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Pre-owned and used Dry Etch Equipment for sale by fabsurplus.com

Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
93868 Alcatel AMS 4200 Advanced Multi chamber ICP Plasma Etching System / Bosch Process 150 mm and 200 mm 01.08.2007 1 as is all rebuilt immediately
93883 Alcatel 602E Deep Trench Etcher 150 mm 01.05.1996 1 as is where is immediately
86711 Applied Materials P5000 2Mark II & 1ASP Metal Etcher 200 mm 31.03.1997 1 as is where is immediately
88508 Applied Materials Centura DPS2 Metal 300 MM 31.05.2005 1 as is where is
89044 Applied Materials DPS+ Metal, Centura 2 Process Chamber 200 mm 1 inquire immediately
91052 APPLIED MATERIALS CENTURA E-MAX CT 3CH DRY ETCH 300 mm 1 as is where is
91269 Applied Materials CENTURA 5200 MxP Poly 200 mm 1 as is where is
91277 Applied Materials Centura DPS II CHAMBER Chamber only 300 mm 1 as is where is
91279 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91280 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91281 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91282 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91283 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91284 Applied Materials Etch dry chamber Only AXIOM, DPS 300 mm 1 as is where is
91285 Applied Materials Etch dry chamber Only AXIOM, DPS 300 mm 1 as is where is
91286 Applied Materials P5000 DELTA DLH 150 mm 1 as is where is
91287 Applied Materials P5000 DELTA DLH 150 mm 31.05.1993 1 as is where is
91313 Applied Materials P5000-Mark II Etch Metal 1 as is where is
91316 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 1 as is where is
91317 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 1 as is where is
92063 Applied Materials P5000 Metal Etcher with two Indexer, L/L CH, Orienter CH, two Process CH, ASP CH, 200 mm 31.05.1995 1 as is where is immediately
92064 Applied Materials P5000 Dry etcher, Poly, with 3 process chambers 200 mm 31.05.1995 1 as is where is immediately
93032 Applied Materials CENTRIS DPS MESA Dry Etch, Twin 3chamber 300 MM 31.05.2010 1 as is where is
93034 Applied Materials CENTURA ENABLER E2 Oxide Etcher /server OS PC 300 MM 31.05.2007 1 as is where is
93035 Applied Materials CENTURA ENABLER E5 Oxide Etcher /server OS PC 300 MM 31.05.2010 1 as is where is
93036 Applied Materials P5000 Etch no chamber (PLIS type) 200 mm 1 as is where is
93896 Applied Materials ENABLER_E2 Etcher 300 mm 31.05.2009 1 as is where is
94508 Applied Materials Centura DPS2 Poly Poly Etch 300 mm 31.05.2006 1 as is where is
94509 Applied Materials Centura DPS2 Poly Poly Etch 300 mm 31.05.2007 1 as is where is
94511 Applied Materials Centura Enabler Oxide etch 300 mm 31.05.2010 1 as is where is
95928 Applied Materials Centura AP DPS2 Advantedge Carina Mesa Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS 300 mm 01.05.2013 1 as is where is immediately
96805 Applied Materials Centura AP AdvantEdge G5 Mesa T2 Poly Polysilicon Etch 300 mm 31.12.2014 1 as is where is immediately
96806 Applied Materials Centura AP AdvantEdge G5 Mesa T2 Poly Polysilicon Etch 300 mm 31.12.2014 1 as is where is
97849 Applied Materials Centura 5200 DPS2 Poly Poly Etcher 300 mm 31.05.2010 1 as is where is
98069 Applied Materials Centura eMax CT+ ETCH 300 mm 01.05.2004 1 as is where is
98072 Applied Materials Centura Enabler Oxide Etch 300 mm 31.05.2004 1 as is where is
98073 Applied Materials Centura Enabler E2 Oxide Etch 300 mm 31.05.2010 1 as is where is
