | as is where is | ||
91322 | LAM Research | LAM 4520 | OXIDE ETCH | 1 | as is where is | |||
91323 | LAM Research | LAM 4520 | OXIDE ETCH | 1 | as is where is | |||
91324 | LAM Research | LAM 4520 | OXIDE ETCH | 1 | as is where is | |||
91325 | LAM Research | LAM 4520 | OXIDE ETCH | 1 | as is where is | |||
91326 | LAM Research | LAM 4528 | OXIDE ETCH | 1 | as is where is | |||
91328 | LAM Research | STAR Chamber Only | DRY ETCH | 300 mm | 1 | as is where is | ||
92594 | LAM Research | 2300 Exelan Flex 45 | Dielectric Etch | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
93038 | LAM Research | RAINBOW4500 | Etcher | 125 mm | 1 | as is where is | ||
94580 | Lam Research | Rainbow 4420 | POLY Etcher | 200mm | 1 | as is where is | immediately | |
94581 | Lam Research | Rainbow 4520 (ENVISION) | Oxide Etcher | 200mm | 1 | as is where is | immediately | |
95099 | Lam Research | A4 4520 PM | ETCH | 8" | 1 | as is where is | ||
95243 | Lam Research | 9600PTX | Dry Etch | 200 mm | 01.01.1998 | 1 | immediately | |
95825 | LAM Research | 2300 Exelan Flex 45 | Dielectric Etch 3 Chamber | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
96880 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch 3 chamber | 300 mm | 1 | as is where is | immediately | |
97004 | LAM RESEARCH | 2300 Metal 45 | Process Chamber (For Spares Use) | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
97227 | LAM Research | 2300FLEX45 | Dielectric Etch | 300 mm | 01.10.2008 | 1 | as is where is | |
97228 | LAM Research | 2300FLEX45 | Dielectric Etch | 300 mm | 01.07.2007 | 1 | as is where is | |
97229 | LAM Research | 2300FLEX45 | Dielectric Etch | 300 mm | 01.09.2007 | 1 | as is where is | |
97230 | LAM Research | 2300FLEX45 | Dielectric Etch | 300 mm | 01.04.2005 | 1 | as is where is | |
97231 | LAM Research | 2300FLEX45 | Dielectric Etch | 300 mm | 01.05.2008 | 1 | as is where is | |
97232 | LAM Research | 2300KIYO45 | Polysilicon Etch | 300 mm | 01.07.2007 | 1 | as is where is | |
97233 | LAM Research | 2300KIYO45 | Polysilicon Etch | 300 mm | 01.02.2013 | 1 | as is where is | |
97234 | LAM Research | 2300KIYO45 | Polysilicon Etch | 300 mm | 01.07.2010 | 1 | as is where is | |
97235 | LAM Research | 2300KIYO45 | Polysilicon Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
97236 | LAM Research | 2300KIYO45 | Polysilicon Etch | 300 mm | 01.12.2010 | 1 | as is where is | |
97677 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch 3 chamber | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
97678 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch 3 chamber | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
97679 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch 3 chamber | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
97680 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch 3 chamber | 300 mm | 01.06.2020 | 1 | as is where is | immediately |
97681 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch 3 chamber | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
97682 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch 3 chamber | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
97683 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch 3 chamber | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
97690 | LAM Research | 2300 SELIS - Chamber Only | Dielectric Etch – Process Chamber | 300 mm | 1 | as is where is | ||
98146 | Lam Research | 2300 Exelan Flex45 | Oxide Etcher | 300 mm | 01.06.2008 | 1 | as is where is | |
