Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 93868 | Alcatel | AMS 4200 | Advanced Multi chamber ICP Plasma Etching System / Bosch Process | 150 mm and 200 mm | 01.09.2007 | 1 | as is all rebuilt | immediately |
| 93883 | Alcatel | 602E | Deep Trench Etcher | 150 mm | 01.06.1996 | 1 | as is where is | immediately |
| 86711 | Applied Materials | P5000 | 2Mark II & 1ASP Metal Etcher | 200 mm | 01.04.1997 | 1 | as is where is | immediately |
| 88508 | Applied Materials | Centura DPS2 | Metal | 300 MM | 01.06.2005 | 1 | as is where is | |
| 89044 | Applied Materials | DPS+ Metal, Centura 2 | Process Chamber | 200 mm | 1 | inquire | immediately | |
| 91051 | APPLIED MATERIALS | CENTURA AP DPS II CHAMBER | DRY ETCH | - | 1 | as is where is | ||
| 91052 | APPLIED MATERIALS | CENTURA E-MAX CT 3CH | DRY ETCH | 300 mm | 1 | as is where is | ||
| 91260 | Applied Materials | CENTURA 5200 | MxP+ Oxide | 200 mm | 1 | as is where is | ||
| 91261 | Applied Materials | CENTURA 5200 | MXP Metal | 150 mm | 1 | as is where is | ||
| 91262 | Applied Materials | CENTURA 5200 | MxP+ Oxide | 200 mm | 1 | as is where is | ||
| 91263 | Applied Materials | CENTURA 5200 | DPS POLY | 200 mm | 01.06.2000 | 1 | as is where is | |
| 91264 | Applied Materials | CENTURA 5200 | SUPER-E | 200 mm | 01.06.2000 | 1 | as is where is | |
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 91270 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 91276 | Applied Materials | Centura DPS II | NT OS | 300 mm | 1 | as is where is | ||
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | ||
| 91278 | Applied Materials | Centura DPS Metal | ASP chamber only / Server OS | 300 mm | 1 | as is where is | ||
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91286 | Applied Materials | P5000 | DELTA DLH | 150 mm | 1 | as is where is | ||
| 91287 | Applied Materials | P5000 | DELTA DLH | 150 mm | 01.06.1993 | 1 | as is where is | |
| 91288 | Applied Materials | P5000 Etch | Mark II Poly | 200 mm | 01.06.1995 | 1 | as is where is | |
| 91289 | Applied Materials | P5000 Etch | Mark II OXIDE | 150 mm | 1 | as is where is | ||
| 91307 | Applied Materials | P5000 Etch | Mark II Metal | 150 mm | 1 | as is where is | ||
| 91308 | Applied Materials | P5000 Mark II Etch | Oxide | 150 mm | 1 | as is where is | ||
| 91311 | Applied Materials | P5000 Mark-II Etch | Oxide | 200 mm | 1 | as is where is | ||
| 91313 | Applied Materials | P5000-Mark II Etch | Metal | 1 | as is where is | |||
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 92063 | Applied Materials | P5000 | Metal Etcher with two Indexer, L/L CH, Orienter CH, two Process CH, ASP CH, | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
| 92064 | Applied Materials | P5000 | Dry etcher, Poly, with 3 process chambers | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
| 93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.06.2010 | 1 | as is where is | |
| 93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 01.06.2007 | 1 | as is where is | |
| 93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 01.06.2010 | 1 | as is where is | |
| 93036 | Applied Materials | P5000 Etch | no chamber (PLIS type) | 200 mm | 1 | as is where is | ||
| 93037 | Applied Materials | PRODUCER GT | Fox/eHarp | 300 mm | 01.06.2009 | 1 | as is where is | |
| 93896 | Applied Materials | ENABLER_E2 | Etcher | 300 mm | 01.06.2009 | 1 | as is where is | |
| 94434 | Applied Materials | CENTURA 5200 | EMAX | 200 mm | 1 | as is where is | ||
| 94435 | Applied Materials | CENTURA DPS G5 | 1Process Chamber / 1Mesa Chamber | 300 mm | 1 | as is where is | ||
| 94508 | Applied Materials | Centura DPS2 Poly | Poly Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 94509 | Applied Materials | Centura DPS2 Poly | Poly Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 94511 | Applied Materials | Centura Enabler | Oxide etch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 95928 | Applied Materials | Centura Advantedge Carina Mesa | Dry Etch Cluster Tool | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