98375 Applied Materials Enabler Chamber System Dry Etch 300 mm 1 as is where is
98555 Applied Materials Centura AP DPS 2 Advantedge Mesa Polysilicon Etcher with 4 chambers 300 mm 01.08.2006 1 as is where is immediately
98556 Applied Materials Centura DPS II Advantedge POLY POLY ETCHER, 4 CHAMBER 300 mm 01.06.2010 1 as is where is immediately
98557 Applied Materials Centura AP DPS II Advantedge Polysilicon Etcher with 4 chambers 300 mm 01.06.2006 1 as is where is immediately
99089 Applied Materials Centura AP DPS AdvantEdge G2 Metal - Chamber Only Metal Etch 300mm 1 as is where is
99090 Applied Materials Centura AP DPS AdvantEdge G2 Metal - Chamber Only Metal Etch 300mm 1 as is where is
100031 Applied Materials Centura DPS 2 Advantedge Mesa Dry Etch 300 mm 31.05.2006 1 as is where is
100032 Applied Materials Centura AP DPS 2 G5 Polysilicon etcher, 3 chamber 300 mm 01.08.2008 1 as is where is immediately
100909 Applied Materials CENTURA DPS ll MESA T2 Poly Etcher 300 mm 31.05.2015 1 as is where is
100910 Applied Materials CENTURA DPS ll MESA T2 Poly Etcher 300 mm 31.05.2015 1 as is where is
100911 Applied Materials CENTURA DPS ll MESA T2 Poly Etcher 300 mm 31.05.2016 1 as is where is
100913 Applied Materials DPS II AE Poly G3 dry etcher 300 mm 31.05.2006 1 as is where is
100914 Applied Materials DPS II AE Poly G3 dry etcher 300 mm 31.05.2007 1 as is where is
101014 Applied Materials Centura ACP DPN HD Gate Stack Decoupled plasma Nitride 300 mm 31.05.2018 1 as is where is immediately
101402 Applied Materials Centura AP AdvantEdge G5 Minos Poly Polysilicon Etch 300mm 31.05.2015 1 as is where is
101404 Applied Materials Centura AP Enabler Polysilicon Etch 300mm 1 as is where is
101408 Applied Materials Producer Etch eXT Dielectric Dielectric Etch 300mm 1 as is where is
102081 Applied Materials Centura Carina Chamber Chamber 300 mm 1 as is where is
102084 Applied Materials Centura DPS2 AdvantEdge G5 Mesa Poly 300 mm 31.05.2007 1 as is where is
102086 Applied Materials Centura DPS2 Advantedge G5 2 chamber dry etch cluster tool 300 mm 31.05.2010 1 as is where is
102088 Applied Materials Centura DPS2 Poly Poly Etch 300 mm 31.05.2006 1 as is where is
102089 Applied Materials Centura Enabler Oxide Etcher 300 mm 31.05.2007 1 as is where is
102111 Applied Materials Producer GT FRONTIER etch 300 mm 31.05.2015 1 as is where is
102112 Applied Materials Producer GT FRONTIER etch 300 mm 31.05.2015 1 as is where is
102113 Applied Materials Producer GT FRONTIER Nitride Poly etch 300 mm 31.05.2016 1 as is where is
102114 Applied Materials Producer GT FRONTIER etch 300 mm 31.05.2017 1 as is where is
102115 Applied Materials Producer GT Chamber ACL 300 mm 31.05.2010 1 as is where is
102659 Applied Materials Centura AP DPS II Metal Metal Etch 2 Ch DPS2 and 2 CH ASP 300 mm 1 as is where is
102660 Applied Materials Centura AP DPS II Metal Metal Etch 2 Ch DPS2 and 2 CH ASP 300 mm 1 as is where is
102661 Applied Materials Centura AP Enabler Dielectric Etch - Etch/Ash/Clean – OXIDE Plasma Processing 300 mm 1 as is where is
102856 Applied Materials Centura 5200 DPS II Metal Etch with 2 x DPS2 Metal etch and 2 x Axiom CH 300 mm 31.05.2008 1 as is where is
102947 Applied Materials DPS2_Poly Dry Etch with 2CH DPS2 and 2 CH Axiom 300 mm 31.05.2010 1 as is where is
102998 Applied Materials P5000 Teos Deposition Tool, Oxide Etch, 3 Chambers 100 mm 1 as is where is
103054 Applied Materials Centris AdvantEdge G5 Mesa Poly Dry Etch 6 chamber Mesa II + 2 AxisWll 300mm 1 as is where is
