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ASML XT760F 248 nm DUV Scanner (KrF) for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used ASML XT760F 248 nm DUV Scanner (KrF).
Please click on the "Get Quote" button at the end of the XT760F description, if you'd like to get a quotation, photos and specifications of this 248 nm DUV Scanner (KrF), and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This ASML XT760F 248 nm DUV Scanner (KrF) is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


ASML XT760F Equipment Details

SDI ID: 98265
Manufacturer: ASML
Model: XT760F
Description: 248 nm DUV Scanner (KrF)
Version: 300 mm
Vintage: 01.04.2008
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

The TWINSCAN™ XT:760F 248-nm Step-and-Scan system was made for running high-volume mid-critical KrF applications. It is a dual-stage ultra-high throughput tool for 300-mm production at the 90,65 and 45 nm nodes.
It is fitted with a variable NA  0.50–0.70 Zeiss Starlith™ 4X reduction lens with an AERIAL™ II Illuminator.
It was made to run layers like implants and back-end layers for the 90-, 65- and 45-nm nodes.

Basic Specifications
Lens NA: Variable o.50 to 0.70
Resolution: >= 130 nm
Field Size (X x Y): 26 mm x 33 mm
Overlay (@ point global alignment): <= 12 nm
Throughput (300 mm wafers, 125 exp, 50 mJ/cm2): >= 134 w.p.h.

-De-installed        -Warehoused

-Can be inspected by appointment  (See attached photos for details.).

Process Run: KrF Low NA
Operating system: UNIX
SMIF/FOUP: YES
HDD: Not included
Track Interface: TEL Lithius
Known Missing/ Damaged Parts: None
Laser Type: Gigaphoton
Laser Model: A700GK-1
Laser Vintage: OCT 2007
Basic Lens Performance (SAT) data summary:(Spec. is shown in brackets after result)
Illumination Intensity: 5792 mW/cm2 (>4300)
Image Plane Deviation Setting 1: 58 nm (<130)
Astigmatism Setting 1: 40 nm (<85)
Dynamic Performance Moving S.D.: 7.44 nm (<10)
Dynamic Performance Moving Average: 3.05 nm (<4.50)
Image Distortion (Non-correctable error, Setting 1): 11.1 nm (<15)
Focus and levelling Wafer Map Reproducability (99.7%): 6.3 (<25)
Stage repeatability: 7.2 nm (<10)
Single machine Overlay (Setting 1, chuck A to chuck B): 13.2 nm (<15)
TIS Pupil Measurement TAMIS XY Z7.8 o/s: 0.63 (0 +/-4)
TIS Pupil Measurement TAMIS XY Z7 Tilt in X: 0.03 nm/cm (0 +/-2)


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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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