| 96805 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.01.2015 | 1 | as is where is | immediately |
| 96806 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.01.2015 | 1 | as is where is | |
| 97849 | Applied Materials | Centura 5200 DPS2 Poly | Poly Etcher | 300 mm | 01.06.2010 | 1 | as is where is | |
| 98069 | Applied Materials | Centura eMax CT+ | ETCH | 300 mm | 01.06.2004 | 1 | as is where is | |
| 98070 | Applied Materials | Centura eMax CT+ | ETCH | 300 mm | 01.06.2007 | 1 | as is where is | |
| 98072 | Applied Materials | Centura Enabler | Oxide Etch | 300 mm | 01.06.2004 | 1 | as is where is | |
| 98073 | Applied Materials | Centura Enabler E2 | Oxide Etch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 98258 | Applied Materials | DPS G5 | Dry Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 98259 | Applied Materials | DPS G5 | Dry Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 98260 | Applied Materials | DPS G5 | Dry Etch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 98261 | Applied Materials | DPS G5 MESA | Polysilicon Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 98375 | Applied Materials | Enabler Chamber System | Dry Etch | 300 mm | 1 | as is where is | ||
| 98555 | Applied Materials | Centura DPS II (AE) POLY | POLY ETCHER | 300 mm | 1 | as is where is | ||
| 98556 | Applied Materials | Centura DPS II (AE) POLY | POLY ETCHER | 300 mm | 1 | as is where is | ||
| 98557 | Applied Materials | Centura DPS II (AE) POLY | POLY ETCHER | 300 mm | 1 | as is where is | ||
| 98801 | Applied Materials | ENDURA 2 | Metal Etch HT-Al 2ch / SIP-Ti 1ch | 300 mm | 01.05.2003 | 1 | as is where is | |
| 99089 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal - Chamber Only | Metal Etch | 300mm | 1 | as is where is | ||
| 99090 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal - Chamber Only | Metal Etch | 300mm | 1 | as is where is | ||
| 100031 | Applied Materials | Centura DPS 2 Advantedge Mesa | Dry Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100032 | Applied Materials | Centura DPS 2 G5 | Dry Etch | 300 mm | 01.06.2008 | 1 | as is where is | immediately |
| 100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 01.06.2015 | 1 | as is where is | |
| 100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 01.06.2015 | 1 | as is where is | |
| 100911 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 01.06.2016 | 1 | as is where is | |
| 100912 | Applied Materials | DPS G5 Mesa | Poly Etcher | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 01.06.2006 | 1 | as is where is | |
| 100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
| 101014 | Applied Materials | Centura ACP DPN HD | Gate Stack Decoupled plasma Nitride | 300 mm | 01.06.2018 | 1 | as is where is | immediately |
| 101402 | Applied Materials | Centura AP AdvantEdge G5 Minos Poly | Polysilicon Etch | 300mm | 01.06.2015 | 1 | as is where is | |
| 101403 | Applied Materials | Centura AP eMax CT | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 101404 | Applied Materials | Centura AP Enabler | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 101408 | Applied Materials | Producer Etch eXT Dielectric | Dielectric Etch | 300mm | 1 | as is where is | ||
| 101524 | Applied Materials | AdvantEdge G5 | Polysilicon Etch | 300 mm | 01.03.2012 | 1 | as is where is | |
| 102081 | Applied Materials | Centura Carina Chamber | Chamber | 300 mm | 1 | as is where is | ||
| 102084 | Applied Materials | Centura DPS2 AdvantEdge G5 Mesa | Poly | 300 mm | 01.06.2007 | 1 | as is where is | |