103055 Applied Materials Centura AdvantEdge Mesa2 Dry Etch Mesa 2 / Mesa 2 W 300mm 1 as is where is
103056 Applied Materials Centura AP AdvantEdge G5 Mesa Poly Poly Dry Etch 300mm 30.11.2014 1 as is where is
103057 Applied Materials Centura AP AdvantEdge G5 Mesa Poly Poly Dry Etch 300mm 30.11.2014 1 as is where is
103063 Applied Materials Producer Etch XT Dielectric Dielectric Dry Etch CHA Twin Di-electric etch, CHC Twin Di-electric etch 300mm 1 as is where is
103064 Applied Materials Producer Etch XT Dielectric Dielectric Dry Etch 300mm 1 as is where is
103473 Applied Materials CENTURA DPS G3 Poly 1ch / Mesa 1ch 300 mm 31.05.2007 1 as is where is
103474 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2003 1 as is where is
103475 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2005 1 as is where is
103476 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2010 1 as is where is
103477 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 1 as is where is
103478 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 1 as is where is
103482 Applied Materials DPS SILVIA Silvia 2ch / Axiom 1ch 300 mm 1 as is where is
103483 Applied Materials DPS2 Poly Etcher 300 mm 1 as is where is
103484 Applied Materials DPS2 Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103485 Applied Materials DPS2 AE Poly Etcher 300 mm 1 as is where is
103486 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103487 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103488 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103489 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103490 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103491 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 1 as is where is
103492 Applied Materials DPS2 AE MINOS (Dry Etch) 300 mm 31.05.2005 1 as is where is
103493 Applied Materials DPS2 AE MINOS (Dry Etch) 300 mm 31.05.2006 1 as is where is
103494 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 31.05.2019 1 as is where is
103495 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 31.05.2019 1 as is where is
103496 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 31.05.2019 1 as is where is
106339 Applied Materials Centura ENABLER-E2 Dry etch cluster tool 300 mm 01.06.2009 1 as is where is
106340 Applied Materials Centura ENABLER-E2 Dry etch cluster tool 300 mm 01.06.2007 1 as is where is
106341 Applied Materials Centura ENABLER-E2 Dry etch cluster tool 300 mm 01.06.2010 1 as is where is
106342 Applied Materials Centura ENABLER-E2 Dry etch cluster tool 300 mm 01.06.2007 1 as is where is
106343 Applied Materials Centura ENABLER-E5 Dry etch cluster tool 300 mm 01.06.2009 1 as is where is
106576 Applied Materials CENTURA DPS G3 Poly 2ch / Mesa 1ch 300 mm 01.06.2001 1 as is where is
106577 Applied Materials CENTURA DPS G3 Poly 3ch 300 mm 01.06.2006 1 as is where is
106578 Applied Materials CENTURA DPS G3 Poly 3ch 300 mm 01.06.2006 1 as is where is
106579 Applied Materials CENTURA DPS G3 Poly 3ch / Axiom 1ch 300 mm 01.06.2013 1 as is where is
106580 Applied Materials CENTURA DPS G3 Poly 3ch / Axiom 1ch 300 mm 01.06.2010 1 as is where is
106581 Applied Materials CENTURA DPS G5 MESA Poly 3ch / AXIOM 1ch / Server OS Type 300 mm 01.06.2011 1 as is where is
106583 Applied Materials CENTURA 5200 DPS Poly Etcher 200 mm 01.06.1999 1 as is where is
106615 Applied Materials G5-MESA DRY ETCH EFEM 300 MM 1 as is where is