98279 | LAM Research | FLEX GX E6 | OXIDE ETCH | 300 mm | 01.06.2008 | 1 | as is where is | |
98280 | LAM Research | FLEX GX E6 | OXIDE ETCH | 300 mm | 01.06.2008 | 1 | as is where is | |
98346 | LAM Research | 2300 KIYO45 | ETCH | 300 mm | 01.06.2018 | 1 | inquire | |
98347 | LAM Research | 2300 KIYO45 | ETCH | 300 mm | 01.06.2012 | 1 | inquire | |
98348 | LAM Research | Alliance4 4420XL PM | ETCH | 150 mm | 01.06.1996 | 1 | inquire | |
98820 | LAM Research | 2300METAL-CIP | Metal Etch | 300 mm | 01.08.2006 | 1 | as is where is | |
98822 | LAM Research | EXTRIMA3100 | Dry Etch | 300 mm | 01.02.2006 | 1 | as is where is | |
98823 | LAM Research | FLEX45 | Dielectric Etch | 300 mm | 01.07.2004 | 1 | as is where is | |
98824 | LAM Research | 2300 KIYO-45 | Dry Etch | 300 mm | 01.05.2003 | 1 | as is where is | |
98826 | LAM Research | TORUS300 | Dry Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
98859 | LAM Research | 4420 | Poly Etch | 200 mm | 1 | inquire | ||
99013 | LAM Research | 2300 FLEX Exelan | Dielectric Etch | 01.08.2013 | 1 | as is where is | ||
99014 | LAM Research | 2300 FLEX Exelan | Dielectric Etch | 01.10.2012 | 1 | as is where is | ||
99015 | LAM Research | 2300 FLEX Exelan | Dielectric Etch | 01.07.2013 | 1 | as is where is | ||
99016 | LAM Research | ALTUS | Metal Etch | 300 mm | 01.07.2005 | 1 | as is where is | |
99017 | LAM Research | ALTUS | Metal Etch | 300 mm | 01.09.2001 | 1 | as is where is | |
99019 | LAM Research | ALTUS | Metal Etch | 300 mm | 01.04.2010 | 1 | as is where is | |
99020 | LAM Research | EXTRIMA3100 | Dry Etch | 01.03.2006 | 1 | as is where is | ||
99021 | LAM Research | FLEX FX EFEM | Dry Etch | 01.09.2012 | 1 | as is where is | ||
99022 | LAM Research | FLEX_FX | Dry Etch | 01.09.2013 | 1 | as is where is | ||
99023 | LAM Research | FLEX-DS | Dry Etch | 01.07.2005 | 1 | as is where is | ||
99024 | LAM Research | KIYO-EX | Dry Etch | 01.08.2007 | 1 | as is where is | ||
99184 | LAM Research | 2300 Exelan Flex (chamber) | Dielectric Etch (Chamber Only) | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
99186 | LAM Research | 2300 Exelan Flex - Chamber Only | Dielectric Etch (Chamber Only) | 300 mm | 1 | as is where is | immediately | |
99188 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch 3 chamber | 300 mm | 01.06.2005 | 1 | as is where is | immediately |
99194 | LAM Research | 2300e5 KIYO 45 | Polysilicon Etch | 300mm | 1 | as is where is | ||
99195 | LAM Research | 2300e5 KIYO 45 | Polysilicon Etch | 300mm | 1 | as is where is | ||
99863 | Lam Research | 9400 | Poly Etcher | 150 mm | 01.06.2001 | 1 | inquire | |
99916 | LAM Research | 2300 e4 FLEX DL (3CH) | Oxide Etch | 300 mm | 1 | as is where is | ||
99917 | LAM Research | 2300 V2 (2CH & 1STRIP) | Metal Etch | 300 mm | 1 | as is where is | ||
99918 | LAM Research | 2300 V2 FLEX (3CH) | Dielectric Etch | 300 mm | 1 | as is where is | ||
99919 | LAM Research | Alliance6 9400DFM (3CH) | ETCH | 200 mm | 1 | as is where is | ||
99920 | LAM Research | Alliance6 9400PTX (3CH) | ETCH | 200 mm | 1 | as is where is | ||
99922 | LAM Research | TCP9400SE | Dry Etcher | 200 mm | 01.06.1993 | 1 | as is where is | |
99923 | LAM Research | TCP9600SE | Dry Etcher | 200 mm | 1 | as is where is | ||
99924 | LAM Research | TORUS300S | Dry Etcher | 300 mm | 1 | as is where is | ||
100204 | LAM Research | 2300 Exelan Flex - Chamber Only | Dielectric Etch | 300mm | 01.06.2006 | 1 | as is where is | |