| 102086 | Applied Materials | Centura DPS2 Advantedge G5 | 2 chamber dry etch cluster tool | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102088 | Applied Materials | Centura DPS2 Poly | Poly Etch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 102089 | Applied Materials | Centura Enabler | Oxide Etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
| 102111 | Applied Materials | Producer GT | FRONTIER etch | 300 mm | 01.06.2015 | 1 | as is where is | |
| 102112 | Applied Materials | Producer GT | FRONTIER etch | 300 mm | 01.06.2015 | 1 | as is where is | |
| 102113 | Applied Materials | Producer GT | FRONTIER Nitride Poly etch | 300 mm | 01.06.2016 | 1 | as is where is | |
| 102114 | Applied Materials | Producer GT | FRONTIER etch | 300 mm | 01.06.2017 | 1 | as is where is | |
| 102115 | Applied Materials | Producer GT Chamber | ACL | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102468 | Applied Materials | Centura 5200 IPS | DI-ELECTRIC ETCH SYSTEM WITH 3 CHAMBERS | 200 mm | 1 | as is where is | immediately | |
| 102659 | Applied Materials | Centura AP DPS II Metal | Metal Etch 2 Ch DPS2 and 2 CH ASP | 300 mm | 1 | as is where is | ||
| 102660 | Applied Materials | Centura AP DPS II Metal | Metal Etch 2 Ch DPS2 and 2 CH ASP | 300 mm | 1 | as is where is | ||
| 102661 | Applied Materials | Centura AP Enabler | Dielectric Etch - Etch/Ash/Clean – OXIDE Plasma Processing | 300 mm | 1 | as is where is | ||
| 102856 | Applied Materials | Centura 5200 DPS II | Metal Etch with 2 x DPS2 Metal etch and 2 x Axiom CH | 300 mm | 01.06.2008 | 1 | as is where is | |
| 102947 | Applied Materials | DPS2_Poly | Dry Etch with 2CH DPS2 and 2 CH Axiom | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102998 | Applied Materials | P5000 | Teos Deposition Tool, Oxide Etch, 3 Chambers | 100 mm | 1 | as is where is | ||
| 103054 | Applied Materials | Centris AdvantEdge G5 Mesa Poly | Dry Etch 6 chamber Mesa II + 2 AxisWll | 300mm | 1 | as is where is | ||
| 103055 | Applied Materials | Centura AdvantEdge Mesa2 | Dry Etch Mesa 2 / Mesa 2 W | 300mm | 1 | as is where is | ||
| 103056 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Poly Dry Etch | 300mm | 01.12.2014 | 1 | as is where is | |
| 103057 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Poly Dry Etch | 300mm | 01.12.2014 | 1 | as is where is | |
| 103063 | Applied Materials | Producer Etch XT Dielectric | Dielectric Dry Etch CHA Twin Di-electric etch, CHC Twin Di-electric etch | 300mm | 1 | as is where is | ||
| 103064 | Applied Materials | Producer Etch XT Dielectric | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 103445 | Applied Materials | Centura aP | Poly Etch | 300 mm | 1 | as is where is | ||
| 103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 01.06.2003 | 1 | as is where is | |
| 103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 01.06.2005 | 1 | as is where is | |
| 103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103482 | Applied Materials | DPS SILVIA | Silvia 2ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103483 | Applied Materials | DPS2 | Poly Etcher | 300 mm | 1 | as is where is | ||
| 103484 | Applied Materials | DPS2 | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103485 | Applied Materials | DPS2 AE | Poly Etcher | 300 mm | 1 | as is where is | ||
| 103486 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103487 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103488 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103489 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103490 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103491 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 1 | as is where is | ||
| 103492 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 01.06.2005 | 1 | as is where is | |
| 103493 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 01.06.2006 | 1 | as is where is | |