106616 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106617 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106618 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106619 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106620 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106624 Applied Materials PRODUCER GT ACL 1ch / Server X 300 mm 1 as is where is
106625 Applied Materials PRODUCER GT CH_A_FOX / CH_B_eHARP / Server OS Type 300 mm 01.06.2009 1 as is where is
106626 Applied Materials PRODUCER GT Ht_Acl 3ch / Server OS Type 300 mm 01.06.2006 1 as is where is
106627 Applied Materials PRODUCER GT Siconi 3ch 300 mm 01.06.2009 1 as is where is
106628 Applied Materials Producer GT Chamber HARP 300 mm 1 as is where is
106629 Applied Materials Producer GT Chamber HARP 300 mm 1 as is where is
106630 Applied Materials Producer GT Chamber SICONI Chamber only 300 mm 01.06.2017 1 as is where is
106632 Applied Materials Producer GT Chamber only SICONI Chamber only 300 mm 01.06.2017 1 as is where is
106844 Applied Materials Centura Enabler Dry etch, 3 chambers 300 mm 01.06.2006 1 as is where is
106872 Applied Materials Centura AP AdvantEdge Minos Poly Polysilicon Etch (3 CH ETCH AND 1 CH STRIP) 300 mm 01.06.2010 1 as is where is immediately
106914 Applied Materials Centura eMax CT DRY ETCH CLUSTER TOOL with 3 chambers 300 mm 01.05.2006 1 as is where is immediately
106640 BMR GAN (A49-3) ETCH 100 mm 1 as is where is
105798 CI Science Torus 300K Dry Etcher 300 mm 1 as is where is
105799 CI Science Torus 300K Dry Etcher 300 mm 1 as is where is
105800 CI Science Torus 300K Dry Etcher 300 mm 1 as is where is
105801 CI Science Torus 300K Dry Etcher 300 mm 1 as is where is
105802 CI Science Torus 300K Dry Etcher 300 mm 1 as is where is
105803 CI Science Torus 300K Dry Etcher 300 mm 1 as is where is
105804 CI Science Torus 300K Dry Etcher 300 mm 1 as is where is
105805 CI Science TORUS300K Dry Etcher 300 mm 1 as is where is
100725 Corial 300IL ICP Dry Etcher 1 as is where is
69945 Gasonics AE 2001 Single wafer etch system 1
82891 Gasonics Strata Oxide Etch System 200 01.06.1997 1 as is where is immediately
81831 Hitachi M712E ECR Plasma Etcher 200mm 1 as is where is immediately
89915 Hitachi U-722 Etch 300mm 300mm 3 as is where is
100164 Hitachi U-7050A Metal Etch 300mm 30.09.2013 1 as is where is
102700 Hitachi U-702 Dry Etcher – Metal 300 mm 31.05.2004 1 as is where is
102701 Hitachi U-702 Dry Etcher – Metal 300 mm 31.05.2004 1 as is where is
102702 Hitachi U-7050A Dry Etcher – Metal 4 chamber 300 mm 30.09.2013 1 as is where is
102703 Hitachi U-7050A Dry Etcher – Metal 4 chamber 300 mm 31.05.2007 1 as is where is
106691 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2010 1 as is where is
106692 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2013 1 as is where is
106693 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2013 1 as is where is
106694 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2013 1 as is where is
106695 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2014 1 as is where is
106696 LAM 2300 FX EX+ CHAMBER ONLY PLASMA OXIDE ETCH 300 mm 01.06.2013 1 as is where is
106697 LAM 2300 MWAVE STRPR CHAMBER MWAVE STRIP (POLY) 300 mm 01.06.2018 1 as is where is
106699 LAM FLEX FX CHAMBER ONLY PLASMA OXIDE ETCH 300 mm 01.06.2013 1 as is where is
106701 LAM TORUS300K DRY Bevel Etcher 300 mm 01.06.2006 1 as is where is
106852 Lam 2300 Exelan Flex 45 Poly etcher, 4 chamber 300 mm 01.07.2006 1 as is where is immediately
106856 Lam 2300 (CHAMBER) Microwave Strip Chamber 300 mm 01.07.2006 1 as is where is immediately