100205 | LAM Research | 2300 Exelan Flex - Chamber Only | Dielectric Etch | 300mm | 1 | as is where is | ||
100207 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch | 300mm | 1 | as is where is | ||
100214 | LAM Research | 2300e5 KIYO 45 | Polysilicon Etch | 300mm | 01.04.2014 | 1 | as is where is | |
100792 | LAM Research | 4520i | Isotropic Oxide Etcher | 200 mm | 01.06.2004 | 1 | inquire | |
100922 | LAM Research | FLEX FX | Dry Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
101477 | LAM Research | 2300 Exelan | Dielectric Etch | 300mm | 1 | as is where is | ||
101478 | LAM Research | 2300 Exelan | Dielectric Etch | 300mm | 1 | as is where is | ||
101479 | LAM Research | 2300 KIYO EX Poly - Chamber Only | Polysilicon Etch | 300mm | 01.06.2011 | 1 | as is where is | |
101480 | LAM Research | 2300 KIYO MCX | Metal Etch | 300mm | 1 | as is where is | ||
101481 | LAM Research | 2300 KIYO MCX | Metal Etch | 300mm | 01.06.2010 | 1 | as is where is | |
101483 | LAM Research | TCP 9600CFE | Metal Etch | 200mm | 01.06.1997 | 1 | as is where is | |
101564 | LAM Research | FLEX DS | Dry Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
101565 | LAM Research | FLEX-FX | Dry Etch | 300 mm | 01.10.2013 | 1 | as is where is | |
101566 | LAM Research | FLEX-FX | Dry Etch | 300 mm | 01.09.2013 | 1 | as is where is | |
101567 | LAM Research | FLEX45 | Dielectric Etch | 300 mm | 01.09.2008 | 1 | as is where is | |
101568 | LAM Research | FLEX45 | Dielectric Etch | 300 mm | 01.12.2006 | 1 | as is where is | |
101569 | LAM Research | KIYO EXP | Dry Etch | 300 mm | 01.09.2014 | 1 | as is where is | |
101570 | LAM Research | KIYO EXP | Dry Etch | 300 mm | 01.08.2014 | 1 | as is where is | |
101571 | LAM Research | KIYO_FX | Dry Etch | 300 mm | 01.04.2020 | 1 | as is where is | |
101572 | LAM Research | KIYO_FX STRIP | ETC | 300 mm | 01.03.2020 | 1 | as is where is | |
101573 | LAM Research | KIYO-45 | Dry Etch | 300 mm | 01.07.2007 | 1 | as is where is | |
101574 | LAM Research | KIYO-45 | Dry Etch | 300 mm | 01.12.2007 | 1 | as is where is | |
101579 | LAM Research | TORUS300 | Dry Etch | 300 mm | 01.03.2007 | 1 | as is where is | |
101580 | LAM Research | TORUS300 | Dry Etch | 300 mm | 01.02.2008 | 1 | as is where is | |
101581 | LAM Research | TORUS300K | Dry Etch | 300 mm | 01.03.2007 | 1 | as is where is | |
83977 | Mattson | Aspen 3 ICP | Dual Chamber Asher | 300 mm | 01.08.2008 | 5 | as is where is | immediately |
88529 | Mattson | Paradigme SP | Light Etch | 300 MM | 01.06.2010 | 1 | as is where is | |
93899 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.06.2011 | 1 | as is where is | |
93900 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.06.2011 | 1 | as is where is | |
93901 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.06.2012 | 1 | as is where is | |
93902 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.06.2011 | 1 | as is where is | |
98148 | Mattson | Aspen 3 Lite | LITE ETCHER | 300 mm | 01.06.2006 | 1 | as is where is | |
98152 | Mattson | ParadigmE | Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
98284 | MATTSON | PARADIGME SI | Polysilicon Etch | 300 mm | 1 | as is where is | ||
98829 | MATTSON | PARADIGME-POLY | Polysilicon Etch | 300 mm | 01.05.2011 | 1 | as is where is | |
101582 | MATTSON | PARADIMG_XP | Polysilicon Etch | 300 mm | 01.09.2013 | 1 | as is where is | |
100732 | Maxis | 300LAH | ICP Etcher | 2 | as is where is | |||