| 103494 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2019 | 1 | as is where is | |
| 103495 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2019 | 1 | as is where is | |
| 103496 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2019 | 1 | as is where is | |
| 103497 | Applied Materials | EMAX CT+ | Dielectric Etch Chamber | 300 mm | 01.06.2017 | 1 | as is where is | |
| 103683 | Applied Materials | P5000 | 2 CH Etch, 2 CH TEOS CVD | 200 mm | 01.06.1995 | 1 | as is where is | |
| 66407 | Applied Materials AMAT | Centura 5200 eMxP+ | 3 chamber dry etcher | 200 mm | 01.06.1999 | 1 | inquire | immediately |
| 101792 | Canon | ILD-4100SR | Oxide Dry Etcher | 200 mm | 01.04.1996 | 1 | inquire | |
| 105798 | CI Science | Torus 300K | Dry Etcher | 300 mm | 1 | as is where is | ||
| 105799 | CI Science | Torus 300K | Dry Etcher | 300 mm | 1 | as is where is | ||
| 105800 | CI Science | Torus 300K | Dry Etcher | 300 mm | 1 | as is where is | ||
| 105801 | CI Science | Torus 300K | Dry Etcher | 300 mm | 1 | as is where is | ||
| 105802 | CI Science | Torus 300K | Dry Etcher | 300 mm | 1 | as is where is | ||
| 105803 | CI Science | Torus 300K | Dry Etcher | 300 mm | 1 | as is where is | ||
| 105804 | CI Science | Torus 300K | Dry Etcher | 300 mm | 1 | as is where is | ||
| 105805 | CI Science | TORUS300K | Dry Etcher | 300 mm | 1 | as is where is | ||
| 100725 | Corial | 300IL | ICP Dry Etcher | 1 | as is where is | |||
| 92713 | FEI | Dual beam 820 | FIB SEM | 200 mm | 01.06.1997 | 1 | as is where is | immediately |
| 69945 | Gasonics | AE 2001 | Single wafer etch system | 1 | ||||
| 82891 | Gasonics | Strata | Oxide Etch System | 200 | 01.06.1997 | 1 | as is where is | immediately |
| 81831 | Hitachi | M712E | ECR Plasma Etcher | 200mm | 1 | as is where is | immediately | |
| 89915 | Hitachi | U-722 | Etch 300mm | 300mm | 3 | as is where is | ||
| 100164 | Hitachi | U-7050A | Metal Etch | 300mm | 01.10.2013 | 1 | as is where is | |
| 102700 | Hitachi | U-702 | Dry Etcher – Metal | 300 mm | 01.06.2004 | 1 | as is where is | |
| 102701 | Hitachi | U-702 | Dry Etcher – Metal | 300 mm | 01.06.2004 | 1 | as is where is | |
| 102702 | Hitachi | U-7050A | Dry Etcher – Metal 4 chamber | 300 mm | 01.10.2013 | 1 | as is where is | |
| 102703 | Hitachi | U-7050A | Dry Etcher – Metal 4 chamber | 300 mm | 01.06.2007 | 1 | as is where is | |
| 60923 | LAM | 4720 | Oxide Etcher | 1 | as is where is | immediately | ||
| 91129 | LAM | TCP9400SE | Etcher | 200mm non-SMIF | 01.06.2018 | 2 | inquire | 4 months |
| 91130 | LAM | TCP9400SE | Etcher | 200mm SMIF | 01.06.2018 | 2 | inquire | 4 months |
| 71831 | LAM RESEARCH | A6 EXELAN | OXIDE ETCHER (refurbished) | 1 | as is where is | immediately | ||
| 82252 | Lam Research | TCP9600SE | Dry etcher | 8" | 1 | as is where is | immediately | |
| 82257 | Lam Research | 2300 EXELAN | Dry etcher | 8" | 01.06.2004 | 1 | as is where is | immediately |
| 82258 | Lam Research | 2300 EXELAN | Dry etcher | 8" | 01.06.2004 | 1 | as is where is | immediately |
| 86155 | LAM Research | A4 TM(Alliance) | DRY ETCHER – HUB | 200 mm | 1 | as is where is | ||
| 91028 | Lam Research | Alliance4 9400SE | Etcher | 150 mm | 01.06.1996 | 1 | as is where is | immediately |
| 91069 | Lam Research | Alliance4 4420XL | DRY ETCHER | 150 mm | 01.06.1996 | 1 | as is where is | |
| 91070 | Lam Research | Alliance4 9400SE | DRY ETCHER | 200 mm | 01.06.1996 | 1 | as is where is | |
| 91318 | LAM Research | 2300 Exelan Chamber Only | OXIDE ETCH | 300 mm | 01.06.2004 | 1 | as is where is | |
| 91319 | LAM Research | 2300 Exelan SYSTEM | OXIDE ETCH | 300 mm | 01.06.2003 | 1 | as is where is | |
| 91320 | LAM Research | EXELAN 2300 | OXIDE ETCH | 300 mm | 1 | as is where is | ||
| 91328 | LAM Research | STAR Chamber Only | DRY ETCH | 300 mm | 1 | as is where is | ||