106874 Lam 2300 Exelan Flex Dry Etcher with 3 chambers 300 mm 01.07.2004 1 as is where is immediately
71831 LAM RESEARCH A6 EXELAN OXIDE ETCHER (refurbished) 1 as is where is immediately
82257 Lam Research 2300 EXELAN Dry etcher 8" 01.06.2004 1 as is where is immediately
82258 Lam Research 2300 EXELAN Dry etcher 8" 01.06.2004 1 as is where is immediately
91320 LAM Research EXELAN 2300 OXIDE ETCH 300 mm 1 as is where is
97679 LAM Research 2300 Exelan Flex EX Dielectric Etch 3 chamber 300 mm 31.05.2013 1 as is where is immediately
97682 LAM Research 2300 Exelan Flex EX+ Dielectric Etch 3 chamber 300 mm 01.05.2013 1 as is where is immediately
98279 LAM Research FLEX GX E6 OXIDE ETCH 300 mm 31.05.2008 1 as is where is
98280 LAM Research FLEX GX E6 OXIDE ETCH 300 mm 31.05.2008 1 as is where is
100204 LAM Research 2300 Exelan Flex - Chamber Only Dielectric Etch 300mm 31.05.2006 1 as is where is
100207 LAM Research 2300 Exelan Flex EX+ Dielectric Etch 300mm 1 as is where is
101481 LAM Research 2300 KIYO MCX Metal Etch 300 mm 31.05.2010 1 as is where is immediately
102289 Lam Research Strip45 Chamber chamber 300 mm 31.05.2010 1 as is where is
102568 LAM Research TORUS 300K Dry Etch 2 inquire
102569 LAM Research TORUS 300S Dry Etch 2 inquire
102607 LAM Research TCP 9600 Dry Etching System 200mm 1 as is where is immediately
102736 LAM Research 2300 Exelan Flex Dielectric Etch Oxide 300 mm 1 as is where is
102737 LAM Research 2300 Exelan Flex EX+ - Chamber Only Dielectric Etch chamber qty 3 300 mm 1 as is where is immediately
103102 LAM Research 2300 Exelan Dielectric Dry Etch 300mm 1 as is where is
103103 LAM Research 2300 Exelan Dielectric Dry Etch 300mm 1 as is where is
103104 LAM Research 2300 Exelan Flex FX Dielectric Dry Etch 300mm 1 as is where is
103105 LAM Research 2300 Exelan Flex FX Dielectric Dry Etch 300mm 1 as is where is
103538 LAM Research INOVA Concept 3 NExT 300 mm 31.05.2005 1 as is where is
106371 Lam Research 2300 Exelan Chamber Dry etch cluster tool (Chamber) 300 mm 1 as is where is
106372 Lam Research 2300 Exelan Flex Chamber Dry etch cluster tool (Chamber) 300 mm 1 as is where is
106373 Lam Research 2300 Exelan Flex Chamber Dry etch cluster tool (Chamber) 300 mm 1 as is where is
106374 Lam Research 2300 SELIS Chamber Dry etch cluster tool (Chamber) 300 mm 1 as is where is
106375 Lam Research 2300 Strip Chamber Dry etch cluster tool (Chamber) 300 mm 01.06.2012 1 as is where is
106376 Lam Research 2300 Strip Chamber Dry etch cluster tool (Chamber) 300 mm 01.06.2013 1 as is where is
106377 Lam Research 2300 Strip Chamber Dry etch cluster tool (Chamber) 300 mm 01.06.2012 1 as is where is
106379 Lam Research FLEX e4/EFEM Dry etch cluster tool EFEM 300 mm 01.06.2020 1 as is where is
106380 Lam Research FLEX e4/EFEM Dry etch cluster tool EFEM 300 mm 01.06.2004 1 as is where is
106385 Lam Research LAM 2300 FLEX45(3CH) Dry etch cluster tool 300 mm 01.06.2006 1 as is where is
106386 Lam Research LAM 2300 FLEX45(3CH) Dry etch cluster tool 300 mm 01.06.2008 1 as is where is
106387 Lam Research LAM ALLIANCE6 9400DFM Dry etch cluster tool 200 mm 1 as is where is
106388 Lam Research LAM ALLIANCE6 9600DFM Dry etch cluster tool 200 mm 1 as is where is
106389 Lam Research RAINBOW 4420 Dry Etcher 200 mm 1 as is where is
106390 Lam Research RAINBOW 4520 Dry Etcher 200 mm 1 as is where is
106391 Lam Research RAINBOW 4520i Dry Etcher 200 mm 01.06.1996 1 as is where is
106392 Lam Research RAINBOW 4720 Dry Etcher - Refurbished condition 200 mm 1 as is where is immediately