91329 | OXFORD | 800+ | RIE (Reactive Ion Etcher) | 1 | as is where is | immediately | ||
99398 | Oxford | Micro-etch 300 | Dry Etcher | 1 | as is where is | immediately | ||
101347 | Oxford | PlasmaLab 100 | ICP Etcher | 150mm | 1 | as is where is | ||
97449 | Oxford Instruments | Plasmalab 100+ICP180 | Inductively Coupled Plasma High Density Etching System | 1 | as is where is | immediately | ||
99868 | Oxford Plasmalab | 800 RIE | Ion Etching System | 1 | inquire | |||
78807 | PLASMA ETCH | BT-1 | PLASMA CLEANER | ASSEMBLY | 01.06.2004 | 1 | as is where is | immediately |
91330 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | ||
91331 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | ||
98421 | Plasma Therm | SLR 720 | RIE Etcher | 150/200 mm | 01.01.2001 | 1 | as is where is | immediately |
98422 | Plasma Therm | VLR | Plasma Etch ICP | 150/200 mm | 2 | as is where is | ||
98423 | Plasma Therm | VLR | Plasma Etch ICP | 150/200 mm | 1 | as is where is | ||
86447 | Plasmatherm | 790 | RIE | 125 mm | 1 | as is where is | immediately | |
97723 | Plasmatherm | 790 Etch | Multi-Process Etch | 200 mm | 1 | as is where is | ||
99403 | PlasmaTherm | SLR 740 | Dual Chamber RIE / Plasma etch | 200 mm | 01.05.1999 | 1 | as is where is | immediately |
95112 | PSK | EVOLITE2 | ETCH | - | 01.06.2011 | 1 | as is where is | |
95113 | PSK | EVOLITE2 | ETCH | - | 01.06.2011 | 1 | as is where is | |
95114 | PSK | TERA21 | ETCH | - | 01.06.2002 | 1 | as is where is | |
86163 | SAMCO | RIE-10N | RIE | 200 mm | 1 | as is where is | ||
86164 | SAMCO | RIE-10N | RIE | 200 mm | 1 | as is where is | ||
86165 | SAMCO | RIE-10NR | RIE | 200 mm | 1 | as is where is | ||
91076 | SAMCO | RIE-10NR | ETCH | 200 mm | 01.06.2000 | 1 | as is where is | |
101733 | SAMCO | RIE-10NR | Reactive Ion Etching | 01.06.1999 | 1 | inquire | ||
93396 | Shibaura | CD 80 | Dry Etcher | 200 mm | 1 | as is where is | immediately | |
97738 | Shibaura | CDE-300 | Metal Etch | 300 mm | 1 | as is where is | ||
87626 | SPTS | Multiplex ASE | Dry etcher system | 100 mm | 01.06.1998 | 1 | as is where is | immediately |
93314 | SPTS | Primaxx CET25-CPX | DRY ETCH | 200 mm | 1 | as is where is | immediately | |
101007 | SPTS | OMEGA 4" | ICP Etcher | 100 mm | 1 | as is where is | immediately | |
101008 | SPTS | Omega | ICP etcher | 100 mm | 01.06.2006 | 1 | as is where is | immediately |
79584 | STS (SPTS) | 320 PC | Reactive Ion Etcher | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
95631 | STS (SPTS) | Multiplex ICP | Deep Reactive Ion Etcher | 150mm | 01.12.2000 | 1 | as is where is | immediately |
99829 | STS (SPTS) | Primaxx HR ICP | Dry Etcher | 01.06.2002 | 1 | as is where is | immediately | |
96620 | TAINICS | TE3100 | ICP Etching Equipment (for GaN Etching) | 2 inch and 4 inch | 01.06.2011 | 1 | as is where is | immediately |
83689 | Tegal | TEGAL 981 | Nitride Etch | 200 mm | 1 | as is where is | immediately | |
93039 | TEGAL | PLASMA 900E | Plasma dry etch | 100 mm | 1 | as is where is | ||
75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
91017 | TEL Tokyo Electron | TE8500 | Dry Etcher | 200mm | 01.06.1994 | 1 | as is where is | |
91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
94559 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2000 | 1 | as is where is | |
96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
96928 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.10.2010 | 1 | as is where is | |