| 93038 | LAM Research | RAINBOW4500 | Etcher | 125 mm | 1 | as is where is | ||
| 95099 | Lam Research | A4 4520 PM | ETCH | 8" | 1 | as is where is | ||
| 97004 | LAM RESEARCH | 2300 Metal 45 | Process Chamber (For Spares Use) | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
| 97679 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch 3 chamber | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
| 97682 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch 3 chamber | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
| 98279 | LAM Research | FLEX GX E6 | OXIDE ETCH | 300 mm | 01.06.2008 | 1 | as is where is | |
| 98280 | LAM Research | FLEX GX E6 | OXIDE ETCH | 300 mm | 01.06.2008 | 1 | as is where is | |
| 98346 | LAM Research | 2300 KIYO45 | ETCH | 300 mm | 01.06.2018 | 1 | inquire | |
| 98347 | LAM Research | 2300 KIYO45 | ETCH | 300 mm | 01.06.2012 | 1 | inquire | |
| 98348 | LAM Research | Alliance4 4420XL PM | ETCH | 150 mm | 01.06.1996 | 1 | inquire | |
| 99916 | LAM Research | 2300 e4 FLEX DL (3CH) | Oxide Etch | 300 mm | 1 | as is where is | ||
| 99917 | LAM Research | 2300 V2 (2CH & 1STRIP) | Metal Etch | 300 mm | 1 | as is where is | ||
| 99918 | LAM Research | 2300 V2 FLEX (3CH) | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 99919 | LAM Research | Alliance6 9400DFM (3CH) | ETCH | 200 mm | 1 | as is where is | ||
| 99923 | LAM Research | TCP9600SE | Dry Etcher | 200 mm | 1 | as is where is | ||
| 99924 | LAM Research | TORUS300S | Dry Etcher | 300 mm | 1 | as is where is | ||
| 100204 | LAM Research | 2300 Exelan Flex - Chamber Only | Dielectric Etch | 300mm | 01.06.2006 | 1 | as is where is | |
| 100207 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch | 300mm | 1 | as is where is | ||
| 100922 | LAM Research | FLEX FX | Dry Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 101481 | LAM Research | 2300 KIYO MCX | Metal Etch | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
| 102289 | Lam Research | Strip45 Chamber | chamber | 300 mm | 01.06.2010 | 1 | as is where is | |
| 102568 | LAM Research | TORUS 300K | Dry Etch | 2 | inquire | |||
| 102569 | LAM Research | TORUS 300S | Dry Etch | 2 | inquire | |||
| 102607 | LAM Research | TCP 9600 | Dry Etching System | 200mm | 1 | as is where is | immediately | |
| 102735 | LAM Research | 2300 Exelan Flex | Dielectric Etch Oxide | 300 mm | 1 | as is where is | ||
| 102736 | LAM Research | 2300 Exelan Flex | Dielectric Etch Oxide | 300 mm | 1 | as is where is | ||
| 102737 | LAM Research | 2300 Exelan Flex EX+ - Chamber Only | Dielectric Etch chambers qty 3 | 300 mm | 3 | as is where is | ||
| 102749 | LAM Research | Rainbow 4720 | Metal Etch Envision | 200mm | 01.06.1999 | 1 | as is where is | |
| 103102 | LAM Research | 2300 Exelan | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 103103 | LAM Research | 2300 Exelan | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 103104 | LAM Research | 2300 Exelan Flex FX | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 103105 | LAM Research | 2300 Exelan Flex FX | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 103106 | LAM Research | 2300 Versys Metal - Chamber Only | Metal Etch | 300mm | 01.06.2006 | 1 | as is where is | |
| 103107 | LAM Research | 2300 Versys Metal - Chamber Only | Metal Etch | 300mm | 01.06.2006 | 1 | as is where is | |
| 103108 | LAM Research | 2300 Versys Metal - Chamber Only | Metal Etch | 300mm | 01.06.2006 | 1 | as is where is | |
| 103109 | LAM Research | 2300 Versys Metal - Chamber Only | Metal Etch | 300mm | 01.06.2006 | 1 | as is where is | |
| 103537 | LAM Research | FLEX 45 | 2300 EXELAN | 300 mm | 01.06.2012 | 1 | as is where is | |
| 103538 | LAM Research | INOVA Concept 3 | NExT | 300 mm | 01.06.2005 | 1 | as is where is | |
| 105777 | Lam Research | 9600 PTX | Dry etcher with 2 CH PTX etch and 2 CH Strip | 200 mm | 1 | inquire | 4 months | |