106399 Lam Research Strip Chamber Dry etch cluster tool (Chamber) 200 mm 1 as is where is
106400 Lam Research Strip Chamber Dry etch cluster tool (Chamber) 200 mm 1 as is where is
106401 Lam Research TCP9400SE Dry Etcher 200 mm 1 as is where is
106402 Lam Research TCP9600SE Dry Etcher 200 mm 1 as is where is
103006 March PX-2400 Box Plasma Etcher 1 as is where is
83977 Mattson Aspen 3 ICP Dual Chamber Asher 300 mm 31.07.2008 5 as is where is immediately
88529 Mattson Paradigme SP Light Etch 300 MM 31.05.2010 1 as is where is
93900 MATTSON PARADIGM_SI Poly-silicon etcher 300 mm 31.05.2011 1 as is where is
98148 Mattson Aspen 3 Lite LITE ETCHER 300 mm 31.05.2006 1 as is where is
98152 Mattson ParadigmE Etch 300 mm 31.05.2012 1 as is where is
98284 MATTSON PARADIGME SI Polysilicon Etch 300 mm 1 as is where is
106323 MATTSON PARADIGM_SI DRY ETCH 300mm 01.06.2012 1 as is where is
91329 OXFORD 800+ RIE (Reactive Ion Etcher) 1 as is where is immediately
99398 Oxford Micro-etch 300 Dry Etcher 1 as is where is immediately
101347 Oxford PlasmaLab 100 ICP Etcher 150 mm and 200 mm 01.02.2000 1 as is where is immediately
102760 Oxford Instruments Plasmalab 80 Plus Dry etcher 300 mm 1 as is where is
78807 PLASMA ETCH BT-1 PLASMA CLEANER ASSEMBLY 31.05.2004 1 as is where is immediately
91330 Plasma Therm Wafer/ Batch 740 DUAL PLASMA ETCH AND RIE 4" 1 as is where is
91331 Plasma Therm Wafer/ Batch 740 DUAL PLASMA ETCH AND RIE 4" 1 as is where is
103008 Plasma-Therm VII 734MF RIE/Plasma Etch 200 mm 1 as is where is
103009 Plasma-Therm 730/740 PECVD, Plasma Etch, Reactive Ion Etch 200 mm 1 as is where is immediately
103010 Plasma-Therm 790 ICP Inductively Coupled Plasma Etcher with 9.5 Inch Electrode 200 mm 31.05.1998 1 as is where is
103011 Plasma-Therm Unaxis 790 ICP Plasma Etching System 200 mm 31.05.2001 1 as is where is
103660 PlasmaQuest Reactive Ion Etching System Reactive Ion Etching System RIE Astex MKS 1 as is where is
64126 Plasmatherm SLR 790 Dual Chamber RIE 01.01.2003 1 as is where is immediately
86447 Plasmatherm 790 RIE 125 mm 1 as is where is immediately
99403 PlasmaTherm SLR 740 Dual Chamber RIE / Plasma etch 200 mm 01.04.1999 1 as is where is immediately
103451 Plasmatherm SLR-770 ICP Silicon Deep Etching 100 mm 01.05.1998 1 as is where is immediately
103661 Plasmatherm SLR 790 RIE System 150 MM 1 as is where is immediately
106759 Plasmatherm SLR 770 Dual Chamber R.I.E. 200 mm 01.06.1994 1 as is where is immediately
95112 PSK EVOLITE2 ETCH - 31.05.2011 1 as is where is
106296 PSK SUPRA3 ETCH N/A 01.06.2007 1 as is where is immediately
106297 PSK SUPRA3 ETCH N/A 01.06.2013 1 as is where is immediately
86163 SAMCO RIE-10N RIE 200 mm 1 as is where is
86164 SAMCO RIE-10N RIE 200 mm 1 as is where is
86165 SAMCO RIE-10NR RIE 200 mm 1 as is where is
91076 SAMCO RIE-10NR ETCH 200 mm 31.05.2000 1 as is where is
106736 SAMCO RIE-300NR Reactive Ion Etching System 300 mm 01.06.2006 1 as is where is
106737 SAMCO RIE-300NR Reactive Ion Etching System 300 mm 01.06.2006 1 as is where is
93396 Shibaura CD 80 Dry Etcher 200 mm 1 as is where is immediately
97738 Shibaura CDE-300 Metal Etch 300 mm 1 as is where is
102392 Shibaura CDE300 Dry Etch 300 mm 1 as is where is
102393 Shibaura ICE/CDE300 Isotropic Chemical Dry Etch 300 mm 31.05.2005 1 as is where is
79584 SPTS 320 PC Reactive Ion Etcher -Manual loading for laboratory use UP TO 200 mm 01.05.1995 1 as is where is immediately