96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
97777 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 01.05.2008 | 1 | as is where is | |
98043 | TEL Tokyo Electron | Unity 2e 855DD (DRM Chamber) | DRM Chamber | 200 mm | 01.06.2004 | 1 | as is where is | |
98044 | TEL Tokyo Electron | Unity 2e 855DP (Poly Chamber) | DRM Chamber | 200 mm | 01.06.2005 | 1 | as is where is | |
98184 | TEL Tokyo Electron | Telius SCCM Jin | Oxide etcher | 300 mm | 01.06.2004 | 1 | as is where is | |
98185 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2003 | 1 | as is where is | |
98186 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2004 | 1 | as is where is | |
98187 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
98188 | TEL Tokyo Electron | Telius SCCM Shin | Oxide etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
98195 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 1 | as is where is | ||
98196 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 01.06.2000 | 1 | as is where is | |
98197 | TEL Tokyo Electron | Unity2e 855SS | Oxide etcher | 200 mm | 1 | as is where is | ||
98198 | TEL Tokyo Electron | Unity2e 85ADI | Oxide etcher | 200 mm | 01.06.2000 | 1 | as is where is | |
98199 | TEL Tokyo Electron | Unity2e 85DI | Oxide etcher | 200 mm | 01.06.1998 | 1 | as is where is | |
98841 | TEL Tokyo Electron | SCCM | Dry Etch | 300 mm | 01.06.2005 | 1 | as is where is | |
98842 | TEL Tokyo Electron | SCCM-SHIN | Dry Etch | 300 mm | 01.07.2007 | 1 | as is where is | |
98843 | TEL Tokyo Electron | TRIAS | Metal Etch | 300 mm | 01.06.2014 | 1 | as is where is | |
98844 | TEL Tokyo Electron | TRIAS-EX2 | Metal Etch | 300 mm | 01.04.2014 | 1 | as is where is | |
98845 | TEL Tokyo Electron | VESTA-NV | Dry Etch | 300 mm | 01.08.2010 | 1 | as is where is | |
98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 01.05.2009 | 1 | as is where is | immediately |
98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 01.08.2013 | 1 | as is where is | immediately |
99047 | TEL Tokyo Electron | SCCM-SHIN | Dry Etch | 01.04.2007 | 1 | as is where is | ||
99048 | TEL Tokyo Electron | TRIAS-EX2 | Metal Etch | 300 mm | 01.03.2014 | 1 | as is where is | |
99049 | TEL Tokyo Electron | VIGUS_V0 | Dielectric Etch | 300 mm | 01.09.2008 | 1 | as is where is | |
99901 | TEL Tokyo Electron | Unity 2E 855 DD | Dry etcher with 2 X DRM CHAMBERS | 200 MM | 01.08.2000 | 1 | as is where is | immediately |
100305 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300mm | 01.06.2002 | 1 | as is where is | |
100307 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | ||
100308 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.06.2003 | 1 | as is where is | |
100309 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | ||
101518 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 1 | as is where is | ||
101807 | TEL Tokyo Electron | SCCM-SHIN | Dry Etecher | 300 mm | 1 | inquire | ||
101808 | TEL Tokyo Electron | TE-8401 | Si Dry Etcher | 200 mm | 01.05.1992 | 1 | inquire | |
86679 | Trion Technology | Phantom II | Reactive ion etcher | 01.06.0200 | 1 | as is where is | immediately | |
100698 | ULVAC | NE-5700 | Metal Etcher | 150 mm | 01.06.2007 | 1 | as is where is | |
98048 | UNAXIS | SLR-720 | RIE | 150 mm | 1 | as is where is | ||
98049 | UNAXIS | SLR-720 | RIE | 200 mm | 1 | as is where is | ||
98849 | WONIK IPS | AKRA BM | Metal Etch | 300 mm | 01.03.2003 | 1 | as is where is |