| 103006 | March | PX-2400 | Box Plasma Etcher | 1 | as is where is | |||
| 83977 | Mattson | Aspen 3 ICP | Dual Chamber Asher | 300 mm | 01.08.2008 | 5 | as is where is | immediately |
| 88529 | Mattson | Paradigme SP | Light Etch | 300 MM | 01.06.2010 | 1 | as is where is | |
| 93900 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.06.2011 | 1 | as is where is | |
| 98148 | Mattson | Aspen 3 Lite | LITE ETCHER | 300 mm | 01.06.2006 | 1 | as is where is | |
| 98152 | Mattson | ParadigmE | Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
| 98284 | MATTSON | PARADIGME SI | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 91329 | OXFORD | 800+ | RIE (Reactive Ion Etcher) | 1 | as is where is | immediately | ||
| 99398 | Oxford | Micro-etch 300 | Dry Etcher | 1 | as is where is | immediately | ||
| 101347 | Oxford | PlasmaLab 100 | ICP Etcher | 150mm | 01.03.2000 | 1 | as is where is | immediately |
| 102760 | Oxford Instruments | Plasmalab 80 Plus | Dry etcher | 300 mm | 1 | as is where is | ||
| 99868 | Oxford Plasmalab | 800 RIE | Ion Etching System | 1 | inquire | |||
| 78807 | PLASMA ETCH | BT-1 | PLASMA CLEANER | ASSEMBLY | 01.06.2004 | 1 | as is where is | immediately |
| 91330 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | ||
| 91331 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | ||
| 103008 | Plasma-Therm | VII 734MF | RIE/Plasma Etch | 200 mm | 1 | as is where is | ||
| 103009 | Plasma-Therm | 73/74 | PECVD, Plasma Etch, Reactive Ion Etch | 1 | as is where is | |||
| 103010 | Plasma-Therm | 790 ICP | Inductively Coupled Plasma Etcher with 9.5 Inch Electrode | 200 mm | 01.06.1998 | 1 | as is where is | |
| 103011 | Plasma-Therm | Unaxis 790 | ICP Plasma Etching System | 200 mm | 01.06.2001 | 1 | as is where is | |
| 103660 | PlasmaQuest | Reactive Ion Etching System | Reactive Ion Etching System RIE Astex MKS | 1 | as is where is | |||
| 86447 | Plasmatherm | 790 | RIE | 125 mm | 1 | as is where is | immediately | |
| 97723 | Plasmatherm | 790 Etch | Multi-Process Etch | 200 mm | 1 | as is where is | immediately | |
| 99403 | PlasmaTherm | SLR 740 | Dual Chamber RIE / Plasma etch | 200 mm | 01.05.1999 | 1 | as is where is | immediately |
| 103451 | Plasmatherm | SLR-770 ICP | Silicon Deep Etching | 100 mm | 01.06.1998 | 1 | as is where is | |
| 95112 | PSK | EVOLITE2 | ETCH | - | 01.06.2011 | 1 | as is where is | |
| 95113 | PSK | EVOLITE2 | ETCH | - | 01.06.2011 | 1 | as is where is | |
| 95114 | PSK | TERA21 | ETCH | - | 01.06.2002 | 1 | as is where is | |
| 86163 | SAMCO | RIE-10N | RIE | 200 mm | 1 | as is where is | ||
| 86164 | SAMCO | RIE-10N | RIE | 200 mm | 1 | as is where is | ||
| 86165 | SAMCO | RIE-10NR | RIE | 200 mm | 1 | as is where is | ||
| 91076 | SAMCO | RIE-10NR | ETCH | 200 mm | 01.06.2000 | 1 | as is where is | |
| 93396 | Shibaura | CD 80 | Dry Etcher | 200 mm | 1 | as is where is | immediately | |
| 97738 | Shibaura | CDE-300 | Metal Etch | 300 mm | 1 | as is where is | ||
| 102392 | Shibaura | CDE300 | Dry Etch | 300 mm | 1 | as is where is | ||
| 102393 | Shibaura | ICE/CDE300 | Isotropic Chemical Dry Etch | 300 mm | 01.06.2005 | 1 | as is where is | |
| 79584 | SPTS | 320 PC | Reactive Ion Etcher | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
| 87626 | SPTS | Multiplex ASE | Dry etcher system | 100 mm | 01.06.1998 | 1 | as is where is | immediately |
| 93314 | SPTS | Primaxx CET25-CPX | DRY ETCH | 200 mm | 1 | as is where is | immediately | |
| 102623 | SPTS | Omega 201 | Plasma Dry etcher | 200 mm | 01.06.2010 | 1 | as is where is | immediately |
| 99829 | STS (SPTS) | Primaxx HR ICP | Dry Etcher | 01.06.2002 | 1 | as is where is | immediately | |
| 83689 | Tegal | TEGAL 981 | Nitride Etch | 200 mm | 1 | as is where is | immediately | |