87626 SPTS Multiplex ASE Dry etcher system 100 mm 31.05.1998 1 as is where is immediately
102623 SPTS Omega 201 Plasma Dry etcher (For spares use) 200 mm 01.05.2010 1 as is where is immediately
106095 SPTS Pegasus Deep Reactive Ion Etch System on a CPX Platform Up to 200 mm 01.06.2006 1 inquire immediately
106885 SPTS Multiplex ICP Deep trench Etcher, Bosch process 150 mm 01.06.1998 1 as is where is immediately
99829 STS (SPTS) MPX HR ICP Dry Etcher 200 mm 01.05.2002 1 as is all rebuilt immediately
83689 Tegal 981 Nitride Dry Etcher 200 mm 01.06.1999 1 as is where is immediately
106150 Tegal 903E Dry Etcher 150 mm 1 as is all rebuilt immediately
106151 TEGAL 900 Plasma dry etch 100 mm 01.10.1984 1 as is where is immediately
106152 TEGAL 903E Plasma dry etch 100 mm 01.06.1985 1 as is where is immediately
75635 TEL Tokyo Electron Unity Me SCCM (Chamber) Dry oxide etch chamber 200 mm 1 as is where is immediately
75636 TEL Tokyo Electron Unity Me SCCM 85S Oxide etcher (3 chamber) 200 mm 30.09.2003 1 as is where is immediately
91341 TEL TOKYO ELECTRON TELIUS SCCM T-3044SS DRY ETCHER 300 mm 31.05.2007 1 as is where is
93040 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 31.05.2009 1 as is where is
93041 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 31.05.2010 1 as is where is
93042 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 31.05.2010 1 as is where is
96927 TEL Tokyo Electron Tactras RLSA Poly Polysilicon Etch 300 mm 31.05.2012 1 as is where is
96931 TEL Tokyo Electron Tactras Vigus RK3 - Chamber Only Dielectric Etch 300 mm 1 as is where is
98846 TEL Tokyo Electron VIGUS Mask Dielectric Etch 300 mm 30.04.2009 1 as is where is immediately
98847 TEL Tokyo Electron VIGUS RK2 Dielectric Etch 300 mm 31.07.2013 1 as is where is immediately
99901 TEL Tokyo Electron Unity 2E 855 DD Dry etcher with 2 X DRM CHAMBERS 200 MM 31.07.2000 1 as is where is immediately
100308 TEL Tokyo Electron Telius 305 SCCM Dielectric Etch 300mm 31.05.2003 1 as is where is
102402 TEL Tokyo Electron Certas LEAGA Etch, Single wafer Dry Cleaning System 300 mm 31.05.2016 1 as is where is
102419 TEL Tokyo Electron nFusion 700 Ion Beam Etch 300 mm 31.05.2013 1 as is where is
102420 TEL Tokyo Electron nFusion 700 MP Ion Beam Etch 300 mm 31.05.2011 1 as is where is
102421 TEL Tokyo Electron nFusion 700 MP Ion Beam Etch 300 mm 31.05.2013 1 as is where is
102439 TEL Tokyo Electron TSP 305 SCCM TE Dielectric Etch 300 mm 31.05.2007 1 as is where is
102811 TEL Tokyo Electron Tactras Vesta Polysilicon Etch 300 mm 28.02.2014 1 as is where is
102825 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch, Oxide Process, 4 CHAMBER SCCM 300 mm 1 as is where is
102826 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Etch, Oxide Process, 4 CHAMBER SCCM 300 mm 31.05.2008 1 as is where is
103130 TEL Tokyo Electron Telius 305 DRM Dielectric Dry Etch 300mm 31.05.2003 1 as is where is
103131 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Dry Etch 300mm 31.05.2007 1 as is where is
103132 TEL Tokyo Electron Telius SP-305 SCCM Dielectric Dry Etch 300mm 1 as is where is
103017 Tepla 4011 Planar Plasma Etcher 1 as is where is
86679 Trion Technology Phantom II Reactive ion etcher 31.05.0200 1 as is where is immediately
103018 Ulvac NE 7800 Ferroelectric Etcher 200 mm 1 as is where is
106309 ULVAC NE-5700 Metal Etcher 150 mm 01.06.2007 1 as is where is immediately
106567 Ulvac FRE200E XeF2 Etching System 01.06.2018 1 as is where is immediately
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