| 93039 | TEGAL | PLASMA 900E | Plasma dry etch | 100 mm | 1 | as is where is | ||
| 75635 | TEL Tokyo Electron | Unity Me SCCM (Chamber) | Dry oxide etch chamber | 200 mm | 1 | as is where is | immediately | |
| 75636 | TEL Tokyo Electron | Unity Me SCCM 85S | Oxide etcher (3 chamber) | 200 mm | 01.10.2003 | 1 | as is where is | immediately |
| 91335 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 91336 | TEL TOKYO ELECTRON | SCCM SHIN | Dry ETCHER | 200 mm | 1 | as is where is | ||
| 91337 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 91338 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1994 | 1 | as is where is | |
| 91339 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.1995 | 1 | as is where is | |
| 91340 | TEL TOKYO ELECTRON | TE8500 | Etcher | 200 mm | 01.06.2006 | 1 | as is where is | |
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 01.06.2007 | 1 | as is where is | |
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2009 | 1 | as is where is | |
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 01.06.2010 | 1 | as is where is | |
| 96927 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 01.06.2012 | 1 | as is where is | |
| 96931 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 98043 | TEL Tokyo Electron | Unity 2e 855DD (DRM Chamber) | DRM Chamber | 200 mm | 01.06.2004 | 1 | as is where is | |
| 98044 | TEL Tokyo Electron | Unity 2e 855DP (Poly Chamber) | DRM Chamber | 200 mm | 01.06.2005 | 1 | as is where is | |
| 98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 01.05.2009 | 1 | as is where is | immediately |
| 98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 01.08.2013 | 1 | as is where is | immediately |
| 99901 | TEL Tokyo Electron | Unity 2E 855 DD | Dry etcher with 2 X DRM CHAMBERS | 200 MM | 01.08.2000 | 1 | as is where is | immediately |
| 100308 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300mm | 01.06.2003 | 1 | as is where is | |
| 101807 | TEL Tokyo Electron | SCCM-SHIN | Dry Etecher | 300 mm | 1 | inquire | ||
| 101808 | TEL Tokyo Electron | TE-8401 | Si Dry Etcher | 200 mm | 01.05.1992 | 1 | inquire | |
| 102402 | TEL Tokyo Electron | Certas LEAGA | Etch, Single wafer Dry Cleaning System | 300 mm | 01.06.2016 | 1 | as is where is | |
| 102419 | TEL Tokyo Electron | nFusion 700 | Ion Beam Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 102420 | TEL Tokyo Electron | nFusion 700 MP | Ion Beam Etch | 300 mm | 01.06.2011 | 1 | as is where is | |
| 102421 | TEL Tokyo Electron | nFusion 700 MP | Ion Beam Etch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 102439 | TEL Tokyo Electron | TSP 305 SCCM TE | Dielectric Etch | 300 mm | 01.06.2007 | 1 | as is where is | |
| 102811 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 01.03.2014 | 1 | as is where is | |
| 102825 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 1 | as is where is | ||
| 102826 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch, Oxide Process, 4 CHAMBER SCCM | 300 mm | 01.06.2008 | 1 | as is where is | |
| 103130 | TEL Tokyo Electron | Telius 305 DRM | Dielectric Dry Etch | 300mm | 01.06.2003 | 1 | as is where is | |
| 103131 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 01.06.2007 | 1 | as is where is | |
| 103132 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Dry Etch | 300mm | 1 | as is where is | ||
| 103017 | Tepla | 4011 | Planar Plasma Etcher | 1 | as is where is | |||
| 86679 | Trion Technology | Phantom II | Reactive ion etcher | 01.06.0200 | 1 | as is where is | immediately | |
| 103018 | Ulvac | NE 7800 | Ferroelectric Etcher | 200 mm | 1 | as is where is | ||
| 103450 | Ulvac | NE-5700 | Metal Etch | 150 mm | 01.06.2007 | 1 | as is where is | |
| 98048 | UNAXIS | SLR-720 | RIE | 150 mm | 1 | as is where is | immediately | |
| 98049 | UNAXIS | SLR-720 | RIE | 200 mm | 1 | as is where is |